DE3381755D1 - Verfahren zur herstellung von diffraktionsgittern. - Google Patents

Verfahren zur herstellung von diffraktionsgittern.

Info

Publication number
DE3381755D1
DE3381755D1 DE8383302132T DE3381755T DE3381755D1 DE 3381755 D1 DE3381755 D1 DE 3381755D1 DE 8383302132 T DE8383302132 T DE 8383302132T DE 3381755 T DE3381755 T DE 3381755T DE 3381755 D1 DE3381755 D1 DE 3381755D1
Authority
DE
Germany
Prior art keywords
production
grids
differential
differential grids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8383302132T
Other languages
English (en)
Inventor
Yoshikazu Sumitomo E Nishiwaki
Shunji Sumitomo Elect Matsuoka
Kenji Sumitomo Electri Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP57063313A external-priority patent/JPS58179805A/ja
Priority claimed from JP57066585A external-priority patent/JPS58182604A/ja
Priority claimed from JP7271382A external-priority patent/JPS58190921A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE3381755D1 publication Critical patent/DE3381755D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8383302132T 1982-04-16 1983-04-15 Verfahren zur herstellung von diffraktionsgittern. Expired - Fee Related DE3381755D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP57063313A JPS58179805A (ja) 1982-04-16 1982-04-16 露光装置
JP57066585A JPS58182604A (ja) 1982-04-20 1982-04-20 回折格子作製法
JP7271382A JPS58190921A (ja) 1982-04-30 1982-04-30 分波素子

Publications (1)

Publication Number Publication Date
DE3381755D1 true DE3381755D1 (de) 1990-08-30

Family

ID=27298125

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383302132T Expired - Fee Related DE3381755D1 (de) 1982-04-16 1983-04-15 Verfahren zur herstellung von diffraktionsgittern.

Country Status (4)

Country Link
US (2) US4560249A (de)
EP (2) EP0092395B1 (de)
CA (1) CA1211868A (de)
DE (1) DE3381755D1 (de)

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US5098804A (en) * 1989-01-13 1992-03-24 E. I. Du Pont De Nemours And Company Multiplexer-demultiplexer for integrated optic circuit
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US7167615B1 (en) 1999-11-05 2007-01-23 Board Of Regents, The University Of Texas System Resonant waveguide-grating filters and sensors and methods for making and using same
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US6490081B1 (en) * 2000-07-28 2002-12-03 The Board Of Trustees Of The Leland Stanford Junior University Method of amplifying optical signals using doped materials with extremely broad bandwidths
US6904201B1 (en) * 2001-05-09 2005-06-07 Intel Corporation Phase-controlled fiber Bragg gratings and manufacturing methods
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US7440078B2 (en) * 2005-12-20 2008-10-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
US7561252B2 (en) * 2005-12-29 2009-07-14 Asml Holding N.V. Interferometric lithography system and method used to generate equal path lengths of interfering beams
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Also Published As

Publication number Publication date
EP0092395A3 (en) 1985-11-21
CA1211868A (en) 1986-09-23
US4560249A (en) 1985-12-24
EP0092395A2 (de) 1983-10-26
EP0303836A1 (de) 1989-02-22
EP0092395B1 (de) 1990-07-25
US4673241A (en) 1987-06-16

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