DE3376853D1 - Apparatus for regenerating an ammoniacal etching solution - Google Patents

Apparatus for regenerating an ammoniacal etching solution

Info

Publication number
DE3376853D1
DE3376853D1 DE8383111152T DE3376853T DE3376853D1 DE 3376853 D1 DE3376853 D1 DE 3376853D1 DE 8383111152 T DE8383111152 T DE 8383111152T DE 3376853 T DE3376853 T DE 3376853T DE 3376853 D1 DE3376853 D1 DE 3376853D1
Authority
DE
Germany
Prior art keywords
etching solution
oxygen
line
etching
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383111152T
Other languages
German (de)
Inventor
Wolfgang Faul
Leander Furst
Walter Holzer
Bertel Prof Dr Kastening
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Juelich GmbH
Original Assignee
Kernforschungsanlage Juelich GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungsanlage Juelich GmbH filed Critical Kernforschungsanlage Juelich GmbH
Priority to DE8383111152T priority Critical patent/DE3376853D1/en
Application granted granted Critical
Publication of DE3376853D1 publication Critical patent/DE3376853D1/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)

Abstract

1. Equipment for regenerating an ammoniacal etching solution which contains catalyst particles for reoxidation with supply of oxygen, having a feed line for etching solution taken from an etching chamber to a filter which is impermeable to catalyst particles in the etching solution, and a return line, connected to the filter, for etching solution, containing catalyst particles, to the etching chamber, and having an electrolytic cell, in which a connecting line, connected to the filter, for catalyst particle-free etching solution obtainable as the filtrate ends and which has an outlet, connectable to the etching chamber, for etching solution which has been deplected of metal ions, characterized in that a liquid-jet pump (10) is inserted into the return line (9), the working medium of the pump being the etching solution and the suction branch (11) of the pump being connected to an oxygen line (12) which carries oxygen or an oxygen-containing gas mixture and which can be fed with oxygen generated at the anode (17) of the electrolytic cell (13), and that teh oxygen line (12) is connected to the gas space above the electrolyte in the electrolytic cell (13) and passes to the suction branch (11) via a condenser (42) for precipitating water vapour from the gas mixture carried in the oxygen line (12), and that a condensate line (44) discharging condensate produced on the condenser (42) ends in washing chamber (2) downstream of the etching chamber (1).
DE8383111152T 1983-04-13 1983-11-08 Apparatus for regenerating an ammoniacal etching solution Expired DE3376853D1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8383111152T DE3376853D1 (en) 1983-04-13 1983-11-08 Apparatus for regenerating an ammoniacal etching solution

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3313293 1983-04-13
DE8383111152T DE3376853D1 (en) 1983-04-13 1983-11-08 Apparatus for regenerating an ammoniacal etching solution

Publications (1)

Publication Number Publication Date
DE3376853D1 true DE3376853D1 (en) 1988-07-07

Family

ID=6196226

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383111152T Expired DE3376853D1 (en) 1983-04-13 1983-11-08 Apparatus for regenerating an ammoniacal etching solution

Country Status (4)

Country Link
EP (1) EP0122963B1 (en)
JP (1) JPS6013083A (en)
AT (1) ATE34781T1 (en)
DE (1) DE3376853D1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2449164A1 (en) * 1979-02-14 1980-09-12 Sogreah ARTIFICIAL BLOCK FOR MARITIME AND RIVER STRUCTURES
DE3345050A1 (en) * 1983-12-13 1985-06-20 Walter 7758 Meersburg Holzer METHOD FOR THE ENVIRONMENTALLY FRIENDLY ASSEMBLY OF CIRCUIT BOARDS AND DEVICE FOR EXERCISING THE WORKING METHOD
AU608969B2 (en) * 1989-04-21 1991-04-18 Ming-Hsing Lee Process for etching copper with ammoniacal etchant solution and reconditioning the used etchant solution
US5248398A (en) * 1990-11-16 1993-09-28 Macdermid, Incorporated Process for direct electrolytic regeneration of chloride-based ammoniacal copper etchant bath
US5085730A (en) * 1990-11-16 1992-02-04 Macdermid, Incorporated Process for regenerating ammoniacal chloride etchants
US20140251797A1 (en) * 2011-10-08 2014-09-11 Christoph Herkle Etching device for the electrolytic etching of copper

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2008766B2 (en) * 1970-02-23 1971-07-29 Licentia Patent Verwaltungs GmbH, 6000 Frankfurt Regenerating cupric chloride etching - solution enriched with cuprous chloride
US3705061A (en) * 1971-03-19 1972-12-05 Southern California Chem Co In Continuous redox process for dissolving copper
DE2216269A1 (en) * 1972-04-05 1973-10-18 Hoellmueller Maschbau H METHOD OF ETCHING COPPER AND COPPER ALLOYS
US3785950A (en) * 1972-05-19 1974-01-15 E Newton Regeneration of spent etchant
DE2641905C2 (en) * 1976-09-17 1986-03-20 Geb. Bakulina Galina Aleksandrovna Batova Process for the regeneration of used etching solutions
DE3031567A1 (en) * 1980-08-21 1982-04-29 Elochem Ätztechnik GmbH, 7758 Meersburg METHOD FOR REGENERATING AN AMMONIA ACAL SOLUTION

Also Published As

Publication number Publication date
ATE34781T1 (en) 1988-06-15
EP0122963B1 (en) 1988-06-01
EP0122963A1 (en) 1984-10-31
JPH0429745B2 (en) 1992-05-19
JPS6013083A (en) 1985-01-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FORSCHUNGSZENTRUM JUELICH GMBH, 5170 JUELICH, DE

8339 Ceased/non-payment of the annual fee