DE3329662C2 - - Google Patents
Info
- Publication number
- DE3329662C2 DE3329662C2 DE3329662A DE3329662A DE3329662C2 DE 3329662 C2 DE3329662 C2 DE 3329662C2 DE 3329662 A DE3329662 A DE 3329662A DE 3329662 A DE3329662 A DE 3329662A DE 3329662 C2 DE3329662 C2 DE 3329662C2
- Authority
- DE
- Germany
- Prior art keywords
- mask
- solution
- layer
- areas
- pure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 17
- 230000005855 radiation Effects 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 8
- 239000004332 silver Substances 0.000 claims description 8
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 101710134784 Agnoprotein Proteins 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 238000000454 electroless metal deposition Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 229940095064 tartrate Drugs 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 6
- 206010070834 Sensitisation Diseases 0.000 description 4
- 230000002950 deficient Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 230000008313 sensitization Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000009996 mechanical pre-treatment Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833329662 DE3329662A1 (de) | 1983-08-17 | 1983-08-17 | Verfahren zum nachbessern von optischen belichtungsmasken |
| JP59168913A JPS6076746A (ja) | 1983-08-17 | 1984-08-14 | 露光マスクの修理方法 |
| EP84201179A EP0141434B1 (de) | 1983-08-17 | 1984-08-15 | Verfahren zum Nachbessern von optischen Belichtungsmasken |
| DE8484201179T DE3474867D1 (en) | 1983-08-17 | 1984-08-15 | Process for the correction of photo masks |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833329662 DE3329662A1 (de) | 1983-08-17 | 1983-08-17 | Verfahren zum nachbessern von optischen belichtungsmasken |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3329662A1 DE3329662A1 (de) | 1985-03-07 |
| DE3329662C2 true DE3329662C2 (en, 2012) | 1988-05-26 |
Family
ID=6206741
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19833329662 Granted DE3329662A1 (de) | 1983-08-17 | 1983-08-17 | Verfahren zum nachbessern von optischen belichtungsmasken |
| DE8484201179T Expired DE3474867D1 (en) | 1983-08-17 | 1984-08-15 | Process for the correction of photo masks |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8484201179T Expired DE3474867D1 (en) | 1983-08-17 | 1984-08-15 | Process for the correction of photo masks |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0141434B1 (en, 2012) |
| JP (1) | JPS6076746A (en, 2012) |
| DE (2) | DE3329662A1 (en, 2012) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2015841C3 (de) * | 1970-04-02 | 1979-04-05 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung einer strukturierten, vorzugsweise metallischen Schicht auf einem Grundkörper |
| US3833375A (en) * | 1972-03-09 | 1974-09-03 | Rca Corp | Method of repairing an imperfect pattern of metalized portions on a substrate |
| US4018938A (en) * | 1975-06-30 | 1977-04-19 | International Business Machines Corporation | Fabrication of high aspect ratio masks |
| JPS5350981A (en) * | 1976-10-20 | 1978-05-09 | Mitsubishi Electric Corp | Photo mask collection method |
| US4200668A (en) * | 1978-09-05 | 1980-04-29 | Western Electric Company, Inc. | Method of repairing a defective photomask |
| US4328298A (en) * | 1979-06-27 | 1982-05-04 | The Perkin-Elmer Corporation | Process for manufacturing lithography masks |
| US4383016A (en) * | 1981-09-25 | 1983-05-10 | Ppg Industries, Inc. | Method for repairing glass photomasks |
| JPS58111317A (ja) * | 1981-12-25 | 1983-07-02 | Oki Electric Ind Co Ltd | フオトマスクの修正方法 |
-
1983
- 1983-08-17 DE DE19833329662 patent/DE3329662A1/de active Granted
-
1984
- 1984-08-14 JP JP59168913A patent/JPS6076746A/ja active Pending
- 1984-08-15 DE DE8484201179T patent/DE3474867D1/de not_active Expired
- 1984-08-15 EP EP84201179A patent/EP0141434B1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0141434A2 (de) | 1985-05-15 |
| EP0141434A3 (en) | 1985-07-24 |
| DE3329662A1 (de) | 1985-03-07 |
| EP0141434B1 (de) | 1988-10-26 |
| DE3474867D1 (en) | 1988-12-01 |
| JPS6076746A (ja) | 1985-05-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |