JPS6076746A - 露光マスクの修理方法 - Google Patents
露光マスクの修理方法Info
- Publication number
- JPS6076746A JPS6076746A JP59168913A JP16891384A JPS6076746A JP S6076746 A JPS6076746 A JP S6076746A JP 59168913 A JP59168913 A JP 59168913A JP 16891384 A JP16891384 A JP 16891384A JP S6076746 A JPS6076746 A JP S6076746A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- solution
- exposure
- coated
- exposure mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008439 repair process Effects 0.000 title claims description 6
- 238000000034 method Methods 0.000 claims description 22
- 229910052709 silver Inorganic materials 0.000 claims description 13
- 239000004332 silver Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- 238000000454 electroless metal deposition Methods 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 2
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical group O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims description 2
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 claims 1
- 229940074439 potassium sodium tartrate Drugs 0.000 claims 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000009996 mechanical pre-treatment Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833329662 DE3329662A1 (de) | 1983-08-17 | 1983-08-17 | Verfahren zum nachbessern von optischen belichtungsmasken |
| DE3329662.6 | 1983-08-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6076746A true JPS6076746A (ja) | 1985-05-01 |
Family
ID=6206741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59168913A Pending JPS6076746A (ja) | 1983-08-17 | 1984-08-14 | 露光マスクの修理方法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0141434B1 (en, 2012) |
| JP (1) | JPS6076746A (en, 2012) |
| DE (2) | DE3329662A1 (en, 2012) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48101559A (en, 2012) * | 1972-03-09 | 1973-12-20 | ||
| JPS5350981A (en) * | 1976-10-20 | 1978-05-09 | Mitsubishi Electric Corp | Photo mask collection method |
| JPS58111317A (ja) * | 1981-12-25 | 1983-07-02 | Oki Electric Ind Co Ltd | フオトマスクの修正方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2015841C3 (de) * | 1970-04-02 | 1979-04-05 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung einer strukturierten, vorzugsweise metallischen Schicht auf einem Grundkörper |
| US4018938A (en) * | 1975-06-30 | 1977-04-19 | International Business Machines Corporation | Fabrication of high aspect ratio masks |
| US4200668A (en) * | 1978-09-05 | 1980-04-29 | Western Electric Company, Inc. | Method of repairing a defective photomask |
| US4328298A (en) * | 1979-06-27 | 1982-05-04 | The Perkin-Elmer Corporation | Process for manufacturing lithography masks |
| US4383016A (en) * | 1981-09-25 | 1983-05-10 | Ppg Industries, Inc. | Method for repairing glass photomasks |
-
1983
- 1983-08-17 DE DE19833329662 patent/DE3329662A1/de active Granted
-
1984
- 1984-08-14 JP JP59168913A patent/JPS6076746A/ja active Pending
- 1984-08-15 DE DE8484201179T patent/DE3474867D1/de not_active Expired
- 1984-08-15 EP EP84201179A patent/EP0141434B1/de not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS48101559A (en, 2012) * | 1972-03-09 | 1973-12-20 | ||
| JPS5350981A (en) * | 1976-10-20 | 1978-05-09 | Mitsubishi Electric Corp | Photo mask collection method |
| JPS58111317A (ja) * | 1981-12-25 | 1983-07-02 | Oki Electric Ind Co Ltd | フオトマスクの修正方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0141434A2 (de) | 1985-05-15 |
| EP0141434A3 (en) | 1985-07-24 |
| DE3329662A1 (de) | 1985-03-07 |
| EP0141434B1 (de) | 1988-10-26 |
| DE3329662C2 (en, 2012) | 1988-05-26 |
| DE3474867D1 (en) | 1988-12-01 |
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