DE3303154A1 - Verfahren zur chemischen abscheidung von vanadinoxidfilmen aus der dampfphase und mit vanadinoxidfilmen ueberzogene gegenstaende - Google Patents
Verfahren zur chemischen abscheidung von vanadinoxidfilmen aus der dampfphase und mit vanadinoxidfilmen ueberzogene gegenstaendeInfo
- Publication number
- DE3303154A1 DE3303154A1 DE19833303154 DE3303154A DE3303154A1 DE 3303154 A1 DE3303154 A1 DE 3303154A1 DE 19833303154 DE19833303154 DE 19833303154 DE 3303154 A DE3303154 A DE 3303154A DE 3303154 A1 DE3303154 A1 DE 3303154A1
- Authority
- DE
- Germany
- Prior art keywords
- vanadium
- glass substrate
- temperature
- glass
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 34
- 238000005234 chemical deposition Methods 0.000 title claims description 8
- 238000004326 stimulated echo acquisition mode for imaging Methods 0.000 title 1
- 239000011521 glass Substances 0.000 claims description 77
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 68
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical group [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 43
- 230000008859 change Effects 0.000 claims description 29
- 229910052720 vanadium Inorganic materials 0.000 claims description 29
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 28
- 239000007789 gas Substances 0.000 claims description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 230000007704 transition Effects 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000000465 moulding Methods 0.000 claims description 11
- 230000001590 oxidative effect Effects 0.000 claims description 11
- IZNXGXORLKRGRH-UHFFFAOYSA-N CC(C)O[V](OC(C)C)(OC(C)C)(OC(C)C)OC(C)C Chemical compound CC(C)O[V](OC(C)C)(OC(C)C)(OC(C)C)OC(C)C IZNXGXORLKRGRH-UHFFFAOYSA-N 0.000 claims description 10
- 230000035699 permeability Effects 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 150000003682 vanadium compounds Chemical class 0.000 claims description 8
- 238000005229 chemical vapour deposition Methods 0.000 claims description 7
- 239000012808 vapor phase Substances 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 230000003595 spectral effect Effects 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- LMHHRCOWPQNFTF-UHFFFAOYSA-N s-propan-2-yl azepane-1-carbothioate Chemical compound CC(C)SC(=O)N1CCCCCC1 LMHHRCOWPQNFTF-UHFFFAOYSA-N 0.000 claims description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 239000002019 doping agent Substances 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 2
- BMTAFVWTTFSTOG-UHFFFAOYSA-N Butylate Chemical compound CCSC(=O)N(CC(C)C)CC(C)C BMTAFVWTTFSTOG-UHFFFAOYSA-N 0.000 claims description 2
- LPHBWRJXTUNCAI-UHFFFAOYSA-N [V+5].CCC[O-].CCC[O-].CCC[O-].CCC[O-].CCC[O-] Chemical compound [V+5].CCC[O-].CCC[O-].CCC[O-].CCC[O-].CCC[O-] LPHBWRJXTUNCAI-UHFFFAOYSA-N 0.000 claims description 2
- ZHXZNKNQUHUIGN-UHFFFAOYSA-N chloro hypochlorite;vanadium Chemical compound [V].ClOCl ZHXZNKNQUHUIGN-UHFFFAOYSA-N 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims 5
- 230000008020 evaporation Effects 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 238000001816 cooling Methods 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 1
- 238000005266 casting Methods 0.000 claims 1
- BWKCCRPHMILRGD-UHFFFAOYSA-N chloro hypochlorite;tungsten Chemical compound [W].ClOCl BWKCCRPHMILRGD-UHFFFAOYSA-N 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 claims 1
- 150000002736 metal compounds Chemical group 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 150000003658 tungsten compounds Chemical class 0.000 claims 1
- 239000010408 film Substances 0.000 description 47
- 239000012071 phase Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000003517 fume Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000010734 process oil Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 241000270728 Alligator Species 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- -1 silver halides Chemical class 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- IBYSTTGVDIFUAY-UHFFFAOYSA-N vanadium monoxide Chemical compound [V]=O IBYSTTGVDIFUAY-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/27—Oxides by oxidation of a coating previously applied
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/322—Oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/324—De-oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/344,906 US4401690A (en) | 1982-02-01 | 1982-02-01 | Thermochromic vanadium oxide with depressed switching temperature |
| US06/344,860 US4400412A (en) | 1982-02-01 | 1982-02-01 | Thermochromic vanadium oxide coated glass |
| US06/344,257 US4393095A (en) | 1982-02-01 | 1982-02-01 | Chemical vapor deposition of vanadium oxide coatings |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3303154A1 true DE3303154A1 (de) | 1983-08-11 |
| DE3303154C2 DE3303154C2 (fr) | 1989-08-03 |
Family
ID=27407607
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19833303154 Granted DE3303154A1 (de) | 1982-02-01 | 1983-01-31 | Verfahren zur chemischen abscheidung von vanadinoxidfilmen aus der dampfphase und mit vanadinoxidfilmen ueberzogene gegenstaende |
| DE3347918A Expired DE3347918C2 (fr) | 1982-02-01 | 1983-01-31 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3347918A Expired DE3347918C2 (fr) | 1982-02-01 | 1983-01-31 |
Country Status (7)
| Country | Link |
|---|---|
| AU (2) | AU546405B2 (fr) |
| DE (2) | DE3303154A1 (fr) |
| ES (1) | ES8504643A1 (fr) |
| FR (1) | FR2520727B1 (fr) |
| GB (1) | GB2114965B (fr) |
| IT (1) | IT1160718B (fr) |
| SE (2) | SE461980B (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6440592B1 (en) | 1998-06-03 | 2002-08-27 | Bruno K. Meyer | Thermochromic coating |
| DE102007061272A1 (de) * | 2007-12-19 | 2009-06-25 | Schott Ag | Schichten, insbesondere photonische Schichten, enthaltend thermochrome Verbindungen, auf Glas- oder Glaskeramiksubstraten |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0314330B1 (fr) * | 1987-10-26 | 1993-10-06 | Pfizer Inc. | Procédé microbiologique pour la préparation de UK-61.689 et micro-organismes utilisables à ces fins |
| DE19613221C2 (de) * | 1996-04-02 | 2001-02-22 | Fraunhofer Ges Forschung | Sonnenschutzverglasung |
| GB9822338D0 (en) | 1998-10-13 | 1998-12-09 | Glaverbel | Solar control coated glass |
| CN1327467A (zh) * | 1999-08-24 | 2001-12-19 | 皇家菲利浦电子有限公司 | 配置有热变色氧化物层的基片 |
| FR2809388B1 (fr) | 2000-05-23 | 2002-12-20 | Saint Gobain Vitrage | Vitrage comprenant au moins une couche a proprietes thermochromes |
| GB0614545D0 (en) | 2006-07-21 | 2006-08-30 | Univ London | Coating Film |
| US8100190B2 (en) | 2009-08-11 | 2012-01-24 | Halliburton Energy Services, Inc. | Methods for swelling swellable elements in a portion of a well using a water-in-oil emulsion |
| US11292962B2 (en) | 2011-09-29 | 2022-04-05 | The Research Foundation For The State University Of New York | Doped nanoparticles and methods of making and using same |
| KR101278058B1 (ko) | 2011-12-08 | 2013-06-24 | 삼성코닝정밀소재 주식회사 | 써모크로믹 글라스 제조방법 |
| DE102012012219B4 (de) | 2012-06-21 | 2014-12-24 | Justus-Liebig-Universität Giessen | Thermochrome Schicht für Glas, Verfahren zur Herstellung einer thermochromen Schicht und Verwendung einer thermochromen Schicht |
| DE102020132629A1 (de) | 2020-01-07 | 2021-07-08 | Taniobis Gmbh | Wolfram(VI)oxidtetrachlorid mit hoher Reinheit und Verfahren zu dessen Herstellung |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3410710A (en) * | 1959-10-16 | 1968-11-12 | Corning Glass Works | Radiation filters |
| US3438803A (en) * | 1965-05-18 | 1969-04-15 | Anchor Hocking Glass Corp | Method and means for vapor coating |
| US3483110A (en) | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
| US3951100A (en) | 1972-12-15 | 1976-04-20 | Ppg Industries, Inc. | Chemical vapor deposition of coatings |
| US3984591A (en) | 1972-12-21 | 1976-10-05 | Glaverbel-Mecaniver S.A. | Process for forming a metallic oxide coating |
| US4307942A (en) | 1974-05-20 | 1981-12-29 | The Southwall Corporation | Solar control system |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH504006A (fr) * | 1969-01-30 | 1971-02-28 | Pilkington Brothers Ltd | Filtre optique |
| US3914515A (en) * | 1973-07-16 | 1975-10-21 | Rca Corp | Process for forming transition metal oxide films on a substrate and photomasks therefrom |
-
1983
- 1983-01-28 AU AU10859/83A patent/AU546405B2/en not_active Ceased
- 1983-01-31 DE DE19833303154 patent/DE3303154A1/de active Granted
- 1983-01-31 DE DE3347918A patent/DE3347918C2/de not_active Expired
- 1983-01-31 IT IT19371/83A patent/IT1160718B/it active
- 1983-01-31 SE SE8300497A patent/SE461980B/sv not_active IP Right Cessation
- 1983-02-01 ES ES519443A patent/ES8504643A1/es not_active Expired
- 1983-02-01 FR FR8301524A patent/FR2520727B1/fr not_active Expired
- 1983-02-01 GB GB08302654A patent/GB2114965B/en not_active Expired
-
1985
- 1985-07-11 AU AU44817/85A patent/AU559271B2/en not_active Ceased
-
1988
- 1988-09-28 SE SE8803445A patent/SE462801B/sv not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3410710A (en) * | 1959-10-16 | 1968-11-12 | Corning Glass Works | Radiation filters |
| US3438803A (en) * | 1965-05-18 | 1969-04-15 | Anchor Hocking Glass Corp | Method and means for vapor coating |
| US3483110A (en) | 1967-05-19 | 1969-12-09 | Bell Telephone Labor Inc | Preparation of thin films of vanadium dioxide |
| US3951100A (en) | 1972-12-15 | 1976-04-20 | Ppg Industries, Inc. | Chemical vapor deposition of coatings |
| US3984591A (en) | 1972-12-21 | 1976-10-05 | Glaverbel-Mecaniver S.A. | Process for forming a metallic oxide coating |
| US4307942A (en) | 1974-05-20 | 1981-12-29 | The Southwall Corporation | Solar control system |
Non-Patent Citations (1)
| Title |
|---|
| US-Z.: J. Electrochem. Soc. 119 (1972), Heft 4, S. 427-429 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6440592B1 (en) | 1998-06-03 | 2002-08-27 | Bruno K. Meyer | Thermochromic coating |
| DE102007061272A1 (de) * | 2007-12-19 | 2009-06-25 | Schott Ag | Schichten, insbesondere photonische Schichten, enthaltend thermochrome Verbindungen, auf Glas- oder Glaskeramiksubstraten |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2520727A1 (fr) | 1983-08-05 |
| SE8300497D0 (sv) | 1983-01-31 |
| IT1160718B (it) | 1987-03-11 |
| SE461980B (sv) | 1990-04-23 |
| FR2520727B1 (fr) | 1986-02-07 |
| SE8803445D0 (sv) | 1988-09-28 |
| SE8803445L (sv) | 1988-09-28 |
| AU4481785A (en) | 1985-10-31 |
| SE8300497L (sv) | 1983-08-02 |
| DE3347918C2 (fr) | 1989-02-09 |
| GB8302654D0 (en) | 1983-03-02 |
| SE462801B (sv) | 1990-09-03 |
| ES519443A0 (es) | 1985-04-16 |
| IT8319371A0 (it) | 1983-01-31 |
| ES8504643A1 (es) | 1985-04-16 |
| GB2114965A (en) | 1983-09-01 |
| AU559271B2 (en) | 1987-03-05 |
| AU1085983A (en) | 1983-08-11 |
| GB2114965B (en) | 1985-08-29 |
| DE3303154C2 (fr) | 1989-08-03 |
| DE3347918A1 (fr) | 1985-05-15 |
| AU546405B2 (en) | 1985-08-29 |
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