DE3274320D1 - Photomask material - Google Patents

Photomask material

Info

Publication number
DE3274320D1
DE3274320D1 DE8282304358T DE3274320T DE3274320D1 DE 3274320 D1 DE3274320 D1 DE 3274320D1 DE 8282304358 T DE8282304358 T DE 8282304358T DE 3274320 T DE3274320 T DE 3274320T DE 3274320 D1 DE3274320 D1 DE 3274320D1
Authority
DE
Germany
Prior art keywords
photomask material
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282304358T
Other languages
English (en)
Inventor
Takashi Hatano
Akira Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Application granted granted Critical
Publication of DE3274320D1 publication Critical patent/DE3274320D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE8282304358T 1981-08-19 1982-08-18 Photomask material Expired DE3274320D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56130460A JPS5831336A (ja) 1981-08-19 1981-08-19 ホトマスク素材

Publications (1)

Publication Number Publication Date
DE3274320D1 true DE3274320D1 (en) 1987-01-02

Family

ID=15034764

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282304358T Expired DE3274320D1 (en) 1981-08-19 1982-08-18 Photomask material

Country Status (4)

Country Link
US (1) US4497878A (de)
EP (1) EP0073136B1 (de)
JP (1) JPS5831336A (de)
DE (1) DE3274320D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4563407A (en) * 1982-11-16 1986-01-07 Hoya Corporation Photo-mask blank comprising a shading layer having a variable etch rate
WO1984004110A1 (en) * 1983-04-18 1984-10-25 Battelle Development Corp HARD LAYER FORMED BY INCORPORATING NITROGEN INTO Mo OU W METAL AND METHOD FOR OBTAINING THIS LAYER
JPS6033555A (ja) * 1983-08-04 1985-02-20 Konishiroku Photo Ind Co Ltd ドライエッチング用マスク素材
JPS60154254A (ja) * 1984-01-24 1985-08-13 Hoya Corp フオトマスクブランクとフオトマスク
JPS60184672A (ja) * 1984-02-29 1985-09-20 Konishiroku Photo Ind Co Ltd クロム化合物層の製造方法
JPS60182439A (ja) * 1984-02-29 1985-09-18 Konishiroku Photo Ind Co Ltd クロムマスク素材
US4677042A (en) * 1984-11-05 1987-06-30 Canon Kabushiki Kaisha Mask structure for lithography, method for preparation thereof and lithographic method
DE3600169A1 (de) * 1985-01-07 1986-07-10 Canon K.K., Tokio/Tokyo Maskenstruktur zur lithographie, verfahren zu ihrer herstellung und lithographisches verfahren
JPS61272746A (ja) * 1985-05-28 1986-12-03 Asahi Glass Co Ltd フオトマスクブランクおよびフオトマスク
JPS6252550A (ja) * 1985-08-30 1987-03-07 Mitsubishi Electric Corp フオトマスク材料
DE3680975D1 (de) * 1985-08-30 1991-09-26 Mitsubishi Electric Corp Photomaskenmaterial.
JPS62153957A (ja) * 1985-12-27 1987-07-08 Hoya Corp フォトマスクブランクとフォトマスク
US4803110A (en) * 1986-09-15 1989-02-07 International Business Machines Corporation Coated mask for photolithographic construction of electric circuits
JPH05297570A (ja) * 1992-04-20 1993-11-12 Toppan Printing Co Ltd フォトマスクブランクの製造方法
US5629115A (en) * 1993-04-30 1997-05-13 Kabushiki Kaisha Toshiba Exposure mask and method and apparatus for manufacturing the same
JP4465405B2 (ja) 2008-02-27 2010-05-19 Ｈｏｙａ株式会社 フォトマスクブランクおよびフォトマスク並びにこれらの製造方法
JP6639253B2 (ja) * 2016-02-08 2020-02-05 アルバック成膜株式会社 電鋳用マスク原版の機能部品、電鋳用マスク原版の機能部品の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3406043A (en) * 1964-11-09 1968-10-15 Western Electric Co Integrated circuit containing multilayer tantalum compounds
JPS4939873B1 (de) * 1969-10-15 1974-10-29
JPS5322426A (en) * 1972-11-30 1978-03-01 Canon Inc Electrophotographic photo-sensitive body
US3907620A (en) * 1973-06-27 1975-09-23 Hewlett Packard Co A process of forming metallization structures on semiconductor devices
US3975003A (en) * 1973-11-19 1976-08-17 Buford Wesley E Torch type pipe cutter
JPS5235513A (en) * 1975-09-13 1977-03-18 Matsushita Electric Ind Co Ltd Circuit for shaping signal waveform
GB1584004A (en) * 1976-06-07 1981-02-04 Amdahl Corp Data processing system
JPS5421273A (en) * 1977-07-19 1979-02-17 Mitsubishi Electric Corp Manufacture for photo mask
JPS6052428B2 (ja) * 1978-05-25 1985-11-19 富士通株式会社 酸化クロム被膜の形成法
JPS5517152A (en) * 1978-07-25 1980-02-06 Fujitsu Ltd Photo mask
DE2851584B2 (de) * 1978-11-29 1980-09-04 Fried. Krupp Gmbh, 4300 Essen Verbundkörper
DE3170637D1 (en) * 1980-12-22 1985-06-27 Dainippon Printing Co Ltd Photomask and photomask blank
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
JPS57135980A (en) * 1981-02-16 1982-08-21 Hitachi Ltd Apparatus having video indicator
JPS57147634A (en) * 1981-03-09 1982-09-11 Hoya Corp Photomask blank
JPS57151945A (en) * 1981-03-17 1982-09-20 Hoya Corp Photomask blank and its manufacture

Also Published As

Publication number Publication date
EP0073136B1 (de) 1986-11-12
EP0073136A1 (de) 1983-03-02
JPS5831336A (ja) 1983-02-24
US4497878A (en) 1985-02-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition