DE3240234C2 - Oberflächenprofil-Interferometer - Google Patents

Oberflächenprofil-Interferometer

Info

Publication number
DE3240234C2
DE3240234C2 DE3240234A DE3240234A DE3240234C2 DE 3240234 C2 DE3240234 C2 DE 3240234C2 DE 3240234 A DE3240234 A DE 3240234A DE 3240234 A DE3240234 A DE 3240234A DE 3240234 C2 DE3240234 C2 DE 3240234C2
Authority
DE
Germany
Prior art keywords
radiation
phase
birefringent
focusing
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3240234A
Other languages
German (de)
English (en)
Other versions
DE3240234A1 (de
Inventor
Michael John Downs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BTG International Ltd
Original Assignee
British Technology Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by British Technology Group Ltd filed Critical British Technology Group Ltd
Publication of DE3240234A1 publication Critical patent/DE3240234A1/de
Application granted granted Critical
Publication of DE3240234C2 publication Critical patent/DE3240234C2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE3240234A 1981-10-30 1982-10-29 Oberflächenprofil-Interferometer Expired - Fee Related DE3240234C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8132745 1981-10-30

Publications (2)

Publication Number Publication Date
DE3240234A1 DE3240234A1 (de) 1983-05-11
DE3240234C2 true DE3240234C2 (de) 1995-01-05

Family

ID=10525503

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3240234A Expired - Fee Related DE3240234C2 (de) 1981-10-30 1982-10-29 Oberflächenprofil-Interferometer

Country Status (3)

Country Link
US (1) US4534649A (enExample)
JP (1) JPS5885103A (enExample)
DE (1) DE3240234C2 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4848908A (en) * 1983-10-24 1989-07-18 Lockheed Missiles & Space Company, Inc. Optical heterodyne roughness measurement system
US5133601A (en) * 1991-06-12 1992-07-28 Wyko Corporation Rough surface profiler and method
DE4138562C2 (de) * 1991-11-25 1995-11-23 Fraunhofer Ges Forschung Mikroprofilometermeßkopf
US5469259A (en) * 1994-01-03 1995-11-21 International Business Machines Corporation Inspection interferometer with scanning autofocus, and phase angle control features
US5764363A (en) * 1995-06-30 1998-06-09 Nikon Corporation Apparatus for observing a surface using polarized light
JP3534363B2 (ja) * 1995-07-31 2004-06-07 パイオニア株式会社 結晶レンズ及びこれを用いた光ピックアップ光学系
US5703684A (en) * 1996-09-23 1997-12-30 International Business Machines Corporation Apparatus for optical differential measurement of glide height above a magnetic disk
US5926266A (en) * 1996-09-23 1999-07-20 International Business Machines Corporation Optical apparatus for rapid defect analysis
US5784163A (en) * 1996-09-23 1998-07-21 International Business Machines Corporation Optical differential profile measurement apparatus and process
JP3559452B2 (ja) * 1998-06-23 2004-09-02 ペンタックス株式会社 自動焦点検出測量機の遮光構造
US6181430B1 (en) 1999-03-15 2001-01-30 Ohio Aerospace Institute Optical device for measuring a surface characteristic of an object by multi-color interferometry
EP1232377B1 (de) * 1999-11-24 2004-03-31 Haag-Streit Ag Verfahren und vorrichtung zur messung optischer eigenschaften wenigstens zweier voneinander distanzierter bereiche in einem transparenten und/oder diffusiven gegenstand
US6580509B1 (en) * 2000-04-24 2003-06-17 Optical Physics Company High speed high resolution hyperspectral sensor
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6844972B2 (en) 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
WO2003038479A2 (en) * 2001-10-30 2003-05-08 Optical Research Associates Structures and methods for reducing aberration in optical systems
US6995908B2 (en) * 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US20090066970A1 (en) * 2007-05-21 2009-03-12 Muetec Automatisierte Mikroskopie Und Messtechnik Gmbh Arrangement and method for improving the measurement accuracy in the nm range for optical systems
GB0713982D0 (en) * 2007-07-18 2007-08-29 Univ Birmingham Improved interferometer
DE102013005187A1 (de) 2013-03-20 2014-09-25 Carl Zeiss Microscopy Gmbh Verfahren zur Ermittlung von Rauheit- und/oder Topographiedaten von Oberflächen in der Materialmikroskopie
US9784570B2 (en) 2015-06-15 2017-10-10 Ultratech, Inc. Polarization-based coherent gradient sensing systems and methods
TWI575221B (zh) * 2015-11-20 2017-03-21 財團法人工業技術研究院 表面粗度檢測系統及其方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2851750B1 (de) * 1978-11-30 1980-03-06 Ibm Deutschland Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche
JPS567006A (en) * 1979-06-22 1981-01-24 Ibm Method of extending measurement range of interference
JPS6017041A (ja) * 1983-07-08 1985-01-28 Sumitomo Electric Ind Ltd ワイアカツト放電加工用電極線

Also Published As

Publication number Publication date
JPS5885103A (ja) 1983-05-21
DE3240234A1 (de) 1983-05-11
JPH0319482B2 (enExample) 1991-03-15
US4534649A (en) 1985-08-13

Similar Documents

Publication Publication Date Title
DE3240234A1 (de) Oberflaechenprofil-interferometer
EP0011708B1 (de) Verfahren und Vorrichtung zur Messung der Ebenheit, der Rauhigkeit oder des Krümmungsradius einer Messfläche
DE19733890C2 (de) Verfahren zum Vermessen eines Mediums und Vorrichtung dazu
DE3419463C1 (de) Vorrichtung zur Erfassung von Stoffeigenschaften von Probenoberflaechen
DE69222742T2 (de) Verfahren und Vorrichtung zur Messung der Dicke dünner Schichten
DE69017947T2 (de) Verfahren und Vorrichtung zum Messen der Dicke dünner Filme.
DE69722876T2 (de) Vorrichtung und Verfahren zur optischen Profilmessung
EP0019088B1 (de) Ellipsometrisches Verfahren und ellipsometrische Vorrichtung zur Untersuchung der physikalischen Eigenschaften der Oberfläche einer Probe
DE69032110T2 (de) Ellipsometrische Vorrichtung mit hohem Auflösungsvermögen
EP0021148A1 (de) Verfahren und Einrichtung zur interferometrischen Messung
EP0075032B1 (de) Verfahren zur interferometrischen Oberflächentopographie
DE60210431T2 (de) Achromatisches Spektralellipsometer mit hoher räumlicher Auflösung
EP1290485B1 (de) Verfahren zur quantitativen optischen messung der topographie einer oberfläche
DE4105192C2 (de) Verfahren zum Bestimmen von Oberflächenrauhigkeiten und dergleichen
DE102007043937A1 (de) Verfahren zur Bestimmung der Dicke und des Brechungsindex von optisch transparenten Schichten auf optisch transparenten planparallelen Substraten
WO2017207681A2 (de) Konfigurierbares retroreflex-sensorsystem zur verbesserten charakterisierung der eigenschaften einer probe, entsprechendes verfahren und entsprechende verwendung
DE3834948A1 (de) Verfahren zum messen des brechungsindex einer duennschicht
DE4233336C2 (de) Verfahren und Vorrichtung zur Detektion von Fokusablagen
DE3737426C2 (de) Interferometer
DE4413758C2 (de) Vorrichtung und Verfahren zur Prüfung der Gestalt einer Oberfläche eines zu vermessenden Objektes
DE2628836C3 (de) Optischer Phasendiskriminator
EP4048978A1 (de) Vorrichtung und verfahren zur profilmessung von flachen objekten mit unbekannten materialien
DE3226137C2 (enExample)
DE9300956U1 (de) Anordnung zum Bestimmen chrakteristischer Größen transparenter Schichten mit Hilfe der Ellipsometrie
DE4024977A1 (de) Zweistrahlinterferometer mit 2n-fachem uebergang des referenzstrahles ueber das objekt unter einem anpassungswinkel von arc cos (1/(2n)) zur kompensation von fuehrungsfehlern, waermedehnungen und schwingungen

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8127 New person/name/address of the applicant

Owner name: NATIONAL RESEARCH DEVELOPMENT CORP., LONDON, GB

8128 New person/name/address of the agent

Representative=s name: MITSCHERLICH, H., DIPL.-ING. GUNSCHMANN, K., DIPL.

8181 Inventor (new situation)

Free format text: DOWNS, MICHAEL JOHN, LIPHOOK, HAMPSHIRE, GB

8127 New person/name/address of the applicant

Owner name: BRITISH TECHNOLOGY GROUP LTD., LONDON, GB

8128 New person/name/address of the agent

Representative=s name: MITSCHERLICH, H., DIPL.-ING. KOERBER, W., DIPL.-IN

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee