DE3231036C2 - - Google Patents

Info

Publication number
DE3231036C2
DE3231036C2 DE3231036A DE3231036A DE3231036C2 DE 3231036 C2 DE3231036 C2 DE 3231036C2 DE 3231036 A DE3231036 A DE 3231036A DE 3231036 A DE3231036 A DE 3231036A DE 3231036 C2 DE3231036 C2 DE 3231036C2
Authority
DE
Germany
Prior art keywords
electrode
sample surface
distance
primary
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3231036A
Other languages
German (de)
English (en)
Other versions
DE3231036A1 (de
Inventor
Helmut Dipl.-Phys. Dr. 8057 Eching De Liebl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Max Planck Gesellschaft zur Foerderung der Wissenschaften
Original Assignee
Max Planck Gesellschaft zur Foerderung der Wissenschaften
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Max Planck Gesellschaft zur Foerderung der Wissenschaften filed Critical Max Planck Gesellschaft zur Foerderung der Wissenschaften
Priority to DE3231036A priority Critical patent/DE3231036A1/de
Priority to GB08322328A priority patent/GB2128396B/en
Priority to JP58152371A priority patent/JPS5958749A/ja
Priority to FR8313484A priority patent/FR2532111B1/fr
Priority to US06/525,413 priority patent/US4551599A/en
Publication of DE3231036A1 publication Critical patent/DE3231036A1/de
Application granted granted Critical
Publication of DE3231036C2 publication Critical patent/DE3231036C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
DE3231036A 1982-08-20 1982-08-20 Kombinierte elektrostatische objektiv- und emissionslinse Granted DE3231036A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE3231036A DE3231036A1 (de) 1982-08-20 1982-08-20 Kombinierte elektrostatische objektiv- und emissionslinse
GB08322328A GB2128396B (en) 1982-08-20 1983-08-19 Combined electrostatic objective and emission lens
JP58152371A JPS5958749A (ja) 1982-08-20 1983-08-19 複合対物および放射レンズ
FR8313484A FR2532111B1 (fr) 1982-08-20 1983-08-19 Lentille d'emission et d'objectif electrostatique combinee
US06/525,413 US4551599A (en) 1982-08-20 1983-08-22 Combined electrostatic objective and emission lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3231036A DE3231036A1 (de) 1982-08-20 1982-08-20 Kombinierte elektrostatische objektiv- und emissionslinse

Publications (2)

Publication Number Publication Date
DE3231036A1 DE3231036A1 (de) 1984-02-23
DE3231036C2 true DE3231036C2 (en, 2012) 1992-09-17

Family

ID=6171340

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3231036A Granted DE3231036A1 (de) 1982-08-20 1982-08-20 Kombinierte elektrostatische objektiv- und emissionslinse

Country Status (5)

Country Link
US (1) US4551599A (en, 2012)
JP (1) JPS5958749A (en, 2012)
DE (1) DE3231036A1 (en, 2012)
FR (1) FR2532111B1 (en, 2012)
GB (1) GB2128396B (en, 2012)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3477710D1 (en) * 1984-02-18 1989-05-18 Leybold Ag Device for measuring the angular distribution of charged particles diffracted on a sample surface
FR2575597B1 (fr) * 1984-12-28 1987-03-20 Onera (Off Nat Aerospatiale) Appareil pour la micro-analyse ionique a tres haute resolution d'un echantillon solide
US4855596A (en) * 1986-06-04 1989-08-08 Arch Development Corp. Photo ion spectrometer
US4889987A (en) * 1986-06-04 1989-12-26 Arch Development Corporation Photo ion spectrometer
US4864130A (en) * 1986-06-04 1989-09-05 Arch Development Corporation Photo ion spectrometer
DE3831940A1 (de) * 1988-09-20 1990-04-05 Siemens Ag Elektronenstrahlerzeuger
JPH071681B2 (ja) * 1990-04-19 1995-01-11 株式会社日立製作所 荷電粒子線装置
US6586736B1 (en) * 1999-09-10 2003-07-01 Kla-Tencor, Corporation Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample
US6664546B1 (en) 2000-02-10 2003-12-16 Kla-Tencor In-situ probe for optimizing electron beam inspection and metrology based on surface potential
FR2806527B1 (fr) * 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
GB2406704B (en) * 2003-09-30 2007-02-07 Ims Nanofabrication Gmbh Particle-optic electrostatic lens
US20070221862A1 (en) * 2006-03-22 2007-09-27 Wayne State University Coupled Electrostatic Ion and Electron Traps for Electron Capture Dissociation - Tandem Mass Spectrometry
JP4283843B2 (ja) * 2006-11-24 2009-06-24 株式会社荏原製作所 幾何収差と空間電荷効果を低減した写像型電子顕微鏡
WO2013171214A1 (en) * 2012-05-14 2013-11-21 Mapper Lithography Ip B.V. Charged particle lithography system and beam generator
US10586625B2 (en) 2012-05-14 2020-03-10 Asml Netherlands B.V. Vacuum chamber arrangement for charged particle beam generator
US11348756B2 (en) 2012-05-14 2022-05-31 Asml Netherlands B.V. Aberration correction in charged particle system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2223367C3 (de) * 1972-05-12 1978-11-30 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Mikrostrahlsonde zur quantitativen Erfassung von geladenen Sekundärteilchen
JPS5336292A (en) * 1976-09-16 1978-04-04 Hitachi Ltd Analyzer for charged particles
DE2842527C3 (de) * 1978-09-29 1981-12-17 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Elektrostatische Emissionslinse
DE2903077C2 (de) * 1979-01-26 1986-07-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zur berührungslosen Potentialmessung an einem elektronischen Bauelement und Anordnung zur Durchführung des Verfahrens

Also Published As

Publication number Publication date
GB2128396B (en) 1986-04-03
GB8322328D0 (en) 1983-09-21
JPS5958749A (ja) 1984-04-04
FR2532111A1 (fr) 1984-02-24
GB2128396A (en) 1984-04-26
JPH0441462B2 (en, 2012) 1992-07-08
US4551599A (en) 1985-11-05
DE3231036A1 (de) 1984-02-23
FR2532111B1 (fr) 1986-12-26

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Legal Events

Date Code Title Description
OM8 Search report available as to paragraph 43 lit. 1 sentence 1 patent law
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee