DE3129997A1 - Kontinuierlich arbeitende vakuumbehandlungsvorrichtung - Google Patents

Kontinuierlich arbeitende vakuumbehandlungsvorrichtung

Info

Publication number
DE3129997A1
DE3129997A1 DE19813129997 DE3129997A DE3129997A1 DE 3129997 A1 DE3129997 A1 DE 3129997A1 DE 19813129997 DE19813129997 DE 19813129997 DE 3129997 A DE3129997 A DE 3129997A DE 3129997 A1 DE3129997 A1 DE 3129997A1
Authority
DE
Germany
Prior art keywords
treatment device
vacuum treatment
continuously working
working vacuum
continuously
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19813129997
Other languages
English (en)
Other versions
DE3129997C2 (de
Inventor
Kiyoshi Imada
Susumu Ueno
Hirokazu Nomura
Masaie Tohkai
Yoshitada Hata
Kenichi Kato
Hideaki Kamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Hitachi Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10363080A external-priority patent/JPS5730733A/ja
Priority claimed from JP14946180A external-priority patent/JPS5773025A/ja
Application filed by Shin Etsu Chemical Co Ltd, Hitachi Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE3129997A1 publication Critical patent/DE3129997A1/de
Application granted granted Critical
Publication of DE3129997C2 publication Critical patent/DE3129997C2/de
Expired legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16JPISTONS; CYLINDERS; SEALINGS
    • F16J15/00Sealings
    • F16J15/16Sealings between relatively-moving surfaces
    • F16J15/168Sealings between relatively-moving surfaces which permits material to be continuously conveyed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006Processes utilising sub-atmospheric pressure; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0089Sealing devices placed between articles and treatment installations during moulding or shaping, e.g. sealing off the entrance or exit of ovens or irradiation rooms, connections between rooms at different pressures
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32788Means for moving the material to be treated for extracting the material from the process chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899Multiple chambers, e.g. cluster tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
DE3129997A 1980-07-30 1981-07-29 Kontinuierlich arbeitende Plasma-Vakuumbehandlungsvorrichtung Expired DE3129997C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10363080A JPS5730733A (en) 1980-07-30 1980-07-30 Device for continuous plasma treatment
JP14946180A JPS5773025A (en) 1980-10-27 1980-10-27 Apparatus for continuous vacuum treatment

Publications (2)

Publication Number Publication Date
DE3129997A1 true DE3129997A1 (de) 1982-04-01
DE3129997C2 DE3129997C2 (de) 1983-12-29

Family

ID=26444251

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3129997A Expired DE3129997C2 (de) 1980-07-30 1981-07-29 Kontinuierlich arbeitende Plasma-Vakuumbehandlungsvorrichtung

Country Status (4)

Country Link
DE (1) DE3129997C2 (de)
FR (1) FR2487696B1 (de)
GB (1) GB2084264B (de)
NL (1) NL8103566A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0130444A1 (de) * 1983-06-17 1985-01-09 Hitachi, Ltd. Apparat zur kontinuierlichen Vakuumbehandlung
US4511419A (en) * 1982-04-23 1985-04-16 Firma Erwin Kampf Gmbh & Co. Method and device for laminating foils
WO2000045861A1 (de) * 1999-02-01 2000-08-10 Robert Bosch Gmbh Verfahren und vorrichtung zur sterilisation von gefässen oder gegenständen
EP2520405A1 (de) * 2011-05-03 2012-11-07 Maschinenbau Scholz Gmbh & Co. Kg Variable Dichtung für CV-Rohr

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3415012A1 (de) * 1984-04-19 1986-01-09 BMP Plasmatechnologie GmbH, 8011 Heimstetten Verfahren und vorrichtung zum kontinuierlichen bearbeiten von substraten mit niederdruck-plasma
US4812101A (en) * 1987-04-27 1989-03-14 American Telephone And Telegraph Company, At&T Bell Laboratories Method and apparatus for continuous throughput in a vacuum environment
JPH05507383A (ja) * 1990-05-10 1993-10-21 イーストマン・コダック・カンパニー 連続的材料のプラズマ処理装置
US5110396A (en) * 1990-06-14 1992-05-05 The Langston Corporation Floating air seal for an apparatus for manufacturing single faced corrugated board
EP0989455A1 (de) * 1998-09-22 2000-03-29 Agfa-Gevaert N.V. Gerät zur kontinuierlichen Vakuumbehandlung von Blattmaterial
US6250222B1 (en) 1998-09-22 2001-06-26 Agfa-Gevaert Apparatus for the continuous treatment of sheet material under reduced pressure
ES2336870B1 (es) 2007-08-20 2011-02-18 Novogenio, S.L. Sistema y procedimiento para el recubrimiento en vacio y en continuo de un material en forma de banda.
EP3771747B1 (de) 2019-08-01 2022-11-30 Vereinigung zur Förderung des Instituts für Kunststoffverarbeitung in Industrie und Handwerk An der Rhein.- Westf. Technischen Hochschule Verfahren und anlage zur kontinuierlichen vakuumbasierten behandlung von bahnware
CN113737149A (zh) * 2020-05-28 2021-12-03 宝山钢铁股份有限公司 一种用于金属带材上的连续真空镀膜密封锁
WO2024052712A1 (en) * 2022-09-05 2024-03-14 Arcelormittal Sealing airlock for deposition chamber

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2384500A (en) * 1942-07-08 1945-09-11 Crown Cork & Seal Co Apparatus and method of coating
DE961771C (de) * 1954-06-27 1957-04-11 Ernst Tuescher Dr Abdichtvorrichtung zum laufenden Hindurchfuehren von Foerdergut, wie Baender, Netze, Faeden, aus einem Raum bestimmten Druckes in einen Raum anderen Druckes
US2853047A (en) * 1954-12-23 1958-09-23 Vac Anstalt Installations for continuously treating strip-like materials in vacuum
US3032890A (en) * 1958-03-28 1962-05-08 Continental Can Co Sealing structures for treating chambers
US3326177A (en) * 1963-09-12 1967-06-20 Pennsalt Chemicals Corp Metal vapor coating apparatus
DE1279426B (de) * 1966-08-24 1968-10-03 Leybold Heraeus Gmbh & Co Kg Bandbedampfungsvorrichtung
DE1911120A1 (de) * 1968-03-08 1969-12-18 Galileo Spa Off Verfahren und Vorrichtung zum halbkontinuierlichen Metallisieren von bahn- oder fadenfoermigem Gut
DD94794A1 (de) * 1972-03-20 1973-01-12
GB1451704A (en) * 1974-06-28 1976-10-06 Head Wrightson & Co Ltd Strip cooling
US4013539A (en) * 1973-01-12 1977-03-22 Coulter Information Systems, Inc. Thin film deposition apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1488202A (fr) * 1962-05-18 1967-07-13 Crompton & Knowles Corp Calfeutrage de récipients sous pression
DE2249333C3 (de) * 1972-10-07 1978-10-05 Hoechst Ag, 6000 Frankfurt Abdichtungsvorrichtung für den kontinuierlichen Ein- und Auslauf textiler Warenbahnen an Hochdruckdämpfern
GB1461412A (en) * 1973-07-16 1977-01-13 Ici Ltd Seal
US3959104A (en) * 1974-09-30 1976-05-25 Surface Activation Corporation Electrode structure for generating electrical discharge plasma

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2384500A (en) * 1942-07-08 1945-09-11 Crown Cork & Seal Co Apparatus and method of coating
DE961771C (de) * 1954-06-27 1957-04-11 Ernst Tuescher Dr Abdichtvorrichtung zum laufenden Hindurchfuehren von Foerdergut, wie Baender, Netze, Faeden, aus einem Raum bestimmten Druckes in einen Raum anderen Druckes
US2853047A (en) * 1954-12-23 1958-09-23 Vac Anstalt Installations for continuously treating strip-like materials in vacuum
US3032890A (en) * 1958-03-28 1962-05-08 Continental Can Co Sealing structures for treating chambers
US3326177A (en) * 1963-09-12 1967-06-20 Pennsalt Chemicals Corp Metal vapor coating apparatus
DE1279426B (de) * 1966-08-24 1968-10-03 Leybold Heraeus Gmbh & Co Kg Bandbedampfungsvorrichtung
DE1911120A1 (de) * 1968-03-08 1969-12-18 Galileo Spa Off Verfahren und Vorrichtung zum halbkontinuierlichen Metallisieren von bahn- oder fadenfoermigem Gut
DD94794A1 (de) * 1972-03-20 1973-01-12
US4013539A (en) * 1973-01-12 1977-03-22 Coulter Information Systems, Inc. Thin film deposition apparatus
GB1451704A (en) * 1974-06-28 1976-10-06 Head Wrightson & Co Ltd Strip cooling

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DE-PA S12330 VI/48b, 25.9.56 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511419A (en) * 1982-04-23 1985-04-16 Firma Erwin Kampf Gmbh & Co. Method and device for laminating foils
EP0130444A1 (de) * 1983-06-17 1985-01-09 Hitachi, Ltd. Apparat zur kontinuierlichen Vakuumbehandlung
WO2000045861A1 (de) * 1999-02-01 2000-08-10 Robert Bosch Gmbh Verfahren und vorrichtung zur sterilisation von gefässen oder gegenständen
EP2520405A1 (de) * 2011-05-03 2012-11-07 Maschinenbau Scholz Gmbh & Co. Kg Variable Dichtung für CV-Rohr

Also Published As

Publication number Publication date
GB2084264B (en) 1984-04-26
NL8103566A (nl) 1982-02-16
FR2487696A1 (fr) 1982-02-05
GB2084264A (en) 1982-04-07
DE3129997C2 (de) 1983-12-29
FR2487696B1 (fr) 1991-06-14

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8363 Opposition against the patent
8331 Complete revocation