DE3124240A1 - "halbleiterlaser" - Google Patents
"halbleiterlaser"Info
- Publication number
- DE3124240A1 DE3124240A1 DE19813124240 DE3124240A DE3124240A1 DE 3124240 A1 DE3124240 A1 DE 3124240A1 DE 19813124240 DE19813124240 DE 19813124240 DE 3124240 A DE3124240 A DE 3124240A DE 3124240 A1 DE3124240 A1 DE 3124240A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- passive
- contact layer
- surface zone
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims description 57
- 230000005855 radiation Effects 0.000 claims description 16
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 claims description 14
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 12
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052725 zinc Inorganic materials 0.000 claims description 12
- 239000011701 zinc Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 4
- 230000001427 coherent effect Effects 0.000 claims description 3
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8003728A NL8003728A (nl) | 1980-06-27 | 1980-06-27 | Halfgeleiderlaser. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3124240A1 true DE3124240A1 (de) | 1982-06-16 |
Family
ID=19835526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19813124240 Withdrawn DE3124240A1 (de) | 1980-06-27 | 1981-06-20 | "halbleiterlaser" |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4429396A (enExample) |
| JP (1) | JPS5739595A (enExample) |
| AU (1) | AU7211281A (enExample) |
| CA (1) | CA1173547A (enExample) |
| DE (1) | DE3124240A1 (enExample) |
| ES (1) | ES8204887A1 (enExample) |
| FR (1) | FR2485823A1 (enExample) |
| GB (1) | GB2079524B (enExample) |
| IT (1) | IT1137926B (enExample) |
| NL (1) | NL8003728A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2156585B (en) * | 1984-03-16 | 1987-10-21 | Hitachi Ltd | Light-emitting device electrode |
| FR2575870B1 (fr) * | 1985-01-10 | 1987-01-30 | Sermage Bernard | Laser a semi-conducteur muni de moyens de reinjection de l'emission spontanee dans la couche active |
| GB8913070D0 (en) * | 1989-06-07 | 1989-07-26 | Bt & D Technologies Ltd | Semiconductor device |
| US20020108896A1 (en) * | 2001-02-09 | 2002-08-15 | Edward Malkin | Filtration device and method of manufacturing the same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1557072A (en) | 1976-10-13 | 1979-12-05 | Standard Telephones Cables Ltd | Stripe lears |
| US4122410A (en) | 1977-05-16 | 1978-10-24 | Rca Corporation | Lateral mode control in semiconductor lasers |
| DE2860817D1 (en) * | 1977-07-01 | 1981-10-15 | Post Office | Light source in an optical communications system |
| FR2440616A1 (fr) * | 1978-10-31 | 1980-05-30 | Bouley Jean Claude | Laser a injection a double heterostructure a profil d'indice de refraction |
-
1980
- 1980-06-27 NL NL8003728A patent/NL8003728A/nl not_active Application Discontinuation
-
1981
- 1981-06-10 US US06/272,438 patent/US4429396A/en not_active Expired - Fee Related
- 1981-06-20 DE DE19813124240 patent/DE3124240A1/de not_active Withdrawn
- 1981-06-24 AU AU72112/81A patent/AU7211281A/en not_active Abandoned
- 1981-06-24 IT IT22549/81A patent/IT1137926B/it active
- 1981-06-24 GB GB8119417A patent/GB2079524B/en not_active Expired
- 1981-06-25 ES ES503353A patent/ES8204887A1/es not_active Expired
- 1981-06-25 CA CA000380538A patent/CA1173547A/en not_active Expired
- 1981-06-26 FR FR8112671A patent/FR2485823A1/fr active Granted
- 1981-06-27 JP JP56099098A patent/JPS5739595A/ja active Pending
Non-Patent Citations (1)
| Title |
|---|
| IEEE J. of Quantum Electronics, Vol. QE-15, 1979, S. 767-771 * |
Also Published As
| Publication number | Publication date |
|---|---|
| ES503353A0 (es) | 1982-05-16 |
| FR2485823B1 (enExample) | 1984-07-13 |
| US4429396A (en) | 1984-01-31 |
| FR2485823A1 (fr) | 1981-12-31 |
| IT1137926B (it) | 1986-09-10 |
| AU7211281A (en) | 1982-01-07 |
| NL8003728A (nl) | 1982-01-18 |
| IT8122549A0 (it) | 1981-06-24 |
| JPS5739595A (en) | 1982-03-04 |
| GB2079524A (en) | 1982-01-20 |
| GB2079524B (en) | 1983-11-16 |
| ES8204887A1 (es) | 1982-05-16 |
| CA1173547A (en) | 1984-08-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8139 | Disposal/non-payment of the annual fee |