DE3036710A1 - Verfahren zur erzeugung von photolackstrukuren - Google Patents

Verfahren zur erzeugung von photolackstrukuren

Info

Publication number
DE3036710A1
DE3036710A1 DE19803036710 DE3036710A DE3036710A1 DE 3036710 A1 DE3036710 A1 DE 3036710A1 DE 19803036710 DE19803036710 DE 19803036710 DE 3036710 A DE3036710 A DE 3036710A DE 3036710 A1 DE3036710 A1 DE 3036710A1
Authority
DE
Germany
Prior art keywords
layer
photoresist
degradable
deep
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19803036710
Other languages
German (de)
English (en)
Other versions
DE3036710C2 (enrdf_load_stackoverflow
Inventor
Siegfried Dipl.-Chem. Dr.rer.nat. 8552 Höchstadt Birkle
Roland Dipl.-Chem. Dr.rer.nat. 8551 Röttenbach Rubner
Reiner Ing.(grad.) 8000 München Sigusch
Dietrich Dr.-Ing. 8025 Unterhaching Widmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Priority to DE19803036710 priority Critical patent/DE3036710A1/de
Publication of DE3036710A1 publication Critical patent/DE3036710A1/de
Application granted granted Critical
Publication of DE3036710C2 publication Critical patent/DE3036710C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE19803036710 1980-09-29 1980-09-29 Verfahren zur erzeugung von photolackstrukuren Granted DE3036710A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19803036710 DE3036710A1 (de) 1980-09-29 1980-09-29 Verfahren zur erzeugung von photolackstrukuren

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803036710 DE3036710A1 (de) 1980-09-29 1980-09-29 Verfahren zur erzeugung von photolackstrukuren

Publications (2)

Publication Number Publication Date
DE3036710A1 true DE3036710A1 (de) 1982-05-13
DE3036710C2 DE3036710C2 (enrdf_load_stackoverflow) 1987-06-25

Family

ID=6113140

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19803036710 Granted DE3036710A1 (de) 1980-09-29 1980-09-29 Verfahren zur erzeugung von photolackstrukuren

Country Status (1)

Country Link
DE (1) DE3036710A1 (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234793A (en) * 1989-04-24 1993-08-10 Siemens Aktiengesellschaft Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development
US5380889A (en) * 1991-08-08 1995-01-10 Mitsubishi Denki Kabushiki Kaisha Method of forming resist pattern and organic silane compound for forming anti-relflection film for use in such method
EP0634695A1 (en) * 1993-06-25 1995-01-18 PT Sub, Inc. Laser imaged printing plate
US6756181B2 (en) 1993-06-25 2004-06-29 Polyfibron Technologies, Inc. Laser imaged printing plates
US6916596B2 (en) 1993-06-25 2005-07-12 Michael Wen-Chein Yang Laser imaged printing plates

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2450380A1 (de) * 1973-10-25 1975-05-07 Shipley Co Mit einem fotolack ueberzogenes substrat und verfahren zu seiner herstellung
US4004044A (en) * 1975-05-09 1977-01-18 International Business Machines Corporation Method for forming patterned films utilizing a transparent lift-off mask
CH619303A5 (enrdf_load_stackoverflow) * 1973-12-19 1980-09-15 Ibm

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2450380A1 (de) * 1973-10-25 1975-05-07 Shipley Co Mit einem fotolack ueberzogenes substrat und verfahren zu seiner herstellung
CH619303A5 (enrdf_load_stackoverflow) * 1973-12-19 1980-09-15 Ibm
US4004044A (en) * 1975-05-09 1977-01-18 International Business Machines Corporation Method for forming patterned films utilizing a transparent lift-off mask

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Journ. Vac. Sci. Technol. 16, 6, Nov/Dec 1979, S. 1984 - 1988 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234793A (en) * 1989-04-24 1993-08-10 Siemens Aktiengesellschaft Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development
US5380889A (en) * 1991-08-08 1995-01-10 Mitsubishi Denki Kabushiki Kaisha Method of forming resist pattern and organic silane compound for forming anti-relflection film for use in such method
US5512422A (en) * 1991-08-08 1996-04-30 Mitsubishi Denki Kabushiki Kaisha Method of forming resist pattern and organic silane compound for forming anti-reflection film for use in such method
EP0634695A1 (en) * 1993-06-25 1995-01-18 PT Sub, Inc. Laser imaged printing plate
US6756181B2 (en) 1993-06-25 2004-06-29 Polyfibron Technologies, Inc. Laser imaged printing plates
US6916596B2 (en) 1993-06-25 2005-07-12 Michael Wen-Chein Yang Laser imaged printing plates

Also Published As

Publication number Publication date
DE3036710C2 (enrdf_load_stackoverflow) 1987-06-25

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee