DE2936972C2 - Einrichtung zum Herstellen eines Radiogramms - Google Patents
Einrichtung zum Herstellen eines RadiogrammsInfo
- Publication number
- DE2936972C2 DE2936972C2 DE2936972A DE2936972A DE2936972C2 DE 2936972 C2 DE2936972 C2 DE 2936972C2 DE 2936972 A DE2936972 A DE 2936972A DE 2936972 A DE2936972 A DE 2936972A DE 2936972 C2 DE2936972 C2 DE 2936972C2
- Authority
- DE
- Germany
- Prior art keywords
- electrode
- grid
- radiation
- insulating layer
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 59
- 230000005855 radiation Effects 0.000 claims description 39
- 238000006243 chemical reaction Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 15
- 239000011810 insulating material Substances 0.000 claims description 12
- 230000005684 electric field Effects 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 10
- -1 aliphatic chlorofluorohydrocarbon compound Chemical class 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 6
- 229910052743 krypton Inorganic materials 0.000 claims description 4
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 4
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 4
- 229910052724 xenon Inorganic materials 0.000 claims description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims 2
- 239000007789 gas Substances 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 238000002601 radiography Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/054—Apparatus for electrographic processes using a charge pattern using X-rays, e.g. electroradiography
- G03G15/0545—Ionography, i.e. X-rays induced liquid or gas discharge
Landscapes
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Conversion Of X-Rays Into Visible Images (AREA)
- Combination Of More Than One Step In Electrophotography (AREA)
- Measurement Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Radiography Using Non-Light Waves (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/942,548 US4218619A (en) | 1978-09-15 | 1978-09-15 | Multi-copy ion-valve radiography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2936972A1 DE2936972A1 (de) | 1980-03-27 |
| DE2936972C2 true DE2936972C2 (de) | 1987-04-16 |
Family
ID=25478252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2936972A Expired DE2936972C2 (de) | 1978-09-15 | 1979-09-13 | Einrichtung zum Herstellen eines Radiogramms |
Country Status (6)
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4200790A (en) * | 1978-12-22 | 1980-04-29 | General Electric Company | Closed-chamber high-pressure gas ion-flow electro-radiography apparatus with direct-charge readout |
| DE3121494A1 (de) * | 1981-05-29 | 1983-01-05 | Siemens AG, 1000 Berlin und 8000 München | Anordnung zum beruehrungslosen messen von elektrischen ladungsbildern bei elektroradiographischen aufzeichnungsverfahren |
| US4583489A (en) * | 1985-04-29 | 1986-04-22 | Xerox Corporation | Method for making duplicate xeroradiographic images |
| DE3815458A1 (de) * | 1988-05-06 | 1989-11-16 | Philips Patentverwaltung | Anordnung zur erzeugung von roentgenaufnahmen mittels eines photoleiters |
| JP2003518672A (ja) * | 1999-12-27 | 2003-06-10 | アルコア・ネーデルランド・ベー・ブイ | 押し出し過程のメッシュ発生用のメッシュ発生器とその方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5817953B2 (ja) * | 1973-11-14 | 1983-04-11 | キヤノン株式会社 | エレクトロラジオグラフイ ノ ガゾウケイセイホウホウ |
| GB1496882A (en) * | 1974-01-23 | 1978-01-05 | Agfa Gevaert | Process and apparatus for forming electrostatic charge patterns |
| US4039830A (en) * | 1976-08-13 | 1977-08-02 | General Electric Company | Electrostatic x-ray image recording device with mesh-base photocathode photoelectron discriminator means |
| US4085327A (en) * | 1977-01-14 | 1978-04-18 | General Electric Company | Direct charge readout electron radiography apparatus with improved signal-to-noise ratio |
-
1978
- 1978-09-15 US US05/942,548 patent/US4218619A/en not_active Expired - Lifetime
-
1979
- 1979-07-04 GB GB7923215A patent/GB2034074B/en not_active Expired
- 1979-08-21 NL NLAANVRAGE7906323,A patent/NL188870C/xx not_active IP Right Cessation
- 1979-09-11 FR FR7922688A patent/FR2436425A1/fr active Granted
- 1979-09-13 DE DE2936972A patent/DE2936972C2/de not_active Expired
- 1979-09-14 JP JP11742079A patent/JPS5546774A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5546774A (en) | 1980-04-02 |
| JPH0219959B2 (US06312121-20011106-C00033.png) | 1990-05-07 |
| FR2436425B1 (US06312121-20011106-C00033.png) | 1985-05-03 |
| FR2436425A1 (fr) | 1980-04-11 |
| NL188870C (nl) | 1992-10-16 |
| DE2936972A1 (de) | 1980-03-27 |
| NL7906323A (nl) | 1980-03-18 |
| GB2034074A (en) | 1980-05-29 |
| US4218619A (en) | 1980-08-19 |
| NL188870B (nl) | 1992-05-18 |
| GB2034074B (en) | 1983-05-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8120 | Willingness to grant licences paragraph 23 | ||
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: VOIGT, R., DIPL.-ING., PAT.-ANW., 6232 BAD SODEN |
|
| 8339 | Ceased/non-payment of the annual fee |