DE2933828A1 - Polyoxazol-vorstufen sowie deren herstellung. - Google Patents
Polyoxazol-vorstufen sowie deren herstellung.Info
- Publication number
- DE2933828A1 DE2933828A1 DE19792933828 DE2933828A DE2933828A1 DE 2933828 A1 DE2933828 A1 DE 2933828A1 DE 19792933828 DE19792933828 DE 19792933828 DE 2933828 A DE2933828 A DE 2933828A DE 2933828 A1 DE2933828 A1 DE 2933828A1
- Authority
- DE
- Germany
- Prior art keywords
- polyoxazole
- aromatic
- precursors
- production
- precursors according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000002360 preparation method Methods 0.000 title abstract description 4
- 239000002243 precursor Substances 0.000 claims abstract description 24
- 125000003118 aryl group Chemical group 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 238000006068 polycondensation reaction Methods 0.000 claims abstract description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 9
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 8
- -1 dicarboxylic-acid chlorides Chemical class 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims abstract description 5
- 150000002148 esters Chemical class 0.000 claims abstract description 4
- 239000012704 polymeric precursor Substances 0.000 claims abstract description 4
- 239000013307 optical fiber Substances 0.000 claims abstract description 3
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 claims description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- KTFJPMPXSYUEIP-UHFFFAOYSA-N 3-benzoylphthalic acid Chemical compound OC(=O)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1C(O)=O KTFJPMPXSYUEIP-UHFFFAOYSA-N 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical group C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 claims description 2
- 239000006223 plastic coating Substances 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 2
- 229920013730 reactive polymer Polymers 0.000 abstract 1
- 239000012713 reactive precursor Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 8
- 239000000243 solution Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 150000002924 oxiranes Chemical class 0.000 description 2
- 229920002577 polybenzoxazole Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- RPDJEKMSFIRVII-UHFFFAOYSA-N oxomethylidenehydrazine Chemical compound NN=C=O RPDJEKMSFIRVII-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
- C08G73/0233—Polyamines derived from (poly)oxazolines, (poly)oxazines or having pendant acyl groups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2913—Rod, strand, filament or fiber
- Y10T428/2933—Coated or with bond, impregnation or core
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyamides (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792933828 DE2933828A1 (de) | 1979-08-21 | 1979-08-21 | Polyoxazol-vorstufen sowie deren herstellung. |
| EP80104643A EP0025506B1 (de) | 1979-08-21 | 1980-08-06 | Polyoxazol-Vorstufen, deren Herstellung und Verwendung |
| DE8080104643T DE3063496D1 (en) | 1979-08-21 | 1980-08-06 | Polyoxazole precursors, their preparation and their use |
| AT80104643T ATE3556T1 (de) | 1979-08-21 | 1980-08-06 | Polyoxazol-vorstufen, deren herstellung und verwendung. |
| US06/179,462 US4398009A (en) | 1979-08-21 | 1980-08-19 | Polyoxazole precursor and the preparation thereof |
| JP11531980A JPS5643254A (en) | 1979-08-21 | 1980-08-21 | Polyoxazol precurcor and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792933828 DE2933828A1 (de) | 1979-08-21 | 1979-08-21 | Polyoxazol-vorstufen sowie deren herstellung. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2933828A1 true DE2933828A1 (de) | 1981-03-12 |
Family
ID=6078953
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19792933828 Withdrawn DE2933828A1 (de) | 1979-08-21 | 1979-08-21 | Polyoxazol-vorstufen sowie deren herstellung. |
| DE8080104643T Expired DE3063496D1 (en) | 1979-08-21 | 1980-08-06 | Polyoxazole precursors, their preparation and their use |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8080104643T Expired DE3063496D1 (en) | 1979-08-21 | 1980-08-06 | Polyoxazole precursors, their preparation and their use |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4398009A (https=) |
| EP (1) | EP0025506B1 (https=) |
| JP (1) | JPS5643254A (https=) |
| AT (1) | ATE3556T1 (https=) |
| DE (2) | DE2933828A1 (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0158726A1 (de) * | 1984-03-29 | 1985-10-23 | Siemens Aktiengesellschaft | Verfahren zur Herstellung von Polyoxazol- und Polythiazolvorstufen |
| US5068308A (en) * | 1988-06-15 | 1991-11-26 | Basf Aktiengesellschaft | Continuous preparation of aromatic polycondensates |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3107519A1 (de) * | 1981-02-27 | 1982-09-16 | Siemens AG, 1000 Berlin und 8000 München | "verfahren zur herstellung von orietierungsschichten fuer fluessigkristalldisplays sowie orientierungsschichten aufweisende fluessigkeitskristalle" |
| DE3411697A1 (de) * | 1984-03-29 | 1985-10-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-reliefstrukturen |
| DE3411714A1 (de) * | 1984-03-29 | 1985-10-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-reliefstrukturen |
| DE3888390D1 (de) * | 1987-05-18 | 1994-04-21 | Siemens Ag | Verfahren zur Herstellung hochwärmebeständiger Dielektrika. |
| IT1228515B (it) * | 1988-03-03 | 1991-06-20 | Central Glass Co Ltd | Resine poliammidi aromatiche resistenti al calore e fotosensibili e metodo per la loro preparazione |
| US5008346A (en) * | 1989-04-28 | 1991-04-16 | The United States Of America As Represented By The Secretary Of The Air Force | Graft copolymers of poly(p-phenylene benzbisimidazole) |
| US5322916A (en) * | 1993-03-16 | 1994-06-21 | The Dow Chemical Company | Method for the preparation of amide oligomers and polybenzazole polymers therefrom |
| JP2005002330A (ja) * | 2003-05-19 | 2005-01-06 | Sumitomo Electric Ind Ltd | 光学樹脂材料、光学素子、光モジュール、フッ素化ポリマー前駆体及びフッ素化ポリマー |
| US11137362B2 (en) | 2019-12-10 | 2021-10-05 | Covestro Llc | Method for assessing the long-term thermal resistance of closed-cell thermal insulating foams at multiple mean temperatures |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6414610A (https=) * | 1963-12-16 | 1965-06-17 | ||
| DE1595723A1 (de) * | 1965-02-09 | 1970-04-30 | Gen Electric | Verfahren zur Herstellung von stickstoffhaltigen Polymeren |
| US3483105A (en) * | 1966-05-18 | 1969-12-09 | Ppg Industries Inc | Highly radiation-sensitive telomerized polyamides |
| NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
| DE2437348B2 (de) * | 1974-08-02 | 1976-10-07 | Ausscheidung in: 24 62 105 | Verfahren zur herstellung von reliefstrukturen |
-
1979
- 1979-08-21 DE DE19792933828 patent/DE2933828A1/de not_active Withdrawn
-
1980
- 1980-08-06 DE DE8080104643T patent/DE3063496D1/de not_active Expired
- 1980-08-06 AT AT80104643T patent/ATE3556T1/de not_active IP Right Cessation
- 1980-08-06 EP EP80104643A patent/EP0025506B1/de not_active Expired
- 1980-08-19 US US06/179,462 patent/US4398009A/en not_active Expired - Lifetime
- 1980-08-21 JP JP11531980A patent/JPS5643254A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0158726A1 (de) * | 1984-03-29 | 1985-10-23 | Siemens Aktiengesellschaft | Verfahren zur Herstellung von Polyoxazol- und Polythiazolvorstufen |
| US5068308A (en) * | 1988-06-15 | 1991-11-26 | Basf Aktiengesellschaft | Continuous preparation of aromatic polycondensates |
Also Published As
| Publication number | Publication date |
|---|---|
| ATE3556T1 (de) | 1983-06-15 |
| DE3063496D1 (en) | 1983-07-07 |
| US4398009A (en) | 1983-08-09 |
| JPS5643254A (en) | 1981-04-21 |
| JPH0260659B2 (https=) | 1990-12-17 |
| EP0025506B1 (de) | 1983-05-25 |
| EP0025506A1 (de) | 1981-03-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0027506B1 (de) | Polyimid-, Polyisoindolochinazolindion-, Polyoxazindion- und Polychinazolindion-Vorstufen, deren Herstellung und Verwendung | |
| EP0041677B1 (de) | Strahlungsreaktive Vorstufen hochwärmebeständiger Polymerer und deren Verwendung | |
| DE3411659A1 (de) | Verfahren zur herstellung von polyoxazol- und polythiazol-vorstufen | |
| DE3411660A1 (de) | Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-vorstufen | |
| DE2933828A1 (de) | Polyoxazol-vorstufen sowie deren herstellung. | |
| DE2933827A1 (de) | Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung. | |
| DE3233912A1 (de) | Fotolacke zur ausbildung von reliefstrukturen aus hochwaermebestaendigen polymeren | |
| EP0024592B1 (de) | Polyimidazol- und Polyimidazopyrrolon-Vorstufen sowie deren Herstellung | |
| EP0157931B1 (de) | Verfahren zur Herstellung von Polyimidazol- und Polyimidazopyrrolon-Vorstufen | |
| DE1570664A1 (de) | Polysilyl-Biuret-Verbindungen,Poly-Biuret-Verbindungen sowie Verfahren zu deren Herstellung | |
| EP0041678A2 (de) | Verfahren zur Herstellung hochwärmebeständiger Reliefstrukturen und deren Verwendung | |
| DE1266427B (de) | Verfahren zur Herstellung von Lackueberzuegen auf Grundlage von Polyisocyanaten | |
| DE102018211720A1 (de) | Funktionalisierte Polymere | |
| DE2933805A1 (de) | Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung | |
| DE3411714A1 (de) | Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-reliefstrukturen | |
| EP0206158A2 (de) | Photopolymere auf Polyetherbasis | |
| DE10115882B4 (de) | Polyhydroxamide, daraus durch Cyclisierung erhältliche Polybenzoxazole, Verfahren zur Herstellung der Polyhydroxamide und Polybenzoxazole, Beschichtungsmaterial für elektronische Bauelemente, elektronische Bauteile mit einer Schicht der Polybenzoxazole, Verfahren zur Beschichtung von Substraten mit den Polyhydroxamiden, Verwendung von Polybenzoxazolen als Isolier- und/oder Schutzschicht und Zusammensetzung enthaltend das Polyhydroxamid | |
| DE2264662B2 (de) | Polyamidimidvorläufer enthaltende härtbare Zusammensetzung | |
| DE3034536C2 (de) | Polyamid-imidharzmasse und ihre Verwendung | |
| DE1720909A1 (de) | Neue waermebestaendige Kunstharze auf Carbonsaeure-Aminbasis und Verfahren zu ihrer Herstellung | |
| EP0259726A2 (de) | Photopolymere auf Epoxidharzbasis | |
| DE2030233C2 (de) | Verfahren zur Herstellung von modifizierten N,N'-substituierten 2,4,5-Triketoimidazolidinen und deren Verwendung | |
| DE2437422C3 (de) | Verfahren zur Herstellung von Reliefstrukturen | |
| DE2462101B2 (https=) | ||
| DE2437369C3 (de) | Verfahren zur Herstellung von Reliefstrukturen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |