DE2626345A1 - Herstellungsverfahren fuer transparente photoschablonen - Google Patents
Herstellungsverfahren fuer transparente photoschablonenInfo
- Publication number
- DE2626345A1 DE2626345A1 DE19762626345 DE2626345A DE2626345A1 DE 2626345 A1 DE2626345 A1 DE 2626345A1 DE 19762626345 DE19762626345 DE 19762626345 DE 2626345 A DE2626345 A DE 2626345A DE 2626345 A1 DE2626345 A1 DE 2626345A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- transparent
- masking layer
- photo
- actinic light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 11
- 230000000873 masking effect Effects 0.000 claims abstract description 32
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 230000005855 radiation Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 15
- 238000000206 photolithography Methods 0.000 abstract description 8
- 239000000758 substrate Substances 0.000 abstract description 5
- 238000005259 measurement Methods 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 44
- 239000011521 glass Substances 0.000 description 12
- 238000009826 distribution Methods 0.000 description 8
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 5
- 229910001431 copper ion Inorganic materials 0.000 description 5
- 235000013980 iron oxide Nutrition 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762626345 DE2626345A1 (de) | 1976-06-11 | 1976-06-11 | Herstellungsverfahren fuer transparente photoschablonen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762626345 DE2626345A1 (de) | 1976-06-11 | 1976-06-11 | Herstellungsverfahren fuer transparente photoschablonen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2626345A1 true DE2626345A1 (de) | 1977-12-22 |
| DE2626345B2 DE2626345B2 (enExample) | 1979-01-11 |
| DE2626345C3 DE2626345C3 (enExample) | 1979-09-13 |
Family
ID=5980365
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762626345 Granted DE2626345A1 (de) | 1976-06-11 | 1976-06-11 | Herstellungsverfahren fuer transparente photoschablonen |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE2626345A1 (enExample) |
-
1976
- 1976-06-11 DE DE19762626345 patent/DE2626345A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE2626345C3 (enExample) | 1979-09-13 |
| DE2626345B2 (enExample) | 1979-01-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OC | Search report available | ||
| OD | Request for examination | ||
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |