DE2543628C2 - Halbleiterbauelement zum Speichern von Information in Form von elektrischen Ladungen, Verfahren zu seinem Betrieb und Informatiosspeicher mit solchen Halbleiterbauelementen - Google Patents
Halbleiterbauelement zum Speichern von Information in Form von elektrischen Ladungen, Verfahren zu seinem Betrieb und Informatiosspeicher mit solchen HalbleiterbauelementenInfo
- Publication number
- DE2543628C2 DE2543628C2 DE2543628A DE2543628A DE2543628C2 DE 2543628 C2 DE2543628 C2 DE 2543628C2 DE 2543628 A DE2543628 A DE 2543628A DE 2543628 A DE2543628 A DE 2543628A DE 2543628 C2 DE2543628 C2 DE 2543628C2
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- insulating layer
- doped
- voltage
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 64
- 238000003860 storage Methods 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 117
- 239000003990 capacitor Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 11
- 239000011159 matrix material Substances 0.000 claims description 13
- 230000007423 decrease Effects 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 2
- 239000002800 charge carrier Substances 0.000 abstract description 3
- 238000011161 development Methods 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
- G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
- H01L29/1062—Channel region of field-effect devices of charge coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42396—Gate electrodes for field effect devices for charge coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
- H01L29/94—Metal-insulator-semiconductors, e.g. MOS
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Semiconductor Memories (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2543628A DE2543628C2 (de) | 1975-09-30 | 1975-09-30 | Halbleiterbauelement zum Speichern von Information in Form von elektrischen Ladungen, Verfahren zu seinem Betrieb und Informatiosspeicher mit solchen Halbleiterbauelementen |
FR7627472A FR2326761A1 (fr) | 1975-09-30 | 1976-09-13 | Memoire d'informations pour la memorisation d'informations sous forme de porteurs de charge electriques et procede pour sa mise en oeuvre |
US05/723,312 US4064491A (en) | 1975-09-30 | 1976-09-15 | Information memory for storing information in the form of electric charge carriers and method of operating thereof |
NL7610696A NL7610696A (nl) | 1975-09-30 | 1976-09-27 | Informatiegeheugen voor het opbergen van infor- matie in de vorm van elektrische ladingsdragers en een werkwijze voor het bedrijf ervan. |
GB40151/76A GB1564617A (en) | 1975-09-30 | 1976-09-28 | Data stors |
CA262,328A CA1087309A (en) | 1975-09-30 | 1976-09-29 | Information memory for storing information in the form of electric charge carriers and method of operation thereof |
IT27758/76A IT1072548B (it) | 1975-09-30 | 1976-09-29 | Memoria di informazioni utile per memorizzare informazioni nella forma di portatori di carica elettrica |
JP51117884A JPS5243381A (en) | 1975-09-30 | 1976-09-30 | Information memory for storing information as charge and method of driving same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2543628A DE2543628C2 (de) | 1975-09-30 | 1975-09-30 | Halbleiterbauelement zum Speichern von Information in Form von elektrischen Ladungen, Verfahren zu seinem Betrieb und Informatiosspeicher mit solchen Halbleiterbauelementen |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2543628A1 DE2543628A1 (de) | 1977-04-21 |
DE2543628C2 true DE2543628C2 (de) | 1987-05-07 |
Family
ID=5957857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2543628A Expired DE2543628C2 (de) | 1975-09-30 | 1975-09-30 | Halbleiterbauelement zum Speichern von Information in Form von elektrischen Ladungen, Verfahren zu seinem Betrieb und Informatiosspeicher mit solchen Halbleiterbauelementen |
Country Status (3)
Country | Link |
---|---|
US (1) | US4064491A (US06373033-20020416-M00002.png) |
CA (1) | CA1087309A (US06373033-20020416-M00002.png) |
DE (1) | DE2543628C2 (US06373033-20020416-M00002.png) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1979000474A1 (en) * | 1978-01-03 | 1979-07-26 | D Erb | A stratified charge memory device |
DE2842588A1 (de) * | 1978-09-29 | 1980-04-17 | Siemens Ag | Hochintegrierbares, dynamisches speicherelement |
DE2912858A1 (de) * | 1979-03-30 | 1980-10-09 | Siemens Ag | Niederohmige leitung |
JPS57157562A (en) * | 1981-03-24 | 1982-09-29 | Fujitsu Ltd | Semiconductor memory |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES404184A1 (es) * | 1971-07-06 | 1975-06-01 | Ibm | Una disposicion de celula de memoria de acceso casual para calculadoras digitales. |
-
1975
- 1975-09-30 DE DE2543628A patent/DE2543628C2/de not_active Expired
-
1976
- 1976-09-15 US US05/723,312 patent/US4064491A/en not_active Expired - Lifetime
- 1976-09-29 CA CA262,328A patent/CA1087309A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA1087309A (en) | 1980-10-07 |
DE2543628A1 (de) | 1977-04-21 |
US4064491A (en) | 1977-12-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |