DE2462450A1 - Verfahren zum stromlosen plattieren oder galvanisieren von metallen sowie mit diesem verfahren hergestellter gegenstand - Google Patents

Verfahren zum stromlosen plattieren oder galvanisieren von metallen sowie mit diesem verfahren hergestellter gegenstand

Info

Publication number
DE2462450A1
DE2462450A1 DE19742462450 DE2462450A DE2462450A1 DE 2462450 A1 DE2462450 A1 DE 2462450A1 DE 19742462450 DE19742462450 DE 19742462450 DE 2462450 A DE2462450 A DE 2462450A DE 2462450 A1 DE2462450 A1 DE 2462450A1
Authority
DE
Germany
Prior art keywords
cell
aluminum
strip
electroplating
metal islands
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19742462450
Other languages
German (de)
English (en)
Inventor
Spaeter Genannt Werden Wird
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US361720A external-priority patent/US3865700A/en
Application filed by Individual filed Critical Individual
Publication of DE2462450A1 publication Critical patent/DE2462450A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005Apparatus specially adapted for electrolytic conversion coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/625Discontinuous layers, e.g. microcracked layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electrochemical Coating By Surface Reaction (AREA)
  • Catalysts (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Chemically Coating (AREA)
DE19742462450 1973-05-18 1974-05-11 Verfahren zum stromlosen plattieren oder galvanisieren von metallen sowie mit diesem verfahren hergestellter gegenstand Withdrawn DE2462450A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US361720A US3865700A (en) 1973-05-18 1973-05-18 Process and apparatus for continuously anodizing aluminum
US449162A US3929594A (en) 1973-05-18 1974-03-07 Electroplated anodized aluminum articles

Publications (1)

Publication Number Publication Date
DE2462450A1 true DE2462450A1 (de) 1977-03-31

Family

ID=27001395

Family Applications (4)

Application Number Title Priority Date Filing Date
DE19742462449 Withdrawn DE2462449A1 (de) 1973-05-18 1974-05-11 Verfahren zum kontinuierlichen elektrolytischen eloxieren und galvanisieren von aluminium sowie vorrichtung zur durchfuehrung dieses verfahrens
DE19742462450 Withdrawn DE2462450A1 (de) 1973-05-18 1974-05-11 Verfahren zum stromlosen plattieren oder galvanisieren von metallen sowie mit diesem verfahren hergestellter gegenstand
DE2422918A Expired DE2422918C3 (de) 1973-05-18 1974-05-11 Flachdruckplatte und Verfahren zu ihrer Herstellung
DE19742462448 Withdrawn DE2462448A1 (de) 1973-05-18 1974-05-11 Flaechiger metallgegenstand, verfahren zu seiner herstellung sowie katalysator aus diesem metallgegenstand

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19742462449 Withdrawn DE2462449A1 (de) 1973-05-18 1974-05-11 Verfahren zum kontinuierlichen elektrolytischen eloxieren und galvanisieren von aluminium sowie vorrichtung zur durchfuehrung dieses verfahrens

Family Applications After (2)

Application Number Title Priority Date Filing Date
DE2422918A Expired DE2422918C3 (de) 1973-05-18 1974-05-11 Flachdruckplatte und Verfahren zu ihrer Herstellung
DE19742462448 Withdrawn DE2462448A1 (de) 1973-05-18 1974-05-11 Flaechiger metallgegenstand, verfahren zu seiner herstellung sowie katalysator aus diesem metallgegenstand

Country Status (8)

Country Link
US (1) US3929594A (OSRAM)
JP (2) JPS5546320B2 (OSRAM)
BR (1) BR7404050D0 (OSRAM)
CA (1) CA1035722A (OSRAM)
DE (4) DE2462449A1 (OSRAM)
FR (1) FR2248332B1 (OSRAM)
GB (1) GB1473347A (OSRAM)
IT (1) IT1011370B (OSRAM)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4021592A (en) * 1974-03-07 1977-05-03 Fromson H A Process of making electroplated anodized aluminum articles and electroless plating
US4014756A (en) * 1976-01-21 1977-03-29 Fromson H A Process for making metal powders
DE2616662C2 (de) * 1976-04-15 1984-02-02 Dornier System Gmbh, 7990 Friedrichshafen Verfahren zur herstellung einer selektiven solarabsorberschicht auf aluminium
JPS53100508A (en) * 1977-02-16 1978-09-02 Hitachi Cable Ltd Rigid trolley
US4371430A (en) * 1979-04-27 1983-02-01 Printing Developments, Inc. Electrodeposition of chromium on metal base lithographic sheet
JPS55176624U (OSRAM) * 1979-06-01 1980-12-18
US4406757A (en) * 1982-03-29 1983-09-27 Polychrome Corporation Anodization method
US4526671A (en) * 1982-09-24 1985-07-02 Pilot Man-Nen-Hitsu Kabushiki Kaisha Surface treatment of aluminum or aluminum alloys
DE3636129A1 (de) * 1986-10-23 1988-05-05 Man Technologie Gmbh Druckform fuer den flachdruck
US4862799A (en) * 1987-11-13 1989-09-05 Rockwell International Corporation Copper coated anodized aluminum ink metering roller
US6479430B1 (en) * 1995-07-13 2002-11-12 Howard A. Fromson Catalyst preparation
US5693207A (en) * 1995-07-13 1997-12-02 Howard A. Fromson Catalyst preparation
US6083871A (en) * 1999-03-30 2000-07-04 Howard A. Fromson Catalyst structure and method of manufacture
US6214765B1 (en) 1999-11-02 2001-04-10 Howard A. Fromson Catalyst product and method of manufacture
CN105308220A (zh) * 2013-02-19 2016-02-03 铝镀公司 改善铝薄膜粘附的方法
US9972877B2 (en) 2014-07-14 2018-05-15 Palo Alto Research Center Incorporated Metamaterial-based phase shifting element and phased array
US10355356B2 (en) 2014-07-14 2019-07-16 Palo Alto Research Center Incorporated Metamaterial-based phase shifting element and phased array
US9871298B2 (en) 2014-12-23 2018-01-16 Palo Alto Research Center Incorporated Rectifying circuit for multiband radio frequency (RF) energy harvesting
US9935370B2 (en) 2014-12-23 2018-04-03 Palo Alto Research Center Incorporated Multiband radio frequency (RF) energy harvesting with scalable antenna
US20160362807A1 (en) * 2015-06-15 2016-12-15 Palo Alto Research Center Incorporated Producing Passive Radiative Cooling Panels And Modules
US9927188B2 (en) 2015-06-15 2018-03-27 Palo Alto Research Center Incorporated Metamaterials-enhanced passive radiative cooling panel
US10060686B2 (en) 2015-06-15 2018-08-28 Palo Alto Research Center Incorporated Passive radiative dry cooling module/system using metamaterials
CN113699573A (zh) * 2020-05-20 2021-11-26 苹果公司 非水性铝阳极化
CN112941514A (zh) * 2021-02-05 2021-06-11 南昌航空大学 一种铜/镍反应性纳米多层膜的制备方法
WO2024197168A1 (en) * 2023-03-22 2024-09-26 General Electric Company Component protected with an array of discrete reactive deposits for regenerative surface treatment

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE606850C (de) * 1930-11-07 1934-12-12 Siemens Ag Verfahren zur Erzeugung festhaftender galvanischer Niederschlaege auf Aluminium und dessen Legierungen
US2798037A (en) * 1953-05-13 1957-07-02 Sprague Electric Co Aluminum oxide films
US2930951A (en) * 1957-07-08 1960-03-29 Gen Electric Electrical capacitor
US2898490A (en) * 1957-12-23 1959-08-04 Gen Electric Target plate
US3099609A (en) * 1961-09-11 1963-07-30 Katayose Kimiyoshi Method of electroplating aluminum or its alloy with porous hard chromium

Also Published As

Publication number Publication date
CA1035722A (en) 1978-08-01
US3929594A (en) 1975-12-30
DE2422918C3 (de) 1978-08-17
BR7404050D0 (pt) 1974-12-03
DE2462449A1 (de) 1977-03-31
FR2248332A1 (OSRAM) 1975-05-16
AU6878374A (en) 1975-11-13
FR2248332B1 (OSRAM) 1979-07-27
JPS5041729A (OSRAM) 1975-04-16
JPS54109038A (en) 1979-08-27
GB1473347A (en) 1977-05-11
DE2422918A1 (de) 1974-12-05
IT1011370B (it) 1977-01-20
DE2422918B2 (de) 1977-12-08
JPS5546320B2 (OSRAM) 1980-11-22
JPS5636879B2 (OSRAM) 1981-08-27
DE2462448A1 (de) 1977-03-31

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Legal Events

Date Code Title Description
BI Miscellaneous see part 2
8141 Disposal/no request for examination