DE2442291C2 - Gaslaser-Oszillator mit axialem Gasdurchfluss - Google Patents

Gaslaser-Oszillator mit axialem Gasdurchfluss

Info

Publication number
DE2442291C2
DE2442291C2 DE2442291A DE2442291A DE2442291C2 DE 2442291 C2 DE2442291 C2 DE 2442291C2 DE 2442291 A DE2442291 A DE 2442291A DE 2442291 A DE2442291 A DE 2442291A DE 2442291 C2 DE2442291 C2 DE 2442291C2
Authority
DE
Germany
Prior art keywords
housing
gas
laser oscillator
mirrors
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2442291A
Other languages
German (de)
English (en)
Other versions
DE2442291A1 (de
Inventor
Bernard Paris Lavarini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Compagnie Generale dElectricite SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Compagnie Generale dElectricite SA filed Critical Compagnie Generale dElectricite SA
Publication of DE2442291A1 publication Critical patent/DE2442291A1/de
Application granted granted Critical
Publication of DE2442291C2 publication Critical patent/DE2442291C2/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Lasers (AREA)
DE2442291A 1973-09-06 1974-09-04 Gaslaser-Oszillator mit axialem Gasdurchfluss Expired DE2442291C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7332156A FR2243538B1 (enExample) 1973-09-06 1973-09-06

Publications (2)

Publication Number Publication Date
DE2442291A1 DE2442291A1 (de) 1975-03-13
DE2442291C2 true DE2442291C2 (de) 1984-09-27

Family

ID=9124709

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2442291A Expired DE2442291C2 (de) 1973-09-06 1974-09-04 Gaslaser-Oszillator mit axialem Gasdurchfluss

Country Status (9)

Country Link
US (1) US3889209A (enExample)
JP (1) JPS5724671B2 (enExample)
BE (1) BE818731A (enExample)
CA (1) CA1015052A (enExample)
DE (1) DE2442291C2 (enExample)
FR (1) FR2243538B1 (enExample)
GB (1) GB1471425A (enExample)
IT (1) IT1027558B (enExample)
NL (1) NL180061C (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5839396B2 (ja) * 1978-08-25 1983-08-30 株式会社日立製作所 ガスレ−ザ発生装置
JPS5885581A (ja) * 1981-11-18 1983-05-21 Hitachi Ltd レ−ザ発生装置
JPS58192194A (ja) * 1982-05-06 1983-11-09 三洋電機株式会社 自動販売機の貨幣制御部
FR2531282A2 (fr) * 1982-07-30 1984-02-03 Comp Generale Electricite Oscillateur laser a flux gazeux
US4486887A (en) * 1982-08-23 1984-12-04 Metalworking Lasers International Ltd. High-power lasers
DE3639580A1 (de) * 1985-11-20 1987-05-21 Mitsubishi Electric Corp Laseranordnung
CA2043512A1 (en) * 1990-06-01 1991-12-02 Mitsugu Terada Gas laser apparatus
JPH08139391A (ja) * 1994-11-02 1996-05-31 Fanuc Ltd レーザ共振器
US6973112B2 (en) * 2003-07-31 2005-12-06 Visx, Incorporated Passive gas flow management and filtration device for use in an excimer or transverse discharge laser

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3447098A (en) * 1966-02-08 1969-05-27 Edwin E Eckberg Gas laser tube system
FR1496231A (fr) * 1966-08-19 1967-09-29 Comp Generale Electricite Tête pour tube laser
US3575669A (en) * 1968-06-17 1971-04-20 Trw Inc Chemical laser apparatus
GB1283601A (en) * 1969-01-01 1972-08-02 Nat Res Dev Improvements in or relating to gas discharge lasers
DE2054096A1 (de) * 1969-11-03 1971-05-27 Hydronautics Gasentladungsrohr, insbesondere fur Gaslaser

Also Published As

Publication number Publication date
JPS5057193A (enExample) 1975-05-19
NL180061C (nl) 1986-12-16
FR2243538A1 (enExample) 1975-04-04
IT1027558B (it) 1978-12-20
GB1471425A (en) 1977-04-27
NL180061B (nl) 1986-07-16
NL7411892A (nl) 1975-03-10
FR2243538B1 (enExample) 1976-06-18
JPS5724671B2 (enExample) 1982-05-25
CA1015052A (en) 1977-08-02
BE818731A (fr) 1975-02-12
DE2442291A1 (de) 1975-03-13
US3889209A (en) 1975-06-10

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee