DE2427656A1 - Photohaertbare pastenzusammensetzungen mit hoher rasterschaerfe - Google Patents

Photohaertbare pastenzusammensetzungen mit hoher rasterschaerfe

Info

Publication number
DE2427656A1
DE2427656A1 DE19742427656 DE2427656A DE2427656A1 DE 2427656 A1 DE2427656 A1 DE 2427656A1 DE 19742427656 DE19742427656 DE 19742427656 DE 2427656 A DE2427656 A DE 2427656A DE 2427656 A1 DE2427656 A1 DE 2427656A1
Authority
DE
Germany
Prior art keywords
inorganic
paste composition
paste
areas
particulate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19742427656
Other languages
German (de)
English (en)
Inventor
David Hitz Scheiber
Richard Vroman Weaver
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE2427656A1 publication Critical patent/DE2427656A1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/109Polyester
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Conductive Materials (AREA)
DE19742427656 1973-06-08 1974-06-07 Photohaertbare pastenzusammensetzungen mit hoher rasterschaerfe Pending DE2427656A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US368316A US3914128A (en) 1973-06-08 1973-06-08 Photohardenable paste compositions having high resolution

Publications (1)

Publication Number Publication Date
DE2427656A1 true DE2427656A1 (de) 1974-12-19

Family

ID=23450727

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19742427656 Pending DE2427656A1 (de) 1973-06-08 1974-06-07 Photohaertbare pastenzusammensetzungen mit hoher rasterschaerfe

Country Status (5)

Country Link
US (1) US3914128A (enrdf_load_stackoverflow)
JP (1) JPS5033827A (enrdf_load_stackoverflow)
DE (1) DE2427656A1 (enrdf_load_stackoverflow)
FR (1) FR2232774B1 (enrdf_load_stackoverflow)
IT (1) IT1010441B (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4083725A (en) * 1973-06-02 1978-04-11 Mitsubishi Chemical Industries Ltd. Photosensitive composition
US3988229A (en) * 1975-08-28 1976-10-26 Eastman Kodak Company Stabilized photopolymerizable polymeric compositions containing a photoinitiator and a nitrone derivative
JPS5534211A (en) * 1978-08-31 1980-03-10 Toppan Printing Co Ltd Calcining ink composition
JPS55137137A (en) * 1979-04-13 1980-10-25 Tokuyama Soda Co Ltd Polypropylene film
JPS6028869B2 (ja) * 1981-04-10 1985-07-06 ミヨシ油脂株式会社 ポリアミド繊維の内部用帯電防止剤組成物
US4598037A (en) * 1984-12-21 1986-07-01 E. I. Du Pont De Nemours And Company Photosensitive conductive metal composition
US4613560A (en) * 1984-12-28 1986-09-23 E. I. Du Pont De Nemours And Company Photosensitive ceramic coating composition
US4943470A (en) * 1985-01-11 1990-07-24 Ngk Spark Plug Co., Ltd. Ceramic substrate for electrical devices
US4828961A (en) * 1986-07-02 1989-05-09 W. R. Grace & Co.-Conn. Imaging process for forming ceramic electronic circuits
JPH0651809B2 (ja) * 1987-08-19 1994-07-06 東レ株式会社 帯電防止性の改良された二軸延伸ポリプロピレンフィルム
JP4151846B2 (ja) * 2004-03-03 2008-09-17 Tdk株式会社 積層セラミック電子部品、回路基板等、および当該部品、基板等の製造に供せられるセラミックグリーンシートの製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE630740A (enrdf_load_stackoverflow) * 1962-04-09
DE1597748A1 (de) * 1967-10-27 1970-08-27 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
US3615457A (en) * 1969-04-02 1971-10-26 Du Pont Photopolymerizable compositions and processes of applying the same
US3573908A (en) * 1969-06-06 1971-04-06 Bell Telephone Labor Inc Photographic technique for the selective deposition of a ceramic substrate glaze
US3661635A (en) * 1970-02-20 1972-05-09 American Lava Corp Dual-etched refractory metallizing

Also Published As

Publication number Publication date
JPS5033827A (enrdf_load_stackoverflow) 1975-04-01
IT1010441B (it) 1977-01-10
US3914128A (en) 1975-10-21
FR2232774A1 (enrdf_load_stackoverflow) 1975-01-03
FR2232774B1 (enrdf_load_stackoverflow) 1976-12-17

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