DE2322689A1 - Werkstueckhalterung fuer glimmentladungseinrichtung - Google Patents

Werkstueckhalterung fuer glimmentladungseinrichtung

Info

Publication number
DE2322689A1
DE2322689A1 DE2322689A DE2322689A DE2322689A1 DE 2322689 A1 DE2322689 A1 DE 2322689A1 DE 2322689 A DE2322689 A DE 2322689A DE 2322689 A DE2322689 A DE 2322689A DE 2322689 A1 DE2322689 A1 DE 2322689A1
Authority
DE
Germany
Prior art keywords
workpiece
tube
glow discharge
workpiece holder
base part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE2322689A
Other languages
German (de)
English (en)
Inventor
Claude Kitchener Jones
Stuart Waldo Martin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE2322689A1 publication Critical patent/DE2322689A1/de
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Discharge Heating (AREA)
  • Physical Vapour Deposition (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
DE2322689A 1972-05-08 1973-05-05 Werkstueckhalterung fuer glimmentladungseinrichtung Ceased DE2322689A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25127472A 1972-05-08 1972-05-08

Publications (1)

Publication Number Publication Date
DE2322689A1 true DE2322689A1 (de) 1973-11-22

Family

ID=22951228

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2322689A Ceased DE2322689A1 (de) 1972-05-08 1973-05-05 Werkstueckhalterung fuer glimmentladungseinrichtung

Country Status (4)

Country Link
US (1) US3739220A (OSRAM)
JP (1) JPS5510664B2 (OSRAM)
DE (1) DE2322689A1 (OSRAM)
GB (1) GB1399571A (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2606454C2 (de) * 1976-02-18 1978-01-12 lonit Anstalt Bernhard Berghaus, Vaduz Thermoelementeinsatz
US4328258A (en) * 1977-12-05 1982-05-04 Plasma Physics Corp. Method of forming semiconducting materials and barriers
US4226897A (en) * 1977-12-05 1980-10-07 Plasma Physics Corporation Method of forming semiconducting materials and barriers
JP2571421B2 (ja) * 1988-07-04 1997-01-16 大同特殊鋼株式会社 プラズマ浸炭熱処理炉
JPH08209352A (ja) * 1995-02-06 1996-08-13 Hitachi Ltd プラズマ処理装置および方法
CN105132858B (zh) * 2015-08-06 2017-11-10 西华大学 内孔局域辉光等离子体放电装置及其使用方法

Also Published As

Publication number Publication date
JPS5510664B2 (OSRAM) 1980-03-18
US3739220A (en) 1973-06-12
JPS4961793A (OSRAM) 1974-06-14
GB1399571A (en) 1975-07-02

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Legal Events

Date Code Title Description
OGA New person/name/address of the applicant
OD Request for examination
8131 Rejection