DE2313801B2 - CHAMBER FOR GAS EXHAUST, ION WATERING OR VAPORATION - Google Patents

Description

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2 em according to claim 1, characterized in that that the sample (II) with the sample holder (14) eccentrically via a ball joint (33) is attached to one end face (34) of the piston (26)

^ Chamber according to claims 1 and 2, characterized ^ indicates that after the application of pressure the piston (26) by overturning the sample holder (14) ir. the compartment in the Piston cylinder (24) under the shiiellu -.-. G of the needle valve (23) and open * the needle valve (27) is retractable "

4. Chamber according to claim 1 or one of the following, characterized in that the Chamber wall (1) and / or the cover window (7) consist of quartz glass.

5. Chamber according to claim 1 or one of the following, characterized in that the loading

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The invention relates to a chamber for gas etching. Ion etching or vapor deposition of the surface of a sample through the addition of atoms or ions of a gaseous medium, which between two hlectrouen, one of which is the sample, each other is located, with a sample holder and a cover window for observation of the surface with a Microscope.

In contrast to cathodic ion etching, gas etching is based on the accumulation of gas ions the polished sample surface. The gas ions arrive mainly through the accumulation of electrons the neutral gas molecules come about, i.e. through surface ionization, since they are still relatively small gaps between electrodes, voltage values and atomic gas pressures Impact ionization and thus positive ion formation can only be expected to a limited extent. The negative ions therefore migrate to the anode, i. H. to the sample and lead to layer formation there the material surface. The possibility of utilizing this layer formation for color contrasting 3S £ as

and also shows the most difficult aspects of the ion beam because H ^e ' ^ne g ^e f "^

S ₅ the Chamber ^ rhande: - is Zur

the preparation, therefore, be removed from the ^self-on £ ^ _m chamber. In addition, poorly conductive samples due to the ^

Chamber housing of the electron number b / «. lcnu, -

beam this year «· ^

The Autgaoe aer tninumig uc a chamber of the type mentioned at the beginning / «butt ·. ,, with no D.cht.gke.tprobleme. d. H. Shirt gas inflows exist, the use of standardized

metallographic sample sizes, an improvement in focusing and a use of the chamber in e.g. B. Hot cells, i.e. Feinbcdunbarke ». is possible and can be guaranteed at the em MehrzwccKemsa U de, Kan, -mer for gas etching, ion etching and vapor deposition.

The solution to this problem consists of the invention that the specimen holder on a KnIKn is articulated, which can be raised and lowered pneumatically within a KoI-benz> Linders on the chamber.

and that a lever linkage is arranged between the piston and the sample ^{1: ltcrung.} with which the sample holder and with this the surface of the sample during the "movements of the piston from cn, τ etched position into an observation position" below the

DaKi can be moved around the top window or vice versa Can the sample 1, with the sample holder _c \ / emnsch

a the c;

bens attached stm.

In one embodiment of the invention During the lifting movement of the piston, the lever linkage can slide the sample holder under the chamber Lead cover window while after pressurizing the piston by tipping over the sample holder can be returned to the piston cylinder in the etching position.

Furthermore, it is particularly advantageous that the chamber wall consists of the chamber and the cover glass Consist of quartz glass or glass. It is also possible according to the invention, the stroke of movement of the piston and

to adjust the lever linkage.

Advantages of the chamber according to the invention are that the high vacuum required for vapor deposition within the chamber of at least

10 "^; Torr can be achieved without difficulty, which was not possible in comparison to previous designs. Another advantage is that the chamber described is easy to clean thanks to its much simpler structure and, thanks to generous tolerances, is less prone to failure and quite inexpensive to manufacture is.

The invention is illustrated below on the basis of an exemplary embodiment by means of FIGS. 1 and 2 closer explained.

In FIG. 1, the chamber 1 is a cylindrical shape Structure made of quartz glass or glass groove. '' vacuum or suction nozzle 2 as well as a ^ v-ite .-. i nozzle 3 for the flange-mounting of a cathode 4. ~: _ Chamber I itself is covered with a cover plate 5 ..! Mine contain a recess 6 "; en is that with a Deek window 7, e.g. B. made of polished quartz glass, is covered. The Diuhtunt, opposite the cover plate 5 takes place via a sealing ring 8 and the holder via a tension spring 9 via the cover window 7 outside the chamber 1, the objective IO of a microscope is arranged schematically.

Opposite the cathode 4 is the etched profile 11 with the sample surface 12, which is soft It) DCIi should be contrasted. The ions are created in the space 13 between the cathode tip and the sample surface 12, namely by applying a voltage between the cathode 4 and the sample holder 14 via the voltage supply units 15 and 16, which on a voltage device

17 are connected. The gas. which is to be ionized. z. B. Oxygen is supplied via the feed

18 with a rigid valve, e.g. B. the needle valve 19. Via the supply line 20. Velchc on the gas bottles 21 is connected. in the chamber interior: introduced.

From the line 20, a further inlet 22 leads from / 11 to a needle valve 23 which is connected to the piston cylinder 24. which itself is ani'tüigt at the bottom 25 of the chamber 1, in particular at its center. The needle valve 23 is in the closed position, so that a piston 26, 7, for example made of glass, located inside the piston 24 is in its rest position. The piston 26 need! compared to the Kolhen / vlinderwandung not necessarily 1; sealed, as there are no special sealing requirements! ¹ 'sin'! Because the gas / operation of the piston 26 is always the same as that between the cathode 4 and the sample object 12 is to be ionized. A further needle valve 27 is connected to the same piston 24, which nut cr . In the illustration, the needle valve 27 is geoiTix so that 111 the chamber 1 and the piston cylinder 24 have the same pressure, ie the piston 26 and with it the sample 11 are in At / s! << ma set.

In Fig. 2 ιΐκ sample 11 is in their BcoKi.li processing position in the line. iirnl / was under the Deek window 7 b / w unu-r the microscopy. The position becomes atlir.'i lit. il.iß the needle ¹

19 in the I cit.nig 20 fe-.i !! is lost, so dal '. ! ■ more gas flows past the cathode 4. However, Glen Ii is also early <! ■ · Needle valve 27 incl

sen and the Nadclvent ^'1' three opened so that dei Κ ·> 1 ^ 5

² 5

30th

35

-ίο gas cylinder 24 or its interior is pressurized with gas. In doing so, the piston 26 is lifted out of the cylinder, since an excess pressure is created in the cylinder. During this process, the sample II or its surface 12 is lifted into the observation position, namely because the piston 26 is connected via the clasp 28 to a lever linkage 29, 30 which is itself articulated on the sample holder 14. The rocker arm 29 of the HebeLjesiänges is particularly hinged to the clasp 28 and furthermore via the hinge 31 on the floor 25 of the chamber 1. The load arm of the rocker arm 29 is articulated to the pull rod 30, while the pull rod 30 itself is connected again via the hinge 32 the sample holder 14 is attached. The length of the pull rod 3ö and the height of the Kiamn.jr28 on the piston 26 are variably adjustable.

The proof holder 14 same "i ^r .» Articulated ex / entrisch via a ball joint 33 on the end face 34 of the piston 26.

When applying the piston cylinder 24 with Gas pressure is thus raised the piston 26 and the sample holder via the lever linkage 29, 30 14 with the sample II around the ball joint 33 vice tilts. The actuation of any mechanisms from the outside is thus superfluous, which means that there are no sealing devices Pop up. At the same time, the sample 11 b / w is adjusted. their sample area 12 automatically in the horizontal, namely by resting on the cover window 7 and can thus directly at high Magnifications using the microscope. 10 observes who »'· - ·'. Since also in the chamber 1 a If there is negative pressure, only actuation of the pneumatic Tilting system 29, 30. 33. 26 only a gas pressure of 0.1 to 0.5 aluminum is necessary. The stroke of movement of the piston 26 and that of the two levers 29, 30 can be changed with two adjusting screws (not shown in detail), whereby sample heights from I 1 to I 5 mm and a diameter of up to / α 27 mm can be used. This MaZi; include the fermented ;; \ c: rm £: raßeri for .nciaüi-.graphic .. Joint-sized. which through di.se Konstiuktu.n directly can be used in the chamber.

See observation, the sample holder! 4 b / w the sample 11 can be tilted back into the etching position by closing the needle valve 23 again and c! ..- Nadelvenii! 27 is opened again. In this way, the piston / cylinder 24 and the chamber 1 receive the same negative pressure. ! Since the sample Π are eccentric with the sample holder 14 is iihci d ball joint 33 connected to piston 26, all they dureh their own Übe'gewichi in Jic V- 'ical with respect to the ^I: missionseleki ^r ode 4 b / v iie- heating element «. ·· - for contrasting / back.

Since dt K. innrer 1 from /. B. quartz glass is a light focusing of the sample 11 / ur dischargev .. _iu le4 can be accomplished quickly and reproducibly / u. . F-.in ( '' fro the Entladungssüult to other I hasten the chamber 1 is omitted insofar as they are made of more or S'.ilil meieren metals mine, - alleviate predominantly of glass can Furthermore, the ^F: lekimden 4 iir. > can be exchanged with a metal grind 35 (anallansthiiiK and exchanged for a suitable heating element for vapor deposition).

Hu t / u 1 sheet of drawings

Claims (1)

Patent claims: 1. Chamber for gas etching, ion etching or vapor deposition of the surface of a sample by the accumulation of atoms or ions of a gaseous medium, which is located between two electrodes, one of which is the sample, with a sample holder and a cover window for observation of the surface microscope characterized in that the sample holder (14) is hinged to a piston (26) which can be raised and lowered pneumatically within a piston cylinder (24) on the chamber (1), and that between the piston (26) and the Sample holder (14) is arranged in a lever-Eestänae (29, 30) with which the sample holder 'U) and with this the upper is already known (F. Hubert, Neue Hütte 6, 1962, ^s 3 ^ _apparatus known (special print from f ^^^^ J ^ stopisdic preparations ^ orgeu. a. ^el = ^k ^^ £ g _nnen ^P _{οίε Gasentladungsappara} - [; ° ^mm ~ " ^W ^, _d excitation facilities equipped. tu ^ tm« two gb _equi- voltage and m, t Em ^A] rbe.tsgas Ka ^^ High frequency t * ¹ _{water cooled} cn table is ^ J ^^ diameter of 10cm; he is and £ * ane ^ _{the dne high} _ * VnlTsduSfSng for one electrode carries. That