DE2308627A1 - Semitransparente, aetzbare duenne schicht auf einem substrat - Google Patents
Semitransparente, aetzbare duenne schicht auf einem substratInfo
- Publication number
- DE2308627A1 DE2308627A1 DE19732308627 DE2308627A DE2308627A1 DE 2308627 A1 DE2308627 A1 DE 2308627A1 DE 19732308627 DE19732308627 DE 19732308627 DE 2308627 A DE2308627 A DE 2308627A DE 2308627 A1 DE2308627 A1 DE 2308627A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- substrate
- semitransparent
- thin layer
- etchable thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 14
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 230000005294 ferromagnetic effect Effects 0.000 claims description 4
- 238000012986 modification Methods 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 230000000087 stabilizing effect Effects 0.000 claims description 3
- 239000000654 additive Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000005298 paramagnetic effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Compounds Of Iron (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH539372A CH565500A5 (OSRAM) | 1972-04-11 | 1972-04-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2308627A1 true DE2308627A1 (de) | 1973-10-18 |
Family
ID=4292810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19732308627 Pending DE2308627A1 (de) | 1972-04-11 | 1973-02-21 | Semitransparente, aetzbare duenne schicht auf einem substrat |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS4915961A (OSRAM) |
| CH (1) | CH565500A5 (OSRAM) |
| DE (1) | DE2308627A1 (OSRAM) |
| GB (1) | GB1359250A (OSRAM) |
| NL (1) | NL7300287A (OSRAM) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH071389B2 (ja) * | 1985-11-22 | 1995-01-11 | シャープ株式会社 | フオトマスクの製造方法 |
| JPS63121054A (ja) * | 1986-11-10 | 1988-05-25 | Nec Corp | フオトマスク |
-
1972
- 1972-04-11 CH CH539372A patent/CH565500A5/xx not_active IP Right Cessation
- 1972-11-14 GB GB5260672A patent/GB1359250A/en not_active Expired
- 1972-12-20 JP JP12728272A patent/JPS4915961A/ja active Pending
-
1973
- 1973-01-09 NL NL7300287A patent/NL7300287A/xx unknown
- 1973-02-21 DE DE19732308627 patent/DE2308627A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| NL7300287A (OSRAM) | 1973-10-15 |
| GB1359250A (en) | 1974-07-10 |
| CH565500A5 (OSRAM) | 1975-08-15 |
| JPS4915961A (OSRAM) | 1974-02-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |