DE2207853A1 - Photoempfindliche, dielektrische Zusammensetzung - Google Patents
Photoempfindliche, dielektrische ZusammensetzungInfo
- Publication number
- DE2207853A1 DE2207853A1 DE19722207853 DE2207853A DE2207853A1 DE 2207853 A1 DE2207853 A1 DE 2207853A1 DE 19722207853 DE19722207853 DE 19722207853 DE 2207853 A DE2207853 A DE 2207853A DE 2207853 A1 DE2207853 A1 DE 2207853A1
- Authority
- DE
- Germany
- Prior art keywords
- vinyl monomer
- polymer
- epoxy resin
- composition according
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims description 45
- 229920000642 polymer Polymers 0.000 claims description 56
- 239000003822 epoxy resin Substances 0.000 claims description 55
- 229920000647 polyepoxide Polymers 0.000 claims description 55
- 239000000178 monomer Substances 0.000 claims description 52
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 41
- 229920002554 vinyl polymer Polymers 0.000 claims description 41
- 239000002904 solvent Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 19
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 13
- 239000004593 Epoxy Substances 0.000 claims description 12
- 239000003504 photosensitizing agent Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 229920006287 phenoxy resin Polymers 0.000 claims description 9
- 239000013034 phenoxy resin Substances 0.000 claims description 9
- 229920003986 novolac Polymers 0.000 claims description 7
- 229930185605 Bisphenol Natural products 0.000 claims description 6
- 239000012442 inert solvent Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 239000004848 polyfunctional curative Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 4
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 3
- 229920006037 cross link polymer Polymers 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- 150000007933 aliphatic carboxylic acids Chemical group 0.000 claims description 2
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 claims description 2
- 125000005313 fatty acid group Chemical group 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 150000004053 quinones Chemical class 0.000 claims description 2
- 150000008064 anhydrides Chemical class 0.000 claims 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 22
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 15
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 12
- 150000003254 radicals Chemical class 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 10
- -1 acrylyl radical Chemical class 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 238000012644 addition polymerization Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000000466 oxiranyl group Chemical group 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- BVEIKFLZWBDLJG-UHFFFAOYSA-N 1-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCCC BVEIKFLZWBDLJG-UHFFFAOYSA-N 0.000 description 1
- AXFVIWBTKYFOCY-UHFFFAOYSA-N 1-n,1-n,3-n,3-n-tetramethylbutane-1,3-diamine Chemical compound CN(C)C(C)CCN(C)C AXFVIWBTKYFOCY-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- DJKGDNKYTKCJKD-UHFFFAOYSA-N chlorendic acid Chemical compound ClC1=C(Cl)C2(Cl)C(C(=O)O)C(C(O)=O)C1(Cl)C2(Cl)Cl DJKGDNKYTKCJKD-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011872 intimate mixture Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11780871A | 1971-02-22 | 1971-02-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2207853A1 true DE2207853A1 (de) | 1972-08-31 |
Family
ID=22374944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722207853 Pending DE2207853A1 (de) | 1971-02-22 | 1972-02-19 | Photoempfindliche, dielektrische Zusammensetzung |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3776729A (enExample) |
| JP (1) | JPS5230969B1 (enExample) |
| CA (1) | CA960077A (enExample) |
| DE (1) | DE2207853A1 (enExample) |
| FR (1) | FR2150657B1 (enExample) |
| GB (1) | GB1386122A (enExample) |
| IT (1) | IT944336B (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2533371A1 (de) * | 1974-07-27 | 1976-02-05 | Canon Kk | Photoempfindliches element fuer die elektrophotographie |
| EP0003040A3 (en) * | 1978-01-09 | 1979-08-22 | International Business Machines Corporation | Light-sensitive coating material and its application as a negative resist |
| EP0014237A3 (en) * | 1978-12-08 | 1980-12-10 | International Business Machines Corporation | Photosensitive coating composition and its use in the production of a negative resist image |
| EP0073444A3 (en) * | 1981-08-28 | 1983-06-15 | Hoechst Aktiengesellschaft | Radiation-polymerisable composition and copying material made therefrom |
| WO1989005476A1 (en) * | 1987-12-07 | 1989-06-15 | Morton Thiokol, Inc. | Photoimageable compositions |
| EP0381900A3 (en) * | 1989-02-06 | 1992-04-15 | Somar Corporation | Method of forming electrically conducting layer |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3935330A (en) * | 1971-12-08 | 1976-01-27 | Union Carbide Corporation | Two-step coating process |
| US4003868A (en) * | 1971-12-08 | 1977-01-18 | Union Carbide Corporation | Ink or coating compositions of low volatility |
| US4035189A (en) * | 1972-02-25 | 1977-07-12 | Hitachi Chemical Company, Ltd. | Image forming curable resin compositions |
| CH576739A5 (enExample) * | 1972-08-25 | 1976-06-15 | Ciba Geigy Ag | |
| US4064199A (en) * | 1973-02-16 | 1977-12-20 | Nippon Oil Company Ltd. | Curable coating compositions |
| GB1478341A (en) * | 1973-06-07 | 1977-06-29 | Hitachi Chemical Co Ltd | Printed circuit board and method of making the same |
| CA1065085A (en) * | 1974-05-20 | 1979-10-23 | John P. Guarino | Radiation curable coating |
| US4128600A (en) * | 1977-01-14 | 1978-12-05 | General Mills Chemicals, Inc. | Interpenetrating dual cure resin compositions |
| US4342793A (en) * | 1977-01-14 | 1982-08-03 | Henkel Corporation | Interpenetrating dual cure resin compositions |
| US4203792A (en) * | 1977-11-17 | 1980-05-20 | Bell Telephone Laboratories, Incorporated | Method for the fabrication of devices including polymeric materials |
| DE3114931A1 (de) * | 1981-04-13 | 1982-10-28 | Hoechst Ag, 6000 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial |
| EP0099856B1 (de) * | 1982-06-24 | 1987-11-11 | Ciba-Geigy Ag | Photopolymerisierbares Beschichtungsmittel, photopolymerisierbares Material und seine Verwendung |
| EP0142463B1 (de) * | 1983-08-24 | 1989-09-20 | Ciba-Geigy Ag | Verfahren zur Herstellung von Prepregs und die damit erhältlichen verstärkten Verbundstoffe |
| US4690957A (en) * | 1986-02-27 | 1987-09-01 | Mitsubishi Denki Kabushiki Kaisha | Ultra-violet ray curing type resin composition |
| AU614106B2 (en) * | 1987-12-07 | 1991-08-22 | Morton Thiokol, Inc. | Photoimageable compositions containing acrylic polymers and epoxy resins |
| US5364736A (en) * | 1987-12-07 | 1994-11-15 | Morton International, Inc. | Photoimageable compositions |
| DE3931467A1 (de) * | 1989-09-21 | 1991-04-04 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske |
| JPH07268065A (ja) * | 1993-11-17 | 1995-10-17 | Sophia Syst:Kk | 紫外線硬化型の無溶媒導電性ポリマー材料 |
| AU4810197A (en) * | 1996-10-08 | 1998-05-05 | Fibercote Industries, Inc. | Sheet material for core support |
| US7323289B2 (en) * | 2002-10-08 | 2008-01-29 | Brewer Science Inc. | Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| JP4233314B2 (ja) * | 2002-11-29 | 2009-03-04 | 東京応化工業株式会社 | レジスト組成物および溶解制御剤 |
| WO2013163100A1 (en) | 2012-04-23 | 2013-10-31 | Brewer Science Inc. | Photosensitive, developer-soluble bottom anti-reflective coating material |
-
1971
- 1971-02-22 US US00117808A patent/US3776729A/en not_active Expired - Lifetime
- 1971-12-24 IT IT32878/71A patent/IT944336B/it active
-
1972
- 1972-01-04 FR FR7200568A patent/FR2150657B1/fr not_active Expired
- 1972-01-06 JP JP47004220A patent/JPS5230969B1/ja active Pending
- 1972-02-01 GB GB456172A patent/GB1386122A/en not_active Expired
- 1972-02-08 CA CA134,218A patent/CA960077A/en not_active Expired
- 1972-02-19 DE DE19722207853 patent/DE2207853A1/de active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2533371A1 (de) * | 1974-07-27 | 1976-02-05 | Canon Kk | Photoempfindliches element fuer die elektrophotographie |
| EP0003040A3 (en) * | 1978-01-09 | 1979-08-22 | International Business Machines Corporation | Light-sensitive coating material and its application as a negative resist |
| EP0014237A3 (en) * | 1978-12-08 | 1980-12-10 | International Business Machines Corporation | Photosensitive coating composition and its use in the production of a negative resist image |
| EP0073444A3 (en) * | 1981-08-28 | 1983-06-15 | Hoechst Aktiengesellschaft | Radiation-polymerisable composition and copying material made therefrom |
| WO1989005476A1 (en) * | 1987-12-07 | 1989-06-15 | Morton Thiokol, Inc. | Photoimageable compositions |
| EP0381900A3 (en) * | 1989-02-06 | 1992-04-15 | Somar Corporation | Method of forming electrically conducting layer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5230969B1 (enExample) | 1977-08-11 |
| FR2150657A1 (enExample) | 1973-04-13 |
| CA960077A (en) | 1974-12-31 |
| IT944336B (it) | 1973-04-20 |
| FR2150657B1 (enExample) | 1975-03-21 |
| US3776729A (en) | 1973-12-04 |
| GB1386122A (en) | 1975-03-05 |
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