DE2162671C3 - Lichtempfindliches Gemisch - Google Patents
Lichtempfindliches GemischInfo
- Publication number
- DE2162671C3 DE2162671C3 DE2162671A DE2162671A DE2162671C3 DE 2162671 C3 DE2162671 C3 DE 2162671C3 DE 2162671 A DE2162671 A DE 2162671A DE 2162671 A DE2162671 A DE 2162671A DE 2162671 C3 DE2162671 C3 DE 2162671C3
- Authority
- DE
- Germany
- Prior art keywords
- radical
- photosensitive
- methane
- triethanolamine
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title claims description 151
- -1 acyl ester Chemical class 0.000 claims description 80
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 34
- DJYQGDNOPVHONN-UHFFFAOYSA-N 2-[bis(2-acetyloxyethyl)amino]ethyl acetate Chemical group CC(=O)OCCN(CCOC(C)=O)CCOC(C)=O DJYQGDNOPVHONN-UHFFFAOYSA-N 0.000 claims description 25
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 21
- 239000003638 chemical reducing agent Substances 0.000 claims description 15
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 claims description 14
- 125000001424 substituent group Chemical group 0.000 claims description 14
- 239000011230 binding agent Substances 0.000 claims description 13
- 239000007800 oxidant agent Substances 0.000 claims description 13
- 150000003254 radicals Chemical class 0.000 claims description 12
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 claims description 11
- 150000002148 esters Chemical class 0.000 claims description 11
- 239000004014 plasticizer Substances 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 229910052801 chlorine Inorganic materials 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 5
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- CSPLCTYUMAHGLL-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanol propanoic acid Chemical compound CCC(O)=O.CCC(O)=O.CCC(O)=O.OCCN(CCO)CCO CSPLCTYUMAHGLL-UHFFFAOYSA-N 0.000 claims description 4
- IWTIBPIVCKUAHK-UHFFFAOYSA-N 3-[bis(2-carboxyethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CCC(O)=O)CCC(O)=O IWTIBPIVCKUAHK-UHFFFAOYSA-N 0.000 claims description 4
- XETOQIJGUBNXLQ-UHFFFAOYSA-N Pyrene-1,8-dione Chemical compound C1=CC(=O)C2=CC=C3C(=O)C=CC4=CC=C1C2=C43 XETOQIJGUBNXLQ-UHFFFAOYSA-N 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- 125000003762 3,4-dimethoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 3
- YFPSDOXLHBDCOR-UHFFFAOYSA-N Pyrene-1,6-dione Chemical compound C1=CC(C(=O)C=C2)=C3C2=CC=C2C(=O)C=CC1=C32 YFPSDOXLHBDCOR-UHFFFAOYSA-N 0.000 claims description 3
- GMACPFCYCYJHOC-UHFFFAOYSA-N [C].C Chemical compound [C].C GMACPFCYCYJHOC-UHFFFAOYSA-N 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000005907 alkyl ester group Chemical group 0.000 claims description 3
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 3
- 125000004414 alkyl thio group Chemical group 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 3
- MYSSRTPFZFYMLM-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-bis(3-methoxyphenyl)imidazol-2-yl]-4,5-bis(3-methoxyphenyl)imidazole Chemical group COC1=CC=CC(C=2C(=NC(N=2)(C=2C(=CC=CC=2)Cl)C2(N=C(C(=N2)C=2C=C(OC)C=CC=2)C=2C=C(OC)C=CC=2)C=2C(=CC=CC=2)Cl)C=2C=C(OC)C=CC=2)=C1 MYSSRTPFZFYMLM-UHFFFAOYSA-N 0.000 claims description 2
- 125000004663 dialkyl amino group Chemical group 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 125000001624 naphthyl group Chemical group 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- ZKRGOTVNTDAVDF-UHFFFAOYSA-N C(C)(=O)O.C(C)(=O)O.C(C)(=O)O.C(C)O.C(C)O.C(C)O Chemical compound C(C)(=O)O.C(C)(=O)O.C(C)(=O)O.C(C)O.C(C)O.C(C)O ZKRGOTVNTDAVDF-UHFFFAOYSA-N 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 125000003282 alkyl amino group Chemical group 0.000 claims 1
- 125000005872 benzooxazolyl group Chemical group 0.000 claims 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 claims 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 125000002541 furyl group Chemical group 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 claims 1
- 125000001041 indolyl group Chemical group 0.000 claims 1
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical compound [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 claims 1
- JNMWNOFTCDEJHU-UHFFFAOYSA-N n,n-diethyl-3,4-dimethylaniline Chemical compound CCN(CC)C1=CC=C(C)C(C)=C1 JNMWNOFTCDEJHU-UHFFFAOYSA-N 0.000 claims 1
- 125000002971 oxazolyl group Chemical group 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- WEMXRTXQKRXSIO-UHFFFAOYSA-N propanenitrile Chemical compound [CH2]CC#N WEMXRTXQKRXSIO-UHFFFAOYSA-N 0.000 claims 1
- 125000004076 pyridyl group Chemical group 0.000 claims 1
- 125000005493 quinolyl group Chemical group 0.000 claims 1
- 125000000335 thiazolyl group Chemical group 0.000 claims 1
- 125000001544 thienyl group Chemical group 0.000 claims 1
- 239000000123 paper Substances 0.000 description 51
- 239000010410 layer Substances 0.000 description 39
- 239000010408 film Substances 0.000 description 36
- 239000002904 solvent Substances 0.000 description 27
- 230000009849 deactivation Effects 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 20
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 18
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 16
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 16
- 239000001913 cellulose Substances 0.000 description 15
- 229920002678 cellulose Polymers 0.000 description 15
- 230000005855 radiation Effects 0.000 description 15
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 14
- 239000000047 product Substances 0.000 description 14
- 150000005840 aryl radicals Chemical class 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 230000035945 sensitivity Effects 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 238000003384 imaging method Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 8
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 8
- 230000035515 penetration Effects 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000004615 ingredient Substances 0.000 description 7
- YDNHCHDMPIHHGH-UHFFFAOYSA-N methyl 3-[bis(3-methoxy-3-oxopropyl)amino]propanoate Chemical compound COC(=O)CCN(CCC(=O)OC)CCC(=O)OC YDNHCHDMPIHHGH-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 235000010292 orthophenyl phenol Nutrition 0.000 description 6
- 229920006267 polyester film Polymers 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- OHPZPBNDOVQJMH-UHFFFAOYSA-N n-ethyl-4-methylbenzenesulfonamide Chemical compound CCNS(=O)(=O)C1=CC=C(C)C=C1 OHPZPBNDOVQJMH-UHFFFAOYSA-N 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 229920000570 polyether Polymers 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- CJABVFCUCRAVOK-UHFFFAOYSA-N pyrene-1,2-dione Chemical compound C1=C2C(=O)C(=O)C=C(C=C3)C2=C2C3=CC=CC2=C1 CJABVFCUCRAVOK-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000002023 wood Substances 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- PHAULEGHFSAAGX-UHFFFAOYSA-N 3-[[5-(diethylamino)-2-methylphenyl]-(3,4-dimethoxyphenyl)methyl]-n,n-diethyl-4-methylaniline Chemical compound CCN(CC)C1=CC=C(C)C(C(C=2C=C(OC)C(OC)=CC=2)C=2C(=CC=C(C=2)N(CC)CC)C)=C1 PHAULEGHFSAAGX-UHFFFAOYSA-N 0.000 description 2
- BVKHQIABCPCWNJ-UHFFFAOYSA-N 3-[bis[5-(diethylamino)-2-methylphenyl]methyl]-n,n-diethyl-4-methylaniline Chemical compound CCN(CC)C1=CC=C(C)C(C(C=2C(=CC=C(C=2)N(CC)CC)C)C=2C(=CC=C(C=2)N(CC)CC)C)=C1 BVKHQIABCPCWNJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
- G03C1/732—Leuco dyes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US9951270A | 1970-12-18 | 1970-12-18 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2162671A1 DE2162671A1 (de) | 1972-06-29 |
| DE2162671B2 DE2162671B2 (de) | 1973-10-25 |
| DE2162671C3 true DE2162671C3 (de) | 1974-05-22 |
Family
ID=22275354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2162671A Expired DE2162671C3 (de) | 1970-12-18 | 1971-12-17 | Lichtempfindliches Gemisch |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3658543A (https=) |
| JP (1) | JPS5421725B1 (https=) |
| BE (1) | BE776854A (https=) |
| DE (1) | DE2162671C3 (https=) |
| GB (1) | GB1332258A (https=) |
Families Citing this family (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4207102A (en) * | 1974-10-21 | 1980-06-10 | E. I. Du Pont De Nemours And Company | Marking transfer sheets and process |
| US4029506A (en) * | 1974-10-21 | 1977-06-14 | E. I. Du Pont De Nemours And Company | Universal product code marking composition containing a photosensitive dye former, a pigment and a binder and the use thereof |
| JPS55133032A (en) * | 1979-04-03 | 1980-10-16 | Ricoh Co Ltd | Photosensitive composition |
| US4232108A (en) * | 1979-05-01 | 1980-11-04 | E. I. Du Pont De Nemours And Company | Marking transfer sheets |
| US4311783A (en) * | 1979-08-14 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5,-triphenylimidazole compounds as photoinitiators |
| US4252887A (en) * | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
| US4341860A (en) | 1981-06-08 | 1982-07-27 | E. I. Du Pont De Nemours And Company | Photoimaging compositions containing substituted cyclohexadienone compounds |
| JPS61137876A (ja) * | 1984-12-07 | 1986-06-25 | Hodogaya Chem Co Ltd | キサンテン化合物、キサンテン化合物の製造方法及びキサンテン化合物を含有する画像形成組成物 |
| US4894314A (en) * | 1986-11-12 | 1990-01-16 | Morton Thiokol, Inc. | Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer |
| JPH0254252A (ja) * | 1988-08-19 | 1990-02-23 | Fuji Photo Film Co Ltd | 光像形成材料 |
| US5210064A (en) * | 1991-11-20 | 1993-05-11 | Polaroid Corporation | Stabilization of thermal images |
| US5206208A (en) * | 1991-11-20 | 1993-04-27 | Polaroid Corporation | Stabilization of thermal images |
| EP1264212B1 (en) | 2000-03-08 | 2009-02-18 | E.I. Du Pont De Nemours And Company | Elements for forming print-out images |
| US7060654B2 (en) * | 2003-10-28 | 2006-06-13 | Hewlett-Packard Development Company | Imaging media and materials used therein |
| US6708644B2 (en) * | 2001-11-13 | 2004-03-23 | Mcnamara Patrick | Thermal imaging fitting system |
| US20030138731A1 (en) * | 2001-12-21 | 2003-07-24 | Treliant Fang | Photoresist formulation for high aspect ratio plating |
| EP1398381A1 (en) * | 2002-09-06 | 2004-03-17 | The Procter & Gamble Company | A microbial oxidoreductase |
| US7700258B2 (en) * | 2003-01-24 | 2010-04-20 | Hewlett-Packard Development Company, L.P. | Color forming compositions with improved marking sensitivity and image contrast and associated methods |
| US6974661B2 (en) * | 2003-01-24 | 2005-12-13 | Hewlett-Packard Development Company, L.P. | Compositions, systems, and methods for imaging |
| US6890614B2 (en) * | 2003-09-05 | 2005-05-10 | Hewlett-Packard Development Company, L.P. | Metal salt activators for use in leuco dye compositions |
| US7462443B2 (en) * | 2003-09-05 | 2008-12-09 | Hewlett-Packard Development Company, L.P. | Leuco dye-containing coating compositions |
| US6958181B1 (en) * | 2003-09-05 | 2005-10-25 | Hewlett-Packard Development Company, L.P. | Protected activators for use in leuco dye compositions |
| US7083904B2 (en) * | 2003-09-05 | 2006-08-01 | Hewlett-Packard Development Company, L.P. | Compositions, systems, and methods for imaging |
| US20050084807A1 (en) * | 2003-10-17 | 2005-04-21 | Meagley Robert P. | Reducing photoresist line edge roughness using chemically-assisted reflow |
| US7144676B2 (en) * | 2004-02-06 | 2006-12-05 | Rohm And Haas Electronic Materials Llc | Imaging compositions and methods |
| US7270932B2 (en) * | 2004-02-06 | 2007-09-18 | Rohm And Haas Electronic Materials Llc | Imaging composition and method |
| KR101125678B1 (ko) * | 2004-02-06 | 2012-03-28 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. | 개선된 이미지화 조성물 및 방법 |
| US7977026B2 (en) * | 2004-02-06 | 2011-07-12 | Rohm And Haas Electronic Materials Llc | Imaging methods |
| US20050175941A1 (en) * | 2004-02-06 | 2005-08-11 | Rohm And Hass Electronic Materials, L.L.C. | Imaging composition and method |
| EP1752494A4 (en) * | 2004-03-31 | 2009-01-28 | Nichiban Kk | PHOTORADICALLY HARDENABLE RESIN COMPOSITION WITH EPOXY RESIN |
| US7148182B2 (en) | 2004-04-27 | 2006-12-12 | Hewlett-Packard Development Company, L.P. | Multilayered color compositions and associated methods |
| US7513682B2 (en) * | 2004-05-11 | 2009-04-07 | Hewlett-Packard Development Company, L.P. | Temperature monitoring system |
| US7897296B2 (en) | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
| US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
| US20060093958A1 (en) * | 2004-10-28 | 2006-05-04 | Vladek Kasperchik | Color forming compositions and associated methods |
| US7198834B2 (en) * | 2005-03-22 | 2007-04-03 | Hewlett-Packard Development Company, L.P. | Imaging media including interference layer for generating human-readable marking on optical media |
| US7270944B2 (en) * | 2005-03-29 | 2007-09-18 | Hewlett-Packard Development Company, L.P. | Compositions, systems, and methods for imaging |
| US20070065623A1 (en) * | 2005-09-21 | 2007-03-22 | Vladek Kasperchik | Laser-imageable coating based on exothermic decomposition |
| US20070065749A1 (en) * | 2005-09-21 | 2007-03-22 | Vladek Kasperchik | Radiation-markable coatings for printing and imaging |
| US20070086308A1 (en) * | 2005-10-13 | 2007-04-19 | Gore Makarand P | Systems and methods for imaging |
| US7390610B2 (en) | 2005-10-18 | 2008-06-24 | Hewlett-Packard Development Company, L.P. | Color forming composition |
| US7314704B2 (en) | 2005-10-24 | 2008-01-01 | Hewlett-Packard Development Company, L.P. | Image recording media and image layers |
| US20070117042A1 (en) * | 2005-11-23 | 2007-05-24 | Rohm And Haas Electronic Materials Llc | Imaging methods |
| US20070238613A1 (en) | 2006-03-29 | 2007-10-11 | Brocklin Andrew L V | Dual band color forming composition and method |
| US20070243354A1 (en) * | 2006-04-18 | 2007-10-18 | Hewlett-Packard Development Company, L.P. | Image-recording medium with thermally insulating layer |
| US20070248918A1 (en) | 2006-04-25 | 2007-10-25 | Vladek Kasperchik | Compositions, systems and methods for imaging |
| US8283100B2 (en) * | 2006-05-16 | 2012-10-09 | Hewlett-Packard Development Company, L.P. | Color forming compositions and associated methods |
| US20080003396A1 (en) | 2006-06-15 | 2008-01-03 | Hladik Molly L | Water-soluble coatings for media |
| US20080020320A1 (en) | 2006-07-20 | 2008-01-24 | Dorsh Cari L | Color forming composition containing optional sensitizer |
| US20080090925A1 (en) | 2006-10-13 | 2008-04-17 | Hladik Molly L | Color forming compositions |
| KR101232179B1 (ko) * | 2006-12-04 | 2013-02-12 | 엘지디스플레이 주식회사 | 박막 패턴의 제조장치 및 방법 |
| US7892619B2 (en) * | 2006-12-16 | 2011-02-22 | Hewlett-Packard Development Company, L.P. | Coating for optical recording |
| US7582408B2 (en) | 2007-04-27 | 2009-09-01 | Hewlett-Packard Development Company, L.P. | Color forming compositions with a fluoran leuco dye having a latent developer |
| CN102224460B (zh) | 2008-10-15 | 2015-01-21 | 国际纸业公司 | 成像颗粒组合物、纸张和方法以及使用双波长光对纸张成像的方法 |
| ES2552855T3 (es) | 2008-10-15 | 2015-12-02 | International Paper Company | Composición, proceso de preparación y método de aplicación y exposición para papel de formación de imágenes mediante luz |
| US8742007B2 (en) | 2010-08-23 | 2014-06-03 | Oatey Co. | Color developing colorless primer |
| US8652996B2 (en) | 2011-12-31 | 2014-02-18 | Sanford, L.P. | Irreversible thermochromic pigment capsules |
| US8664156B2 (en) | 2011-12-31 | 2014-03-04 | Sanford, L.P. | Irreversible thermochromic ink compositions |
| US8709973B2 (en) | 2011-12-31 | 2014-04-29 | Sanford, L.P. | Irreversible thermochromic ink compositions |
| US8865621B2 (en) | 2012-08-06 | 2014-10-21 | Sanford, L.P. | Irreversible color changing ink compositions |
| WO2015069945A1 (en) | 2013-11-08 | 2015-05-14 | Seeleaf, Inc. | Methods and articles for the detection of exposure to polyhydroxyaromatic skin irritants |
| US10822150B2 (en) | 2015-06-03 | 2020-11-03 | Bemis Company, Inc. | Package for indicating heat-seal condition |
| CN110049877A (zh) | 2016-12-02 | 2019-07-23 | 比密斯公司 | 用于指示热密封条件的包装 |
| US20220372312A1 (en) | 2021-05-21 | 2022-11-24 | Sanford L.P. | Marking compositions |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3445234A (en) * | 1962-10-31 | 1969-05-20 | Du Pont | Leuco dye/hexaarylbiimidazole imageforming composition |
| US3390994A (en) * | 1966-02-17 | 1968-07-02 | Du Pont | Photodeactivatable light-sensitive color-forming composition |
-
1970
- 1970-12-18 US US99512A patent/US3658543A/en not_active Expired - Lifetime
-
1971
- 1971-12-16 GB GB5846571A patent/GB1332258A/en not_active Expired
- 1971-12-17 DE DE2162671A patent/DE2162671C3/de not_active Expired
- 1971-12-17 BE BE776854A patent/BE776854A/xx not_active IP Right Cessation
- 1971-12-18 JP JP10312871A patent/JPS5421725B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2162671A1 (de) | 1972-06-29 |
| GB1332258A (en) | 1973-10-03 |
| US3658543A (en) | 1972-04-25 |
| JPS5421725B1 (https=) | 1979-08-01 |
| DE2162671B2 (de) | 1973-10-25 |
| BE776854A (fr) | 1972-06-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 |