DE2153860C2 - Verwendung von photopolymerisierbaren Gemischen zur Herstellung ätzmittelbeständiger Masken - Google Patents
Verwendung von photopolymerisierbaren Gemischen zur Herstellung ätzmittelbeständiger MaskenInfo
- Publication number
- DE2153860C2 DE2153860C2 DE19712153860 DE2153860A DE2153860C2 DE 2153860 C2 DE2153860 C2 DE 2153860C2 DE 19712153860 DE19712153860 DE 19712153860 DE 2153860 A DE2153860 A DE 2153860A DE 2153860 C2 DE2153860 C2 DE 2153860C2
- Authority
- DE
- Germany
- Prior art keywords
- parts
- mixture
- toluene
- polymer film
- photopolymerizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Silicon Polymers (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP45094698A JPS5031041B1 (enExample) | 1970-10-29 | 1970-10-29 | |
| JP596671 | 1971-02-13 | ||
| JP5373071A JPS5336515B1 (enExample) | 1971-07-19 | 1971-07-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2153860A1 DE2153860A1 (de) | 1972-05-04 |
| DE2153860C2 true DE2153860C2 (de) | 1982-06-09 |
Family
ID=27276969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712153860 Expired DE2153860C2 (de) | 1970-10-29 | 1971-10-28 | Verwendung von photopolymerisierbaren Gemischen zur Herstellung ätzmittelbeständiger Masken |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2153860C2 (enExample) |
| FR (1) | FR2110115A5 (enExample) |
| GB (1) | GB1323869A (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS525884B2 (enExample) * | 1973-05-09 | 1977-02-17 | ||
| FR2377654A1 (fr) * | 1977-01-18 | 1978-08-11 | Dainippon Printing Co Ltd | Procede de fabrication d'une plaque pour l'impression a plat |
| US4387240A (en) * | 1978-06-02 | 1983-06-07 | Minnesota Mining And Manufacturing Company | Oligomeric methacryl substituted alkylsiloxanes |
| FR2447386A1 (fr) * | 1979-01-24 | 1980-08-22 | Rhone Poulenc Ind | Compositions organopolysiloxaniques photopolymerisables |
| EP0076656B1 (en) * | 1981-10-03 | 1988-06-01 | Japan Synthetic Rubber Co., Ltd. | Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same |
| US4496210A (en) * | 1982-07-19 | 1985-01-29 | Desoto, Inc. | Low temperature-flexible radiation-curable unsaturated polysiloxane coated fiber optic |
| US4528081A (en) * | 1983-10-03 | 1985-07-09 | Loctite Corporation | Dual curing silicone, method of preparing same and dielectric soft-gel compositions thereof |
| US4504629A (en) * | 1983-07-20 | 1985-03-12 | Loctite Corporation | Polymers with graft α-alkylacrylate functionality |
| US4665147A (en) * | 1983-06-30 | 1987-05-12 | Loctite Corporation | Novel methacrylated siloxanes |
| EP0130731A3 (en) * | 1983-06-30 | 1986-03-26 | Loctite Corporation | Methacrylated siloxanes |
| DE3482042D1 (de) * | 1984-11-14 | 1990-05-31 | Loctite Corp | Auf zwei weisen haertbare silikone, verfahren zu deren herstellung und gelartige dielektrische zusammensetzungen. |
| JPH01301708A (ja) * | 1988-05-30 | 1989-12-05 | Shin Etsu Chem Co Ltd | 光硬化性オルガノポリシロキサン組成物 |
| FR2655993B1 (fr) * | 1989-12-19 | 1993-09-17 | Rhone Poulenc Chimie | Compositions durcissables sous u.v., utilisables notamment dans le domaine de l'antiadherence papier et des fibres optiques. |
| WO1992016590A1 (en) * | 1991-03-20 | 1992-10-01 | Minnesota Mining And Manufacturing Company | Radiation curable vinyl/silicone release coating |
| US5264278A (en) * | 1991-03-20 | 1993-11-23 | Minnesota Mining And Manufacturing Company | Radiation-curable acrylate/silicone pressure-sensitive adhesive coated tapes adherable to paint coated substrates |
| WO1992016593A2 (en) | 1991-03-20 | 1992-10-01 | Minnesota Mining And Manufacturing Company | Radiation-curable acrylate/silicone pressure-sensitive adhesive compositions |
| US5464659A (en) | 1991-05-23 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Silicone/acrylate vibration dampers |
| FR2724660B1 (fr) | 1994-09-16 | 1997-01-31 | Rhone Poulenc Chimie | Amorceurs de reticulation, par voie cationique, de polymeres a groupements organofonctionnels, compositions a base de polyorganosiloxanes reticulables et contenant ces amorceurs et application desdites compositions en antiadherence |
| CN1113886C (zh) * | 1997-07-31 | 2003-07-09 | 松下电器产业株式会社 | 化学吸附物质以及它们的制备方法 |
| AU4215299A (en) | 1998-06-01 | 1999-12-20 | Loctite Corporation | Flame-retardant uv curable silicone compositions |
| US6323253B1 (en) | 1998-06-01 | 2001-11-27 | Loctite Corporation | Flame-retardant UV and UV/moisture curable silicone compositions |
| JP3788911B2 (ja) | 2001-02-07 | 2006-06-21 | 信越化学工業株式会社 | オルガノポリシロキサン組成物 |
| US7309732B1 (en) | 2003-04-21 | 2007-12-18 | Henkel Corporation | UV and UV/moisture dual curable compositions with improved cure through volume |
| US20050003216A1 (en) | 2003-06-30 | 2005-01-06 | Jean-Marc Frances | Microparticle containing silicone release coatings having improved anti-block and release properties |
| EP1690885A1 (de) * | 2005-02-09 | 2006-08-16 | Ciba Spezialitätenchemie Pfersee GmbH | Acrylatofunktionelle Polysiloxane |
| JP5271713B2 (ja) | 2005-11-29 | 2013-08-21 | ヘンケル コーポレイション | 放射硬化性シリコーン組成物 |
| JP5616339B2 (ja) | 2008-07-30 | 2014-10-29 | ブルースター・シリコーン・フランス・エスアエスBluestar Silicones France Sas | フレキシブル基材をコーティングして、高い付着性、機械的強度および反応性を有する架橋コーティングを形成するためのシリコーン組成物 |
| JP5640944B2 (ja) | 2011-10-11 | 2014-12-17 | 信越化学工業株式会社 | 硬化性オルガノポリシロキサン組成物 |
| JP5776516B2 (ja) | 2011-11-29 | 2015-09-09 | 信越化学工業株式会社 | オルガノポリシロキサン化合物の製造方法並びにその化合物を用いた硬化性組成物 |
| PL2912075T3 (pl) | 2012-10-02 | 2017-06-30 | Bluestar Silicones France Sas | Kompozycja sieciowalna/polimeryzowalna kationowo, zawierająca boran jodoniowy i wydzielająca dopuszczalny zapach |
| FR3052784A1 (fr) | 2016-06-21 | 2017-12-22 | Bluestar Silicones France | Procede de lutte contre l'apparition de brouillard dans un dispositif a cylindres lors de l'enduction de supports flexibles avec une composition silicone liquide reticulable |
| JP7430727B2 (ja) | 2018-12-20 | 2024-02-13 | エルケム・シリコーンズ・フランス・エスアエス | 架橋可能な液体シリコーン組成物による可撓性支持体のコーティング中のロールを含む装置におけるミスト形成の防止のための方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2922806A (en) * | 1957-02-01 | 1960-01-26 | Dow Corning | Preparation of acryloxyalkyl substituted siloxanes |
-
1971
- 1971-10-28 DE DE19712153860 patent/DE2153860C2/de not_active Expired
- 1971-10-28 GB GB5021771A patent/GB1323869A/en not_active Expired
- 1971-10-29 FR FR7138904A patent/FR2110115A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1323869A (en) | 1973-07-18 |
| DE2153860A1 (de) | 1972-05-04 |
| FR2110115A5 (enExample) | 1972-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2246020C3 (de) | Verfahren zur Herstellung von Reliefoberflächen und Verwendung des Verfahrens zur Herstellung von Druckformen | |
| DE60102028T2 (de) | Polysiloxan, Verfahren zur Herstellung, Silicium-haltige alicyclische Verbindung, und strahlungsempfindliche Harzverbindungen | |
| DE2153860A1 (de) | Photopolymerisierbare Gemische und ihre Verwendung in der Drucktechnik sowie zur Herstellung ätzmittelbeständiger Reservagen | |
| KR100261224B1 (ko) | 실리콘을 함유하는 폴리머 및 이를 포함하는 화학증폭형 레지스트 조성물 | |
| EP0108037B1 (de) | Propiophenonderivate als Photoinitiatoren für die Photopolymerisation | |
| DE2804283C2 (de) | Unter Ausschluß von Wasser lagerfähige polymerisierbare Massen und Verfahren zur Kondensation von hydrolysierbaren Silanen in Gegenwart von Katalysatoren | |
| JP2582792B2 (ja) | チタノセン、それらの製造法およびそれらを含有する組成物 | |
| KR101681919B1 (ko) | 포지티브형 감광성 실록산 조성물 | |
| DE2207495A1 (de) | Flachdruckplatten und Verfahren zu ihrer Herstellung | |
| KR100304223B1 (ko) | 감방사선성수지조성물 | |
| US5770346A (en) | Photoresist and compounds for composing the photoresist | |
| EP0940422A1 (de) | (Meth)Acrylatester von Organosiloxanpolyolen, Verfahren zu deren Herstellung und deren Verwendung als strahlenhärtbare Beschichtungsmassen | |
| HK103296A (en) | Titanocenes, their use and n-substituted pyrroles | |
| EP1072326A2 (de) | Oberflächenaktive Photoinitiatoren | |
| US4042613A (en) | Benzophenone derivatives and their preparation and application | |
| DE69405479T2 (de) | Resistmaterialien | |
| JPS6052845A (ja) | パタ−ン形成材料 | |
| JP4013367B2 (ja) | 感放射線性樹脂組成物 | |
| DE2233514C3 (de) | Photopolymerisierbare, gegebenenfalls Füllstoffe enthaltende Organopolysiloxanformmassen und deren Verwendung zur Herstellung von Druckplatten und ätzmittelbeständigen Reservagen | |
| JP2697680B2 (ja) | 珪素含有高分子化合物および感光性樹脂組成物 | |
| DE69029104T2 (de) | Polysiloxane und positiv arbeitende Resistmasse | |
| JPH0586193A (ja) | アクリル官能性メチルフルオロアルキルシルセスキオキサン化合物 | |
| US5773192A (en) | Organic silicon compound, resist, thermal polymerization composition and photopolymerization composition | |
| JPWO2020196601A5 (enExample) | ||
| JPH0756354A (ja) | 珪素含有高分子化合物及びそれを用いたレジスト材 料 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| D2 | Grant after examination | ||
| 8339 | Ceased/non-payment of the annual fee |