DE2126887C3 - Niederschlagen magnetisierbarer Schichten durch Kathodenzerstäubung - Google Patents
Niederschlagen magnetisierbarer Schichten durch KathodenzerstäubungInfo
- Publication number
- DE2126887C3 DE2126887C3 DE19712126887 DE2126887A DE2126887C3 DE 2126887 C3 DE2126887 C3 DE 2126887C3 DE 19712126887 DE19712126887 DE 19712126887 DE 2126887 A DE2126887 A DE 2126887A DE 2126887 C3 DE2126887 C3 DE 2126887C3
- Authority
- DE
- Germany
- Prior art keywords
- layer
- layers
- metal
- deposited
- iron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 title claims description 8
- 238000000151 deposition Methods 0.000 title description 3
- 230000008021 deposition Effects 0.000 title 1
- 239000010410 layer Substances 0.000 claims description 40
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 25
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 229910052742 iron Inorganic materials 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 239000012298 atmosphere Substances 0.000 claims description 5
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052756 noble gas Inorganic materials 0.000 claims description 3
- 238000001556 precipitation Methods 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 230000005291 magnetic effect Effects 0.000 description 17
- 239000010408 film Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 230000000994 depressogenic effect Effects 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000005298 paramagnetic effect Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
- H01F10/265—Magnetic multilayers non exchange-coupled
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712126887 DE2126887C3 (de) | 1971-05-29 | 1971-05-29 | Niederschlagen magnetisierbarer Schichten durch Kathodenzerstäubung |
| IT2071672A IT947677B (it) | 1971-05-29 | 1972-02-18 | Procedimento per il deposito di strati magnetizzabili mediante spruzzatura catodica |
| JP2907172A JPS5328631B1 (show.php) | 1971-05-29 | 1972-03-24 | |
| FR7214368A FR2139841B1 (show.php) | 1971-05-29 | 1972-04-18 | |
| GB1886272A GB1331038A (en) | 1971-05-29 | 1972-04-24 | Sputter deposition of magnetic coatings |
| CA143,242A CA984334A (en) | 1971-05-29 | 1972-05-24 | Deposition of magnetizable layers by means of cathode sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712126887 DE2126887C3 (de) | 1971-05-29 | 1971-05-29 | Niederschlagen magnetisierbarer Schichten durch Kathodenzerstäubung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2126887A1 DE2126887A1 (de) | 1972-11-30 |
| DE2126887B2 DE2126887B2 (de) | 1981-01-08 |
| DE2126887C3 true DE2126887C3 (de) | 1981-11-19 |
Family
ID=5809356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712126887 Expired DE2126887C3 (de) | 1971-05-29 | 1971-05-29 | Niederschlagen magnetisierbarer Schichten durch Kathodenzerstäubung |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5328631B1 (show.php) |
| CA (1) | CA984334A (show.php) |
| DE (1) | DE2126887C3 (show.php) |
| FR (1) | FR2139841B1 (show.php) |
| GB (1) | GB1331038A (show.php) |
| IT (1) | IT947677B (show.php) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5155995A (en) * | 1974-11-12 | 1976-05-17 | Nippon Telegraph & Telephone | Sankabutsujiseihakumakuno seizohoho |
| CH595458A5 (show.php) * | 1975-03-07 | 1978-02-15 | Balzers Patent Beteilig Ag | |
| US4481999A (en) * | 1982-02-23 | 1984-11-13 | The United States Of America As Represented By The United States Department Of Energy | Method of forming a thin unbacked metal foil |
| JPS60138720A (ja) * | 1983-12-27 | 1985-07-23 | Sharp Corp | 垂直磁気記録媒体 |
| JPS6115941A (ja) * | 1984-06-30 | 1986-01-24 | Res Dev Corp Of Japan | 酸素を含む強磁性非晶質合金およびその製造法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3400066A (en) * | 1965-11-15 | 1968-09-03 | Ibm | Sputtering processes for depositing thin films of controlled thickness |
| DE1955716A1 (de) * | 1969-11-05 | 1971-05-13 | Siemens Ag | Verfahren zum Herstellen gut haftender Metallkontaktschichten insbesondere fuer Halbleiterbauelemente in Beam-Lead-Technik |
-
1971
- 1971-05-29 DE DE19712126887 patent/DE2126887C3/de not_active Expired
-
1972
- 1972-02-18 IT IT2071672A patent/IT947677B/it active
- 1972-03-24 JP JP2907172A patent/JPS5328631B1/ja active Pending
- 1972-04-18 FR FR7214368A patent/FR2139841B1/fr not_active Expired
- 1972-04-24 GB GB1886272A patent/GB1331038A/en not_active Expired
- 1972-05-24 CA CA143,242A patent/CA984334A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5328631B1 (show.php) | 1978-08-16 |
| DE2126887B2 (de) | 1981-01-08 |
| GB1331038A (en) | 1973-09-19 |
| CA984334A (en) | 1976-02-24 |
| DE2126887A1 (de) | 1972-11-30 |
| FR2139841A1 (show.php) | 1973-01-12 |
| IT947677B (it) | 1973-05-30 |
| FR2139841B1 (show.php) | 1978-03-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |