DE2123233C3 - Feinteiliges grossoberflaechiges siliciumdioxid - Google Patents
Feinteiliges grossoberflaechiges siliciumdioxidInfo
- Publication number
- DE2123233C3 DE2123233C3 DE19712123233 DE2123233A DE2123233C3 DE 2123233 C3 DE2123233 C3 DE 2123233C3 DE 19712123233 DE19712123233 DE 19712123233 DE 2123233 A DE2123233 A DE 2123233A DE 2123233 C3 DE2123233 C3 DE 2123233C3
- Authority
- DE
- Germany
- Prior art keywords
- oxygen
- silicon dioxide
- gas
- hydrogen
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 49
- 239000000377 silicon dioxide Substances 0.000 title claims description 24
- 235000012239 silicon dioxide Nutrition 0.000 title claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 26
- 239000007789 gas Substances 0.000 claims description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 19
- 239000001301 oxygen Substances 0.000 claims description 19
- 229910052760 oxygen Inorganic materials 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- 239000010703 silicon Substances 0.000 claims description 17
- -1 silicon halide Chemical class 0.000 claims description 17
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 11
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 11
- 239000005052 trichlorosilane Substances 0.000 claims description 11
- 230000008719 thickening Effects 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000000567 combustion gas Substances 0.000 claims description 7
- 238000002485 combustion reaction Methods 0.000 claims description 7
- 230000000694 effects Effects 0.000 claims description 7
- 239000011164 primary particle Substances 0.000 claims description 7
- 230000007062 hydrolysis Effects 0.000 claims description 6
- 238000006460 hydrolysis reaction Methods 0.000 claims description 6
- 239000003570 air Substances 0.000 claims description 5
- 239000012159 carrier gas Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- 125000005372 silanol group Chemical group 0.000 claims description 4
- 238000004438 BET method Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 150000004820 halides Chemical class 0.000 claims description 2
- 239000002002 slurry Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 235000015067 sauces Nutrition 0.000 claims 1
- 239000002245 particle Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910004028 SiCU Inorganic materials 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- 230000001698 pyrogenic effect Effects 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 229920006337 unsaturated polyester resin Polymers 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- VJJVVKGSBWRFNP-UHFFFAOYSA-N [O].[Si](=O)=O Chemical compound [O].[Si](=O)=O VJJVVKGSBWRFNP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- RTCGUJFWSLMVSH-UHFFFAOYSA-N chloroform;silicon Chemical compound [Si].ClC(Cl)Cl RTCGUJFWSLMVSH-UHFFFAOYSA-N 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000011552 falling film Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002737 metalloid compounds Chemical class 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712123233 DE2123233C3 (de) | 1971-05-11 | 1971-05-11 | Feinteiliges grossoberflaechiges siliciumdioxid |
| NL7201420A NL175984C (nl) | 1971-05-11 | 1972-02-03 | Werkwijze ter bereiding van fijn verdeeld siliciumdioxyde. |
| FR7211509A FR2137479B1 (OSRAM) | 1971-05-11 | 1972-03-31 | |
| SU1770873A SU457208A3 (ru) | 1971-05-11 | 1972-04-10 | Способ получени тонкоизмельченной двуокиси кремни |
| GB1961872A GB1394116A (en) | 1971-05-11 | 1972-04-27 | Production of finely divided silicon dioxide |
| JP4582272A JPS535636B1 (OSRAM) | 1971-05-11 | 1972-05-09 | |
| BE783326A BE783326A (fr) | 1971-05-11 | 1972-05-10 | Procede pour la preparation de dioxyde de silicium finement divise a grande surface |
| US05/652,459 US4067954A (en) | 1971-05-11 | 1976-01-26 | Process for the production of finely divided silicon dioxide having a large specific surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19712123233 DE2123233C3 (de) | 1971-05-11 | 1971-05-11 | Feinteiliges grossoberflaechiges siliciumdioxid |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2123233A1 DE2123233A1 (de) | 1972-11-30 |
| DE2123233B2 DE2123233B2 (de) | 1977-03-03 |
| DE2123233C3 true DE2123233C3 (de) | 1977-10-13 |
Family
ID=5807495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712123233 Expired DE2123233C3 (de) | 1971-05-11 | 1971-05-11 | Feinteiliges grossoberflaechiges siliciumdioxid |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS535636B1 (OSRAM) |
| BE (1) | BE783326A (OSRAM) |
| DE (1) | DE2123233C3 (OSRAM) |
| FR (1) | FR2137479B1 (OSRAM) |
| GB (1) | GB1394116A (OSRAM) |
| NL (1) | NL175984C (OSRAM) |
| SU (1) | SU457208A3 (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3016010C2 (de) * | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
| US5340560A (en) * | 1993-04-30 | 1994-08-23 | General Electric Company | Method for making fumed silica having a reduced aggregate size and product |
| DE10135452A1 (de) * | 2001-07-20 | 2003-02-06 | Degussa | Pyrogen hergestellte Aluminium-Silicium-Mischoxide |
| US20240116764A1 (en) | 2021-02-11 | 2024-04-11 | Evonik Operations Gmbh | Fumed silica powder with reduced silanol group density |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE900339C (de) * | 1951-07-05 | 1953-12-21 | Degussa | Verfahren und Vorrichtung zur Herstellung von kolloidaler Kieselsaeure in Aerogelform |
-
1971
- 1971-05-11 DE DE19712123233 patent/DE2123233C3/de not_active Expired
-
1972
- 1972-02-03 NL NL7201420A patent/NL175984C/xx not_active IP Right Cessation
- 1972-03-31 FR FR7211509A patent/FR2137479B1/fr not_active Expired
- 1972-04-10 SU SU1770873A patent/SU457208A3/ru active
- 1972-04-27 GB GB1961872A patent/GB1394116A/en not_active Expired
- 1972-05-09 JP JP4582272A patent/JPS535636B1/ja active Pending
- 1972-05-10 BE BE783326A patent/BE783326A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE2123233B2 (de) | 1977-03-03 |
| DE2123233A1 (de) | 1972-11-30 |
| SU457208A3 (ru) | 1975-01-15 |
| GB1394116A (en) | 1975-05-14 |
| BE783326A (fr) | 1972-09-01 |
| FR2137479B1 (OSRAM) | 1975-03-21 |
| JPS535636B1 (OSRAM) | 1978-03-01 |
| NL175984C (nl) | 1985-02-01 |
| NL175984B (nl) | 1984-09-03 |
| FR2137479A1 (OSRAM) | 1972-12-29 |
| NL7201420A (OSRAM) | 1972-11-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 |