GB1394116A - Production of finely divided silicon dioxide - Google Patents

Production of finely divided silicon dioxide

Info

Publication number
GB1394116A
GB1394116A GB1961872A GB1961872A GB1394116A GB 1394116 A GB1394116 A GB 1394116A GB 1961872 A GB1961872 A GB 1961872A GB 1961872 A GB1961872 A GB 1961872A GB 1394116 A GB1394116 A GB 1394116A
Authority
GB
United Kingdom
Prior art keywords
finely divided
sihcl
silicon dioxide
vol
surface area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1961872A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Deutsche Gold und Silber Scheideanstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH, Deutsche Gold und Silber Scheideanstalt filed Critical Degussa GmbH
Publication of GB1394116A publication Critical patent/GB1394116A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

1394116 Finely divided silicon dioxide DEUTSCHE GOLD - UND SILBER - SCHEIDEANSTALT 27 April 1972 [11 May 1971] 19618/72 Heading C1A Finely divided SiO 2 with a BET surface area of greater than 380 m.<SP>2</SP>/g. is prepared by reacting SiHCl 3 vapour with a mixture of O 2 or air together with an inflammable gas containing free hydrogen, e.g. H 2 , or combined hydrogen whose combustion is accompanied by the formation of water in a flame using N 2 as an inert carrier gas, wherein 410-565 g. SiHCl 3 per Nm.<SP>3</SP>/h. of total gas are used, the vol. ratio of SiHCl 3 /N 2 is 0À5 : 1 to 5 : 1 and the vol. ratio of H 2 /O 2 is 0À5 : 1 to 1À3 : 1. The SiO 2 product may have a BET surface area of 380-650 m.<SP>2</SP>/g., a particle size of 5-7 nm., a pH in a 5% by wt. aq. suspension of 3À4-4À4, an apparent density of 20-120 g./l., a bulking value of 1000-2000 ml./100 g. and a silanol group density of 80-85 Š<SP>2</SP>/SiOH.
GB1961872A 1971-05-11 1972-04-27 Production of finely divided silicon dioxide Expired GB1394116A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712123233 DE2123233C3 (en) 1971-05-11 1971-05-11 FINE-PARTED LARGE-SURFACE SILICON DIOXIDE

Publications (1)

Publication Number Publication Date
GB1394116A true GB1394116A (en) 1975-05-14

Family

ID=5807495

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1961872A Expired GB1394116A (en) 1971-05-11 1972-04-27 Production of finely divided silicon dioxide

Country Status (7)

Country Link
JP (1) JPS535636B1 (en)
BE (1) BE783326A (en)
DE (1) DE2123233C3 (en)
FR (1) FR2137479B1 (en)
GB (1) GB1394116A (en)
NL (1) NL175984C (en)
SU (1) SU457208A3 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0622334A1 (en) * 1993-04-30 1994-11-02 General Electric Company Method for making fumed silica
EP1277702A3 (en) * 2001-07-20 2003-10-29 Degussa AG Pyrogenically prepared aluminium-silicon mixed oxide, dispersions prepared therefrom and its uses

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3016010C2 (en) * 1980-04-25 1985-01-10 Degussa Ag, 6000 Frankfurt Process for the pyrogenic production of silica
CN116888073A (en) 2021-02-11 2023-10-13 赢创运营有限公司 Fumed silica powder with reduced silanol group density

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE900339C (en) * 1951-07-05 1953-12-21 Degussa Process and device for the production of colloidal silica in airgel form

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0622334A1 (en) * 1993-04-30 1994-11-02 General Electric Company Method for making fumed silica
EP1277702A3 (en) * 2001-07-20 2003-10-29 Degussa AG Pyrogenically prepared aluminium-silicon mixed oxide, dispersions prepared therefrom and its uses

Also Published As

Publication number Publication date
BE783326A (en) 1972-09-01
FR2137479A1 (en) 1972-12-29
DE2123233B2 (en) 1977-03-03
NL175984C (en) 1985-02-01
NL7201420A (en) 1972-11-14
DE2123233A1 (en) 1972-11-30
NL175984B (en) 1984-09-03
DE2123233C3 (en) 1977-10-13
SU457208A3 (en) 1975-01-15
FR2137479B1 (en) 1975-03-21
JPS535636B1 (en) 1978-03-01

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years