DE69401028T2 - Verfahrensverbesserung zur Herstellung eines synthetischen Quarzglaskörpers - Google Patents

Verfahrensverbesserung zur Herstellung eines synthetischen Quarzglaskörpers

Info

Publication number
DE69401028T2
DE69401028T2 DE1994601028 DE69401028T DE69401028T2 DE 69401028 T2 DE69401028 T2 DE 69401028T2 DE 1994601028 DE1994601028 DE 1994601028 DE 69401028 T DE69401028 T DE 69401028T DE 69401028 T2 DE69401028 T2 DE 69401028T2
Authority
DE
Germany
Prior art keywords
production
quartz glass
glass body
synthetic quartz
process improvement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1994601028
Other languages
English (en)
Other versions
DE69401028D1 (de
Inventor
Hisatoshi Ohtsuka
Masatoshi Takita
Akira Fujinoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE69401028D1 publication Critical patent/DE69401028D1/de
Publication of DE69401028T2 publication Critical patent/DE69401028T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/12—Nozzle or orifice plates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
DE1994601028 1993-04-27 1994-04-18 Verfahrensverbesserung zur Herstellung eines synthetischen Quarzglaskörpers Expired - Lifetime DE69401028T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5100808A JP3007510B2 (ja) 1993-04-27 1993-04-27 合成石英ガラス部材の製造方法

Publications (2)

Publication Number Publication Date
DE69401028D1 DE69401028D1 (de) 1997-01-16
DE69401028T2 true DE69401028T2 (de) 1997-04-10

Family

ID=14283676

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994601028 Expired - Lifetime DE69401028T2 (de) 1993-04-27 1994-04-18 Verfahrensverbesserung zur Herstellung eines synthetischen Quarzglaskörpers

Country Status (3)

Country Link
EP (1) EP0622340B1 (de)
JP (1) JP3007510B2 (de)
DE (1) DE69401028T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5702495A (en) * 1993-02-10 1997-12-30 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
EP0964832B1 (de) 1997-03-07 2001-05-23 Schott ML GMBH Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung
GB9722020D0 (en) * 1997-10-17 1997-12-17 Tsl Group Plc Production of quartz glass articles having high surface purity
EP0978487A3 (de) * 1998-08-07 2001-02-21 Corning Incorporated Brenner mit abgedichtetem Kopf und ohne Vormischung für die Abscheidung von Quarzglas
DE19850736C2 (de) 1998-11-04 2003-04-17 Heraeus Tenevo Ag Kernglas für eine Vorform für eine optische Faser, unter Verwendung des Kernglases hergestellte Vorform, sowie Verfahren zur Herstellung des Kernglases einer Vorform für eine optische Faser
US6336347B1 (en) * 1998-12-28 2002-01-08 Pirelli Cavi E Sistemi S.P.A. Process for producing silica by decomposition of an organosilane
TW581747B (en) 1999-02-16 2004-04-01 Nikon Corp Synthetic quartz glass optical member for ultraviolet light
US6649268B1 (en) 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
JP2001019465A (ja) * 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
US6403508B1 (en) * 2000-05-31 2002-06-11 Corning Incorporated Fused silica with constant induced absorption
JP4158009B2 (ja) 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
JP2004284886A (ja) 2003-03-24 2004-10-14 Shin Etsu Chem Co Ltd 合成石英ガラス製造用バーナー
US20050132749A1 (en) 2003-12-05 2005-06-23 Shin-Etsu Chmeical Co., Ltd. Burner and method for the manufacture of synthetic quartz glass
DE102006061931B3 (de) * 2006-12-21 2008-04-17 Institut für Physikalische Hochtechnologie e.V. Verfahren zur Herstellung von Quarzglas mit geringem OH-Gehalt
EP3205630B1 (de) * 2016-02-12 2020-01-01 Heraeus Quarzglas GmbH & Co. KG Diffusormaterial aus synthetisch erzeugtem quarzglas sowie verfahren zur herstellung eines vollständig oder teilweise daraus bestehenden formkörpers
EP4015467A1 (de) * 2020-12-16 2022-06-22 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS565339A (en) * 1979-06-26 1981-01-20 Nippon Telegr & Teleph Corp <Ntt> Manufacture of high purity quartz glass

Also Published As

Publication number Publication date
JP3007510B2 (ja) 2000-02-07
EP0622340A1 (de) 1994-11-02
JPH06305736A (ja) 1994-11-01
EP0622340B1 (de) 1996-12-04
DE69401028D1 (de) 1997-01-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition