DE2113477A1 - Optischer Abtaster und Messanordnungen mit solchen optischen Abtastern - Google Patents

Optischer Abtaster und Messanordnungen mit solchen optischen Abtastern

Info

Publication number
DE2113477A1
DE2113477A1 DE19712113477 DE2113477A DE2113477A1 DE 2113477 A1 DE2113477 A1 DE 2113477A1 DE 19712113477 DE19712113477 DE 19712113477 DE 2113477 A DE2113477 A DE 2113477A DE 2113477 A1 DE2113477 A1 DE 2113477A1
Authority
DE
Germany
Prior art keywords
optical
reflective
optical scanner
measuring
measuring bench
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712113477
Other languages
German (de)
English (en)
Inventor
Michel Lacombat
Raymond Marcy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of DE2113477A1 publication Critical patent/DE2113477A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE19712113477 1970-03-20 1971-03-19 Optischer Abtaster und Messanordnungen mit solchen optischen Abtastern Pending DE2113477A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7010163A FR2082618A5 (enExample) 1970-03-20 1970-03-20

Publications (1)

Publication Number Publication Date
DE2113477A1 true DE2113477A1 (de) 1971-10-07

Family

ID=9052650

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712113477 Pending DE2113477A1 (de) 1970-03-20 1971-03-19 Optischer Abtaster und Messanordnungen mit solchen optischen Abtastern

Country Status (3)

Country Link
US (1) US3738754A (enExample)
DE (1) DE2113477A1 (enExample)
FR (1) FR2082618A5 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4377036A (en) * 1980-02-21 1983-03-22 Dr. Johannes Heidenhain Gmbh Precision measuring apparatus having a measuring interval sealed from environmental influences
DE3429684A1 (de) * 1984-08-11 1986-02-13 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Positionsmesseinrichtung
DE4100773C2 (de) * 1991-01-12 1999-09-30 Zeiss Carl Jena Gmbh Interferometrische Längenmeßeinrichtung

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS578402B2 (enExample) * 1973-12-28 1982-02-16
CH602974A5 (enExample) * 1974-12-20 1978-08-15 Heidenhain Gmbh Dr Johannes
US4280054A (en) * 1979-04-30 1981-07-21 Varian Associates, Inc. X-Y Work table
JPH064246Y2 (ja) * 1987-04-08 1994-02-02 工業技術院長 分離型レ−ザ干渉計
GB9026622D0 (en) * 1990-12-07 1991-01-23 Ometron Limited Apparatus for the measurement of surface shape
US5583636A (en) * 1991-10-23 1996-12-10 Bulow; Jeffrey A. Interferometric modulator for optical signal processing
US7110121B2 (en) * 1997-03-04 2006-09-19 Excel Precision, Inc. Rotation and translation measurement
CN100573032C (zh) * 2004-08-16 2009-12-23 凯姆.C.刘 用于三维光学测量的系统和方法
US7027162B2 (en) * 2004-08-16 2006-04-11 Lau Kam C System and method for three-dimensional measurement
WO2010085655A2 (en) * 2009-01-23 2010-07-29 University Of Washington Cytometer with automatic continuous alignment correction
CN116124045A (zh) * 2022-11-22 2023-05-16 合肥工业大学 一种基于低相干干涉的深孔表面形貌测量系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3436153A (en) * 1965-10-05 1969-04-01 Atomic Energy Commission Object measuring by interferometry
US3572935A (en) * 1968-10-09 1971-03-30 Nasa Fringe counter for interferometers

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4377036A (en) * 1980-02-21 1983-03-22 Dr. Johannes Heidenhain Gmbh Precision measuring apparatus having a measuring interval sealed from environmental influences
DE3429684A1 (de) * 1984-08-11 1986-02-13 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Positionsmesseinrichtung
DE4100773C2 (de) * 1991-01-12 1999-09-30 Zeiss Carl Jena Gmbh Interferometrische Längenmeßeinrichtung

Also Published As

Publication number Publication date
FR2082618A5 (enExample) 1971-12-10
US3738754A (en) 1973-06-12

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