DE2043749C3 - Raster-Korpuskularstrahlmikroskop - Google Patents

Raster-Korpuskularstrahlmikroskop

Info

Publication number
DE2043749C3
DE2043749C3 DE19702043749 DE2043749A DE2043749C3 DE 2043749 C3 DE2043749 C3 DE 2043749C3 DE 19702043749 DE19702043749 DE 19702043749 DE 2043749 A DE2043749 A DE 2043749A DE 2043749 C3 DE2043749 C3 DE 2043749C3
Authority
DE
Germany
Prior art keywords
diaphragm
fields
area
scanning
microscope according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19702043749
Other languages
German (de)
English (en)
Other versions
DE2043749B2 (de
DE2043749A1 (de
Inventor
Walter Prof. Dr. 8000 Muenchen Hoppe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Max Planck Gesellschaft zur Foerderung der Wissenschaften
Original Assignee
Max Planck Gesellschaft zur Foerderung der Wissenschaften
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Max Planck Gesellschaft zur Foerderung der Wissenschaften filed Critical Max Planck Gesellschaft zur Foerderung der Wissenschaften
Priority to DE19702043749 priority Critical patent/DE2043749C3/de
Priority to GB3099871A priority patent/GB1328713A/en
Priority to NL7111783A priority patent/NL7111783A/xx
Priority to JP6695571A priority patent/JPS5435061B1/ja
Publication of DE2043749A1 publication Critical patent/DE2043749A1/de
Priority to US00358080A priority patent/US3857034A/en
Publication of DE2043749B2 publication Critical patent/DE2043749B2/de
Application granted granted Critical
Publication of DE2043749C3 publication Critical patent/DE2043749C3/de
Priority to US05/710,420 priority patent/USRE29500E/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE19702043749 1970-08-31 1970-08-31 Raster-Korpuskularstrahlmikroskop Expired DE2043749C3 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE19702043749 DE2043749C3 (de) 1970-08-31 1970-08-31 Raster-Korpuskularstrahlmikroskop
GB3099871A GB1328713A (en) 1970-08-31 1971-07-02 Corpuscular beam scanning microscopes
NL7111783A NL7111783A (enExample) 1970-08-31 1971-08-26
JP6695571A JPS5435061B1 (enExample) 1970-08-31 1971-08-31
US00358080A US3857034A (en) 1970-08-31 1973-05-07 Scanning charged beam particle beam microscope
US05/710,420 USRE29500E (en) 1970-08-31 1976-08-02 Scanning charged beam particle beam microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702043749 DE2043749C3 (de) 1970-08-31 1970-08-31 Raster-Korpuskularstrahlmikroskop

Publications (3)

Publication Number Publication Date
DE2043749A1 DE2043749A1 (de) 1972-03-02
DE2043749B2 DE2043749B2 (de) 1975-01-09
DE2043749C3 true DE2043749C3 (de) 1975-08-21

Family

ID=5781510

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702043749 Expired DE2043749C3 (de) 1970-08-31 1970-08-31 Raster-Korpuskularstrahlmikroskop

Country Status (4)

Country Link
JP (1) JPS5435061B1 (enExample)
DE (1) DE2043749C3 (enExample)
GB (1) GB1328713A (enExample)
NL (1) NL7111783A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3987276B2 (ja) * 2000-10-12 2007-10-03 株式会社日立製作所 試料像形成方法
JP2007207764A (ja) * 2007-02-26 2007-08-16 Hitachi Ltd 走査形荷電粒子顕微鏡
ITBO20070409A1 (it) * 2007-06-11 2008-12-12 C N R Consiglio Naz Delle Ri C Dispositivo rivelatore per microscopio elettronico.
DE102009016861A1 (de) 2009-04-08 2010-10-21 Carl Zeiss Nts Gmbh Teilchenstrahlmikroskop
JP5208910B2 (ja) * 2009-12-07 2013-06-12 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡及び試料観察方法
CN104040681B (zh) 2012-03-06 2017-04-26 盛达欧米科有限公司 用于粒子光谱仪的分析设备
DE102012007868A1 (de) 2012-04-19 2013-10-24 Carl Zeiss Microscopy Gmbh Transmissionselektronenmikroskopiesystem

Also Published As

Publication number Publication date
JPS5435061B1 (enExample) 1979-10-31
DE2043749B2 (de) 1975-01-09
GB1328713A (en) 1973-08-30
DE2043749A1 (de) 1972-03-02
NL7111783A (enExample) 1972-03-02

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977
8339 Ceased/non-payment of the annual fee