DE2035703C3 - Verfahren zur Verbesserung der Strahlungsresistenz von Siliziumtransistoren mit Siliziumoxiddeckschicht - Google Patents
Verfahren zur Verbesserung der Strahlungsresistenz von Siliziumtransistoren mit SiliziumoxiddeckschichtInfo
- Publication number
- DE2035703C3 DE2035703C3 DE2035703A DE2035703A DE2035703C3 DE 2035703 C3 DE2035703 C3 DE 2035703C3 DE 2035703 A DE2035703 A DE 2035703A DE 2035703 A DE2035703 A DE 2035703A DE 2035703 C3 DE2035703 C3 DE 2035703C3
- Authority
- DE
- Germany
- Prior art keywords
- transistor
- silicon
- irradiation
- temperature
- transistors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/43—Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/906—Dram with capacitor electrodes used for accessing, e.g. bit line is capacitor plate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/953—Making radiation resistant device
Landscapes
- Bipolar Transistors (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2035703A DE2035703C3 (de) | 1970-07-18 | 1970-07-18 | Verfahren zur Verbesserung der Strahlungsresistenz von Siliziumtransistoren mit Siliziumoxiddeckschicht |
| NL7109041A NL7109041A (https=) | 1970-07-18 | 1971-06-30 | |
| GB3246871A GB1310449A (en) | 1970-07-18 | 1971-07-09 | Treatment of oxide covered semiconductor devices |
| US00162439A US3829961A (en) | 1970-07-18 | 1971-07-14 | Method of improving the radiation resistance of silicon transistors with a silicon oxide coating |
| FR7126056A FR2099452B1 (https=) | 1970-07-18 | 1971-07-16 | |
| DE19722235069 DE2235069C3 (de) | 1972-07-17 | Verfahren zur Verbesserung der Strahlungsresistenz von Siliziumtransistoren mit Siliziumoxid-Deckschicht | |
| NL7307460A NL7307460A (https=) | 1970-07-18 | 1973-05-29 | |
| GB3235573A GB1408063A (en) | 1970-07-18 | 1973-06-06 | Silicon-based semiconductor devices |
| FR7326043A FR2193258A2 (https=) | 1970-07-18 | 1973-07-16 | |
| US05/416,252 US3935033A (en) | 1970-07-18 | 1973-11-15 | Method of improving the radiation resistance of silicon transistors with a silicon oxide coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2035703A DE2035703C3 (de) | 1970-07-18 | 1970-07-18 | Verfahren zur Verbesserung der Strahlungsresistenz von Siliziumtransistoren mit Siliziumoxiddeckschicht |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2035703A1 DE2035703A1 (de) | 1972-01-27 |
| DE2035703B2 DE2035703B2 (de) | 1973-12-13 |
| DE2035703C3 true DE2035703C3 (de) | 1974-07-11 |
Family
ID=5777150
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2035703A Expired DE2035703C3 (de) | 1970-07-18 | 1970-07-18 | Verfahren zur Verbesserung der Strahlungsresistenz von Siliziumtransistoren mit Siliziumoxiddeckschicht |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3829961A (https=) |
| DE (1) | DE2035703C3 (https=) |
| FR (1) | FR2099452B1 (https=) |
| GB (1) | GB1310449A (https=) |
| NL (1) | NL7109041A (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4043836A (en) * | 1976-05-03 | 1977-08-23 | General Electric Company | Method of manufacturing semiconductor devices |
| US4163156A (en) * | 1976-05-19 | 1979-07-31 | International Business Machines Corporation | Method of modifying the performance characteristics of a Josephson junction |
| JPS5395581A (en) * | 1977-02-02 | 1978-08-21 | Hitachi Ltd | Manufacture for semiconductor device |
| US4184896A (en) * | 1978-06-06 | 1980-01-22 | The United States Of America As Represented By The Secretary Of The Air Force | Surface barrier tailoring of semiconductor devices utilizing scanning electron microscope produced ionizing radiation |
| US4172228A (en) * | 1978-06-30 | 1979-10-23 | Nasa | Method for analyzing radiation sensitivity of integrated circuits |
| US4903094A (en) * | 1986-08-26 | 1990-02-20 | General Electric Company | Memory cell structure having radiation hardness |
| JPWO2013054788A1 (ja) * | 2011-10-14 | 2015-03-30 | 住友重機械工業株式会社 | 荷電粒子線照射システム及び荷電粒子線照射計画方法 |
| CN108362988B (zh) * | 2018-02-09 | 2020-12-29 | 哈尔滨工业大学 | 一种抑制双极晶体管低剂量率增强效应的方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3430043A (en) * | 1965-10-08 | 1969-02-25 | Atomic Energy Commission | Minimum ionization particle detector produced by gamma ray irradiation |
| US3570112A (en) * | 1967-12-01 | 1971-03-16 | Nat Defence Canada | Radiation hardening of insulated gate field effect transistors |
-
1970
- 1970-07-18 DE DE2035703A patent/DE2035703C3/de not_active Expired
-
1971
- 1971-06-30 NL NL7109041A patent/NL7109041A/xx unknown
- 1971-07-09 GB GB3246871A patent/GB1310449A/en not_active Expired
- 1971-07-14 US US00162439A patent/US3829961A/en not_active Expired - Lifetime
- 1971-07-16 FR FR7126056A patent/FR2099452B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2035703A1 (de) | 1972-01-27 |
| NL7109041A (https=) | 1972-01-20 |
| DE2035703B2 (de) | 1973-12-13 |
| GB1310449A (en) | 1973-03-21 |
| FR2099452A1 (https=) | 1972-03-17 |
| US3829961A (en) | 1974-08-20 |
| FR2099452B1 (https=) | 1977-01-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) |