DE2021902A1 - Verfahren zum selektiven Durchloechern von Festkoerpern - Google Patents
Verfahren zum selektiven Durchloechern von FestkoerpernInfo
- Publication number
- DE2021902A1 DE2021902A1 DE19702021902 DE2021902A DE2021902A1 DE 2021902 A1 DE2021902 A1 DE 2021902A1 DE 19702021902 DE19702021902 DE 19702021902 DE 2021902 A DE2021902 A DE 2021902A DE 2021902 A1 DE2021902 A1 DE 2021902A1
- Authority
- DE
- Germany
- Prior art keywords
- sheet
- damage
- radiation
- charged particles
- selectively
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 23
- 239000007787 solid Substances 0.000 title claims description 7
- 239000002245 particle Substances 0.000 claims description 36
- 238000005530 etching Methods 0.000 claims description 28
- 230000005855 radiation Effects 0.000 claims description 17
- 230000037361 pathway Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 229920003002 synthetic resin Polymers 0.000 claims description 11
- 239000000057 synthetic resin Substances 0.000 claims description 11
- 239000011148 porous material Substances 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000012634 fragment Substances 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229920005668 polycarbonate resin Polymers 0.000 claims description 5
- 239000004431 polycarbonate resin Substances 0.000 claims description 5
- 239000012298 atmosphere Substances 0.000 claims description 4
- 230000005670 electromagnetic radiation Effects 0.000 claims description 4
- 230000008859 change Effects 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- 239000000344 soap Substances 0.000 claims 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000003776 cleavage reaction Methods 0.000 description 3
- 230000007017 scission Effects 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000004992 fission Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-BJUDXGSMSA-N Boron-10 Chemical compound [10B] ZOXJGFHDIHLPTG-BJUDXGSMSA-N 0.000 description 1
- 102100026816 DNA-dependent metalloprotease SPRTN Human genes 0.000 description 1
- 101710175461 DNA-dependent metalloprotease SPRTN Proteins 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- HCWPIIXVSYCSAN-IGMARMGPSA-N Radium-226 Chemical compound [226Ra] HCWPIIXVSYCSAN-IGMARMGPSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000002927 oxygen compounds Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000002265 redox agent Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- JFALSRSLKYAFGM-OIOBTWANSA-N uranium-235 Chemical compound [235U] JFALSRSLKYAFGM-OIOBTWANSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26F—PERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
- B26F1/00—Perforating; Punching; Cutting-out; Stamping-out; Apparatus therefor
- B26F1/26—Perforating by non-mechanical means, e.g. by fluid jet
- B26F1/31—Perforating by non-mechanical means, e.g. by fluid jet by radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/737—Articles provided with holes, e.g. grids, sieves
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Toxicology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US82170369A | 1969-05-05 | 1969-05-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2021902A1 true DE2021902A1 (de) | 1972-08-03 |
Family
ID=25234087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19702021902 Pending DE2021902A1 (de) | 1969-05-05 | 1970-05-05 | Verfahren zum selektiven Durchloechern von Festkoerpern |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2021902A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2047340A5 (enrdf_load_stackoverflow) |
| GB (1) | GB1305777A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4293374A (en) * | 1980-03-10 | 1981-10-06 | International Business Machines Corporation | High aspect ratio, high resolution mask fabrication |
| DD206924A3 (de) * | 1981-10-01 | 1984-02-08 | Mikroelektronik Zt Forsch Tech | Verfahren zum herstellen einer freitragenden abstandsmaske |
| US4827138A (en) * | 1988-02-26 | 1989-05-02 | Texas Instruments Incorporated | Filled grid mask |
| RU2327510C1 (ru) * | 2006-10-09 | 2008-06-27 | Общество с ограниченной ответственностью "РЕАТРЕК-Фильтр" | Асимметричная трековая мембрана и способ ее изготовления |
-
1970
- 1970-05-05 FR FR7016439A patent/FR2047340A5/fr not_active Expired
- 1970-05-05 GB GB2166070A patent/GB1305777A/en not_active Expired
- 1970-05-05 DE DE19702021902 patent/DE2021902A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2047340A5 (enrdf_load_stackoverflow) | 1971-03-12 |
| GB1305777A (enrdf_load_stackoverflow) | 1973-02-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1436322B1 (de) | Verfahren zum Herstellen feiner Poren in scheibenfoermigen Koerpern mittels energiereicher Strahlung | |
| DE2105807A1 (de) | Verfahren zur Herstellung von Bestrah lungsspuren | |
| DE2302116C3 (de) | Vorrichtung zur Herstellung einer maskierenden Schicht auf einem Träger mit Hilfe von weichen Röntgenstrahlen | |
| US3852134A (en) | Method for forming selectively perforate bodies | |
| DE2628099C2 (de) | Verfahren zum Herstellen einer Maske | |
| EP0120834A1 (de) | Optisch strukturiertes Filter und Verfahren zu dessen Herstellung | |
| DE1931885A1 (de) | Poroese Koerper und Verfahren zu ihrer Herstellung | |
| DE3913463C2 (enrdf_load_stackoverflow) | ||
| DE69722185T2 (de) | Verfahren zur nach-ätzung eines mechanisch behandelten substrats | |
| DE2933850C2 (de) | Plasma-Ätzvorrichtung | |
| DE2817072A1 (de) | Verfahren zum gesteuerten oberflaechentexturieren von kristallinem halbleitermaterial | |
| DE2855080A1 (de) | Verfahren zur herstellung von duesenplaettchen fuer tintenstrahldrucker | |
| DE2945630A1 (de) | Verfahren zur bildung eines musters | |
| DE2421833A1 (de) | Verfahren zum behandeln einer schicht auf einem substrat | |
| DE2021902A1 (de) | Verfahren zum selektiven Durchloechern von Festkoerpern | |
| DE3046629C2 (de) | Verfahren zur Herstellung von Isolatoroberflächen | |
| DE2717400C2 (de) | Ätzverfahren zur Herstellung von Strukturen unterschiedlicher Höhe | |
| DE2643811A1 (de) | Verfahren zur herstellung eines musters in einer photolackschicht und hierfuer geeignete maske | |
| DE3416198A1 (de) | Verfahren und vorrichtung zum erzeugen eines elektronenvorhangs mit regulierbarer intensitaetsverteilung | |
| DE60306174T2 (de) | Oberflächenbehandlung von beton | |
| DE2405880C3 (de) | Verbundplatte, insbesondere zur Herstellung einer Druckplatte | |
| DE1704680C3 (de) | Verfahren und Vorrichtung zur Herstellung von Zerstörungsspuren in einem Band aus dielektrischem Material | |
| DE2951376A1 (de) | Verfahren zur erzeugung der kernspuren oder aus kernspuren hervorgehender mikroloescher eines einzelnen iones | |
| DE2452326A1 (de) | Verfahren zur herstellung einer aetzmaske mittels energiereicher strahlung | |
| DE2535156B2 (de) | Verfahren zur herstellung einer schicht mit vorgegebenem muster von bereichen geringerer schichtdicke und verwendung der schicht als maske bei der dotierung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHW | Rejection |