FR2047340A5 - - Google Patents

Info

Publication number
FR2047340A5
FR2047340A5 FR7016439A FR7016439A FR2047340A5 FR 2047340 A5 FR2047340 A5 FR 2047340A5 FR 7016439 A FR7016439 A FR 7016439A FR 7016439 A FR7016439 A FR 7016439A FR 2047340 A5 FR2047340 A5 FR 2047340A5
Authority
FR
France
Prior art keywords
sheet
tracks
damage tracks
exposed area
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7016439A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Application granted granted Critical
Publication of FR2047340A5 publication Critical patent/FR2047340A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26F—PERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
    • B26F1/00—Perforating; Punching; Cutting-out; Stamping-out; Apparatus therefor
    • B26F1/26—Perforating by non-mechanical means, e.g. by fluid jet
    • B26F1/31—Perforating by non-mechanical means, e.g. by fluid jet by radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/737—Articles provided with holes, e.g. grids, sieves

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
FR7016439A 1969-05-05 1970-05-05 Expired FR2047340A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82170369A 1969-05-05 1969-05-05

Publications (1)

Publication Number Publication Date
FR2047340A5 true FR2047340A5 (fr) 1971-03-12

Family

ID=25234087

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7016439A Expired FR2047340A5 (fr) 1969-05-05 1970-05-05

Country Status (3)

Country Link
DE (1) DE2021902A1 (fr)
FR (1) FR2047340A5 (fr)
GB (1) GB1305777A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0044372A2 (fr) * 1980-03-10 1982-01-27 International Business Machines Corporation Fabrication et emploi d'un masque collimateur à haute résolution, ayant des trous beaucoup plus profonds que larges, pour réaliser une croissance épitaxiale sur des éléments semiconducteurs au moyen de faisceaux ioniques
FR2515373A1 (fr) * 1981-10-01 1983-04-29 Zentrum Forschung Technologie Procede de fabrication d'un cache maintenu a distance non soutenu
EP0330330A2 (fr) * 1988-02-26 1989-08-30 Texas Instruments Incorporated Masque réseau rempli

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0044372A2 (fr) * 1980-03-10 1982-01-27 International Business Machines Corporation Fabrication et emploi d'un masque collimateur à haute résolution, ayant des trous beaucoup plus profonds que larges, pour réaliser une croissance épitaxiale sur des éléments semiconducteurs au moyen de faisceaux ioniques
EP0044372A3 (en) * 1980-03-10 1982-03-31 International Business Machines Corporation Fabrication and use of a high aspect ratio, high resolution collimating mask for ion beam growth of semiconductor devices
FR2515373A1 (fr) * 1981-10-01 1983-04-29 Zentrum Forschung Technologie Procede de fabrication d'un cache maintenu a distance non soutenu
EP0330330A2 (fr) * 1988-02-26 1989-08-30 Texas Instruments Incorporated Masque réseau rempli
EP0330330A3 (fr) * 1988-02-26 1991-05-22 Texas Instruments Incorporated Masque réseau rempli

Also Published As

Publication number Publication date
GB1305777A (fr) 1973-02-07
DE2021902A1 (de) 1972-08-03

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Legal Events

Date Code Title Description
ST Notification of lapse