DE202016105926U1 - Processing arrangement, vacuum arrangement and transport arrangement - Google Patents

Abstract

A transport assembly (100), comprising: a rotatably mounted processing roller (122p) for transporting a substrate along a transport path (111); An intermediate guide arrangement (142) with a plurality of rotatably mounted guide rollers (122), by means of which the transport path (111) is guided in a first area away from the processing roller (122p) and in a second area towards the processing roller (122p); Wherein a portion (111a, 111b, 111c) of the transport path (111) extending from the first area to the second area is spaced from the processing roller (122p).

Description

The invention relates to a processing arrangement, a vacuum arrangement and a transport arrangement.

In general, a substrate, for example a glass substrate, a metal substrate and / or a polymer substrate, may be treated (processed), e.g. be coated so that the chemical and / or physical properties of the substrate can be changed. For coating a substrate, various coating methods such as vapor deposition, e.g. a chemical vapor deposition (CVD) or a physical vapor deposition (PVD).

In general, flexible substrates in the form of a tape (e.g., metal tape, foil tape or glass ribbon) may be processed in a continuous line, e.g. coated (and / or otherwise treated) in a film coater. In this case, for example, a belt substrate can be transported through a coating area by means of a transport arrangement. For example, the transport assembly may be configured to process the tape substrate from roll-to-roll (also referred to as R2R), where the tape substrate is unwound from a first substrate roll, transported through the coating region, and after coating a second substrate roll is rewound (also referred to as wrapping). In this case, the coating system may have a vacuum chamber, so that the tape substrate can be coated in a vacuum.

For example, a vacuum deposition system can be used to deposit one or more layers on a tape substrate by means of chemical and / or physical vapor deposition. In order to realize a large-area deposition on correspondingly large-area tape substrates efficiently, the tape substrate can be wrapped by guide rollers through several coating areas, wherein during the transport of the substrate through the system in each coating area of the coating system, a coating process can be performed. During coating, the substrate can be tempered by means of a processing roller to obtain e.g. dissipate heat energy introduced into the substrate and / or maintain the substrate at a predetermined temperature.

Conventionally, in-situ measuring devices are arranged before and / or after the process area (in which the process roller is arranged) and housed in the winding of the plants. This is because the wrapping, i. the distance along which the substrate is passed over the processing roller, is limited and therefore the route is used primarily for cost reasons for processing. However, only the totality of all applied layers can be measured. If transparent (for example ceramic) layers are sputtered and optically dense layers, for example of copper, are applied in the following compartments, then the transparency of the ceramic layer can only be falsified or no longer measured.

However, a requirement for a vacuum coating system may be that a characterization of each individual layer should take place. Conventionally, the individual coating processes have to be spatially and / or temporally separated, e.g. distributed on two processing rolls or two process runs to allow a measurement process in between. This increases the size of the plant and the time it takes to coat, which adds costs.

Alternatively, conventionally, the substrate may be optically measured on the processing roll by analyzing the light reflected from the processing roll and the substrate resting thereon. In this case, the surface of the processing roller can serve as a reference, i. the portion of the light which penetrates the substrate and is reflected by the processing roll itself. However, this measuring process is error-prone, since the surface of the processing roller can change during the course of the coating, which is difficult to calibrate. Likewise, other measures, such as electrical properties of the layer, are difficult to access for such a measurement geometry.

According to various embodiments, it has been recognized that a more flexible, reliable, and universal measurement process requires more space to accommodate e.g. to be able to measure the substrate without disturbing influences. Clearly, it was recognized that the additional space for the measuring process reduces the space available for processing, but that spatial and / or temporal separation of the coating processes can be dispensed with, which compensates for the lost space.

According to various embodiments, a processing assembly, a vacuum assembly, and a transport assembly are provided that allow for a more flexible, reliable, and universal measurement process.

Illustratively, according to various embodiments, an intermediate guide arrangement is provided, by means of which the substrate guided over the processing roller can be lifted off and re-applied to it, so that the substrate is transported therebetween in free-hanging configuration (in the so-called freespan). This eliminates the influence of the processing roll on the measuring process, for example on the measurement of an optical and / or electrical variable.

This intermediate measurement process makes it possible to provide more reliable conclusions about the individual layers. Alternatively, or in addition to the measuring process, the intermediate guide assembly may also allow room for additional processing in which a free-hanging configuration of the substrate is advantageous, e.g. if you want to process both sides.

According to various embodiments, an intermediate guide arrangement can be flexibly set up and / or aligned, which makes it possible to convert existing systems more easily and / or to adapt them to a changed process sequence and thus to save costs and effort.

According to various embodiments, a transport arrangement may comprise: a rotatably mounted processing roller for transporting a substrate along a transport path; an intermediate guide arrangement with a plurality of rotatably mounted guide rollers, by means of which the transport path is guided in a first region away from the processing roller and in a second region towards the processing roller; wherein a portion of the transport path extending from the first region to the second region is spaced from the processing roll.

According to various embodiments, the transport assembly may further comprise: a bearing assembly (e.g., having a hinge) by which the intermediate guide assembly is supported, the bearing assembly (e.g., the hinge) providing a rotational degree of freedom whereby the intermediate guide assembly is pivotally supported relative to the processing roller.

According to various embodiments, an axis of rotation of the rotational degree of freedom and an axis of rotation of the rotatably mounted processing roller may be the same.

According to various embodiments, the intermediate guide arrangement may further comprise: a sensor arrangement for detecting a measured variable in the section of the transport path. For example, the sensor arrangement can provide an optical continuity measurement.

According to various embodiments, the measurand may represent a (e.g., physical) characteristic of the substrate, e.g. a characteristic of a substrate coating, such as an electrical quantity (e.g., film impedance, e.g., film resistance), a film size (e.g., film thickness), and / or an optical size (e.g., film transmission and / or film reflection). The characteristic of the substrate may be, for example, a processing progress, i. the measure can represent how much processing has progressed (i.e., how much its effect is pronounced).

According to various embodiments, at least a part of the sensor arrangement may be arranged between the section and the processing roller.

According to various embodiments, the sensor assembly may include at least one optical sensor, one magnetic sensor, and / or at least one electrical sensor (e.g., an inductive sensor, e.g., an eddy current sensor).

According to various embodiments, the sensor arrangement may comprise a transmission sensor, reflection sensor and / or an impedance sensor (for example according to an eddy current method).

According to various embodiments, the plurality of guide rollers may comprise at least one (i.e., exactly one or more than one) spreader roller.

According to various embodiments, the transport arrangement may further comprise: a tempering device, which is thermally coupled to a lateral surface of the processing roller for exchanging thermal energy.

According to various embodiments, the tempering device may have a heat source for supplying thermal energy to the jacket surface and / or a heat sink for removing thermal energy from the jacket surface.

According to various embodiments, the transport arrangement may further comprise: one or the controller, which is set up to control and / or regulate an exchange of thermal energy between the temperature control device and the lateral surface of the processing roller. The exchange can be an inflow of thermal Have energy to the lateral surface of the processing roll and / or a outflow of thermal energy from the lateral surface of the processing roll.

According to various embodiments, the controller may be further configured to detect a temperature of the processing roll and / or the substrate and to control the exchange of thermal energy with the processing roll based on the sensed temperature. Alternatively or additionally, the controller may be configured to control and / or regulate the exchange of thermal energy with the processing roll based on the measurand.

The heat source may include or be formed from an electric heat converter, in accordance with various embodiments. The electric heat converter may, for example, have a heating resistor, e.g. a heating coil or a jacket tube heater. Then, the electric heat converter can be supplied, for example by means of an energy source with electrical energy. Alternatively or additionally, the electroheat converter may include or be formed from a patch transducer (e.g., a surface heater). Alternatively or in addition to the electric heat converter, the heat source may include or be formed from a mass flow heater (e.g., fluid heater). The mass flow heater may have a mass flow line which passes through the processing roll. The mass flow conduit may have a cavity through which a heated mass flow (e.g., a fluid stream) may be passed. The stream may, for example, comprise or be formed from a flowing fluid (heating fluid), e.g. a liquid stream, e.g. Oil. For example, the flow of material (e.g., a liquid stream) may be heated by the electric heat converter. Thus, a larger thermal power per area can be realized. For example, the electric heat converter may be arranged in a separate housing or, e.g. outside the vacuum chamber.

The heat sink may be configured to transfer the extracted thermal energy to one or the material stream. The stream may, for example, comprise or be formed from a flowing fluid (cooling fluid), e.g. a liquid stream, e.g. Oil. Alternatively or additionally, the stream may comprise or be formed from a flowing gas (cooling gas), i. a gas stream. The material flow can be guided through the processing roller, for example, by means of a material flow line. The material flow line may have a cavity through which the material flow is passed. The material stream may be cooled externally from the processing roll, e.g. by means of a cooling device, which e.g. is arranged outside the vacuum chamber.

The material stream may be thermally coupled to the outer surface of the processing roller.

According to various embodiments, a vacuum assembly may include: a vacuum chamber, or one of the vacuum chamber disposed transport assembly according to various embodiments, wherein the vacuum chamber has a plurality of vacuum areas adjacent to the processing roll (and at least partially surrounded); wherein the intermediate guide assembly is disposed in a vacuum region (e.g., a processing region or a gas separation region) of the plurality of vacuum regions and / or is pivotally supported therebetween.

According to various embodiments, the vacuum assembly may further include: a gas separation structure that gasses the plurality of vacuum regions from each other.

According to various embodiments, a processing arrangement may include: one or more vacuum arrangements according to various embodiments, at least one first processing source disposed in a first vacuum area of the plurality of vacuum areas; at least one second processing source disposed in a second vacuum region of the plurality of vacuum regions (and, for example, configured to change a transmittance and / or electrical impedance of the substrate); wherein the intermediate guide assembly of the vacuum assembly is disposed in and / or pivotable in a third vacuum region of the plurality of vacuum regions, the third vacuum region is arranged between the first vacuum region and the second vacuum region.

According to various embodiments, a processing assembly may include: one or more vacuum assemblies according to various embodiments, at least one first coating material source disposed in a first vacuum region of the plurality of vacuum regions to form a first layer; at least one second coating material source disposed in a second vacuum region of the plurality of vacuum regions to form a second layer, the second layer differing in transmittance or electrical impedance from the first layer; wherein the intermediate guide assembly of the vacuum assembly is disposed in and / or pivotable in a third vacuum region of the plurality of vacuum regions, the third vacuum region being disposed between the first vacuum region and the second vacuum region.

According to various embodiments, one or more processing arrangements may include: one or more vacuum arrangements according to various embodiments, at least one coating material source disposed in a vacuum area of the plurality of vacuum areas, for emitting a gaseous coating material into the vacuum area.

According to various embodiments, one or more processing arrangements may include: at least a first coating material source disposed in a first vacuum region of the plurality of vacuum regions to form a transparent layer; at least one second coating material source disposed in a second vacuum region of the plurality of vacuum regions to form an opaque layer; wherein the intermediate guide assembly is disposed in a third vacuum region disposed between the first vacuum region and the second vacuum region.

According to various embodiments, the controller may be configured to control and / or regulate the formation of one or the first layer (also referred to as a first coating process) that occurs in the transport direction in front of the intermediate guide assembly (e.g., based on the measurand). Alternatively or additionally, the controller may be arranged to control and / or regulate the formation of one or the second layer (also referred to as a second coating process) which takes place in the transport direction after the intermediate guide arrangement (for example based on the measured variable). Control and / or regulation may be accomplished, for example, by adjusting an electrical parameter (such as power, frequency, voltage) and / or an environmental parameter (such as process gas composition, gas standard volumetric flow, temperature, pressure, etc.). Optionally, the controller may be configured to control and / or regulate a transport speed of the substrate (e.g., based on the measurand).

According to various embodiments, a plurality of intermediate guide arrangements may also be used.

According to various embodiments, one or each intermediate guide arrangement may comprise three or more guide rollers, e.g. four guide rollers, five guide rollers or six guide rollers.

According to various embodiments, two guide rollers of the intermediate guide arrangement, which are located adjacent the processing roller, form a first roller pair. Optionally, two additional guide rollers (if any) of the intermediate guide assembly, between which and the processing roller the first roller pair is disposed, may form a second roller pair.

According to various embodiments, the guide rollers of the first pair of rollers may be a first distance apart which is different (e.g., smaller) than a second distance of the guide rollers of the second pair of rollers from each other. For example, the first distance may be in a range of about 1 cm (centimeters) to about 30 cm, e.g. less than about 20 cm, e.g. less than about 10 cm.

According to various embodiments, alternatively or in addition to the sensor arrangement, a processing arrangement may be used to process (e.g., two-sided) processing, e.g. for heating, cleaning and / or irradiating the substrate.

According to various embodiments, one or more transporting assemblies may include a plurality of wrapping rollers and the processing roller, of which a transport path is defined, for wrapping a substrate between the plurality of wrapping rollers along the transport path which is curved by the at least one guide roller.

According to various embodiments, one or each rewinding roller of the transporting arrangement may comprise a rotatably mounted winding tube coupling. The or each winding sleeve coupling may, for example, be adapted for coupling a winding tube to or from which a flexible substrate is to be wound, i. to be wound up and / or handled by it. Alternatively or additionally, the or a winding tube coupling can be set up for coupling a winding tube, by means of which an intermediate layer is to be received and / or held.

According to various embodiments, the transport arrangement may further comprise: a drive system for driving the rewinding roll or its winding tube coupling at least one guide roller of the intermediate guide arrangement and / or the processing reel. To this end, the drive system may comprise a plurality of (e.g., at least two, three, or four) drives, each of which is coupled to a drive roller (e.g., at least one guide roller, rewinding roller, or processing roller) to be driven.

According to various embodiments, the at least one guide roller of the intermediate guide arrangement may be at least one of the following guide roller types: a deflection roller; a Spreader roll; a measuring roller and / or a tension roller. At least the pull roll may be a driven (ie active) guide roll. Alternatively or additionally, the deflection roller, the spreader roller and / or the measuring roller may be a non-driven (ie passive) guide roller.

The spreading may be understood as the generation of a mechanical tensile stress (e.g., by a force on the two edge regions of the substrate facing away from each other) which is transverse to the transport direction. According to the size of the modulus of elasticity of the substrate and / or present wrinkles, the substrate may respond to the mechanical tensile stress with a stretch (the so-called spreading), i. with a broadening substrate.

According to various embodiments, a method may include: transporting a substrate through a processing roll (e.g., overlying it) through a vacuum; Detaching the substrate in a first region from the processing roll; Applying the substrate in a second region to the processing roll; and transporting the substrate from the first region to the second region at a distance from the processing roll.

According to various embodiments, a plurality of guide rollers may be used to detach a substrate in a first region from the processing roller; for applying the substrate in a second area to the processing roll; and transporting the substrate from the first region to the second region at a distance from the processing roll.

According to various embodiments, a plurality of guide rollers may be used to form a cavity surrounded by a processing roller and a substrate.

Embodiments of the invention are illustrated in the figures and are explained in more detail below.

Show it

1A and 1B in each case a transport arrangement according to various embodiments in a schematic side view or transverse view;

2 and 3 each an intermediate guide arrangement in various configurations according to various embodiments.

4A a vacuum arrangement according to various embodiments in a schematic side view or cross-sectional view;

4B a processing arrangement according to various embodiments in a schematic side view or cross-sectional view;

5A and 5B in each case a processing arrangement according to various embodiments in a schematic side view or transverse view;

6 a processing arrangement according to various embodiments in a schematic side view or cross-sectional view; and

7 a method according to various embodiments in a schematic flow diagram.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the described figure (s). Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It should be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

In the context of this description, the terms "connected", "connected" and "coupled" are used to describe both a direct and an indirect connection (eg ohmic and / or electrically conductive, eg an electrically conductive connection), a direct or indirect connection and a direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate.

According to various embodiments, the term "coupled" or "coupling" in the US Pat Meaning of a (eg mechanical, hydrostatic, thermal and / or electrical), eg direct or indirect, connection and / or interaction are understood. For example, multiple elements may be coupled together along an interaction chain. According to various embodiments, "coupled" may be understood in the sense of a mechanical (eg physical or physical) coupling, eg by means of a direct physical contact. A clutch may be configured to transmit a mechanical interaction (eg, force, torque, etc.).

In the context of vacuum generating or vacuum sustaining vacuum components (e.g., a pump, a chamber, a conduit, a valve, etc.), the term "coupled" or "coupling" may be understood to mean a connection to a common vacuum system. The components of the vacuum system may be configured to exchange a gas with one another by means of the coupling, wherein the coupling may be gas-separated from an exterior of the vacuum system.

According to various embodiments, a controller may include a forward control path, and thus illustratively implement a flow control that converts an input into an output. The control path can also be part of a control loop, so that a control is implemented. The control has, in contrast to the pure forward control on a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback). In other words, as an alternative or in addition to the control, a regulation can be used or, alternatively or in addition to the control, a regulation can take place.

According to various embodiments, processing (also referred to as treating) of a substrate (eg, a tape substrate) may be performed and include at least one of: cleaning the substrate, coating the substrate, irradiating (eg, by light, coherent light, UV light, particles, Electrons, ions, etc.) of the substrate, modifying the surface of the substrate, heating the substrate, etching the substrate, and smoldering the substrate.

According to various embodiments, the substrate may or may not be coated with a coating material (also referred to as forming a layer). The coating material may comprise or be formed from at least one material of the following materials: a metal; a transition metal, an oxide (e.g., a metal oxide or a transition metal oxide); a dielectric; a polymer (e.g., a carbon-based polymer or a silicon-based polymer); an oxynitride; a nitride; a carbide; a ceramic; a semi-metal (e.g., carbon); a perovskite; a glass or glassy material (e.g., a sulfidic glass); a semiconductor; a semiconductor oxide; a semi-organic material, and / or an organic material. The coating material for coating the substrate may be provided by a source of coating material, e.g. in a gaseous state.

The coating material source may be configured to coat at least one substrate, which may be e.g. e.g. resting on the processing roller. For example, the coating material source may be configured to provide a gaseous coating material (e.g., a material vapor) and / or liquid coating material, e.g. on the at least one substrate for forming a layer can be deposited. A source of coating material may include at least one of a sputtering apparatus, a thermal evaporation apparatus (e.g., a laser beam evaporator, an arc evaporator, an electron beam evaporator, and / or a thermal evaporator), a precursor gas source, a liquid phase sprayer. A sputtering apparatus may be arranged to atomize the coating material by means of a plasma. A thermal evaporation device may be configured to transfer the coating material to a gaseous state by means of thermal energy. Depending on the nature of the coating material, a sublimation and / or evaporation of the coating material can take place. In other words, the thermal evaporation device can also sublimate the coating material. A liquid phase sprayer may be adapted to apply a liquid phase coating material, e.g. having a dye or formed therefrom.

According to various embodiments, the substrate may comprise or be formed of at least one of a ceramic, a glass, a semiconductor (eg an amorphous, polycrystalline or monocrystalline semiconductor, eg silicon), a metal (eg aluminum, copper, iron, steel, Platinum, gold, etc.) a polymer (eg plastic) and / or a mixture of different materials, such as a composite material (e.g., carbon fiber reinforced carbon, or carbon fiber reinforced plastic).

According to various embodiments, the substrate may include or be formed from a plastic film, a semiconductor foil, a metal foil, and / or a glass foil, and optionally be coated. Alternatively or In addition, the substrate may comprise fibers, for example glass fibers, carbon fibers, metal fibers and / or plastic fibers, for example in the form of a woven fabric, a net, a knitted fabric, a knitted fabric or as a felt or fleece.

According to various embodiments, a substrate may be transported as a ribbon (also referred to as a ribbon substrate) from roll-to-roll (i.e., wrapped between the wrapping rolls). For example, the tape substrate may have a width (transverse dimension to the transport direction) in a range from about 30 cm to about 500 cm, or a width greater than about 500 cm. Furthermore, the tape substrate can be flexible. Illustratively, a tape substrate can be any substrate that can be wound onto a roll and / or processed, for example, roll-to-roll. The tape substrate may have a material thickness (also referred to as substrate thickness) in a range of about a few micrometers (e.g., from about 1 μm) to about a few millimeters (e.g., to about 10 mm), e.g., about 10 mm, depending on the elasticity of the material used. in a range of about 0.01 mm to about 3 mm. The guide rollers and / or processing roller may be axially larger in extent than the substrate is wide.

Furthermore, the transport arrangement described herein may be arranged such that a predefined tensile stress (also referred to as strip tension) is brought along the transport direction onto the tape substrate. For example, due to the predefined mass of the roller, a guide roller of the transport arrangement can generate a predefined tension and / or its speed can be controlled and / or regulated.

As used herein, a metal (also referred to as a metallic material) may comprise (or be formed of) at least one metallic element (i.e., one or more metallic elements), e.g. at least one element from the following group of elements: copper (Cu), iron (Fe), titanium (Ti), nickel (Ni), silver (Ag), chromium (Cr), platinum (Pt), gold (Au), Magnesium (Mg), Aluminum (Al), Zirconium (Zr), Tantalum (Ta), Molybdenum (Mo), Tungsten (W), Vanadium (V), Barium (Ba), Indium (In), Calcium (Ca), Hafnium (Hf), samarium (Sm), silver (Ag), and / or lithium (Li). Further, a metal may include or be formed of a metallic compound (e.g., an intermetallic compound or an alloy), e.g. a compound of at least two metallic elements (e.g., the group of elements), e.g. Bronze or brass, or e.g. a compound of at least one metallic element (e.g., the group of elements) and at least one non-metallic element (e.g., carbon), e.g. Stole.

According to various embodiments, a chamber housing may have one or more chambers. For example, the chamber housing may be provided to provide a vacuum or vacuum (i.e., configured as a vacuum chamber housing) with a pump assembly, e.g. coupled to a vacuum pumping arrangement (e.g., gas conducting) and stably arranged to withstand exposure to the air pressure in the pumped-down state. The pump assembly (including at least one vacuum pump, e.g., a high vacuum pump, e.g., a turbomolecular pump) may allow some of the gas to be removed from within the processing chamber, e.g. from the vacuum area, pump off. Accordingly, one or more vacuum chambers may be provided in a chamber housing. In other words, the chamber housing may be configured as a vacuum chamber housing.

According to various embodiments, a chamber housing, eg, a vacuum chamber provided therein, may be configured to provide pressure in a range of about 10 mbar to about 1 mbar (in other words, rough vacuum) and / or pressure in a range from about 1 mbar to about 10 ^-3 mbar (in other words, fine vacuum), and / or a pressure in a range of about 10 ^-3 mbar to about 10 ^-7 mbar (in other words high vacuum) and / or a pressure of less as a high vacuum, eg less than about 10 ^-7 mbar.

According to various embodiments, there are provided a processing assembly, a vacuum assembly, and a transport assembly which may be used for a vacuum deposition equipment in which flexible substrates are coated, e.g. a vacuum coating system in which multiple sputtering processes around a processing roll occur in respective separate compartments.

According to various embodiments, for different plant concepts, for example, which provide high flexibility, that is, that they can be changed in the compartments, which are arranged around the processing roll, different and / or in accordance with a desired process sequence. By way of example, such a system concept can have a common division into separation and processing sections, which can be optimally configured for a very wide variety of applications. When optimizing the process sequence and at the same time necessary measurement of certain layer properties, such as transmission and electrical sheet resistance (also referred to as layer impedance), for individual layers, the need may arise, this Measure properties between the processes, which is subjected to the substrate in the course of transport through the processing roller. As a result, processes can be better monitored, tracked and / or regulated. Alternatively or additionally, it is possible to dispense with separating the processes to be monitored spatially or temporally, which saves space, time and costs.

According to various embodiments, a processing section and / or a gas separation section are occupied by the intermediate guide arrangement, whereby no processing of the substrate (resting on the processing roller) can take place therein. Clearly, a process or separation section is "sacrificed" to drain the substrate from the processing roll therein. However, the substrate may be guided therein by additional guide rollers (also referred to as guide rollers) which allow a measurement of transmission or resistance between them before the substrate re-runs onto the processing roller (also referred to as a process roller).

The guide rollers of the intermediate guide arrangement can optionally be pivotally mounted or, which makes it possible to arrange them in a section of your choice. For example, the pivot axis of their recording can run exactly in the axis of rotation of the processing roller. The sensor assembly (also referred to as measurement technology) can also be mounted in the same receptacle so that its spatial position relative to the guide rollers is determined and / or the same in each section.

Furthermore, the reception of the guide rollers may be lockable in various positions so that the entire unit (i.e., intermediate guide assembly and / or optionally the sensor assembly) can be pivoted into any compartment and the process arrangement thus remains flexible.

Furthermore, by choosing appropriate guide rollers (e.g., concave rollers), an additional spreading effect in the process area can be achieved. Thus, the formation of wrinkles in the substrate can be counteracted, which is stimulated by the entry of process heat and temperature fluctuations. Clearly, by means of the spreading effect of the guide rollers, the impairment of the substrate due to the processing can be minimized.

According to various embodiments, a method may include: wrapping a substrate from a first wrapping roll to a second wrapping roll through a vacuum region; Processing the substrate in the vacuum region.

1A illustrates a transport arrangement 100 According to various embodiments in a schematic side view or cross-sectional view (eg, viewed along a rotation axis direction 101 the transport arrangement 100 ) and 1B the transport arrangement 100 with inserted substrate 102 in a wrap-around configuration 100b in the schematic side view or cross-sectional view.

According to various embodiments, the transport arrangement 100 a plurality of rotatably mounted wrapping rollers 112a . 112b . 112c have, for example, at least or exactly two Umwickelrollen 112a . 112b or at least or exactly three rewinding rolls 112a . 112b . 112c , Every wrapping roll 112a . 112b . 112c the several wrapping rollers 112a . 112b . 112c can be set up for receiving and storing (coupling) a winding tube. Each rewinding roll of the several rewinding rolls 112a . 112b . 112c can be about a rotation axis 101 be rotatably mounted.

A winding tube (also referred to as a coil) can be understood as a tubular carrier, by means of which a flexible material in the form of a winding stored or wrapped, ie wound into a winding or unwound from a winding can be. The flexible material may be, for example, a substrate 102 form or at least be part of which is to be processed later. For example, by means of a winding tube, a substrate 102 wrapped, eg wound on or unwound from, are (also referred to as a substrate winding tube). The flexible substrate 102 can be between two wrapping rollers 112a . 112b the several wrapping rollers 112a . 112b . 112c be wrapped, for example, from a first rewinding to a second rewinding or vice versa.

Alternatively or additionally, a flexible material may be an optional interlayer 104 form or at least be part of this. The intermediate layer can be between individual layers of a winding 102w of the substrate 102 (also as a substrate winding 102w to be arranged). In other words, the substrate can 102 and the intermediate layer 104 be wrapped or become one another. By means of the intermediate layer 104 may be a physical contact of individual layers of the substrate winding 102w prevents what the substrate 102 and / or protects its coating.

According to various embodiments, by means of at least one additional winding tube, the optional intermediate layer 104 wrapped, eg wound on or unwound from, are (also referred to as intermediate layer winding tube). At least one optional additional rewinding reel 112c the several wrapping rollers 112a . 112b . 112c may be provided, the optional intermediate layer 104 Umwickeln, ie from a substrate winding 102w out and / or into a substrate winding 102w to wrap in it. The intermediate layer 104 may for example be an interlayer winding 104w wound up and / or handled by this. Alternatively, the intermediate layer 104 between the two substrate coils 102w be wrapped.

Furthermore, the transport arrangement 100 at least one rotatably mounted processing roller 122p exhibit. The at least one processing role 122p can be about a rotation axis 101 be rotatably mounted.

The processing role 122p For example, a curved transport path 111 define (various options illustrated by dashed lines) along which the wrapping 111w can be done. The substrate 102 can by means of at least one rotatably mounted processing roller 122p be diverted, managed and / or pulled.

Furthermore, the transport arrangement 100 at least one intermediate guide arrangement 142 with several guide rollers 122 which, in addition to the processing role 122p is arranged. The at least one intermediate guide arrangement 142 can lift off the substrate 102 from the at least one processing role 122p and applying the substrate 102 to the same at least one processing role 122p be furnished.

The redirecting of the transport path 111 by means of the at least one rotatably mounted processing roller 122p and / or any guiding role of the intermediate guide assembly 142 can have an angle (clearly the difference from the incoming transport path 111 and expiring transport path 111 ). The angle can also be referred to as wrapping. The wrapping of each leadership role 122 For example, it may be greater than about 10 °, 20 °, 30 °. The wrapping of the processing roll 122p For example, it can be larger than any leadership role 122 or as about 45 °, 60 °, 90 °, 120 ° or 180 °.

The transport arrangement 100 For example, one or more intermediate guide arrangement 142 according to various embodiments.

2 illustrates an intermediate route arrangement 142 in a first configuration 200 and 3 a similar intermediate guide arrangement 142 in a second configuration 300 according to various embodiments in a schematic detail view (along the direction of rotation to the axis of rotation 101 ), eg the transport arrangement 100 or one of the transport arrangements described below.

The intermediate route arrangement 142 can be a first pair of roles 222a (with two rotatably mounted guide rollers 122 ), by means of which the transport path 111 in a first area 211 from the processing roll 122p away (to detach the substrate 102 from the processing roll 122p ) and in a second area 211b to the processing role 122p towards (for applying the substrate 102 to the processing role 122p ) is guided.

Depending on the configuration 200 . 300 can be the interim guide 142 at least an additional leadership role 122 . 222b (eg a second pair of rolls 222b ), by means of which the transport path 111 between the first area 211 and the second area 211b is transferred.

In the first configuration 200 can be the interim guide 142 at least two additional leadership roles 122 . 222b (eg a second pair of rolls 222b ), so that between the first area 211 and the second area 211b three (eg rectilinear) sections 111 . 111b . 111c the transport path 111 (also as transport path sections 111 . 111b . 111c designated), which is a distance from the processing roll 122p exhibit. In the second configuration 300 can be the interim guide 142 exactly one additional leadership role 122 have, so that between the first area 211 and the second area 211b exactly two (eg rectilinear) transport path sections 111 . 111b be provided, which is a distance from the processing role 122p exhibit.

According to various embodiments, the intermediate guide arrangement 142 or can their leadership roles 122 by means of a bearing arrangement 202 be stored. The bearing arrangement 202 can each have rotary bearings, by means of which each guide roller 122 the intermediate guide arrangement 142 rotatable about its axis of rotation 101 is stored. Furthermore, the bearing assembly 202 a frame (also referred to as a suspension), by means of which the pivot bearings are supported. The frame may optionally be pivotally mounted or, as will be described in more detail later.

At least one or each transport path section 111 . 111b . 111c can be substantially rectilinear and / or set up in freely suspended configuration, ie between two adjacent guide rollers 122 be arranged. The substrate 102 can at the transport path sections 111 . 111b . 111c Slightly sag due to its weight, ie its course follows a chain line.

Optionally, a sensor arrangement 204a . 204b which for detecting a measured variable of the substrate 102 in the at least one or each transport path section 111 . 111b . 111c is set up, at the intermediate route arrangement 142 be arranged or become. For example, the sensor arrangement 204a . 204b by means of the bearing arrangement 202 be or be supported.

The sensor arrangement 204a . 204b For example, it may comprise an optical sensor which is set up to transmit and / or reflect the substrate 102 capture. Alternatively or additionally, the sensor arrangement 204a . 204b an inductive sensor (eg, an eddy current sensor), which is set up an electrical characteristic of the substrate 102 For example, its resistance (also referred to as resistance) to capture. The sensor arrangement 204a . 204b For example, you can have multiple elements 204a . 204b between which the transport path 111 runs.

4A illustrates a vacuum arrangement 400a and 4B a processing arrangement 400b showing the vacuum arrangement 400a according to various embodiments in a schematic side view or cross-sectional view (viewed along the axis of rotation 101 ). The wrapping of the substrate 102 can be done in a vacuum according to various embodiments, for example in the vacuum arrangement 400a ,

According to various embodiments, the vacuum arrangement 400a a vacuum chamber housing 802 in which a vacuum can be generated and / or obtained. The vacuum chamber housing 802 can be, for example, airtight, dustproof and / or vacuum-tight set up or become. The vacuum chamber housing 802 can be exactly one vacuum chamber 802 or in several vacuum chambers 802 be divided. The or each vacuum chamber 802 can have one or more vacuum areas 306b . 308b provide. The several vacuum chambers 802 and / or the multiple vacuum areas 306b . 308b of the vacuum chamber housing 802 may optionally be at least partially gas-separated from each other.

Furthermore, the vacuum chamber housing 802 with a pump system 804 (comprising at least one rough-action vacuum pump and optionally at least one high-vacuum pump). The pump system 804 can be set up, the vacuum chamber housing 802 to withdraw a gas (eg the process gas), so that within the vacuum chamber housing 802 a vacuum (ie, a pressure less than 0.3 bar) and / or a pressure in a range of about 1 mbar to about 10 ^-3 mbar (in other words, a fine vacuum) and / or a pressure in a range of about 10 ^-3 mbar to about 10 ^-7 mbar (in other words high vacuum) or a pressure of less than high vacuum, for example, less than about 10 ^-7 mbar (in other words ultrahigh vacuum) can be provided.

According to various embodiments, the vacuum arrangement 400a a gas supply 1716 exhibit. By means of the gas supply 1716 can the vacuum chamber housing 802 a process gas is supplied to form a process atmosphere in the vacuum chamber housing 802 , The process gas may include, for example, an inert gas or be formed therefrom. Alternatively or additionally, the process gas may comprise or be formed from a reactive gas, for example a gas having oxygen, nitrogen, hydrogen and / or carbon. The process pressure can be formed from a balance of process gas, which by means of the gas supply 1716 supplied and by means of the pump system 804 is withdrawn.

Furthermore, the vacuum chamber housing 802 be set up so that the vacuum conditions (the process conditions) within the vacuum chamber housing 802 (Eg process pressure, process temperature, chemical process gas composition, etc.) can be made or regulated (eg locally), eg by means of a controller 508 , For example, by means of the vacuum chamber housing 802 several vacuum areas 306b . 308b be provided with mutually different vacuum conditions. For example, the controller 508 for controlling and / or regulating the gas supply 1716 and / or the pump system 804 be set so that a process pressure and / or a process gas composition can be controlled and / or regulated. For example, the controller 508 be arranged for controlling and / or regulating a standard volume flow of process gas, which by means of the gas supply 1716 supplied and / or by means of the pump system 804 is withdrawn.

According to various embodiments, the controller may 508 for controlling and / or regulating the substrate temperature control device 1124 (eg comprising a heating device and / or a cooling device), so that a process temperature (eg of the substrate 102 and / or the process gas), for example during processing (eg during coating), can be controlled and / or regulated. For example, the controller 508 be set up to control and / or regulating a thermal power, which by means of the substrate temperature control device 1124 supplied and / or withdrawn by means of this.

Optionally, the vacuum arrangement 400a a supply device for supplying the tempering device 1124 For example, for supplying with a tempered (eg cooled or heated) fluid or with electrical energy. For example, the supply device outside the processing chamber 802 be arranged. For example, a heating or a cooling fluid to the temperature control 1124 (eg the processing role 122p ) and removed from this again.

According to various embodiments, the vacuum chamber housing 802 a chamber opening for exposing the interior of the vacuum chamber housing 802 exhibit. The chamber opening may be the interior of the vacuum chamber housing 802 for example in the direction of rotation 101 uncover. For closing the chamber opening, the vacuum chamber housing 802 have a chamber lid.

In the vacuum chamber housing 802 (eg in a first vacuum chamber) can be at least one vacuum region 306b , eg a first vacuum area 306b and / or a second vacuum area 308b , which to the processing role 122p borders. Are several vacuum areas 306b . 308b in the vacuum chamber housing 802 arranged, these may optionally be gas-separated from each other, for example by means of a gas separation structure.

The processing arrangement 400b can the vacuum arrangement 400a and further configured to process the substrate, as described in more detail below. The processing (eg coating and / or processing) of the substrate 102 can be done in a vacuum according to various embodiments, for example in the processing arrangement 400b , In every vacuum area 306b . 308b the processing arrangement 400b can be done processing, which is the substrate 102 (eg a physical or chemical property of the substrate 102 ), eg its chemical composition (eg by the substrate 102 a coating is added), an electrical and / or an optical property (such as electrical impedance, optical transmission, optical reflection and / or optical absorption).

Between two vacuum areas 306b . 308b in which the substrate 102 is changed by means of processing, the inter-guide arrangement 142 be arranged.

For processing, in the vacuum chamber housing 802 (eg in the first vacuum chamber) a first processing source 306 , eg a source of coating material 306 be arranged. The coating material source 306 can be used to emit a gaseous coating material in the first vacuum area 306b (also commonly referred to as processing area). With the coating material, the substrate 102 be coated or be. In other words, the coating of the substrate 102 done in a vacuum. The first vacuum area 306b For example, a coating area 306b be.

In the vacuum chamber housing 802 (For example, in a second vacuum chamber or in the first vacuum chamber), at least a second vacuum region 308b be arranged. Further, in the vacuum chamber housing 802 (eg in the second vacuum chamber) a second processing source 308 , eg an exposure device 308 be arranged. The second processing source 308 may be arranged to process the coating material with which the substrate 102 is coated or is, for example by means of light. For example, the processing source 308 be configured for structuring or chemical conversion of the coating material with which the substrate 102 is or will be coated. The second vacuum area 308b can be a editing area 308b be.

For example, the second processing source 308 at least one exposure device 308 For example, a light source (eg, a laser, a lamp, a flash lamp or an X-ray source), a heat radiation source or a particle source (eg, an electron source or a proton source or an ion source). The second processing source 308 may be a pulsed or continuously operated second processing source 308 be. For example, by means of the second processing source 308 a (eg pulsed or continuous) radiation (eg electromagnetic radiation, such as light, heat radiation and / or particle radiation, such as electron radiation and / or ion radiation) are generated, for example, a continuous electron beam by means of an electron beam gun (eg by means of a linear source) or a pulsed flash of light a flash lamp (eg a gas discharge lamp or a light emitting diode).

The second processing source 308 For example, it may include or be formed from one or more flash lamps. The or each flashlamp may comprise a gas discharge lamp which may or may be pulsed, for example by means of the controller 508 , For pulsed operation of the or each gas discharge lamp, a current pulse may be discharged through the gas discharge lamp.

The second processing source 308 Alternatively, it may also be a source of coating material 308 have or be formed therefrom, which for example a to the first coating material source 306 provides various coating material.

According to various embodiments, the controller may 508 for controlling and / or regulating the first processing source 306 and / or the second second processing source 308 be set up, for example by controlling a quantity of material and / or thermal energy (eg radiation energy) and / or regulate which per time in the direction 105 of the substrate 102 is emitted.

Furthermore, the vacuum arrangement 400a a wrapping roll 112a for unwinding a substrate 102 have (also as Abwickelwalze 112a designated), so that the substrate 102 in the at least one vacuum area 306b . 308b is brought in. Furthermore, the vacuum arrangement 400a a wrapping roll 112b for winding up the substrate 102 have (also as a take-up roller 112b designated), which from the at least one vacuum region 306b . 308b is brought out. In other words, the substrate 102 be processed by roll-to-roll.

Furthermore, the vacuum arrangement 400a several guide rollers 122 which have a transport path 111 along which the substrate is defined 102 (For example, a band-shaped substrate 102 ) between the unwinding roll 112a . 112b and the processing role 122p and / or between the take-up roller 112b and the processing role 122p is transported, for example in a transport direction 111w (Which perpendicular to the rotation axis direction 101 can be).

The vacuum arrangement 400a exactly one processing role 122p have, which the tempering 1124 has, ie which as a processing role 122p is set up by means of the substrate 102 tempered, eg heated and / or cooled, can be. By means of the processing role 122p may be the constantly curved and / or tempered section 111k the transport path 111 (also as transport path section 111k be provided). The transport path section 111k can in the at least one vacuum area 306b . 308b be arranged, in which the substrate 102 is processed.

Furthermore, the vacuum arrangement 400a a drive system 518 having at least part of the plurality of rollers 112a . 112b . 122 . 122p coupled 518k is, for example, at least part of the multiple leadership roles 122 , the processing role 122p and with each rewinding roll of the plurality of rewinding rolls 112a . 112b , The drive system 518 Can the multiple drives 506 exhibit. For example, the drive system 518 by means of waves, 518k chain 518k , Straps 518k or gears 518k with the part of the variety of roles 112a . 112b . 122 . 122p be coupled, which are driven. The drive system 518 and part of the variety of roles 112a . 112b . 122 . 122p may be part of a positioning device used to position the substrate 102 is set up.

The control 508 can to control 518k and / or rules 518k of the drive system 518 be set up, for example, to control 518k and / or rules 518k a transport characteristic, for example a transport speed, a mechanical tension on the substrate 102 , and / or a layer of the substrate 102 , The taxes 518k and / or rules 518k of the drive system 518 can during the processing of the substrate 102 take place, for example during the coating and / or irradiation, for example on the basis of a processing progress (eg a coating progress and / or a structuring progress) and / or on the basis of a transport characteristic. The processing progress can be represented, for example, by the measured variable.

According to various embodiments, the vacuum arrangement 400a optionally at least one substrate pretreatment device 310 (ie, one or more substrate pretreatment devices 310 ) for pretreating the substrate 102 , eg for chemically activating the substrate 102 For example, to chemically activate its surface to clean the substrate 102 and / or for etching the substrate 102 , For example, the at least one substrate pretreatment device 310 have an etching device or be formed therefrom for etching the substrate 102 , Alternatively or additionally, the at least one substrate pretreatment device 310 at least one sputter etching source, at least one plasma source, at least one glow device and / or at least one etching gas source have or be formed therefrom. For example, the pretreatment of the substrate 102 have the substrate 102 by sputter etching; Ion etching and / or glowing to treat.

Alternatively or additionally, a substrate aftertreatment device 310 used to the substrate 102 , which is coated with the coating material to post-treat, eg similar to the pretreatment. For example, the substrate 102 having the coating with the coating material selectively heated (eg tempered) and / or etched.

By means of additional rollers, the wrapping around the processing roller 122p be enlarged or become.

For example, the diameter of the guide roller (s) 122 the transport arrangement is less than about 200 mm, for example less than about 150 mm, which saves space. Alternatively or additionally, the diameter of the guide roller (s) 122 the transport arrangement be greater than about 200 mm, for example less than about 250 mm. The larger the diameter, the smaller the risk that the substrate 102 breaks, especially if the substrate 102 is very brittle (such as flexible glass). The diameter of the processing roll 122p can be even bigger than the one of the leadership role (s) 122 ,

The transport path 111 can by means of or any leadership role 122 the transport arrangement to be deflected, which is clearly configured as a deflection roller, for example by an angle (vividly the difference from einlaufendem transport path 111 and expiring transport path 111 ). The angle can also be referred to as wrapping. The angle of the non-driven guide rollers 122 may be greater than about 10 °, eg greater than about 20 °, eg greater than about 30 °.

5A and 5B each illustrate a processing arrangement 500a . 500b According to various embodiments in a schematic side view or cross-sectional view (eg with a view along the rotation axis direction 101 the processing arrangement 500a . 500b ).

According to various embodiments, the processing arrangement 500a . 500b a vacuum chamber 802 (more generally as a processing chamber 802 designated), which several sections 2202a . 2202b (also referred to as compartments). The sections 2202a . 2202b can optionally by means of a surface element 2206 (Eg a partition wall) be gassepariert from each other. The processing chamber 802 For example, it may be or may be provided by means of a vacuum chamber housing, as described above. In the or each section 2202a . 2202b can be a vacuum area 306b . 308b be or be provided.

The processing arrangement 500a . 500b Furthermore, at least one transport arrangement with at least one intermediate guide arrangement 142 and a processing role 122p exhibit. The at least one intermediate guide arrangement 142 can have three or more than three leadership roles 122 exhibit.

According to various embodiments, the plurality of sections 2202a . 2202b at each a curved portion extending 111k the transport path 111 adjoin. The curved sections 111k the transport path 111 For example, along a lateral surface 122m the at least one processing role 122p run. Between the curved sections 111k the transport path 111 can the transport path 111 by means of the intermediate guide arrangement 142 from the processing roll 122p be gone and be led back to this.

The optional surface element 2206 can a gap 2206s provide through which the transport path 111 leads through. For example, the gap 2206s between the surface element 2206 and the processing role 122p or their lateral surface 122m be formed. The gap 2206s can clearly be set up so large that a means of processing role 122p transported substrate 102 through the gap 2206s fits through. The extent of the gap 2206s For example, it may be smaller than 10 cm, eg smaller than 5 cm, eg smaller than 1 cm.

The gas separation clearly describes a difference in gas pressure or in the gas composition between vacuum-related vacuum areas 306b . 308b (eg gas-isolated vacuum areas), ie, clearly a vacuum separation. The components 2206 (That is, the components of a gas separation structure), which contribute to the gas separation, may be arranged such that the difference in gas pressure or in the gas composition between vacuum-related vacuum areas 306b . 308b can be maintained (eg stable). In other words, a gas exchange between vacuum-technically interconnected and gas-separated vacuum areas 306b . 308b be disturbed and / or reduced, for example, the greater the gas separation between the vacuum areas 306b . 308b is.

Optionally, the gas separation structure, between two surface elements 2206 , a gas separation section 1802 in which the intermediate guide arrangement 142 is arranged. The gas separation section 1802 can be a gas separation of the neighboring sections 2202a . 2202b strengthen.

The processing arrangement 500a . 500b can be at least one processing source 306 have, for example, a first processing source 306 (eg, a first source of coating material 306 ), which in a first 2202a the several sections 2202a . 2202b be arranged or can be. The first processing source 306 For example, it may have one or more magnetron cathodes. Optionally, the processing arrangement 500a . 500b a second processing source 308 (eg, a second source of coating material 308 ), which in a second 2202b the several sections 2202a . 2202b be arranged or can be. The second Prozessierquelle 308 For example, it may have one or more magnetron cathodes.

According to various embodiments, in the processing chamber 802 by means of the at least one coating material source 306 . 308 a coating process may be performed such that a substrate transported by the transport assembly 102 with at least one coating material (eg at least two coating materials, for example at least three coating materials) can be coated.

For example, any source of coating material 306 . 308 a coating material which is used to coat the substrate 102 vaporized and towards the substrate 102 (ie in the direction of the transport path 111 ) is emitted. On the substrate 102 The emitted coating material can accumulate and form a layer. That in the direction of the substrate 102 emitted coating material of each coating material source 306 . 308 can be a layer or a layer stack on the substrate 102 form. For example, so many layers that differ from each other on the substrate 102 be formed, such as coating material sources 306 . 308 be used.

By means of a first coating material source 306 which is in the first vacuum area 306b the multiple vacuum areas 306b . 308b can be arranged a first layer on the substrate 102 are formed and by means of a second coating material source 308 , which in the second vacuum area 308b the multiple vacuum areas 306b . 308b can be arranged, a second layer on the substrate 102 be formed. The first layer and the second layer may, for example, differ in their chemical properties (eg their chemical composition), their spatial dimensions (eg their thickness), their electrical properties (eg their electrical impedance) or their optical properties (eg their transmittance). For example, in the first vacuum area 306b an oxidic coating process and in the second vacuum region 308b a metallic coating process done.

6 illustrates a processing arrangement 600 According to various embodiments in a schematic side view or cross-sectional view (eg, viewed along a rotation axis direction 101 the processing arrangement 600 ).

According to various embodiments, at least one substrate 102 by means of the processing arrangement 600 (eg in their vacuum arrangement) are processed (treated). In this case, the processing arrangement 600 be set up so that the substrate 102 for example, coated, heated, cooled, etched, exposed, patterned and / or otherwise treated. The treatment (processing) of the at least one substrate 102 can for example be done in a vacuum (in a vacuum chamber), for example in several sections 2202a . 2202b . 2202c . 2202d . 2202e a vacuum chamber.

For processing a substrate 102 can the processing arrangement 600 several processing sources 306 . 308 . 2308 . 2310 each of which has its processing source in a section of the plurality of sections 2202a . 2202b . 2202c . 2202d . 2202e can be arranged.

The several sections 2202a . 2202b . 2202c . 2202d . 2202e may be gas-separated from each other or, for example, in pairs by means of gas separation sections arranged therebetween 1802 , The or each gas separation section 1802 can be adjacent to a high vacuum pump and / or by means of a respective surface element 2206 from an adjacent section of the several sections 2202a . 2202b . 2202c . 2202d . 2202e be gas-separated.

A processing source 306 . 308 . 2308 . 2310 generally comprise or be formed from one of the following types of processing source: a source of coating material (a magnetron, a tube magnetron or a double-tube magnetron, a planar magnetron or double planar magnetron), an exposure device (a light source, a laser, a flashlamp or a flash lamp assembly), a heat source (eg, a heater), an etching device (eg, an etching gas source or etching plasma source), a radiation source (eg, an electron beam source or ion beam source), or the like.

For coating (vapor deposition) of the at least one substrate 102 At least one of the following coating processes may be used: chemical vapor deposition, physical vapor deposition, thermal evaporation, and / or electron beam evaporation.

For coating (vapor deposition) of the at least one substrate 102 For example, at least one source of coating material 306 . 308 . 2308 . 2310 can be used, which is arranged such that by means of the at least one coating material source, a sputtering (sputtering) method can be performed. The sputtering methods may be performed in a variety of ways, for example as DC (DC) sputtering, medium frequency (MF) sputtering, radio frequency (RF) sputtering, each using one or more cathodes (targets) using a magnet system (Magnetron sputtering) using reactive gas as reactive sputtering, high power pulse sputtering and / or the like.

According to various embodiments, the bearing assembly 202 provide a rotational degree of freedom, according to which the intermediate guide arrangement 142 relative to the processing role 122p is pivotally mounted. For example, the bearing assembly 202 be set up such that the intermediate guide arrangement 142 into each of the several sections 2202a . 2202b . 2202c . 2202d . 2202e (Process compartments) or in each of the gas separation sections 1802 is pivotable. As a result, the greatest possible flexibility for realizing different process sequences can be achieved.

7 illustrates a method 700 according to various embodiments in a schematic flow diagram.

The procedure 700 can in 701 comprising: transporting a substrate by means of a processing roller (eg resting thereon) in a vacuum. By way of example, tempering (cooling or heating) of the substrate can take place by means of the processing roller.

The procedure 700 can also be found in 703 comprising: detaching the substrate in a first region from the processing roll.

The procedure 700 can also be found in 705 comprising: applying the substrate in a second region to the processing roll.

The procedure 700 can also be found in 707 comprising: transporting the substrate from the first region into the second region at a distance (eg in freely suspended configuration) from the processing roll.

The procedure 700 optionally may include: first processing the substrate prior to peeling and / or second processing the substrate after application. For example, the first processing and / or the second processing can change an electrical property of the substrate (eg its impedance, eg its resistance) and / or an optical property of the substrate (eg its transmittance and / or reflectance). The first processing may include, for example: first coating the substrate (in other words, forming a first layer on the substrate), eg with a first coating material. Alternatively or additionally, the second processing may comprise second coating the substrate (in other words forming a second layer on the substrate), eg with a second coating material (which differs from the first coating material, for example). For example, the first layer and the second layer may differ from one another, for example in their transmittance and / or their electrical impedance.

The procedure 700 Optionally comprise: detecting a measured variable of the substrate (eg the first layer) between the first region and the second region, eg an optical measurement variable (eg the transmittance) and / or an electrical measurement variable (eg the electrical impedance).

The procedure 700 optionally may include: controlling and / or regulating the first processing and / or the second processing based on the measurand.

Claims (10)

Transport arrangement ( 100 ), comprising: • a rotatably mounted processing roller ( 122p ) for transporting a substrate along a transport path ( 111 ); • an interim management system ( 142 ) with a plurality of rotatably mounted guide rollers ( 122 ), by means of which the transport path ( 111 ) in a first region of the processing roll ( 122p ) and in a second area to the processing role ( 122p ) led out; • where a section ( 111 . 111b . 111c ) of the transport path ( 111 ), which extends from the first region into the second region, a distance from the processing roller ( 122p ) having. Transport arrangement ( 100 ) according to claim 1, further comprising: a bearing assembly ( 202 ), by means of which the intermediate guide arrangement ( 142 ), wherein the bearing arrangement provides a rotational degree of freedom, according to which the intermediate guide arrangement ( 142 ) relative to the processing role ( 122p ) is pivotally mounted. Transport arrangement ( 100 ) according to claim 2, wherein an axis of rotation of the rotational degree of freedom and an axis of rotation of the rotatably mounted processing roller ( 122p ) are the same. Transport arrangement ( 100 ) according to one of claims 1 to 3, the intermediate guide arrangement ( 142 ) further comprising: a sensor arrangement ( 204a . 204b ) for detecting a measurand in the section ( 111 . 111b . 111c ) of the transport path ( 111 ). Transport arrangement ( 100 ) according to claim 4, wherein the sensor arrangement ( 204a . 204b ) has at least one optical sensor and / or at least one eddy current sensor. Transport arrangement ( 100 ) according to one of claims 1 to 5, wherein the plurality of guide rollers ( 122 ) have at least one spreader roller. Transport arrangement according to one of claims 1 to 6, further comprising: a temperature control device ( 1124 ), which with a lateral surface of the processing roller ( 122p ) is thermally coupled to exchange thermal energy. Vacuum arrangement ( 400a ), comprising: a vacuum chamber ( 802 ), • one in the vacuum chamber ( 802 ) arranged transport arrangement ( 100 ) according to one of claims 1 to 7, • wherein the vacuum chamber ( 802 ) has a plurality of vacuum areas which are connected to the processing roller ( 122p ) are adjacent; Where the intermediate routing arrangement ( 142 ) is arranged in a vacuum region of the plurality of vacuum regions and / or is pivotally mounted between them. Vacuum arrangement ( 400a ) according to claim 8, further comprising: a gas separation structure by means of which the plurality of vacuum areas are gas-separated from each other. Processing arrangement ( 400b . 500a . 500b . 600 ), comprising: a vacuum arrangement ( 400a ) according to claim 8 or 9, • at least one first processing source ( 306 . 308 ) disposed in a first vacuum region of the plurality of vacuum regions; At least one second processing source ( 2308 . 2310 ) disposed in a second vacuum region of the plurality of vacuum regions; Where the intermediate routing arrangement ( 142 ) of the vacuum assembly is disposed in and / or pivotable in a third vacuum region of the plurality of vacuum regions, wherein the third vacuum region is disposed between the first vacuum region and the second vacuum region.

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