DE102019124489B3 - Vacuum arrangements, methods and use of an electrode in a vacuum - Google Patents

Abstract

According to various embodiments, a vacuum arrangement (100 to 900) can have: a transport roller (112), which has a dielectric roller cover (112m), for providing a transport path (111p) in a first area to the roller cover (112m) and in a second Area away from the roll cover (112m); a gas separation structure (302) which provides a gas-separated cavity (302h), the cavity (302h) extending from the transport path (111p) in the first area to the transport path (111p) in the second area and to the roller cover (112m) adjoins; an electrode (304) for exciting a gas discharge, the electrode (304) being arranged in the cavity (302h).

Description

Various exemplary embodiments relate to a vacuum arrangement, a method and the use of an electrode in a vacuum.

In general, a substrate can be treated (processed) in this way, e.g. be coated so that the chemical and / or physical properties of the substrate can be changed. Various coating methods can be used to coat a substrate, such as vapor deposition, e.g. chemical vapor deposition (CVD) or physical vapor deposition (PVD). One method of PVD is, for example, electron beam evaporation (EBPVD), i. the evaporation of a coating material by means of an electron beam. For example, a metal can be evaporated in a vacuum and deposited on a non-metallic substrate (e.g. made of polyethylene terephthalate - PET) in order to metallize it.

When metallizing (or more generally when coating) the substrate by means of EBPVD, the bombardment with backscattered electrons from the process space can result in an electrical charge of the substrate. When depositing an insulating layer, for example made of SiO ₂ , the substrate and the layer can be charged. The potential difference between the metallic grounded roller surface and the thus negatively charged substrate can lead to an electrostatic attraction between the substrate (eg a foil) and the roller. Electrons in a metallic layer, for example, lead to the charging of the latter, provided the belt run (ie the rollers contacting the layer) are insulated. On the other hand, for example, a portion of the high-energy electrons remains in the insulating substrate itself, so that it is negatively charged. The substrate can serve as an insulator between the electrically conductive layers. This additional force (in addition to belt tensile forces) increases the contact pressure between the substrate and the roller and thus also the effective removal of the process heat absorbed by the substrate in the coating window (e.g. heat of condensation, radiant heat, particle energy) to a cooling roller, which reduces the thermal stress on the substrate.

To ensure stable transport of the substrate, it may be necessary to discharge the substrate in a targeted manner in the area of the gusset between the roller and the draining substrate. Conventionally, a specific neutralization of the substrate is brought about by igniting a glow discharge. For this purpose, for example, a rod electrode in the area of the expiring gusset between the substrate and the process roller can be subjected to a voltage (approx. +1000 V), whereby an inert gas that is specifically admitted or that escapes between the substrate and the roller is ionized (i.e. a plasma is formed). Ions accelerated in the area of the cathode fall hit the substrate and thus contribute to the discharge.

DE 10 2018 103 626 A1 describes a cooling roller which allows gas to be introduced between the substrate and the cooling roller, and a supply interface for supplying the cooling roller with the gas. DE 197 44 060 A1 describes a method and a device for the surface treatment of substrates with the aid of a gas discharge. EP 1 472 387 B1 describes a coating of a substrate by means of a corona discharge-assisted chemical vapor deposition.

According to various embodiments, it has been clearly recognized that a contamination on the roller (hereinafter also referred to as the transport roller) can locally reduce the electrostatic attraction, e.g. if the contamination is electrically conductive. This contamination can for example have an undesirable parasitic coating of the transport roller with the coating material and / or metallic abrasion from the substrate. It is true that the transport roller so contaminated could be cleaned regularly. However, this requires regular interruptions to the coating process and therefore reduces its profitability.

In this context, it was recognized that this effect can be counteracted by additionally supplying the glow discharge with a gas (hereinafter also referred to as reactive gas) which electrically passivates the contamination. Passivation can be done, for example, by at least partially (i.e. partially or completely) transferring the impurity into a dielectric, e.g. by oxidizing the impurity.

According to various embodiments, a vacuum arrangement can have: a transport roller, which has a dielectric roller cover, for providing a transport path in a first area towards the roller cover and in a second area away from the roller cover; a gas separation structure which provides a gas-separated cavity (also generally referred to as a gas discharge space), the cavity extending from the transport path in the first area to the transport path in the second area and adjoining the roller cover; an electrode for exciting a gas discharge, the electrode being arranged in the cavity.

• 1 bis 9 eine Vakuumanordnung gemäß verschiedenen Ausführungsformen in verschiedenen schematischen Ansichten; und
• 10 ein Verfahren gemäß verschiedenen Ausführungsformen in einem schematischen Ablaufdiagramm.

Show it

• 1 to 9 a vacuum arrangement according to various embodiments in various schematic views; and
• 10 a method according to various embodiments in a schematic flowchart.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which there is shown, for purposes of illustration, specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "back", etc. is used with reference to the orientation of the character (s) being described. Because components of embodiments can be positioned in a number of different orientations, the directional terminology is used for purposes of illustration and is in no way limiting. It goes without saying that other embodiments can be used and structural or logical changes can be made without departing from the scope of protection of the present invention. It goes without saying that the features of the various exemplary embodiments described herein can be combined with one another, unless specifically stated otherwise. Therefore, the following detailed description is not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

In the context of this description, the terms “connected”, “connected” and “coupled” are used to describe both a direct and an indirect connection (e.g. ohmic and / or electrically conductive, e.g. an electrically conductive connection), a direct or indirect connection as well as a direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference symbols, as far as this is appropriate.

Controlling can be understood as an intended influencing of a system. The state of the system can be changed according to a specification. Regulation can be understood as controlling, whereby a change in the state of the system due to disruptions is also counteracted. The controller can clearly have a forward-facing control path and thus clearly implement a sequence control which converts an input variable into an output variable. The control path can, however, also be part of a control loop, so that regulation is implemented. In contrast to the pure forward control, the control has a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback). In other words, a regulation can be used as an alternative or in addition to the control or regulation can take place as an alternative or in addition to the control. In the case of regulation, an actual value of the controlled variable (e.g. determined based on a measured value) is compared with a reference value (a setpoint or a specification or a preset value) and the controlled variable can accordingly be adjusted using a manipulated variable (using an actuator) can be influenced so that there is as little deviation as possible of the respective actual value of the controlled variable from the reference value. The input variable can thus be a measured variable of the system to be controlled / regulated.

Small (e.g. irregularly distributed) cavities in a solid can be called pores. The cavities can extend into the solid and / or an interconnected network, e.g. extending through this form, so that the solid body becomes gas-permeable. Micropores can have an extension (e.g. pore diameter) of less than about 2 nm.

Mesopores can have an extension in the range from approximately 2 nm to approximately 50 nm. Macropores, can be greater than about 50 nm in size and e.g. less than 1 micrometer (µm). The size of a pore can be understood as the diameter of a sphere which has the same volume as the pore. Thus, a heterogeneous mixture of the solid and a fluid (e.g. gaseous and / or liquid material) which is arranged in the pores of the solid can be formed.

According to various embodiments, a substrate can be transported as a tape (also referred to as a tape substrate) from roll-to-roll (ie wrapped between the wrapping rolls). The tape substrate can, for example, have a width (extension transverse to the transport direction) in a range from approximately 1 cm (eg 30 cm) to approximately 500 cm or a width (also referred to as substrate width) of more than approximately 500 cm. Furthermore, the tape substrate can be flexible. A tape substrate can clearly be any substrate that can be wound onto a roll and / or, for example, can be processed from roll-to-roll. Depending on the elasticity of the material used, the tape substrate can have a material thickness (also referred to as substrate thickness) in a range from approximately a few micrometers (eg from approximately 1 μm) to approximately several millimeters (eg up to approximately 10 mm), eg in a range from approximately 0.01 mm to about 3 mm and / or in a range from about 300 µm (micrometers) to about 1 mm (e.g. for a PVD application). The wrapping can take place along a transport path by means of a multiplicity of transport rollers which, for example, can be axially longer than the width of the tape substrate.

According to various embodiments, a substrate (e.g. a tape substrate) may comprise or be formed from at least one of the following: a ceramic, a glass, a semiconductor, a metal, a polymer (e.g. plastic) and / or a mixture of different materials, e.g. a composite material (e.g. carbon fiber-reinforced-carbon, or carbon-fiber-reinforced-plastic). For example, the substrate can comprise or be formed from a plastic film, a semiconductor film, a metal film and / or a glass film, and optionally be or will be coated, e.g. with a coating material. Alternatively or additionally the substrate may for example comprise fibers, e.g. Glass fibers, carbon fibers, metal fibers, vegetable fibers (paper) and / or plastic fibers, e.g. in the form of a woven fabric, a net, a knitted fabric, a knitted fabric or as a felt or fleece. The substrate can for example have a flexible substrate material. For example, the substrate can have a polymer film (made of PET or polyimide-PI) or be formed from it. Alternatively or in addition, the substrate can have a metal foil (e.g. made of aluminum or steel) or be formed from it.

According to various embodiments, the coating material may comprise or be formed from a metal, e.g. Copper.

In the context of this description, the term “metallic” can be understood as comprising or formed from a metal. In the context of this description, a metal (also referred to as a metallic material) can comprise (or be formed from) at least one metallic element (i.e. one or more metallic elements), e.g. at least one element from the following group of elements: copper (Cu), iron (Fe), titanium (Ti), nickel (Ni), silver (Ag), chromium (Cr), platinum (Pt), gold (Au), Magnesium (Mg), aluminum (Al), zirconium (Zr), tantalum (Ta), molybdenum (Mo), tungsten (W), vanadium (V), barium (Ba), indium (In), calcium (Ca), Hafnium (Hf), samarium (Sm), silver (Ag), and / or lithium (Li). Furthermore, a metal may comprise or be formed from a metallic compound (e.g. an intermetallic compound or an alloy), e.g. a combination of at least two metallic elements (e.g. from the group of elements), e.g. Bronze or brass, or e.g. a compound of at least one metallic element (e.g. from the group of elements) and at least one non-metallic element (e.g. carbon), e.g. Stole.

A transport roller can be designed differently depending on the application and configuration. For example, a transport roller can be set up as (e.g. active or passive) guiding and / or deflection of the transport path, for temperature control (e.g. cooling) or driving the substrate transport. Such a transport roller for tempering (also referred to as a tempering roller), e.g. a cooling roller, for example, can be driven and the rotation of which causes the substrate transport to be driven. The temperature control roller can have a ceramic surface, for example, which can be sprayed on, for example.

The outer surface (also enveloping surface or circumferential surface) of a body can be understood as the (e.g. circumferential) surface that is created, for example, in a cylindrical body by rotating a line around an axis of rotation. The outermost circumferential surface of a transport roller that is exposed and on which the substrate is intended to rest can also be referred to as the substrate support surface. Thermal energy can be supplied to and / or withdrawn from the substrate (more generally also referred to as temperature control) by means of the substrate support surface.

According to various embodiments, a substrate discharge is provided independently of a transport direction in the vacuum coating system, for example after the substrate (e.g. comprising PET) has been coated on the transport roller (e.g. with a metal) by means of a PVD process (e.g. EBPVD). For example, the substrate front side can already be coated. Optionally, the back of the substrate can be coated (e.g. with one or the metal). In order to generate an electrostatic attraction between the substrate and the transport roller in this case as well, the process roller can have a positive potential (also referred to as a bias voltage) applied to the substrate. For electrical insulation between the transport roller and the substrate, the outer surface of the transport roller can have a dielectric coating (also referred to as a dielectric roller cover).

According to various embodiments, the detachment of the substrate from the process roller can be facilitated in the event that the substrate has a back coating. In continuous coating operation, metallic deposits (for example due to abrasion) can occur on the dielectric surface of the transport roller, as a result of which the electrical field of the transport roller is locally shielded. As a result, surface pressing of the substrate against the transport roller based on electrostatic attraction can no longer be ensured reliably and with full strength, which can increase the heat transfer resistance between the substrate and the transport roller, eg at the resulting defects. For example, the substrate can be thermally damaged locally by the heat flow of the coating process that is built up as a result.

According to various embodiments, an electrical insulation effect of the outer roll jacket layer can be maintained.

The substrate can be unwound on a substrate roll by means of a take-up roller, guided along the transport path and subsequently wound up by means of a take-up roller (also referred to as wrapping). The space enclosed by the substrate and the transport roller (also referred to as a cavity or gas discharge space) can be shielded and / or pressure-separated at the end as well as possible from the substrate roll in the winding space by means of one or more than one separation plate (as part of a gas separation structure). Sufficient gas separation from the winding space and from the process for the required working pressure of the coating can be provided by means of the gas separation structure.

Furthermore, a gas discharge unit (e.g. glow discharge unit or magnetron) can be arranged in the gas discharge space between the gussets. The gas discharge unit can have one or more than one electrode. By means of a stationary gas discharge (e.g. a glow discharge or plasma discharge) on an open section of the transport roller (e.g. limited by the gusset between the incoming or outgoing substrate and the outer surface), the removal of the substrate can be facilitated. The substrate can be guided on the process roller, for example by means of electrostatic attraction. Optionally, the gas discharge unit can have a magnetic field tunnel to extend the duration of the electrons' stay in the plasma space.

According to various embodiments, the gas discharge unit can have exactly one or two electrodes (e.g. for AC operation). Optionally, the two electrodes can be connected alternately as anode or cathode, i.e. a polarity reversal take place. In AC operation (alternating voltage operation), an alternating voltage can be applied between the two electrodes (i.e. their potential difference can be the alternating voltage). A frequency of the alternating voltage can be, for example, in a range from approximately 100 Hertz (Hz) to approximately 10 kHz (also referred to as AC-MF). As an alternative to AC operation, direct voltage operation (DC operation) can be used. Optionally the DC voltage can be pulsed between the two electrodes, e.g. bipolar or unipolar. The voltage between the two electrodes (e.g. their amplitude) can be in a range from about 1 kV to about 5 kV.

For example, an atmosphere (also referred to as a gas discharge atmosphere) can be or can be provided in the gas discharge space which a working gas (ie the plasma-forming gas) can have. A process pressure in the gas discharge space can, for example, be in a range from approximately 5 · 10 ^-2 mbar (millibars) to approximately 5 · 10 ^-3 mbar. The working gas can for example have an inert gas (for example argon) or be formed from it. For this purpose, a gas supply to the gas discharge space can be provided, for example to the diffuse gas inlet via a nozzle tube. The gas discharge can take place by means of the working gas. Optionally, a reactive gas can be added to the atmosphere, for example if the impurities in the transport roller are to be passivated. The reactive gas can for example contain oxygen or be formed from it. The ratio between reactive gas and working gas can for example be controlled and / or regulated, for example by means of a control device. The gas discharge atmosphere can, for example, cause a chemical conversion of a metal deposit / abrasion (also referred to as contamination) on the transport roller into a dielectric metal oxide.

According to various embodiments, the detachment behavior of the substrate from the transport roller can be supported (e.g. ensured) during both the front and the rear side coating. For example, by controlling the ratio between reactive gas and working gas in the gas discharge space, a chemical conversion of metallic deposits on the outer surface of the transport roller can be achieved, whereby the substrate cooling on a transport roller by means of the bias voltage (general bias potential) ensures long-term stability over the duration of the campaign can be.

According to various embodiments, it was clearly recognized that a contamination on the roller can locally reduce the electrostatic attraction, for example if the contamination is electrically conductive. This applies, for example, to the special case in which a process roller with an insulating jacket (clearly corresponds to the dielectric of the capacitor), whose roller core (clearly corresponds to the first electrode of the capacitor) is at an electrical potential, and a metallic grounded substrate (clearly corresponds to the second Electrode of the capacitor, for example also an insulating polymer film with a metallic layer, which is guided with the metallic side over the roller). In this case, a metallic deposit on the roller leads to a local shielding of the electrical field and thus at this point to the loss of the electrostatic attraction between substrate and roller.

1 illustrates a vacuum arrangement 100 according to various embodiments in a schematic side view or cross-sectional view.

The vacuum arrangement 100 can be a transport roller 112 exhibit. A transport role 112 which is set up to control the temperature of the substrate, ie to withdraw thermal energy from it and / or to supply it, can also be used as a temperature control roller 112 (e.g. a gas cooling roller 112 or gas cooling roller). The temperature control roller can be used to control the temperature of the substrate 112 for example a temperature control device 1124 have, which is optionally set up, the substrate in a thermally conductive manner to the transport roller 112 to be coupled, as will be described in more detail later. The gas cooling roller 112 can be set up for thermal coupling of the substrate by means of a gas.

The transport role 112 can be a (e.g. cylindrical) roller cover 112m (also referred to as roller jacket or outer jacket). The temperature control roller 122 can be a roller housing 112h have on which the roll cover 112m is upset. The role cover 112m can be a substrate support surface 1604o (also called the outer peripheral surface 1064o designated) on which the substrate is to rest.

The temperature control device 1124 can optionally have a fluid supply 114 have, for example a gas supply 114 . The gas supply 114 can have a variety of gas outlet openings 112o (also called openings 112o designated), which, for example, statistically and / or irregularly on the outer, exposed substrate support surface 1604o the roll cover 112m can be arranged and / or spatially distributed. For example, the roll cover 112m have or be formed from a porous layer which surrounds the roller housing and the pores of which the gas outlet openings 112o provide. By means of the gas supply 114 can a gas through the gas outlet openings 112o through between the substrate and the roll cover 112m be introduced, which the substrate thermally with the roll cover 112m couples (also referred to as heat coupling).

The fluid supply 114 can optionally have a cooling fluid supply 116 fluid-conducting (eg liquid-conducting) with the gas outlet openings 112o connect. The cooling fluid supply 116 (for example their gas supply and / or their liquid supply) can, for example, at least one pump 116r and / or at least one pipeline 116r exhibit. By means of the cooling fluid supply 116 can the transport roller 112 a cooling fluid can be supplied during operation, for example the gas and / or a liquid. The fluid supply 114 can have a gas supply (for supplying the gas) and / or a liquid supply (for supplying the liquid) or be formed therefrom.

A cooling device of the temperature control device can be used by means of the liquid 1124 (see. 2 ) are supplied, which of the roll cover 112m withdraws thermal energy. The gas can flow out of the gas outlet openings 112o step out. The gas supply 114 can for example radial lines 120 have, which the cooling fluid supply 116 with the cooling device and / or the gas outlet openings 112o Connect fluidly. The cooling fluid supply can be illustrated 116 also both the gas to exit from the gas outlet openings 112o as well as the liquid coolant (which flows into the cooling roller via the flow and return 112 is pumped in and out of this).

Where the substrate is from the transport roller 112 peeled off, the gas can flow into the gas discharge space, as will be described in more detail later, and become part of the gas discharge atmosphere.

About the contact pressure of the (e.g. metallic or metallized) substrate on the (e.g. jacket-surface-insulated) transport roller 112 In addition to being able to increase the contact pressure resulting from the belt tension, the roller housing 112h an electrical potential (also called a bias potential) voltage can be applied. For example, a first electrode can clearly be provided by means of the roller core, a dielectric can be provided by means of the ceramic roller jacket and a second electrode can be provided by means of the (eg metallic or metallized) substrate. The substrate can, for example, only be coated on one side or on both sides. Alternatively, for example, a first electrode can be provided by means of the metallic roller, a dielectric can be provided by means of the dielectric substrate and a second electrode can be provided by means of the metallic layer (eg on the front side of the substrate) on the substrate.

The gas pressure between the substrate and the roll cover 112m can be increased further without the substrate lifting off, which increases the heat transfer at the contact surface between substrate and cooling roller 112 can improve. If a critical pressure (defined by the size of the gap between the roll shell and the substrate and the mean free path) is exceeded, the heat transfer decreases again due to the increasing gas particle collisions, ie there is an optimum that is defined by the maximum of the Gas conductivity as a function of gas pressure. In clear terms, two effects overlap, one of which increases the heat transfer with the number of particles and the other decreases it. As many particles as possible can clearly be required in order to transport as much energy as possible from one interface to the other. However, too many particles increase the risk of particle collisions (eg if the mean free path <gap width), so that not all particles can transfer their absorbed energy. For example, above a certain pressure, the heat can mainly be transferred by convection (flow), which, however, reduces the heat transfer.

The role cover 112m can for this purpose, for example, have a dielectric (for example an oxide) or be formed therefrom, for example an oxide ceramic or a carbide ceramic. Alternatively or additionally, the roller cover 112m Aluminum and / or zirconium (Zr) or be formed therefrom, for example an oxide thereof. The dielectric can galvanically separate a substrate resting on it.

Due to the electrically insulating roll cover 112m can be a potential difference between the transport roller 112 and a metal-containing substrate, which can provide the increase in the contact pressure due to the electrostatic attraction caused thereby. For example, a breakdown voltage of the roll cover 112m be more than 1000 volts (V), e.g. more than about 2000 volts (V), or more than 3000 volts (V).

The vacuum arrangement 100 can also be a wave 118 have, by means of which the temperature control roller 112 (eg rotatable) is mounted, for example about an axis of rotation 111d around.

2 illustrates a vacuum arrangement 200 according to various embodiments in a schematic side view or cross-sectional view (with a viewing direction along the axis of rotation 111d) , e.g. the vacuum arrangement 100 .

According to various embodiments, the vacuum arrangement 200 a vacuum chamber housing 802k have, in which a vacuum can be generated and / or maintained. The wrapping and / or processing (eg coating) of the substrate 102 can according to various embodiments in the vacuum or the vacuum chamber housing 802k respectively. The vacuum chamber housing 802k can be set up for this purpose, for example, airtight, dust-tight and / or vacuum-tight. The vacuum chamber housing 802k can have one or more vacuum chambers. The or each vacuum chamber can have at least one vacuum area 306b , 308b , 302h , eg one or more than one processing area 306b , 308b and the gas discharge space described in more detail later 302h , exhibit.

Furthermore, the vacuum chamber housing 802k with a pump system 804 (having at least one rough vacuum pump and optionally at least one high vacuum pump).

The pump system 804 can be set up the vacuum chamber housing 802k , e.g. the or each at least one vacuum area 306b , 308b , 302h To withdraw gas, so that there is a vacuum (ie a pressure less than 0.3 bar) and / or a pressure in a range from approximately 1 mbar to approximately 10 ^-3 mbar (in other words fine vacuum) and / or a pressure in a range from about 10 ^-3 mbar to about 10 ^-7 mbar (in other words high vacuum) or a pressure of less than high vacuum, for example less than about 10 ^-7 mbar (in other words ultra-high vacuum) can be provided or can be provided.

Alternatively or additionally, the vacuum arrangement 200 a gas supply system 1716 with one or more than one gas supply. By means of the gas supply system 1716 can the vacuum chamber housing 802k , e.g. the or each vacuum area 306b , 308b , 302h , Gas may be supplied to form an atmosphere therein. Depending on the process / vacuum range to be carried out, the atmosphere can have a corresponding composition and / or a corresponding pressure. The gas to be supplied can, for example, comprise an inert gas or be formed from it. As an alternative or in addition, the gas to be fed in can comprise or be formed from a reactive gas, for example oxygen, nitrogen and / or hydrogen. The pressure in the or each vacuum area 306b , 308b , 302h can form from an equilibrium of gas, which is generated by means of the gas supply system 1716 fed and by means of the pump system 804 is withdrawn.

Furthermore, the vacuum chamber housing 802k be set up in such a way that the operating point at which the substrate is processed can be set or regulated, for example by means of a control device 508 , eg the gas pressure, the process temperature, the chemical gas composition, the electrostatic attraction, etc. In general, two vacuum ranges can exist 306b , 308b , 302h differ from one another in their working points, for example in their atmosphere, for example their composition and / or pressure.

For example, the control device 508 for controlling and / or regulating a voltage supply 806 , the gas supply system 1716 and / or the pumping system 804 be set up. By means of the power supply 806 can for example the transport roller 112 the bias potential be or will be provided. For example, the control device 508 to control and / or regulate the transport roller 112 coupled bias potential and / or the attraction force resulting therefrom, which the substrate 102 be conveyed. Alternatively or additionally, the control device 508 be set up to control and / or regulate a standard volume flow of process gas, which by means of the gas supply system 1716 and / or the temperature control roller 112 supplied and / or by means of the pump system 804 is withdrawn.

According to various embodiments, the control device 508 for controlling and / or regulating the temperature control device 1124 (eg having a heating device and / or the cooling device), so that a process temperature (eg the substrate 102 and / or the process gas), for example during processing (for example during coating), can be controlled and / or regulated. For example, the control device 508 be set up to control and / or regulate a thermal output, which by means of the temperature control device 1124 is supplied and / or withdrawn by means of this.

Furthermore, in the vacuum chamber housing 802k (eg in the first vacuum chamber) at least one processing device 306 , 308 , for example at least one coating device 306 , 308 , be arranged. The at least one coating device 306 , 308 can emit a gaseous coating material into the at least one processing area 306b , 308b be furnished into it. With the coating material can the substrate 102 be coated. According to various embodiments, the control device 508 for controlling and / or regulating the or each processing device 306 , 308 be set up, for example by this an amount of material and / or thermal energy (eg radiation energy) which per time in the direction 105 of the substrate 102 is emitted, controls and / or regulates.

Furthermore, the vacuum arrangement 200 at least one transport roller 112 (e.g. a gas cooling roller 112 ) and optionally several guide rollers 122 (e.g. pulleys) which have a transport path 111p provide along which the substrate 102 (e.g. a tape-shaped substrate) between the unwind roller 112a and the take-up roller 112b through the at least one processing area 306b , 308b is transported through it, for example in a transport direction (which is perpendicular to the axis of rotation 111d can be). A leadership role 122 can be set up the transport path 111p redirect.

Furthermore, passivating the roller cover 112m done by contaminating the roll cover 112m converted (e.g. oxidized or otherwise chemically reacted). The contamination can be from the roll cover dielectric 112m have different material (for example a parasitically deposited coating material and / or abrasion from the substrate), for example a metal of the substrate or a layer deposited on the front side of the substrate while the rear side of the substrate is processed. The impurity can be converted by means of a gas discharge. The formation of the gas discharge can include at least one electrode 304 ionize a working gas. The formation of the gas discharge or the ionization of the working gas can include on the at least one electrode 304 (e.g. between two electrodes 304 ) apply an electrical potential (also known as electrode potential). In other words, the gas discharge can be supplied with electrical energy, which by means of the at least one electrode 304 is fed.

Passivation of the roll cover 112m can generally comprise reducing an electrical conductivity of the contamination, for example to a value less than approximately 10 ^-6 Siemens per meter (S / m), for example less than approximately 10 ^-8 S / m. The passivated contamination (e.g. after conversion, e.g. the reaction product of a chemical reaction) can, for example, have a dielectric or be formed from it, e.g. an oxidic and / or carbidic compound (e.g. ceramic), e.g. a compound of the coating material and / or a metal of the Substrate. For example, the passivated impurity can comprise or be formed from a metal oxide. The passivated contamination can then be transferred to the transport roller 112 remain and become part of the roll cover 112m will.

In order to support the passivation, the gas discharge or the atmosphere of the gas discharge space 302h (also referred to as a gas discharge atmosphere) a reactive gas (eg oxygen) can be supplied, for example by means of a gas supply of the gas supply system 1716 . The or each electrode 304 can generate an electric field, which the gas discharge atmosphere or the gas discharge space 302h flooded. The electric field can, for example, be greater than about 1000 volts / meter (V / m), for example than about 2000 V / m or than 5000 V / m. The or each electrode can, for example, have a rod anode or be formed therefrom.

Depending on the pressure of the gas discharge atmosphere in which the at least one electrode 304 is arranged, the gas discharge can be a plasma discharge (for example at approximately 10 ^-3 mbar) or a Have a glow discharge (eg at about 10 ^-2 mbar). The gas discharge atmosphere can generally have a greater pressure and / or more reactive gas than the process atmosphere in the or each processing area 306b , 308b in which, for example, the coating takes place. In order for this difference to be maintained, the gas discharge space 302h from the or each processing area 306b , 308b by means of a gas separation structure 302 gas separated as described below.

3 illustrates a vacuum arrangement 300 according to various embodiments in a schematic side view or cross-sectional view (with a viewing direction along the axis of rotation 111d that are parallel to a rotation axis direction 101 is), e.g. the vacuum arrangement 100 or 200 . The role cover 112m may have a porous dielectric or be formed from it. In contrast, the roller housing 112h , which is the roll cover 112m carries, for example, be designed to be electrically conductive and / or comprise or be formed from a metal.

The transport path 111p , e.g. a first section 111a of which can be in a first area 301a to the transport roller 112 run up, for example in the direction of the transport roller 112 down. The transport path 111p , e.g. a second section 111b of which can be in a second area 301b from the transport roller 112 run away, for example in the direction of the transport roller 112 path. The first paragraph 111a and the second section 111b can for example have a distance from one another which is smaller than the diameter of the roll cover 112m .

The gas separation structure 302 can be between the first section 111a and the second section 111b be arranged. The gas discharge space 302h can thus be limited on the reverse side (then also as a cavity 302h from the first section 111a , the second section 111b , the gas separation structure 302 and the transport roller 112 . In other words, a can along the transport path 111p transported substrate the gas discharge space 302h physically limit on both sides. Due to the external limitation, the cavity 302h during operation of the vacuum arrangement 300 be gas-separated to the outside.

The gas separation clearly describes a difference in the gas pressure or in the gas composition between areas connected to one another by vacuum technology (e.g. gas-separated areas). The components (e.g. the parts of a gas separation structure) which contribute to the gas separation can be set up in such a way that the difference in gas pressure or in the gas composition between areas connected to one another by vacuum technology (e.g. gas-separated areas) can be maintained (e.g. stable). In other words, a gas exchange between vacuum-technically connected and gas-separated areas can be reduced, e.g. the greater the gas separation between the areas.

For example, more than 90% of the boundary of the cavity can be 302h be sealed vacuum-tight from its surroundings, for example by means of the gas separation structure 302 , the transport roller 112 and the substrate. Alternatively or additionally, the substrate can effect less than 50% of the seal.

In the cavity 302h can be one or more than one electrode 304 (In other words, at least one electrode) which is used to excite the gas discharge in the cavity 302h can be set up. Multiple electrodes 304 can provide at least one anode and one cathode for the gas discharge, for example. This achieves, for example, that the gas discharge is more local. Multiple electrodes 304 can, for example, enable the gas discharges to be excited by means of a bipolar voltage. For example, two electrodes that are assigned to one another 304 are periodically interchanged in their polarity, so that an electrical field formed between them is periodically inverted. It can thus be achieved that deposits on an electrode that is operated as an anode are removed when it is operated as a cathode (or vice versa). Thus, the life of the electrodes 304 elevated. Alternatively or in addition, several electrodes 304 make it easier to keep a difference in the effect of the gas discharge on the substrate between the two transport directions as small as possible. Alternatively or in addition, several electrodes 304 the interaction with the peripheral surface 1604o improve.

The gas separation structure 302 may generally have various components that make up the cavity 302h surround. For example, the gas separation structure 302 have a housing which is provided by means of one or more than one wall element. Optionally, the gas separation structure 302 and / or the gas discharge space 302h between several leadership roles 122 be arranged. Optionally, the gas separation structure 302 have one or more than one seal, which two adjoining components of the gas separation structure 302 vacuum-tight connects to each other. For example, a distance between the gas separation structure 302 and the transport path be smaller than about 1 cm (centimeters), for example as about 0.5 cm, as about 0.1 cm.

Here, for easier understanding, on exactly one electrode 304 can also be used for several electrodes 304 be valid.

4th illustrates a vacuum arrangement 400 according to various embodiments in a schematic side view or cross-sectional view (with a viewing direction along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 300 . The vacuum arrangement 400 can be one or more than one coating device 306 , 308 exhibit. The or each coating device 306 , 308 can be set up for thermal evaporation of the coating material and / or for atomizing the coating material. The coating device can be used for atomizing the coating material 306 , 308 for example, be set up to generate a plasma. For thermal evaporation, a coating device can have, for example, an electron beam gun, by means of which the coating material is heated.

5 illustrates a vacuum arrangement 500 according to various embodiments in a schematic side view or cross-sectional view (with a viewing direction along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 400 .

The vacuum arrangement 500 can be a gas exchange device 402 exhibit. The gas exchange device 402 may have one or more than one gas conduit inserted in the cavity 302h flows out. By means of the gas exchange device 402 can the cavity 302h Gas (more generally a gas mixture, also referred to as gas discharge gas) are supplied and / or withdrawn to form the gas discharge atmosphere in the cavity 302h . The supply and / or withdrawal of the gas discharge gas by means of the gas exchange device 402 can optionally be controlled and / or regulated, for example by means of the control device 508 . This enables the pressure inside the cavity 302h and / or a pressure differential of the cavity 302h to control and / or regulate its environment.

The cavity can be opened by means of a gas line 302h for example, the gas discharge gas can be supplied, ie a gas supply can be provided. The gas discharge gas can be supplied and / or mixed in, for example, from at least one gas source (for example a gas tank). Alternatively or additionally, the cavity 302h the gas discharge gas can be withdrawn by means of a gas line, ie a gas discharge can be provided. The gas discharge gas can, for example, by means of a pump 804 (e.g. a high vacuum pump).

A gas line can generally enable the intended exchange of gas by gas discharge gas being passed through the gas line. The gas line can for example have a tube, valves, hollow body in a solid body or the like and optionally one or more than one valve. The gas supply can for example by means of the gas outlet openings 112o the roll cover 112m be provided. For example, the transport roller 112 the gas discharge gas or at least a component thereof (for example an inert gas) are supplied, which comes from the gas outlet openings 112o exit. Alternatively or additionally, the gas supply can have one or more than one nozzle in the cavity 302h have, from which the gas discharge gas (eg diffuse) or at least a component thereof (eg a reactive gas) can emerge.

In other words, the gas discharge gas can have an inert gas and a reactive gas. The inert gas, for example argon, can be designed to be inert with respect to the substrate and / or the coating material. The reactive gas, for example oxygen, nitrogen and / or hydrogen, can be set up to react the impurity to form a dielectric, for example the dielectric of the roller cover 112m . The reaction of the contamination with the reactive gas can be stimulated, for example, by means of the gas discharge.

6th illustrates a vacuum arrangement 600 according to various embodiments in a schematic side view or cross-sectional view (with a viewing direction along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 500 .

The gas separation structure 302 can be one or more than one leadership role 122 have, which is set up, the transport path 111p in the first area 301a and / or the second area 302b redirect. This can make it possible to wrap it around more closely (denotes the angle along which the substrate and the transport roller 112 is in contact). One or more leadership roles 122 can for example the cavity 302h physically limit. Alternatively or additionally, the transport path 111p between the leadership role 122 and the cavity 302h be arranged. For example, a distance between the gas separation structure 302 and the or each of the leadership roles 122 be none than about 1 cm (centimeters), e.g., about 0.5 cm, than about 0.1 cm.

7th illustrates a vacuum arrangement 700 according to various embodiments in a schematic side view or cross-sectional view (with a viewing direction along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 600 .

The substrate 102 can with a first page 102a to the transport roller 112 created, e.g. with the roll cover 112m brought into physical contact, to be or to be. Optionally, the substrate 102 on the first page 102a already coated, for example with a first layer (also referred to as a back coating), before it comes into contact with the transport roller 112 comes. The substrate 102 can be on a second page 102b that the transport roller 112 is turned away, are coated in the at least one processing area 306b , 308b , e.g. with a second layer. The first layer and / or the second layer can comprise or be formed from a metal, for example copper.

Alternatively or additionally, the first layer and the second layer can have the same chemical composition. The first layer can optionally be multi-ply, e.g. having a copper layer and above it a copper-nickel layer (as passivation).

The substrate 102 can for example have a carrier which is in the at least one processing area 306b , 308b is coated with the coating material. The carrier can for example have a film or be formed from it. Alternatively or additionally, the carrier can have a dielectric or be formed from it, for example a plastic (eg PET and / or PI) or another polymer.

Generally the reel housing 112h a reference potential can be or will be provided, for example electrical ground 704 . The reference potential can, however, also be a different electrical potential, for example a potential that is positive with respect to electrical ground. In general, the voltage information herein can be related to the reference potential.

In relation to the reference potential, the substrate 102 be or become electrically charged, for example due to the coating process in the at least one processing area 306b , 308b . For example, the coating process can apply electrical charge carriers (for example electrons and / or ions) to the substrate 102 transferred (more generally also referred to as charge supply or electrical charge). The electrons can originate, for example, from an electron beam gun by means of which the coating material is vaporized.

The substrate 102 an electrical potential (also as substrate potential) can be provided due to the electrical charge. The substrate potential can differ from the reference potential. Because of this, the substrate 102 electrically (for example electrostatically) from the transport roller 112 be or will be attracted.

In general, the vacuum assembly 700 be set up in such a way that the substrate potential at least along the section of the substrate which is connected to the transport roller 112 is in contact is maintained. This is achieved, among other things, by means of the dielectric roller cover 112m which the substrate 102 galvanically from the reel housing 112h or the reference potential.

To the substrate 102 better off the transport roll 112 To be able to detach, the substrate potential in the first area can be achieved by means of the gas discharge 301a and / or second area 301b (more generally also referred to as charge withdrawal or electrical neutralization or discharge). The gas discharge can provide electrical charge carriers, which when in contact with the substrate 102 occur, the charging of the substrate 102 to reduce.

The electrical neutralization and / or electrical charging of the substrate can optionally be carried out 102 controlled and / or regulated, for example by means of the control device 508 . This enables the force of attraction to be adjusted.

To excite the gas discharge, the at least one electrode can 304 the electrode potential can be provided, for example of several hundred volts (V), for example of at least approximately 1000 V. The electrode potential can be provided by means of the voltage supply 806 be or will be provided. In general, the electrode potential may differ from that of the power supply 806 be provided by means of a mixed voltage (having a direct voltage and / or an alternating voltage). An alternating voltage can provide a continuous change in the electrode potential. In contrast, a DC voltage can be essentially invariant over time, at least in sections. Optionally, the voltage can be or will be pulsed, for example bipolar or unipolar pulsed.

For example, the polarity of the DC voltage can be reversed periodically, for example with a frequency (then also referred to as the polarity reversal frequency). Alternatively or additionally, the direct voltage can be or become pulsed, for example with the frequency (then also referred to as the pulse frequency). A pulsed / reversed DC voltage can provide an abruptly variable electrode potential. The frequency of the voltage (e.g. AC voltage frequency, polarity reversal frequency or pulse frequency) can be less than 1 MHz (megahertz), e.g. less than about 100 kHz (kilohertz), e.g. less than about 50 kHz, e.g. less than about 10 kHz, e.g. less than about 1 kHz.

The gas discharge atmosphere can for example have a pressure in a range from 10 ^-2 millibars (mbar) to approximately 10 ^-4 millibars. Alternatively or additionally, the gas discharge atmosphere can have at least the reactive gas or be formed therefrom, for example oxygen. The excess on the transport roller can be reached by means of the reactive gas 112 accumulated abrasion (eg a metal that is part of the backside coating) is converted into a dielectric. This can prevent the electrostatic attraction of the substrate from being inhibited by the abrasion. In other words, the operability in terms of electrostatic attraction of the substrate can be improved 102 be sustained longer.

8th illustrates a vacuum arrangement 800 according to various embodiments in a schematic detailed view (with a viewing direction along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 700 . The coating device 308 , 306 can for example be a crucible 814 have and / or on one of the gas separation structure 302 opposite side of the transport roller 112 be arranged. Optionally, the gas separation structure 302 have a cooling device, which is set up, the one wall element 302g the gas separation structure 302 to withdraw thermal energy.

9 illustrates a vacuum arrangement 900 according to various embodiments in a schematic detailed view (with a viewing direction along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 800 . Optionally, the or each electrode 304 one or more than one magnet 802 exhibit. This can improve the gas discharge. For example, the at least one electrode 304 Be part of a magnetron.

10 illustrates a procedure 1000 according to various embodiments in a schematic detailed view (with a viewing direction along the axis of rotation 111d) , e.g. to operate one of the vacuum arrangements 100 to 900 .

The procedure 1000 may have: in 1001, transporting a strip-shaped substrate in a first region to a transport roller and in a second region away from the transport roller; in 1003, optionally emitting a coating material to the transport roller for coating the substrate (lying against the transport roller) with the coating material; in 1005, excitation of a gas discharge which is arranged between the first region and the second region.

As previously described, the substrate can be electrostatically attracted to the transport roller. The force of attraction between the substrate and the transport roller can optionally be controlled and / or regulated, for example by means of the control device. The force of attraction can be mediated between the electrical potential of the substrate and the electrical potential of the transport roller, which are galvanically separated from one another by means of the dielectric.

As described above, the substrate and / or the transport roller can during transport 1001 be exposed to gas discharge. The gas discharge acting on the transport roller can convert contamination of the transport roller into a dielectric. The gas discharge acting on the substrate can cause an electrical neutralization of the substrate so that it can be detached from the transport roller more easily. Electrical neutralization can vividly reduce the force of attraction.

In other words, the procedure can 1000 in 1005: passivating part of the contamination of the transport roller, for example by converting it into a dielectric by means of the gas discharge, the substrate also being exposed to the gas discharge. A reactive gas, for example oxygen, can be fed to the gas discharge for conversion.

Various examples are described below that relate to those described above and shown in the figures.

Example 1 is a vacuum arrangement comprising: a transport roller, which has a dielectric roller cover, for providing a transport path in a first area to the roller cover and in a second area away from the roller cover, the roller cover, for example, having a porous dielectric; a gas separation structure providing a gas separated cavity, the cavity extending from the transport path in the first region to the transport path in the second region and being adjacent to the roller cover; an electrode for exciting a gas discharge, the electrode being arranged in the cavity.

Example 2 is a vacuum arrangement, comprising: a transport roller for providing a transport path in a first area towards the roller cover and in a second area away from the roller cover, the roller cover being dielectric wherein the roller cover comprises, for example, a porous dielectric; two electrodes (ie one electrode and one additional electrode) for exciting a gas discharge, the two electrodes being arranged between the transport path in the first region and the transport path in the second region; and optionally a gas separation structure which provides a gas separated cavity, the cavity extending from the transport path in the first area to the transport path in the second area and adjoining the roller cover.

Example 3 is a vacuum arrangement, comprising: a transport roller, which has a peripheral surface (e.g. of the roller housing), for providing a transport path in a first area towards the peripheral surface and in a second area away from the peripheral surface, wherein a dielectric layer ( eg as part of the roll cover) is provided; a gas separation structure providing a gas separated cavity, the cavity extending from the transport path in the first region to the transport path in the second region and adjoining the dielectric layer; an electrode for exciting a gas discharge, the electrode being arranged in the cavity.

Example 4 is the vacuum arrangement according to one of Examples 1 to 3, further comprising: a coating device for emitting a coating material towards the transport roller, the coating device having, for example, an electron beam source.

Example 5 is the vacuum arrangement according to any one of claims 1 to 4, wherein the gas separation structure has one or more than one wall element which delimits the cavity.

Example 6 is the vacuum arrangement according to one of Examples 1 to 5, further comprising: a gas supply for supplying one or more than one gas into the cavity, wherein, for example, the gas supply is set up to supply a first gas (e.g. inert gas) through the roller cover and / or to supply a second gas (eg a reactive gas) through an outlet opening (eg nozzle) spatially separated from the transport roller.

Example 7 is the vacuum arrangement according to Example 6, wherein the gas has a reactive gas, wherein, for example, the reactive gas is set up to react with a metal of the substrate and / or with the coating material to form a dielectric, wherein, for example, the gas supply has a reactive gas source which has the Has reactive gas.

Example 8 is the vacuum arrangement according to one of Examples 1 to 7, further comprising: one or more than one guide roller for guiding the transport path to and / or away from the transport roller, for example a first guide roller within the first area and / or a second guide roller is arranged within the second region, and / or wherein the gas separation structure is arranged between two guide rollers of the more than one guide roller.

Example 9 is the vacuum arrangement according to one of Examples 1 to 8, the transport roller having a temperature control device (e.g. a cooling device) which is set up to supply and / or withdraw thermal energy from the roller cover.

Example 10 is the vacuum arrangement according to one of Examples 1 to 9, further comprising: an additional electrode assigned to the electrode within the cavity, wherein, for example, the electrode and the additional electrode are interconnected in such a way that they provide an anode and a cathode during operation.

Example 11 is the vacuum arrangement according to one of Examples 1 to 10, further comprising: a voltage supply which is set up to apply a voltage to the electrode, the voltage being, for example, a mixed voltage and / or pulsed, e.g. bipolar or unipolar pulsed.

Example 12 is the vacuum arrangement according to any one of Examples 1 to 11, wherein the electrode has one or more than one magnet for providing a magnetic field within the gas separation housing.

Example 13 is the vacuum arrangement according to one of Examples 1 to 12, further comprising: a control device which is set up to provide a pressure within the cavity in a range from approximately 10 ^-2 mbar to approximately 10 ^-4 (eg 10 ^-3 ); and / or to provide an additional pressure next to the gas separation structure (eg outside the cavity) on the transport path, wherein a ratio between the pressure inside the cavity and the additional pressure is more than about 10 (eg than 50).

Example 14 is the vacuum arrangement according to one of Examples 1 to 13, the transport path and / or the roller cover being exposed to the gas discharge.

Example 15 is the vacuum arrangement according to any one of Examples 1 to 14, wherein the roll cover comprises or is formed from a layer of the dielectric (i.e. a dielectric layer).

Example 16 is the vacuum arrangement according to one of Examples 1 to 15, wherein the gas separation structure is set up to gas-separate the gas discharge from an exterior of the gas separation structure; and / or to provide a ratio between the pressure within the cavity and an additional pressure on the gas separation structure outside the cavity of greater than about 10 (e.g., than 50).

Example 17 is the vacuum arrangement according to any one of Examples 1 to 16, wherein the cavity is delimited on opposite sides by the gas separation structure and the roller cover; and / or is limited by the transport path in the first area and the second area.

Example 18 is the vacuum arrangement according to any one of Examples 1 to 17, wherein the coating device is a physical coating device.

Example 19 is the vacuum arrangement according to one of Examples 1 to 18, the gas separation structure having a cooling device which is set up to extract thermal energy.

Example 20 is the vacuum arrangement according to one of Examples 1 to 19, further comprising: a control device which is configured to control an electrical attraction force between a substrate transported along the transport path and the transport roller.

Example 21 is the vacuum arrangement according to Example 20, wherein the control device is set up to provide the substrate with a first electrical potential and the transport roller with a different second electrical potential, for example an electrical field between the first electrical potential and the second electrical potential penetrating the roller cover , wherein, for example, the force of attraction between the first electrical potential and the second electrical potential is mediated.

Example 22 is a method, e.g. for operating the vacuum arrangement according to one of Examples 1 to 21, the method comprising: transporting a strip-shaped substrate in a first area to a transport roller and in a second area away from the transport roller, the substrate being electrically (e.g. electrostatically) attracted by the transport roller becomes; optionally emitting a coating material to the transport roller for coating the substrate with the coating material; Exciting a gas discharge between the first region and the second region, the substrate and the transport roller being exposed to the gas discharge; and wherein a reactive gas is supplied to the gas discharge, the reactive gas being set up, for example, to passivate the coating material and / or a metal of the substrate (to react to form a dielectric).

Example 23 is a method e.g. according to example 22 and / or for operating the vacuum arrangement according to one of examples 1 to 21, comprising the method: transporting a strip-shaped substrate by means of a transport roller; optionally emitting a coating material to the transport roller for coating the substrate transported by means of the transport roller with the coating material; Converting part of the coating material, which has been deposited on the transport roller, into a dielectric by means of a gas discharge to which the substrate is exposed.

Example 24 is the method according to Example 22 or 23, wherein the excitation of the gas discharge takes place by means of a voltage (e.g. a mixed voltage), the voltage being for example pulsed, e.g. bipolar and / or unipolar pulsed.

Example 25 is the process according to any of Examples 22 to 24, wherein the substrate comprises (e.g., coated with) or is formed from a metal, the metal being disposed on, for example, a polymer of the substrate.

Example 26 is the method according to any one of Examples 22 to 25, wherein emitting a coating material comprises evaporating the coating material by means of an electron beam.

Example 27 is the method according to any of Examples 22 to 26, wherein an electrical potential of the substrate differs from an electrical potential of the transport roller.

Example 28 is the use of one (ie the same) electrode for the simultaneous electrical discharge (neutralization) of a substrate and electrical passivation of a transport roller, the passivation comprising, for example, forming a dielectric on the transport roller (eg its outer surface), which comprises, for example, discharging to reduce a potential difference between the substrate and the transport roller (eg electrical ground).

Claims (11)

A vacuum arrangement (100 to 900), comprising: a transport roller (112), which has a dielectric roller cover (112m), for providing a transport path (111p) in a first area (301a) to the roller cover (112m) and in one second region (301b) away from the roll cover (112m); • a gas separation structure (302) which provides a gas-separated cavity (302h), the cavity (302h) extending from the transport path (111p) in the first region (301a) to the transport path (111p) in the second region (301b) and adjacent to the roll cover (112m); • an electrode (304) for exciting a gas discharge, the electrode (304) being arranged in the cavity (302h). Vacuum arrangement (100 to 900) according to Claim 1 , further comprising: a coating device (306, 308) for emitting a coating material towards the transport roller (112). Vacuum arrangement (100 to 900) according to Claim 1 or 2 , wherein the gas separation structure (302) has one or more than one wall element which delimits the cavity (302h). Vacuum arrangement (100 to 900) according to one of the Claims 1 to 3 , further comprising: a gas supply (402) for supplying a gas into the cavity (302h). Vacuum arrangement (100 to 900) according to Claim 4 , wherein the gas supply (402) is set up to supply the gas through the roller cover (112m). Vacuum arrangement (100 to 900) according to one of the Claims 1 to 5 , wherein the transport roller (112) has a temperature control device (1124) which is set up to supply and / or withdraw thermal energy from the roller casing (112m). Vacuum arrangement (100 to 900) according to one of the Claims 1 to 6th , further comprising: an additional electrode (304) associated with the electrode (304) within the cavity (302h). Vacuum arrangement (100 to 900) according to Claim 7 , wherein the electrode (304) and the additional electrode (304) are interconnected in such a way that they provide an anode and a cathode during operation. Vacuum arrangement (100 to 900), comprising: • a transport roller (112) for providing a transport path (111p) in a first area (301a) to the roll cover (112m) and in a second area (301b) away from the roll cover (112m), the roll cover (112m) a Having dielectric; • two electrodes (304) for exciting a gas discharge, the two electrodes (304) being arranged between the transport path (111p) in the first area (301a) and the transport path (111p) in the second area (301b). Method (1000), comprising: • Transporting (1001) a strip-shaped substrate (102) in a first area (301a) to a transport roller (112) and in a second area (301b) away from the transport roller (112), wherein the substrate is electrically removed from the transport roller (112 ) is tightened; • excitation (1005) of a gas discharge between the first area (301a) and the second area (301b), the substrate (102) and the transport roller (112) being exposed to the gas discharge, a reactive gas being supplied to the gas discharge. Using an electrode (304) in a vacuum for the simultaneous electrical discharge of a substrate (102) and electrical passivation of a transport roller (112) by means of a gas discharge.

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