DE202021100664U1 - Vacuum arrangement - Google Patents

Abstract

Vacuum arrangement (100 to 1400), comprising:
• a transport roller (112) for providing a transport path (111p) in a first area (301a) to the roll cover (112m) and in a second area (301b) away from the roll cover (112m), wherein the roll cover (112m) a Having dielectric;
• at least one electrode (304) for exciting a gas discharge, which is arranged between the transport roller (112) and the transport path (111p) in the first area (301a) or the transport path (111p) in the second area (301b);
• wherein the at least one electrode (304) has a non-magnetic tube.

Description

Various embodiments relate to a vacuum arrangement.

In general, a substrate can be treated (processed), e.g. coated, in such a way that the chemical and / or physical properties of the substrate can be changed. Various coating processes can be used to coat a substrate, such as, for example, a vapor deposition, e.g. a chemical vapor deposition (CVD) or a physical vapor deposition (PVD). One method of PVD is, for example, electron beam evaporation (EBPVD), i.e. the evaporation of a coating material using an electron beam. For example, a metal can be evaporated in a vacuum and deposited on a non-metallic substrate (e.g. made of polyethylene terephthalate - PET) in order to metallize it.

When metallizing (or more generally when coating) the substrate by means of EBPVD, the bombardment with backscattered electrons from the process space can result in an electrical charge of the substrate. When an insulating layer, for example made of SiO ₂ , is deposited, the substrate and the layer can be charged. The potential difference between the metallic grounded roller surface and the thus negatively charged substrate can lead to an electrostatic attraction between the substrate (eg a foil) and the roller. Electrons in a metallic layer, for example, lead to the charging of the latter, provided that the belt run (ie the rollers contacting the layer) are insulated. On the other hand, some of the high-energy electrons remain in the insulating substrate itself, for example, so that it is negatively charged. The substrate can serve as an insulator between the electrically conductive layers. This additional force (in addition to belt tension) increases the contact pressure between the substrate and the roller and thus also the effective removal of the process heat absorbed by the substrate in the coating window (e.g. heat of condensation, radiant heat, particle energy) to a cooling roller, which reduces the thermal stress on the substrate.

To ensure stable transport of the substrate, it may be necessary to discharge the substrate in a targeted manner in the area of the gusset between the roller and the outflowing substrate. Conventionally, a specific neutralization of the substrate is brought about by igniting a glow discharge. For this purpose, for example, a stick electrode in the area of the expiring gusset between the substrate and the process roller can be subjected to a voltage (approx. +1000 V), which ionizes an inert gas that is specifically admitted or escapes between the substrate and the roller (i.e. a plasma is formed). Ions accelerated in the area of the cathode fall hit the substrate and thus contribute to the discharge.

According to various embodiments, a vacuum arrangement is provided which clearly requires particularly little installation space. This clearly achieves that the electrode can be arranged as close as possible to the point at which the substrate and the transport roller come into contact with one another or separate from one another. This clearly enables the substrate to be unloaded as directly as possible on the transport roller, which inhibits the formation of wrinkles or any other disruption to the transport of the substrate. For example, an electrode generating a magnetic field is provided for this purpose.

This achieves (e.g. compared to an electrode without a magnetic field) that the ignition pressure of the gas discharge and / or the operating pressure (to maintain the gas discharge) can be lower, the gas discharge consumes less power (e.g. with the same amperage of the discharge current), a higher plasma density ( eg with the same power) is achieved, the gas discharge can be maintained at a lower operating pressure and / or lower discharge voltage, which reduces the erosion of the electrode (eg with the same amperage of the discharge current). Furthermore, the magnet system and thus the plasma zones can be shifted, which results in a longer service life of the electrode. By tensioning the electrode, sagging of the electrode can be inhibited, which allows a lighter construction without additional support.

• 1 bis 14A eine Vakuumanordnung gemäß verschiedenen Ausführungsformen in verschiedenen schematischen Ansichten; und
• 14B bis 14D verschiedene Formen von Magneten gemäß verschiedenen Ausführungsformen in verschiedenen schematischen Perspektivansichten.

Show it

• 1 to 14A a vacuum arrangement according to various embodiments in various schematic views; and
• 14B to 14D different shapes of magnets according to different embodiments in different schematic perspective views.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof, and in which there is shown, for purposes of illustration, specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "back", etc. is used with reference to the orientation of the character (s) being described. As components of embodiments are positioned in a number of different orientations Directional terminology is used for purposes of illustration and is in no way limiting. It goes without saying that other embodiments can be used and structural or logical changes can be made without departing from the scope of protection of the present invention. It goes without saying that the features of the various exemplary embodiments described herein can be combined with one another, unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

In the context of this description, the terms “connected”, “connected” and “coupled” are used to describe both a direct and an indirect connection (e.g. ohmic and / or electrically conductive, e.g. an electrically conductive connection), a direct or indirect connection as well as a direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference symbols, insofar as this is appropriate.

Controlling can be understood as an intentional influencing of a system. The state of the system can be changed according to a specification. Regulation can be understood as controlling, whereby a change in the state of the system due to disturbances is also counteracted. The controller can clearly have a forward-facing control path and thus clearly implement a sequence control which converts an input variable into an output variable. The control path can, however, also be part of a control loop, so that regulation is implemented. In contrast to the pure forward control, the regulation has a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback). In other words, a regulation can be used as an alternative or in addition to the control, or regulation can take place as an alternative or in addition to the control. In the case of regulation, an actual value of the controlled variable (e.g. determined based on a measured value) is compared with a reference value (a setpoint value or a specification or a preset value) and the controlled variable can accordingly be adjusted by means of a manipulated variable (using an actuator) can be influenced so that there is as little deviation as possible of the respective actual value of the controlled variable from the reference value. The input variable can thus be a measured variable of the system to be controlled / regulated.

Small (e.g. irregularly distributed) cavities in a solid can be referred to as pores. The cavities can extend into the solid body and / or form an interconnected network, e.g. extending through it, so that the solid body becomes gas-permeable. Micropores can have an extension (e.g. pore diameter) of less than about 2 nm. Mesopores can have an extension in the range from approximately 2 nm to approximately 50 nm. Macropores, can be greater than about 50 nm in size and, for example, less than 1 micrometer (µm). The dimension of a pore can be understood as the diameter of a sphere which has the same volume as the pore. Thus, a heterogeneous mixture of the solid and a fluid (e.g. gaseous and / or liquid material) which is arranged in the pores of the solid can be formed.

According to various embodiments, a substrate may be transported as a tape (also referred to as a tape substrate) from roll-to-roll (i.e., wrapped between the wrap-around rolls). The tape substrate can, for example, have a width (extension transverse to the transport direction) in a range from approximately 1 cm (e.g. 30 cm) to approximately 500 cm or a width (also referred to as the substrate width) of more than approximately 500 cm. Furthermore, the tape substrate can be flexible. A tape substrate can clearly be any substrate that can be wound onto a roll and / or, for example, can be processed from roll-to-roll. Depending on the elasticity of the material used, the tape substrate can have a material thickness (also referred to as substrate thickness) in a range from approximately a few micrometers (eg from approximately 1 μm) to approximately a few millimeters (eg up to approximately 10 mm), eg in a range from approximately 0.01 mm to approximately 3 mm and / or in a range from approximately 3 µm (micrometers) to approximately 1 mm (eg for a PVD application). The wrapping can take place along a transport path by means of a multiplicity of transport rollers which, for example, can be axially longer than the width of the tape substrate.

According to various embodiments, a substrate (eg a tape substrate) may have or be formed from at least one of the following: a ceramic, a glass, a semiconductor, a metal, a polymer (eg plastic) and / or a mixture of different materials, such as a Composite material (e.g. carbon-fiber-reinforced-carbon, or carbon-fiber-reinforced-plastic). For example, the substrate can comprise or be formed from a plastic film, a semiconductor film, a metal film and / or a glass film, and optionally be or are coated, for example with a coating material. Alternatively or additionally, the substrate can for example have fibers, e.g. glass fibers, Carbon fibers, metal fibers, plant fibers (paper) and / or plastic fibers, for example in the form of a woven fabric, a net, a knitted fabric, a knitted fabric or as a felt or fleece. The substrate can for example have a flexible substrate material. For example, the substrate can have a polymer film (made of PET or polyimide-PI) or be formed from it. As an alternative or in addition, the substrate can have a metal foil (for example made of aluminum or steel) or be formed therefrom.

According to various embodiments, the coating material can comprise or be formed from a metal, for example copper.

In the context of this description, the term “metallic” can be understood as having or formed from a metal or having an electrical conductivity of more than 10 ⁶ S / m. In the context of this description, a metal (also referred to as a metallic material) can have at least one metallic element (ie one or more metallic elements) (or be formed therefrom), e.g. at least one element from the following group of elements: copper (Cu), Iron (Fe), titanium (Ti), nickel (Ni), silver (Ag), chromium (Cr), platinum (Pt), gold (Au), magnesium (Mg), aluminum (Al), zirconium (Zr), Tantalum (Ta), molybdenum (Mo), tungsten (W), vanadium (V), barium (Ba), indium (In), calcium (Ca), hafnium (Hf), samarium (Sm), silver (Ag), and / or lithium (Li). Furthermore, a metal can have a metallic compound (for example an intermetallic compound or an alloy) or be formed therefrom, for example a compound of at least two metallic elements (for example from the group of elements), such as bronze or brass, or for example a compound of at least one metallic element (eg from the group of elements) and at least one non-metallic element (eg carbon), such as steel.

A transport roller can, depending on the purpose and configuration, be or be designed differently. For example, a transport roller can be set up as (e.g. active or passive) guiding and / or deflection of the transport path, for temperature control (e.g. cooling) or driving the substrate transport. Such a transport roller for tempering (also referred to as a tempering roller), e.g. a cooling roller, can be driven, for example, and its rotation can drive the substrate transport. The temperature control roller can have a ceramic surface, for example, which can be sprayed on, for example.

The outer surface (also enveloping surface or circumferential surface) of a body can be understood as the (e.g. circumferential) surface that is created, for example, in a cylindrical body by rotating a line around an axis of rotation. The outermost circumferential surface of a transport roller, which is exposed and on which the substrate is intended to rest, can also be referred to as the substrate support surface. Thermal energy can be supplied to and / or withdrawn from the substrate (more generally also referred to as temperature control) by means of the substrate support surface.

According to various embodiments, a substrate discharge is provided independently of a transport direction in the vacuum coating system, for example after the substrate (e.g. comprising PET) has been coated on the transport roller (e.g. with a metal) by means of a PVD process (e.g. EBPVD). For example, the substrate front side can already be coated. Optionally, the back of the substrate can be coated (e.g. with one or the metal). In order to generate an electrostatic attraction between the substrate and the transport roller in this case as well, the process roller can have a positive potential (also referred to as a bias voltage) applied to the substrate. For electrical insulation between the transport roller and the substrate, the outer surface of the transport roller can have a dielectric coating (also referred to as a dielectric roller cover).

According to various embodiments, the detachment of the substrate from the process roller can be facilitated in the event that the substrate has a rear-side coating. In continuous coating operation, metallic deposits (e.g. due to abrasion) can occur on the dielectric surface of the transport roller, as a result of which the electrical field of the transport roller is locally shielded. As a result, surface pressing of the substrate against the transport roller on the basis of electrostatic attraction can no longer be ensured reliably and with full strength, which can increase the heat transfer resistance between the substrate and the transport roller, e.g. at the resulting defects. For example, the substrate can be locally thermally damaged by the heat flow of the coating process that has built up as a result.

The substrate can be unwound on a substrate roll by means of a winding roller, guided along the transport path and subsequently wound up by means of a winding roller (also referred to as wrapping). The space enclosed by the substrate and the transport roller (also referred to as gas discharge space) can be shielded and / or pressure-separated at the end as well as possible from the substrate roll in the winding space by means of one or more than one separation plate (as part of a gas separation structure). By means of the gas separation structure, there can be sufficient gas separation for the winding space and for the process the required working pressure of the coating must be provided.

Furthermore, a gas discharge unit (e.g. glow discharge unit or magnetron) can be arranged in the gas discharge space between the gussets. The gas discharge unit can have one or more than one electrode. The removal of the substrate can be facilitated by means of a stationary gas discharge (e.g. a glow discharge or plasma discharge) on an open section of the transport roller (e.g. limited by the gusset between the incoming or outgoing substrate and the outer surface). The substrate can, for example, be guided on the process roller by means of electrostatic attraction. Optionally, the gas discharge unit can have a magnetic field tunnel to extend the duration of the electrons' stay in the plasma space.

According to various embodiments, the gas discharge unit can have exactly one or two electrodes (e.g. for AC operation). Optionally, the two electrodes can be connected alternately as anode or cathode, i.e. the polarity can be reversed. In the AC operation (alternating voltage operation), an alternating voltage can be applied between the two electrodes (i.e. their potential difference can be the alternating voltage). A frequency of the alternating voltage can be, for example, in a range from approximately 100 Hertz (Hz) to approximately 100 kHz (also referred to as AC-MF). As an alternative to AC operation, direct voltage operation (DC operation) can be used. Optionally, the DC voltage can be pulsed between the two electrodes, e.g. bipolar or unipolar. The voltage between the two electrodes (e.g. their amplitude) can be in a range from about 1 kV to about 5 kV.

For example, an atmosphere (also referred to as a gas discharge atmosphere) can be or can be provided in the gas discharge space which a working gas (ie the plasma-forming gas) can have. A process pressure in the gas discharge space (also referred to as discharge pressure) can, for example, be in a range from approximately 1 · 10 ^-2 mbar (millibars) to approximately 5 · 10 ^-4 mbar. The working gas can, for example, comprise an inert gas (for example argon) or be formed from it. For this purpose, a gas supply to the gas discharge space can be provided, for example to the diffuse gas inlet via a nozzle tube. The gas discharge can take place by means of the working gas. Optionally, a reactive gas can be added to the atmosphere. The reactive gas can, for example, contain oxygen or be formed from it. The ratio between reactive gas and working gas can for example be controlled and / or regulated, for example by means of a control device. The gas discharge atmosphere can, for example, cause a chemical conversion of a metal deposit / abrasion (also referred to as contamination) on the transport roller into a dielectric metal oxide.

According to various embodiments, the detachment behavior of the substrate from the transport roller can be supported (e.g. ensured) during both the front and the rear side coating. For example, by controlling the ratio between reactive gas and working gas in the gas discharge space, a chemical conversion of metallic deposits on the outer surface of the transport roller can be achieved, whereby the substrate cooling on a transport roller by means of the bias voltage (general bias potential) ensures long-term stability over the duration of the campaign can be.

1 illustrates a vacuum arrangement 100 according to various embodiments in a schematic side view or cross-sectional view.

The vacuum arrangement 100 can be a transport roller 112 have, for example, as a temperature control roller 112 is set up. A transport role 112 which is set up to control the temperature of the substrate, ie to withdraw thermal energy from it and / or to supply it, can also be used here as a temperature control roller 112 (e.g. a gas cooling roller 112 or gas cooling roller). The temperature control roller can be used to control the temperature of the substrate 112 for example a temperature control device 1124 have, which is optionally set up, the substrate in a thermally conductive manner to the transport roller 112 to be coupled, as will be described in more detail later. The gas cooling roller 112 can be set up for thermal coupling of the substrate by means of a gas.

The transport role 112 can be a (e.g. cylindrical) roller cover 112m (also referred to as roller jacket or outer jacket). The temperature control roller can be a roller housing 112h have on which the roll cover 112m is upset. The role cover 112m can be a substrate support surface 1604o (also called the outer circumferential surface 1604o designated) on which the substrate is to rest.

The temperature control device 1124 can optionally have a fluid supply 114 have, for example a gas supply 114 . The gas supply 114 can have a variety of gas outlet openings 112o (also called openings 112o designated), which, for example, statistically and / or irregularly on the outer, exposed, substrate support surface 1604o the roll cover 112m can be arranged and / or spatially distributed. For example, the roll cover 112m have a porous layer or be formed therefrom, which surrounds the roller housing and whose pores the gas outlet openings 112o provide. By means of the gas supply 114 can a gas through the gas outlet openings 112o through between the substrate and the roll cover 112m be introduced, which the substrate thermally with the roll cover 112m couples (also known as heat coupling).

The fluid supply 114 can optionally have a cooling fluid supply 116 fluid-conducting (eg liquid-conducting) with the gas outlet openings 112o connect. The cooling fluid supply 116 (eg their gas supply and / or their liquid supply) can, for example, at least one pump 116r and / or at least one pipeline 116r exhibit. By means of the cooling fluid supply 116 can the transport roller 112 a cooling fluid can be supplied during operation, for example the gas and / or a liquid. The fluid supply 114 can have a gas supply (for supplying the gas) and / or a liquid supply (for supplying the liquid) or be formed therefrom.

A cooling device of the temperature control device can be used by means of the liquid 1124 (see. 2 ) are supplied, which of the roll cover 112m withdraws thermal energy. The gas can flow out of the gas outlet openings 112o step out. The gas supply 114 can, for example, radial lines 120 have, which the cooling fluid supply 116 with the cooling device and / or the gas outlet openings 112o Connect fluidly. The cooling fluid supply can be clearly illustrated 116 also provide both the gas to exit the gas outlet openings and the liquid coolant (which is pumped into and out of the cooling roller via the flow and return).

Where the substrate is from the transport roller 112 peeled off, the gas can flow into the gas discharge space, as will be described in more detail later, and become part of the gas discharge atmosphere.

About the contact pressure of the (e.g. metallic or metallized) substrate on the (e.g. jacket-surface-insulated) transport roller 112 In addition to being able to increase the contact pressure resulting from the belt tension, the roller housing 112h be applied with an electrical potential (also called bias potential) or with a voltage. Clearly, for example, a first electrode can be provided by means of the roll core, a dielectric can be provided by means of the ceramic roll jacket, and a second electrode can be provided by means of the (eg metallic or metallized) substrate. The substrate can, for example, only be coated on one side or on both sides. Alternatively, for example, a first electrode can be provided by means of the metallic roller, a dielectric can be provided by means of the dielectric substrate and a second electrode can be provided on the substrate by means of the metallic layer (eg on the front side of the substrate).

The role cover 112m can for example have a dielectric (for example an oxide) or be formed therefrom, for example an oxidic ceramic or a carbidic ceramic. Alternatively or additionally, the roller cover 112m Aluminum and / or zirconium (Zr) or be formed therefrom, for example an oxide thereof. The dielectric can galvanically separate a substrate lying on it.

Through the electrically insulating roll cover 112m can be a potential difference between the transport roller 112 and a metal-containing substrate, which can provide the increase in the contact pressure due to the electrostatic attraction caused thereby. For example, a breakdown voltage of the roll cover 112m be more than 1000 volts (V), e.g. more than about 2000 volts (V), or more than 3000 volts (V).

The vacuum arrangement 100 can also be a wave 118 have, by means of which the temperature control roller 112 (eg rotatable) is mounted, for example about an axis of rotation 111d around.

2 illustrates a vacuum arrangement 200 according to various embodiments in a schematic side view or cross-sectional view (looking along the axis of rotation 111d) , e.g. the vacuum arrangement 100 .

According to various embodiments, the vacuum arrangement 200 a vacuum chamber housing 802k have, in which a vacuum can be generated and / or maintained. The wrapping and / or processing (eg coating) of the substrate 102 can according to various embodiments in the vacuum or the vacuum chamber housing 802k respectively. The vacuum chamber housing 802k can be set up for this purpose, for example, airtight, dust-tight and / or vacuum-tight. The vacuum chamber housing 802k can have one or more vacuum chambers. The or each vacuum chamber can have at least one vacuum area 306b , 308b , 302h , e.g. one or more than one processing area 306b , 308b and the gas discharge space described in more detail later 302h , exhibit.

Furthermore, the vacuum chamber housing 802k with a pump system 804 (having at least one rough vacuum pump and optionally at least one high vacuum pump). The pump system 804 can be set up the vacuum chamber housing 802k , e.g. the or each at least one vacuum area 306b , 308b , 302h To withdraw gas, so that there is a vacuum (ie a pressure less than 0.3 bar) and / or a pressure in a range from approximately 1 mbar to approximately 10 ^-3 mbar (in other words fine vacuum) and / or a pressure in a range from approximately 10 ^-3 mbar to approximately 10 ^-7 mbar (in other words high vacuum) or a pressure less than high vacuum, for example less than approximately 10 ^-7 mbar (in other words ultra-high vacuum).

Alternatively or additionally, the vacuum arrangement 200 a gas supply system 1716 with one or more than one gas supply. By means of the gas supply system 1716 can the vacuum chamber housing 802k , e.g. the or each vacuum area 306b , 308b , 302h , Gas may be supplied to form an atmosphere therein. Depending on the process / vacuum range to be carried out, the atmosphere can have a corresponding composition and / or a corresponding pressure. The gas to be supplied can, for example, comprise an inert gas or be formed from it. As an alternative or in addition, the gas to be fed in can comprise or be formed from a reactive gas, for example oxygen, nitrogen and / or hydrogen. The pressure in the or each vacuum area 306b , 308b , 302h can form from an equilibrium of gas, which by means of the gas supply system 1716 fed and by means of the pump system 804 is withdrawn.

Furthermore, the vacuum chamber housing 802k be set up in such a way that the operating point at which the substrate is processed can be set or regulated, for example by means of a control device 508 , e.g. the gas pressure, the process temperature, the chemical gas composition, the electrostatic attraction, etc.

For example, the control device 508 for controlling and / or regulating a voltage supply 806 , the discharge pressure, the gas supply system 1716 and / or the pumping system 804 be set up. By means of the power supply 806 can for example the transport roller 112 the bias potential can be or will be provided. For example, the control device 508 to control and / or regulate the transport roller 112 coupled bias potential and / or the attraction force resulting therefrom, which the substrate 102 is conveyed, be set up. Alternatively or additionally, the control device 508 be set up to control and / or regulate a standard volume flow of process gas, which by means of the gas supply system 1716 and / or the temperature control roller 112 supplied and / or by means of the pump system 804 is withdrawn.

According to various embodiments, the control device 508 for controlling and / or regulating the temperature control device 1124 (for example having a heating device and / or the cooling device) so that a process temperature (for example of the substrate 102 and / or the process gas), for example during processing (for example during coating), can be controlled and / or regulated. For example, the control device 508 be set up to control and / or regulate a thermal output, which by means of the temperature control device 1124 is supplied and / or withdrawn by means of this.

Furthermore, in the vacuum chamber housing 802k (eg in the first vacuum chamber) at least one processing device 306 , 308 , for example at least one coating device 306 , 308 , be arranged. The at least one coating device 306 , 308 can emit a gaseous coating material into the at least one processing area 306b , 308b be set up in it. With the coating material can the substrate 102 be coated. According to various embodiments, the control device 508 for controlling and / or regulating the or each processing device 306 , 308 be set up, for example by adding an amount of material and / or thermal energy (eg radiation energy) which per time in the direction 105 of the substrate 102 is emitted, controls and / or regulates.

Furthermore, the vacuum arrangement 200 at least one transport roller 112 (e.g. a gas cooling roller 112 ) and optionally several guide rollers 122 (eg pulleys) which have a transport path 111p provide along which the substrate 102 (e.g. a tape-shaped substrate) between the unwinding roller 112a and the take-up roller 112b through the at least one processing area 306b , 308b is transported through it, for example in a transport direction (which is perpendicular to the axis of rotation 111d can be). A leadership role 122 can be set up the transport path 111p redirect.

The formation of the gas discharge (also referred to as an interstitial gas discharge) can involve at least one electrode 304 ionize a working gas. In the case that exactly one (for example tubular or magnet-containing) electrode 304 is present (e.g.), the electrical system ground (e.g. parts of the gas separation 302 ) provide the corresponding counter electrode.

Optionally, the control device 508 be set up to control and / or regulate the gas discharge. The formation of the gas discharge or the Ionizing the working gas can have on the at least one electrode 304 (e.g. between two electrodes 304 ) apply an electrical potential (also known as electrode potential). In other words, the gas discharge can be supplied with electrical energy, which by means of the at least one electrode 304 is fed. The at least one electrode can preferably 304 (eg several electrodes) can be or will be arranged in just one gusset (eg on the output side).

The or each electrode 304 can generate an electric field, which the gas discharge atmosphere or the gas discharge space 302h flooded. The electric field can, for example, be greater than about 1000 volts / meter (V / m), for example than about 2000 V / m or than 5000 V / m. The or each electrode can, for example, have a rod anode or be formed therefrom.

Depending on the pressure of the gas discharge atmosphere in which the at least one electrode 304 is arranged, the gas discharge can have a plasma discharge (eg at approximately 10 ^-3 mbar) or a glow discharge (eg at approximately 10 ^-2 mbar or more). The gas discharge atmosphere can generally have a greater pressure and / or more reactive gas than the process atmosphere in the or each processing area 306b , 308b in which, for example, the coating takes place. In order for this difference to be maintained, the gas discharge space 302h from the or each processing area 306b , 308b optionally be gas separated by means of a gas separation structure, as will be described below.

3 illustrates a vacuum arrangement 300 according to various embodiments in a schematic side view or cross-sectional view (looking along the axis of rotation 111d that are parallel to a rotation axis direction 101 is), e.g. the vacuum arrangement 100 or 200 . The role cover 112m may have a porous dielectric or be formed from it. In contrast, the roller housing 112h , which is the roll cover 112m carries, for example, be designed to be electrically conductive and / or comprise a metal or be formed from it.

The transport path 111p , e.g. a first section 111a of which can be in a first area 301a to the transport roller 112 run up, for example in the direction of the transport roller 112 down. The transport path 111p , e.g. a second section 111b of which can be in a second area 301b from the transport roller 112 run away, for example in the direction of the transport roller 112 path. The first paragraph 111a and the second section 111b can for example have a distance from one another which is smaller than the diameter of the roll cover 112m .

The optional gas separation structure 302 can be between the first section 111a and the second section 111b be arranged. The gas discharge space 302h can thus be limited on the reverse side (then also as a cavity 302h from the first section 111a , the second section 111b , the gas separation structure 302 and the transport roller 112 . In other words, a can along the transport path 111p transported substrate the gas discharge space 302h physically limit on both sides. Due to the external limitation, the gas discharge space 302h during operation of the vacuum arrangement 300 be gas-separated to the outside.

The gas separation clearly describes a difference in the gas pressure or in the gas composition between areas connected to one another by vacuum technology (e.g. gas-separated areas). The components (e.g. the parts of a gas separation structure) which contribute to the gas separation can be set up in such a way that the difference in gas pressure or in the gas composition between areas connected to one another by vacuum technology (e.g. gas separated areas) can be maintained (e.g. stable). In other words, gas exchange between areas that are vacuum-connected and gas-separated from one another can be reduced, e.g. the greater the gas separation between the areas.

For example, more than 90% of the limit of the gas discharge space can be used 302h be sealed vacuum-tight from its surroundings, for example by means of the gas separation structure 302 , the transport roller 112 and the substrate. Alternatively or additionally, the substrate can effect less than 50% of the seal.

In the gas discharge space 302h can be one or more than one electrode 304 (in other words, at least one electrode) can be arranged which is used to excite the gas discharge in the gas discharge space 302h can be set up. Multiple electrodes 304 can provide at least one anode and one cathode for the gas discharge, for example. This achieves, for example, that the gas discharge is more local. Multiple electrodes 304 can, for example, enable the gas discharges to be excited by means of a bipolar voltage. For example, two electrodes that are assigned to one another 304 are periodically interchanged in their polarity, so that an electrical field formed between them is periodically inverted. This means that deposits on an electrode that is operated as an anode are removed when it is operated as a cathode will (or vice versa). Thus, the life of the electrodes 304 elevated. Alternatively or additionally, several electrodes can make it easier to keep a difference in the effect of the gas discharge on the substrate between the two transport directions as small as possible. Alternatively or additionally, several electrodes can interact with the circumferential surface 1604o improve.

The gas separation structure 302 can generally have various components that make up the gas discharge space 302h surround. For example, the gas separation structure 302 have a housing which is provided by means of one or more than one wall element. Optionally, the gas separation structure 302 and / or the gas discharge space 302h between several leadership roles 122 be arranged. Optionally, the gas separation structure 302 have one or more than one seal, which two adjoining components of the gas separation structure 302 vacuum-tight connects to each other. For example, a distance between the gas separation structure can be 302 and the transport path be less than about 1 cm (centimeter), for example than about 0.5 cm, than about 0.1 cm.

Here, to make it easier to understand, it refers to exactly one electrode 304 can accordingly also be used for several electrodes 304 be valid.

4th illustrates a vacuum arrangement 400 according to various embodiments in a schematic side view or cross-sectional view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 300 . The vacuum arrangement 400 can be one or more than one coating device 306 , 308 exhibit. The or each coating device 306 , 308 can be set up for thermal evaporation of the coating material and / or for atomizing the coating material. In order to atomize the coating material, the coating device can be set up, for example, to generate a plasma. For thermal evaporation, a coating device can have, for example, an electron beam gun, by means of which the coating material is heated.

5 illustrates a vacuum arrangement 500 according to various embodiments in a schematic side view or cross-sectional view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 400 .

The vacuum arrangement 500 can be a gas exchange device 402 exhibit. The gas exchange device 402 may have one or more than one gas line which is in the gas discharge space 302h flows out. By means of the gas exchange device 402 can the gas discharge space 302h Gas (more generally a gas mixture, also referred to as gas discharge gas) are supplied and / or withdrawn to form the gas discharge atmosphere in the gas discharge space 302h . The supply and / or withdrawal of the gas discharge gas by means of the gas exchange device 402 can optionally be controlled and / or regulated, for example by means of the control device 508 . This makes it possible to control the pressure inside the gas discharge space 302h and / or a pressure difference in the gas discharge space 302h to control and / or regulate its environment.

The gas discharge space can be reached by means of a gas line 302h for example, the gas discharge gas can be supplied, ie a gas supply can be provided. The gas discharge gas can, for example, be supplied and / or mixed in from at least one gas source (for example a gas tank). Alternatively or additionally, the gas discharge space 302h the gas discharge gas can be withdrawn by means of a gas line, ie a gas discharge can be provided. The gas discharge gas can be pumped out, for example, by means of a pump (for example a high vacuum pump).

A gas line can generally enable the intended exchange of gas by gas discharge gas being passed through the gas line. The gas line can for example have a pipe, valves, hollow body in a solid body or the like and optionally one or more than one valve. The gas supply can, for example, by means of the gas outlet openings 112o the roll cover 112m be provided. For example, the transport roller 112 the gas discharge gas or at least a component thereof (for example an inert gas) can be supplied, which from the gas outlet openings 112o exit. Alternatively or additionally, the gas supply can have one or more than one nozzle in the gas discharge space 302h have, from which the gas discharge gas (eg diffuse) or at least a component thereof (eg a reactive gas) can emerge.

In other words, the gas discharge gas can have an inert gas and a reactive gas. The inert gas, for example argon, can be designed to be inert with respect to the substrate and / or the coating material. The reactive gas, e.g. oxygen, nitrogen and / or hydrogen.

6th illustrates a vacuum arrangement 600 according to various embodiments in a schematic side view or cross-sectional view (looking along the Axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 500 .

The gas separation structure 302 can be one or more than one leadership role 122 have, which is set up, the transport path 111p in the first area 301a and / or the second area 302b redirect. This can make it possible to wrap it around more closely (denotes the angle along which the substrate and the transport roller 112 is in contact). One or more leadership roles 122 can, for example, the gas discharge space 302h physically limit. Alternatively or additionally, the transport path 111p between the leadership role 122 and the cavity 302h be arranged. For example, a distance between the gas separation structure can be 302 and the or each of the guide rollers may be less than about 1 cm (centimeters), for example about 0.5 cm, than about 0.1 cm.

7th illustrates a vacuum arrangement 700 according to various embodiments in a schematic side view or cross-sectional view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 600 .

The substrate 102 can with a first page 102a to the transport roller 112 created, e.g. with the roll cover 112m brought into physical contact, to be or to be. Optionally, the substrate 102 on the first page 102a already coated, for example with a first layer (also referred to as a back coating), before it comes into contact with the transport roller 112 comes. The substrate 102 can be on a second page 102b that the transport roller 112 is turned away, are coated in the at least one processing area 306b , 308b (see. 2 ), e.g. with a second layer. The first layer and / or the second layer can comprise or be formed from a metal, for example copper. Alternatively or additionally, the first layer and the second layer can have the same chemical composition. The first layer can optionally be multi-layered, for example having a copper layer and above it a copper-nickel layer (as passivation).

The substrate 102 can for example have a carrier which is in the at least one processing area 306b , 308b is coated with the coating material. The carrier can, for example, have a film or be formed from it. As an alternative or in addition, the carrier can have or be formed from a dielectric, for example a plastic (eg PET and / or PI) or another polymer.

Generally the reel housing 112h a reference potential can be or will be provided, for example electrical ground 704 . The reference potential can, however, also be a different electrical potential, for example a potential that is positive with respect to electrical ground. In general, the voltage information herein can be related to the reference potential.

In relation to the reference potential, the substrate can 102 be or become electrically charged, for example due to the coating process in the at least one processing area 306b , 308b . For example, the coating process can apply electrical charge carriers (for example electrons and / or ions) to the substrate 102 transferred (more generally also referred to as charge delivery or electrical charge). The electrons can originate, for example, from an electron beam gun by means of which the coating material is evaporated.

The substrate 102 an electrical potential (also as substrate potential) can be provided due to the electrical charge. The substrate potential can differ from the reference potential. Because of this, the substrate 102 electrically (example electrostatically) from the transport roller 112 be or will be attracted.

In general, the vacuum assembly 700 be set up in such a way that the substrate potential at least along the section of the substrate 102 , which one with the transport roller 112 is in contact is maintained. This is achieved, among other things, by means of the dielectric roller cover 112m which is the substrate 102 galvanically from the reel housing 112h or the reference potential.

To the substrate 102 To be able to detach it better from the transport roller, the substrate potential in the first area can be increased by means of the gas discharge 301a and / or second area 301b be broken down (more generally referred to as charge withdrawal or electrical neutralization or discharge). The gas discharge can provide electrical charge carriers, which when in contact with the substrate 102 occur, the charging (ie the difference in the electrical potential of the substrate from the reference potential) of the substrate 102 to reduce.

The electrical neutralization and / or electrical charging of the substrate can optionally be carried out 102 controlled and / or regulated, for example by means of the control device 508 . With this, the detachment can be improved.

The at least one electrode can be used to excite the gas discharge 304 the electrode potential can be or will be provided, for example of several hundred volts (V), for example of at least approximately 1000 V. The electrode potential can be determined by means of the Power supply 806 be or will be provided. In general, the electrode potential may differ from that of the power supply 806 can be provided by means of a mixed voltage (having a direct voltage and / or an alternating voltage). An alternating voltage can provide a continuous change in the electrode potential. In contrast, a DC voltage can be essentially invariant over time, at least in sections. Optionally, the voltage can be or will be pulsed, for example bipolar or unipolar pulsed. For example, the electrode potential can be provided in a pulsed manner, with the removal of the electrode being minimized by setting the frequency and pulse duration while at the same time maintaining the plasma formation.

For example, the DC voltage can be periodically reversed, e.g. with a frequency (then also referred to as the polarity reversal frequency). Alternatively or additionally, the DC voltage can be or will be pulsed, e.g. with the frequency (then also referred to as the pulse frequency). A pulsed / reversed DC voltage can provide an abruptly variable electrode potential. The frequency of the voltage (e.g. alternating voltage frequency, polarity reversal frequency or pulse frequency) can be less than 1 MHz (megahertz), e.g. less than approximately 100 kHz (kilohertz), e.g. less than approximately 50 kHz, e.g. less than approximately 10 kHz, e.g. less than approximately 1 kHz.

The gas discharge atmosphere can, for example, have a pressure in a range from 10 ^-2 millibars (mbar) to approximately 10 ^-4 millibars. As an alternative or in addition, the gas discharge atmosphere can have at least the reactive gas or be formed therefrom, for example oxygen. The excess on the transport roller can be reached by means of the reactive gas 112 deposited abrasion (eg a metal that is part of the backside coating) is converted into a dielectric. This can prevent the electrostatic attraction of the substrate from being inhibited by the abrasion. In other words, the operability in terms of electrostatic attraction of the substrate can be improved 102 be sustained longer.

8th illustrates a vacuum arrangement 800 according to various embodiments in a schematic detailed view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 700 . The coating device 308 , 306 can for example be a crucible 814 have and / or on one of the gas separation structure 302 opposite side of the transport roller 112 be arranged. Optionally, the gas separation structure 302 have a cooling device which is set up, the one wall element 302g the gas separation structure 302 to withdraw thermal energy.

9 illustrates a vacuum arrangement 900 according to various embodiments in a schematic detailed view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 800 . Optionally, the or each electrode 304 one or more than one magnet 802 exhibit. An improvement in the gas discharge can thus be achieved. For example, the at least one electrode 304 Be part of a magnetron, which stimulates the gas discharge.

It can be understood that the electrode described here does not necessarily have to be used to passivate the transport roller. This can, for example, only serve to electrically neutralize (e.g. discharge) the substrate. In this case, the vacuum arrangement can clearly require very little installation space. This clearly achieves that the electrode can be arranged as close as possible to the point at which the substrate and the transport roller come into contact with one another or separate from one another. This clearly enables the substrate to be unloaded as directly as possible at the transport roller, which inhibits the formation of wrinkles or any other disruption to the transport of the substrate.

According to various embodiments, a plasma or a glow discharge can be used to transfer charge carriers to the surface of the substrate. In this way the charged surface can be discharged. This can prevent the substrate from being detached from the transport roller 112 For example, when coating a plastic film, strong charging effects occur that can be discharged through overcharges or breakdowns and thereby damage the substrate. If there is insufficient discharge, winding errors and wrinkles in the substrate can also occur in the further transport of the substrate and when the film is wound up. As explained above, the substrate can be discharged by means of a plasma. This can be done on the outside of the substrate, for example, by means of a magnetron discharge. On the inside of the substrate, which is the transport roller 112 is facing and when the substrate is detached from the transport roller 112 (e.g. cooling roller) is free, the so-called interstitial gas discharge can be stimulated. This is an electrode 304 positioned in the immediate vicinity of the separation area and ignited a plasma through a corresponding gas inlet. The overflow of gas into other process areas can be inhibited by a very close-fitting housing 302 at the electrode 304 is arranged. This enclosure 302 requires corresponding installation space.

The admitted gas is pumped out and also requires additional pumping power. Nevertheless, the gas flowing over into other process areas can have a disruptive effect. The high voltage that would be required for a glow discharge on the electrode can stimulate a sputtering process that can lead to undesired deposits on the cooling roller and contamination on the substrate. Neutralization devices downstream of the process also require additional installation space and additional expenses, for example.

According to various embodiments, it was clearly recognized that the discharge voltage and the gas pressure required to excite the gas discharge (e.g. a glow discharge) can be reduced by means of a suitable magnet arrangement.

According to various embodiments, a corresponding vacuum arrangement is provided which provides a gas discharge (e.g. having a plasma discharge and / or a glow discharge) in order to discharge charges such as occur when plastic substrates are detached from the cooling roller. This is explained below.

10 illustrates a vacuum arrangement 1000 according to various embodiments in a schematic detailed view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 900 . The first electrode 304 can, for example, be a greater (eg more than twice, five times or ten times) distance from the transport path 111p in the first area 301a than from the transport path 111p in the second area 301b exhibit or vice versa. Alternatively or additionally, the gas separation structure 302 a greater (e.g. more than twice, five or ten times) distance from the transport path 111p in the first area 301a than from the transport path 111p in the second area 301b exhibit or vice versa. Alternatively or additionally, the cavity 302h only to the transport path 111p in the first area 301a or to the transport path 111p in the second area 301b adjoin.

By means of the gas separation structure 302 a gas separation to other process areas is provided. Optionally, the vacuum arrangement 1000 the gas exchange device 402 as explained above.

11 illustrates a vacuum arrangement 1100 according to various embodiments in a schematic perspective view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 1000 in which the first electrode 304 is elongated, along one direction 1101 (also called electrode direction 1101 referred to) and / or penetrated along this by a cavity. The electrode direction 1101 can, for example, along the axis of rotation 111d be.

The first electrode 304 can be a housing (for example a tubular housing, then also referred to as a tube) and a cavity therein 304h (also referred to as electrode cavity), in which at least one (ie one or more than one) magnet 802 is arranged. The housing or tube can also be a rectangular tube or a tube with a square cross-section. The cross-sectional area of the magnets is preferably smaller than the inner cross-sectional area of the tube (its cavity) in order to allow the passage of a cooling fluid.

The vacuum arrangement 1100 thus provides that the formation of the plasma for discharging the substrate takes place by means of magnetic field support (also referred to as magnetic field supported gas discharge). This reduces the space required. Furthermore, the gas inlet or the gas inflow rate to be supplied is thereby reduced. An expensive housing and an expensive pumping device can thus be avoided. Furthermore, the electrical electrode potential (also referred to as the discharge voltage in relation to the electrical reference potential) for igniting and / or for maintaining the gas discharge can be reduced by means of the magnetic field support. This reduces the sputtering rate of the electrode 304 which in turn pollutes the transport roller 112 and / or the substrate.

A magnet can be understood here as a magnetized material, having a magnetization and clearly set up as a permanent magnet. The magnet can, for example, have a hard magnetic material or be formed from it. A hard magnetic material can clearly have a high coercive field strength, for example approximately 10 ³ A / m (amperes per meter) or more, for example approximately 10 ⁴ A / m or more, for example approximately 10 ⁵ A / m or more. Examples of a hard magnetic material include: a rare earth compound (such as neodymium-iron-boron (NdFeB)) or samarium-cobalt (SmCo)), hard-magnetic ferrite, bismanol and / or aluminum-nickel-cobalt. If magnets with high temperature stability are used (e.g. made of SmCo), this can affect the durability of the electrode 304 enlarge.

Soft magnetic material (also referred to as FM) can be understood to be a magnetizable (eg ferromagnetic) material which can clearly be easily reversed, ie clearly has a low coercive field strength, eg less than approximately 10 ³ A / m, eg less than about 100 A / m, for example less than about 10 A / m. Examples of a soft magnetic material include: iron, soft magnetic ferrite, steel, cobalt, amorphous metal, a NiFe compound. The magnetic (eg soft magnetic and / or hard magnetic) material can for example have a magnetic permeability of approximately 10 or more, eg approximately 100 or more, eg approximately 10 ³ or more, eg approximately 10 ⁴ or more, eg approximately 10 ⁵ or more.

A non-magnetic material can be understood as a material that is essentially magnetically neutral, e.g. also slightly paramagnetic or diamagnetic. The non-magnetic material can, for example, have a magnetic permeability of substantially 1, i.e. in a range from about 0.9 to about 1.1. Examples of a non-magnetic material include: graphite, aluminum, platinum, copper, a ceramic (e.g. an oxide), air, water.

For example, the first electrode 304 a housing 304r (e.g. tube), the interior of which is the electrode cavity 304h provides. In the following, reference is made to an exemplary tube as the housing, wherein what has been described for the tube can apply analogously to any other housing, that is, a cavity 304h having.

There are several magnets in the electrode cavity 304h arranged, their magnetic north pole N or their magnetic south pole S in the electrode direction 1101 be aligned. For example, several magnets arranged one after the other 802 in the same direction (e.g. electrode direction 1101 ) be magnetized or alternately in and against the electrode direction 1101 as shown below.

The plurality of magnets arranged one after the other can preferably 802 have a corresponding distance from one another in order to favor the magnetic field (also referred to as magnetic field) emerging from the electrode and thus effectively enclosing electrons of the gas discharge, as will be explained in more detail below.

ist. Die mittlere absolute Abweichung d_k von der mittleren Magnetkenngröße K kann kleiner sein als ungefähr 10%, z.B. als ungefähr 5%, z.B. als ungefähr 1%. Dies verbessert die Wirkung der Elektrode. Die mittlere absolute Abweichung d_k kann geschrieben werden als: $$d_k=N^{-1}{\displaystyle \sum _{n=1}^N\left|\overline{K}-K_n\right|}$$

In an exemplary embodiment, the first electrode 304 in the electrode cavity 304h a number of N magnets 802 (for example, N≥3, N≥4, N≥5, N≥10, or N≥20), which together are that of the electrode 304 provide an outgoing magnetic field. Furthermore, any magnet 802 have a parameter K (also referred to as a magnetic parameter), which is the magnetic strength of the magnet 802 represents. For example, nth magnet 802 a parameter K _n (1≤n≤N)). Examples of the magnetic parameters include: the magnetic energy product, the magnetic energy density, the total magnetic energy. The energy product is proportional to the energy density, ie the amount of energy that is stored per unit volume in a magnet or a magnetic pole. The total amount of magnetic energy (also known as total magnetic energy) is the product of the energy density and the volume of the magnet or magnetic pole. The N magnets of the electrode 304 can have a medium magnetic parameter K have, where $$\overline{K}=N^{-1}{\displaystyle \sum _{n=1}^N{K}_n}$$

is. The mean absolute deviation d _k from the mean magnetic parameter K can be less than about 10%, e.g. than about 5%, e.g. than about 1%. This improves the effectiveness of the electrode. The mean absolute deviation d _k can be written as: $$d_k=N^{-1}{\displaystyle \sum _{n=1}^N\left|\overline{K}-K_n\right|}$$

In an exemplary embodiment similar to this, the first electrode has 304 in the electrode cavity 304h a number of N magnets 802 (for example, N≥3, N≥4, N≥5, N≥10, or N≥20), which together are that of the electrode 304 provide an outgoing magnetic field. Every magnet 802 the electrode 304 can be circular cylindrical and magnetized along the cylinder axis.

In another similar exemplary embodiment, the first electrode 304 in the electrode cavity 304h a number of N magnets 802 (for example, N≥3, N≥4, N≥5, N≥10, or N≥20), which together are that of the electrode 304 provide an outgoing magnetic field. Furthermore, the electrode 304 several (e.g. N-1) non-magnetic spacers 1108 each of which has spacers 1108 is arranged between two adjacent magnets or they are spatially separated from one another. The spatial separation of the magnets from one another can, however, also be provided in some other way, for example by means of magnetic repulsion, as in relation to 12th is explained in more detail.

According to various embodiments, the tube 304r be non-magnetic. This achieves that the electrode 304 exerts less influence on a magnetic field. For example, the electrode must 304 with the non-magnetic pipe 304r do not necessarily have the at least one magnet. The at least one magnet can for example, it can only be retrofitted later if there is a need, or it can be arranged elsewhere, for example outside the pipe 304r . Is that at least one magnet 802 the non-magnetic pipe 304r in the electrode 304 arranged, the magnetic field can be outside the electrode 304 be as strong as possible.

Optionally, the pipe 304r (also referred to as electrode tube) coated or made of a material that is harmless to the process. For example, the pipe 304r be made of graphite. The gas discharge gas can then contain, for example, oxygen and / or water vapor. This results in a very low sputter rate on the electrode 304 reached and the atomized carbon atoms form with the gas discharge gas (eg its oxygen) and / or with the water vapor given off by the substrate carbon dioxide, which can be pumped off. More generally speaking, the gas discharge gas can be set up with the material of the electrode 304 to react to a volatile reaction product, e.g. to a gas.

The electrode 304 can, for example, have a tube which is non-magnetic stainless steel, or stainless steel with graphite or CFC (carbon fiber reinforced carbon) (eg coated) or is formed from it.

The pipe 304r for example, may have a diameter in a range from about 5 mm (millimeters) to about 20 mm. The pipe 304r can for example have a wall thickness in a range from approximately 0.5 mm to approximately 2 mm.

Several in the tube 304r arranged magnets 802 (eg permanent magnets) can for example be positioned equidistantly, for example with a distance of a few millimeters (for example 1 mm or 5 mm) to a few centimeters (for example 1 or 5 cm), for example by means of the spacers 1108 .

In the case of a rectified arrangement, the distance between the magnets determines the extent of the area in which the discharge is concentrated, wherein the distance can be selected and / or optimized in such a way that the largest possible areas can be used to concentrate the discharge with sufficient magnetic field strength. It can therefore make sense to keep the size of the magnets as small as possible.

In the case of an alternating arrangement, the length of individual magnets can be increased by combining hard magnets and soft magnetic spacer elements (cf. 14B) . This can be useful in the alternating arrangement, where concentrated areas of the discharge are formed in the areas around the magnets. The length of these areas can be selected and / or optimized in such a way that, given a sufficient magnetic field strength, the largest possible areas can be used to concentrate the discharge.

The electrode 304 can for example be connected as a cathode, which excites the gas discharge, wherein the associated anode can be provided, for example, by means of the system ground or by means of an additional electrode (also referred to as a second electrode). For example, the electrode potential can be provided in a pulsed manner, with the removal of the electrode being minimized by setting the frequency and pulse duration while at the same time maintaining the plasma formation.

For example, the second electrode can be set up in the same way as the first electrode and the gas discharge is ignited between the two electrodes, optionally both working alternately as anode and cathode by reversing the polarity of the electrode potential.

12th illustrates a vacuum arrangement 1200 according to various embodiments in a schematic perspective view (looking along the axis of rotation 111d) , e.g. one of the vacuum arrangements 100 to 1100 in which the first electrode 304 is elongated along one direction 1101 (also called electrode direction 1101 designated).

13th illustrates a vacuum arrangement 1300 according to various embodiments in a schematic perspective view (looking across the electrode direction 1101 ), e.g. one of the vacuum arrangements 100 to 1200 which have one or more than one fluid connection 1302 having that with the electrode cavity 304h is fluidly connected. The one or more than one fluid connection 1302 can be part of an additional fluid supply 1114 (also referred to as electrode fluid supply). The electrode fluid supply 1114 can optionally have a cooling fluid supply 1116 fluid-conducting (eg liquid-conducting) with the first electrode 304 connect. The cooling fluid supply 1116 (eg their liquid supply) can, for example, at least one pump 116r and / or at least one pipeline 116r exhibit. By means of the cooling fluid supply 116 can the first electrode 304 a cooling fluid can be supplied during operation, for example comprising a gas and / or a liquid, and / or the electrode cavity 304h flowing through.

During operation, the cooling fluid can pass through the electrode 304 stream through 1301, at least around the at least one magnet 802 around (eg flowing around it) and / or through the at least one magnet 802 through (e.g. flowing through). In the latter case, the at least one magnet can 802 have a through opening, which this along the electrode direction 1101 (and / or its cylinder axis) and / or its direction of magnetization penetrates.

For example, the at least one magnet 802 have a smaller diameter than the electrode cavity 304h . This achieves that between the at least one magnet 802 and the pipe 304r , or its pipe wall, a gap is formed through which the cooling fluid can flow. Through the pipe 304r For example, a coolant is applied to the magnet 802 passed the pipe 304r and magnets 802 cools.

Optionally, the vacuum arrangement 1200 , e.g. the cooling fluid supply 1116 , an actuator 1310 have which is configured to flow through the electrode cavity 304h to influence, for example the flow rate of the cooling fluid, the flow rate of the cooling fluid, the flow direction of the cooling fluid and / or the pressure of the cooling fluid. This achieves a force on the at least one magnet by means of the cooling fluid 802 can be transferred. If it is also slidably mounted, for example, it lies loosely in the pipe 304r , the force (also referred to as translational force) can be a translation (displacement) of the at least one magnet 802 stimulate. The actuator 1310 can for example be controlled by means of the control device.

The displacement of the at least one magnet has the effect that the spatial distribution of the gas discharge (for example its discharge distribution) is varied. This prevents the gas discharge from entering the electrode 304 burns (ie removes it locally) and the electrode 304 thereby fails prematurely. The magnets 802 are displaceably mounted, for example, so that the area of the magnetically constricted plasma zone is on the tube 304r can be moved. The shift can take place, for example, by changing the flow velocity and / or the direction of the cooling liquid, for example by means of the actuator 1310 and / or controlled by means of the control device. For example, local burn-off of the electrode can be prevented by alternately pushing the magnets back and forth.

More generally speaking, the actuator can 1310 Be part of the displacement device, which is set up, the at least one magnet 802 in the electrode cavity 304h to move. The means of the actuator 1310 generated or varied translational force does not necessarily have to be transmitted by means of the cooling fluid. The translational force can be transmitted magnetically, for example, magnetic coupling from the outside by moving permanent magnets or by differently excited electromagnets.

14A illustrates a vacuum arrangement 1400 according to various embodiments in a schematic perspective view (looking across the electrode direction 1101 ), e.g. one of the vacuum arrangements 100 to 1300 showing a jig 1402 which is configured to apply a force to the first electrode 304 to transmit (also known as the stretching force) which the first electrode 304 stretches (also called tensioning), that is, along the direction of the electrodes 1101 works. This prevents the electrode from sagging in the event of thermal expansion. For example, the jig 1402 be set up, the expansion force on a thermally induced expansion (eg elongation) of the electrode 304 maintain. For example, the stretching force can be a spring force. Exemplary components of the clamping device 1402 have: a spring, for example a spring package made of disc springs, a toggle clamp, screwing device to achieve and adjust the preload.

Alternatively or additionally, the electrode 304 sag less than 3mm with a length of 3m G = 0.1%, e.g. as G = 0.03%. The dimension G of the sagging can be understood as the quotient of the deflection A in the center of the pipe (ie at the point L / 2) of an exactly linearly extending pipe to the length L of the pipe, ie that G = A / L.

14B to 14D illustrate various embodiments 1400b to 1400d of the magnets discussed herein 802 in different schematic perspective views. According to the embodiments 1400b has one or more than one (e.g. each) of the magnets 802 the electrode is a hard magnetic material 1410 and / or a soft magnetic material 1412 on, for example, a portion of the soft magnetic material 1410 between two sections of the hard magnetic material 1412 . According to the embodiments 1400c is one or more than one (e.g. each) of the magnets 802 the electrode (e.g. its hard magnetic material 1412 ) from a through opening 1414 (along the electrode direction 1101 , which runs along the so-called electrode axis) and / or has a cylindrical shape. According to the embodiments 1400d has one or more than one (e.g. each) of the magnets 802 the electrode has a prismatic (eg cuboid) shape.

In the following, various examples are described which relate to those described above and shown in the figures.

Example 1 is a vacuum arrangement, comprising: a transport roller, which, for example, has a dielectric roller cover, for providing a transport path in a first area to the roller cover and in a second area away from the roller cover, with the roller cover, for example, a (e.g. porous) dielectric having; an optional gas separation structure providing a gas separated cavity, the cavity extending from the transport path in the first region to the transport path in the second region and being adjacent to the roller cover; at least one electrode for exciting a gas discharge, the at least one electrode being arranged between the transport roller and the transport path in the first region or the transport path in the second region and / or being arranged in the cavity; wherein the at least one electrode preferably has at least one (i.e. one or more than one) magnet, the direction of magnetization of which is aligned along a longitudinal extension of the electrode; and / or wherein the at least one electrode preferably has a (e.g. non-magnetic) tube (in which, for example, the at least one magnet is arranged).

Example 2 is the vacuum arrangement according to Example 1, wherein the transport roller has a circumferential surface (e.g. of the roller housing), the transport path in the first area leading to the circumferential surface and in the second area leading away from the circumferential surface, with one on the circumferential surface, for example Dielectric layer (e.g. as part of the roll cover) is provided.

Example 3 is the vacuum arrangement according to Example 1 or 2, wherein the at least one magnet has one or more than one pair of directly adjacent magnets, the magnets of which are: for example magnetized towards or away from one another; or, for example, have the same direction of magnetization.

Example 4 is the vacuum arrangement according to one of Examples 1 to 3, further comprising: at least one (e.g. non-magnetic) spacer which is arranged between two immediately adjacent magnets of the at least one magnet.

Example 5 is the vacuum arrangement according to one of Examples 1 to 4, wherein the at least one magnet is set up in such a way that it adjoins a (e.g. annular) gap, for example the gap extends, for example, between the tube and the at least one magnet.

Example 6 is the vacuum arrangement according to one of Examples 1 to 5, further comprising: a fluid connection (e.g. cooling fluid connection) which is coupled in a fluid-conducting manner to a cavity of the electrode in which the at least one magnet is arranged, the fluid connection, for example, at the end of the pipe is arranged and / or opens into the cavity.

Example 7 is the vacuum arrangement according to Example 6, further comprising: a pump which is coupled to the fluid connection in a fluid-conducting manner and is set up, for example, to supply a fluid to the fluid connection.

Example 8 is the vacuum arrangement according to one of Examples 1 to 7, further comprising: a tensioning device which is set up to transmit a force that expands (i.e., tension) the at least one electrode to the at least one electrode.

Example 9 is the vacuum arrangement according to one of Examples 1 to 8, wherein the at least one magnet is circular cylinder-shaped and / or is penetrated by a through opening (e.g. is ring-shaped).

Example 10 is the vacuum arrangement according to one of Examples 1 to 9, the at least one magnet being displaceable relative to the transport roller, displaceable along an axis of rotation of the transport roller (also referred to as the transport roller axis of rotation) and / or displaceable along a longitudinal extension of the electrode (also referred to as the electrode axis ) is stored.

Example 11 is the vacuum arrangement according to one of Examples 1 to 10, further comprising: a displacement device which is set up to transmit a (e.g. time-variable) force to the at least one magnet (e.g. by means of a fluid) in such a way that it is relative to the transport roller is moved.

Example 12 is the vacuum arrangement according to one of Examples 1 to 11, further comprising: the gas separation structure, which provides a gas-separated gas discharge space to which the at least one electrode is adjacent, the gas discharge space, for example, to the transport path in the first area or the transport path in the second Area adjoins and / or adjoins the roll cover.

Example 13 is the vacuum arrangement according to one of Examples 1 to 12, further comprising: a coating device for emitting a coating material towards the transport roller, wherein the coating device has, for example, an electron beam source.

Example 14 is the vacuum arrangement according to Example 13, wherein the at least one electrode has the coating material.

Example 15 is the vacuum arrangement according to one of claims 1 to 14, wherein the gas separation structure has one or more than one wall element which delimits the gas discharge space in which, for example, the at least one electrode is arranged.

Example 16 is the vacuum arrangement according to one of Examples 1 to 15, further comprising: a gas supply for supplying one or more than one gas into an area between the at least one electrode and the transport path (e.g. into the cavity), wherein, for example, the gas supply is set up is to supply a first gas (eg inert gas) through the roller cover and / or supply a second gas (eg a reactive gas) through an outlet opening (eg nozzle) that is spatially separated from the transport roller.

Example 17 is the vacuum arrangement according to Example 16, wherein the gas comprises a reactive gas, wherein, for example, the reactive gas is set up to react with a metal of the substrate and / or with the coating material to form a dielectric, wherein, for example, the gas supply has a reactive gas source which has the Has reactive gas.

Example 18 is the vacuum arrangement according to one of Examples 1 to 17, further comprising: one or more than one guide roller for guiding the transport path to and / or away from the transport roller, of which, for example, a first guide roller within the first area and / or a second guide roller is arranged within the second area, and / or wherein the gas separation structure is arranged between two guide rollers of the more than one guide roller.

Example 19 is the vacuum arrangement according to one of Examples 1 to 18, wherein the transport roller has a temperature control device (e.g. a cooling device) which is set up to supply and / or withdraw thermal energy from the roller cover.

Example 20 is the vacuum arrangement according to one of Examples 1 to 19, wherein the at least one electrode has a first electrode and / or (eg one of the first electrode assigned) second electrode, which for example between the transport roller and the transport path in the first area or the Transport path are arranged in the second area, for example within the gas discharge space.

Example 21 is the vacuum arrangement according to Example 20, the first electrode and the second electrode being connected to one another in such a way that they provide an anode and a cathode during operation.

Example 22 is the vacuum arrangement according to one of Examples 1 to 21, further comprising: a voltage supply which is set up to apply an electrical voltage to the at least one electrode, the voltage being, for example, a mixed voltage and / or pulsed, e.g. bipolar or unipolar pulsed ; where the voltage varies, for example, over time, e.g. in its polarity direction and / or its amplitude.

Example 23 is the vacuum arrangement according to one of Examples 1 to 22, further comprising: a control device which is set up to provide a pressure within the cavity in a range from approximately 10 ^-2 mbar to approximately 10 ^-4 (eg 10 ^-3 ); and / or to provide an additional pressure next to the gas separation structure (eg outside the cavity) on the transport path, wherein a ratio between the pressure inside the gas discharge space and the additional pressure is more than approximately 10 (eg than 50).

Example 24 is the vacuum arrangement according to one of Examples 1 to 23, wherein the transport path and / or the roller cover are exposed to the gas discharge.

Example 25 is the vacuum assembly of any one of Examples 1 to 24, wherein the roll cover comprises or is formed from a layer of the dielectric (i.e., a dielectric layer).

Example 26 is the vacuum arrangement according to one of Examples 1 to 25, wherein the gas separation structure is set up to gas-separate the gas discharge with respect to an exterior of the gas separation structure; and / or to provide a ratio between the pressure within the cavity and an additional pressure on the gas separation structure outside the cavity of greater than about 10 (e.g., than 50).

Example 27 is the vacuum arrangement according to any one of Examples 1 to 26, wherein the cavity is delimited on opposite sides by the gas separation structure and the roller cover; and / or is limited by the transport path in the first area and the second area.

Claims (21)

Vacuum arrangement (100 to 1400), comprising: • a transport roller (112) for providing a transport path (111p) in a first area (301a) to the roll cover (112m) and in a second area (301b) away from the roll cover (112m), wherein the roll cover (112m) a Having dielectric; • at least one electrode (304) for exciting a gas discharge, which is arranged between the transport roller (112) and the transport path (111p) in the first area (301a) or the transport path (111p) in the second area (301b); • wherein the at least one electrode (304) has a non-magnetic tube. Vacuum arrangement (100 to 1400) according to Claim 1 wherein the at least one electrode (304) has at least one magnet in the tube, the direction of magnetization of which is aligned along a longitudinal extension of the tube. Vacuum arrangement (100 to 1400), comprising: • a transport roller (112) for providing a transport path (111p) in a first area (301a) to the roll cover (112m) and in a second area (301b) away from the roll cover (112m), wherein the roll cover (112m) a Having dielectric; • at least one electrode (304) for exciting a gas discharge, which is arranged between the transport roller (112) and the transport path (111p) in the first area (301a) or the transport path (111p) in the second area (301b); • wherein the at least one electrode (304) has at least one magnet, the direction of magnetization of which is aligned along a longitudinal extension of the at least one electrode (304). Vacuum arrangement (100 to 1400) according to Claim 3 , wherein the at least one electrode (304) has a tube in which the at least one magnet is arranged. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 4th , wherein the at least one magnet has two directly adjacent magnets which: • are magnetized towards or away from one another; or • have the same direction of magnetization. Vacuum arrangement (100 to 1400) according to Claim 5 , further comprising: at least one non-magnetic spacer which is arranged between the two immediately adjacent magnets. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 6th , further comprising: a fluid connection which is coupled in a fluid-conducting manner to a cavity of the electrode in which the at least one magnet is arranged. Vacuum arrangement (100 to 1400) according to Claim 7 , further comprising: a pump which is fluidly coupled to the fluid connection and is set up to supply a fluid, preferably a liquid, to the fluid connection. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 8th , further comprising: a tensioning device (1402) which is set up to transmit a force that extends the at least one electrode to the at least one electrode. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 9 , wherein the at least one magnet is circular cylinder-shaped and / or is penetrated by a through opening. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 10 , wherein the at least one magnet is mounted displaceably: • relative to the transport roller, preferably along an axis of rotation of the transport roller; • and / or along a longitudinal extension of the electrode. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 11 , further comprising: a displacement device which is set up to transmit a force to the at least one magnet in such a way that it is displaced relative to the transport roller. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 12th , further comprising: a gas separation structure (302), which provides a gas-separated gas discharge space (302h) to which the at least one electrode (304) adjoins, wherein the gas discharge space (302h) is connected to the transport path (111p) in the first region (301a) or adjoins the transport path (111p) in the second area (301b) and adjoins the roll cover (112m). Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 13th , further comprising: a coating device (306, 308) for emitting a coating material towards the transport roller (112). Vacuum arrangement (100 to 1400) according to Claim 14 , wherein the at least one electrode comprises the coating material. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 15th , further comprising: a gas supply (402) for supplying a gas to an area between the at least one electrode and the transport path. Vacuum arrangement (100 to 1400) according to Claim 16 , wherein the gas supply (402) is set up to supply the gas through the roller cover (112m). Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 17th , wherein the transport roller (112) has a temperature control device (1124) which is set up to supply and / or withdraw thermal energy from the roller casing (112m). Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 18th , wherein the at least one electrode has a first electrode (304) and a second electrode (304) assigned to the first electrode (304), which is preferably located between the transport roller (112) and the transport path (111p) in the first area (301a) or the transport path (111p) is arranged in the second area (301b). Vacuum arrangement (100 to 1400) according to Claim 19 , wherein the first electrode (304) and the second electrode (304) are connected to one another in such a way that they provide an anode and a cathode during operation. Vacuum arrangement (100 to 1400) according to one of the Claims 1 to 20th , further comprising: a voltage supply which is set up to apply an electrical voltage to the at least one electrode, the voltage preferably varying over time.

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