DE2011193C3 - Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse - Google Patents

Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse

Info

Publication number
DE2011193C3
DE2011193C3 DE2011193A DE2011193A DE2011193C3 DE 2011193 C3 DE2011193 C3 DE 2011193C3 DE 2011193 A DE2011193 A DE 2011193A DE 2011193 A DE2011193 A DE 2011193A DE 2011193 C3 DE2011193 C3 DE 2011193C3
Authority
DE
Germany
Prior art keywords
sample
output terminal
oscillator
electrons
sample surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2011193A
Other languages
German (de)
English (en)
Other versions
DE2011193A1 (de
DE2011193B2 (de
Inventor
Ulrich Dr. 7500 Karlsruhe Weber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE2011193A priority Critical patent/DE2011193C3/de
Priority to CH336371A priority patent/CH520332A/de
Priority to FR7108019A priority patent/FR2084337A5/fr
Priority to US00122785A priority patent/US3714424A/en
Priority to GB22775/71A priority patent/GB1293716A/en
Publication of DE2011193A1 publication Critical patent/DE2011193A1/de
Publication of DE2011193B2 publication Critical patent/DE2011193B2/de
Application granted granted Critical
Publication of DE2011193C3 publication Critical patent/DE2011193C3/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE2011193A 1970-03-10 1970-03-10 Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse Expired DE2011193C3 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE2011193A DE2011193C3 (de) 1970-03-10 1970-03-10 Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse
CH336371A CH520332A (de) 1970-03-10 1971-03-08 Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse
FR7108019A FR2084337A5 (OSRAM) 1970-03-10 1971-03-09
US00122785A US3714424A (en) 1970-03-10 1971-03-10 Apparatus for improving the signal information in the examination of samples by scanning electron microscopy or electron probe microanalysis
GB22775/71A GB1293716A (en) 1970-03-10 1971-04-19 The use of electron beams for examining surface structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2011193A DE2011193C3 (de) 1970-03-10 1970-03-10 Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse

Publications (3)

Publication Number Publication Date
DE2011193A1 DE2011193A1 (de) 1971-09-23
DE2011193B2 DE2011193B2 (de) 1973-08-23
DE2011193C3 true DE2011193C3 (de) 1974-03-28

Family

ID=5764619

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2011193A Expired DE2011193C3 (de) 1970-03-10 1970-03-10 Vorrichtung für die Elektronen-Rastermikroskopie und die Elektronenstrahl-Mikroanalyse

Country Status (5)

Country Link
US (1) US3714424A (OSRAM)
CH (1) CH520332A (OSRAM)
DE (1) DE2011193C3 (OSRAM)
FR (1) FR2084337A5 (OSRAM)
GB (1) GB1293716A (OSRAM)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2903077C2 (de) * 1979-01-26 1986-07-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zur berührungslosen Potentialmessung an einem elektronischen Bauelement und Anordnung zur Durchführung des Verfahrens
DE2921151C2 (de) * 1979-05-25 1982-12-02 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen
JPS5932145A (ja) * 1982-08-16 1984-02-21 Hitachi Ltd 電位検出装置
JPS607049A (ja) * 1983-06-24 1985-01-14 Hitachi Ltd 電位測定装置
GB8515250D0 (en) * 1985-06-17 1985-07-17 Texas Instruments Ltd Testing of integrated circuits
DE3602366A1 (de) * 1986-01-27 1987-07-30 Siemens Ag Verfahren und anordnung zum nachweis der auf einer probe von einem primaeren korpuskularstrahl ausgeloesten sekundaerkorpuskeln
US5866904A (en) * 1990-10-12 1999-02-02 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
US5412210A (en) * 1990-10-12 1995-05-02 Hitachi, Ltd. Scanning electron microscope and method for production of semiconductor device by using the same
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
WO2010148423A1 (en) * 2009-06-22 2010-12-29 The University Of Western Australia An imaging detector for a scanning charged particle microscope
US9190241B2 (en) * 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US11933668B2 (en) * 2020-02-03 2024-03-19 Rohde & Schwarz Gmbh & Co. Kg Sampling assembly and testing instrument

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3535516A (en) * 1966-10-17 1970-10-20 Hitachi Ltd Electron microscope employing a modulated scanning beam and a phase sensitive detector to improve the signal to noise ratio

Also Published As

Publication number Publication date
US3714424A (en) 1973-01-30
GB1293716A (en) 1972-10-25
CH520332A (de) 1972-03-15
FR2084337A5 (OSRAM) 1971-12-17
DE2011193A1 (de) 1971-09-23
DE2011193B2 (de) 1973-08-23

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977
EHJ Ceased/non-payment of the annual fee