DE2000054A1 - Getter-Spruehvorrichtung und Verfahren zum Aufspruehen eines Werkstoffs auf ein Substrat - Google Patents

Getter-Spruehvorrichtung und Verfahren zum Aufspruehen eines Werkstoffs auf ein Substrat

Info

Publication number
DE2000054A1
DE2000054A1 DE19702000054 DE2000054A DE2000054A1 DE 2000054 A1 DE2000054 A1 DE 2000054A1 DE 19702000054 DE19702000054 DE 19702000054 DE 2000054 A DE2000054 A DE 2000054A DE 2000054 A1 DE2000054 A1 DE 2000054A1
Authority
DE
Germany
Prior art keywords
spray
getter
cathode
substrate
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19702000054
Other languages
German (de)
English (en)
Inventor
Coltman Harvey David
James David William Francis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bangor University
Original Assignee
Bangor University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bangor University filed Critical Bangor University
Publication of DE2000054A1 publication Critical patent/DE2000054A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
DE19702000054 1969-01-02 1970-01-02 Getter-Spruehvorrichtung und Verfahren zum Aufspruehen eines Werkstoffs auf ein Substrat Pending DE2000054A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB38069 1969-01-02
GB5695969 1969-11-20

Publications (1)

Publication Number Publication Date
DE2000054A1 true DE2000054A1 (de) 1971-03-04

Family

ID=26235885

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702000054 Pending DE2000054A1 (de) 1969-01-02 1970-01-02 Getter-Spruehvorrichtung und Verfahren zum Aufspruehen eines Werkstoffs auf ein Substrat

Country Status (4)

Country Link
US (1) US3691053A (enExample)
DE (1) DE2000054A1 (enExample)
FR (1) FR2027696A1 (enExample)
GB (1) GB1301653A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3811599A1 (de) * 1988-04-07 1989-10-19 Battelle Institut E V Vorrichtung zur beschichtung der innenwand eines kunststoff-kraftfahrzeugtanks mit einer sperrschicht

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1485266A (en) * 1973-11-20 1977-09-08 Atomic Energy Authority Uk Storage of material
US3904503A (en) * 1974-05-31 1975-09-09 Western Electric Co Depositing material on a substrate using a shield
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
DE3569265D1 (en) * 1985-01-17 1989-05-11 Ibm Deutschland Process for the production of low-resistance contacts
US4961832A (en) * 1989-03-14 1990-10-09 Shagun Vladimir A Apparatus for applying film coatings onto substrates in vacuum
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5223112A (en) * 1991-04-30 1993-06-29 Applied Materials, Inc. Removable shutter apparatus for a semiconductor process chamber
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
JP4344019B2 (ja) * 1997-05-28 2009-10-14 キヤノンアネルバ株式会社 イオン化スパッタ方法
WO2003027352A1 (en) * 2001-09-27 2003-04-03 E.I. Du Pont De Nemours And Company Dual-source, single-chamber method and apparatus for sputter deposition
US12474537B2 (en) * 2021-08-06 2025-11-18 Duke University High stability optomechanical system and cryo-package assembly for quantum computing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3811599A1 (de) * 1988-04-07 1989-10-19 Battelle Institut E V Vorrichtung zur beschichtung der innenwand eines kunststoff-kraftfahrzeugtanks mit einer sperrschicht

Also Published As

Publication number Publication date
GB1301653A (enExample) 1973-01-04
FR2027696A1 (enExample) 1970-10-02
US3691053A (en) 1972-09-12

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