DE19882821T1 - Verfahren und Vorrichtung zum Modelieren eines chemisch-mechanischen Polierprozesses - Google Patents

Verfahren und Vorrichtung zum Modelieren eines chemisch-mechanischen Polierprozesses

Info

Publication number
DE19882821T1
DE19882821T1 DE19882821T DE19882821T DE19882821T1 DE 19882821 T1 DE19882821 T1 DE 19882821T1 DE 19882821 T DE19882821 T DE 19882821T DE 19882821 T DE19882821 T DE 19882821T DE 19882821 T1 DE19882821 T1 DE 19882821T1
Authority
DE
Germany
Prior art keywords
modeling
mechanical polishing
chemical mechanical
polishing process
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19882821T
Other languages
German (de)
English (en)
Inventor
Scott R Runnels
Inki Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Speedfam IPEC Corp
Southwest Research Institute SwRI
Original Assignee
Speedfam IPEC Corp
Southwest Research Institute SwRI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Speedfam IPEC Corp, Southwest Research Institute SwRI filed Critical Speedfam IPEC Corp
Publication of DE19882821T1 publication Critical patent/DE19882821T1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
DE19882821T 1997-11-18 1998-11-12 Verfahren und Vorrichtung zum Modelieren eines chemisch-mechanischen Polierprozesses Withdrawn DE19882821T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97255197A 1997-11-18 1997-11-18
PCT/US1998/024231 WO1999025520A1 (en) 1997-11-18 1998-11-12 Method and apparatus for modeling a chemical mechanical polishing process

Publications (1)

Publication Number Publication Date
DE19882821T1 true DE19882821T1 (de) 2001-05-10

Family

ID=25519800

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19882821T Withdrawn DE19882821T1 (de) 1997-11-18 1998-11-12 Verfahren und Vorrichtung zum Modelieren eines chemisch-mechanischen Polierprozesses

Country Status (5)

Country Link
JP (1) JP2001523586A (ja)
KR (1) KR20010032223A (ja)
DE (1) DE19882821T1 (ja)
GB (1) GB2346103A (ja)
WO (1) WO1999025520A1 (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001249724A1 (en) * 2000-04-03 2001-10-15 Speed-Fam-Ipec Corporation System and method for predicting software models using material-centric process instrumentation
US7097534B1 (en) 2000-07-10 2006-08-29 Applied Materials, Inc. Closed-loop control of a chemical mechanical polisher
DE10065380B4 (de) 2000-12-27 2006-05-18 Infineon Technologies Ag Verfahren zur Charakterisierung und Simulation eines chemisch-mechanischen Polier-Prozesses
US7160739B2 (en) * 2001-06-19 2007-01-09 Applied Materials, Inc. Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles
US20020192966A1 (en) * 2001-06-19 2002-12-19 Shanmugasundram Arulkumar P. In situ sensor based control of semiconductor processing procedure
DE10208165C1 (de) * 2002-02-26 2003-10-02 Advanced Micro Devices Inc Verfahren, Steuerung und Vorrichtung zum Steuern des chemisch-mechanischen Polierens von Substraten
JP4777658B2 (ja) 2002-11-22 2011-09-21 アプライド マテリアルズ インコーポレイテッド 研磨制御のための方法および器具
JP4266668B2 (ja) * 2003-02-25 2009-05-20 株式会社ルネサステクノロジ シミュレーション装置
US7394554B2 (en) * 2003-09-15 2008-07-01 Timbre Technologies, Inc. Selecting a hypothetical profile to use in optical metrology
DE102005000645B4 (de) * 2004-01-12 2010-08-05 Samsung Electronics Co., Ltd., Suwon Vorrichtung und ein Verfahren zum Behandeln von Substraten
JP4952155B2 (ja) * 2006-09-12 2012-06-13 富士通株式会社 研磨条件予測プログラム、記録媒体、研磨条件予測装置および研磨条件予測方法
US8117568B2 (en) 2008-09-25 2012-02-14 International Business Machines Corporation Apparatus, method and computer program product for fast simulation of manufacturing effects during integrated circuit design
WO2018074091A1 (ja) * 2016-10-18 2018-04-26 株式会社 荏原製作所 基板処理制御システム、基板処理制御方法、およびプログラム
JP6753758B2 (ja) * 2016-10-18 2020-09-09 株式会社荏原製作所 研磨装置、研磨方法およびプログラム
JP6782145B2 (ja) * 2016-10-18 2020-11-11 株式会社荏原製作所 基板処理制御システム、基板処理制御方法、およびプログラム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5599423A (en) * 1995-06-30 1997-02-04 Applied Materials, Inc. Apparatus and method for simulating and optimizing a chemical mechanical polishing system
US5637031A (en) * 1996-06-07 1997-06-10 Industrial Technology Research Institute Electrochemical simulator for chemical-mechanical polishing (CMP)

Also Published As

Publication number Publication date
GB0010451D0 (en) 2000-06-14
JP2001523586A (ja) 2001-11-27
KR20010032223A (ko) 2001-04-16
GB2346103A (en) 2000-08-02
WO1999025520A1 (en) 1999-05-27

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8139 Disposal/non-payment of the annual fee