DE19527681A1 - Projektionsbelichtungsverfahren und -vorrichtung sowie Maske hierfür - Google Patents

Projektionsbelichtungsverfahren und -vorrichtung sowie Maske hierfür

Info

Publication number
DE19527681A1
DE19527681A1 DE19527681A DE19527681A DE19527681A1 DE 19527681 A1 DE19527681 A1 DE 19527681A1 DE 19527681 A DE19527681 A DE 19527681A DE 19527681 A DE19527681 A DE 19527681A DE 19527681 A1 DE19527681 A1 DE 19527681A1
Authority
DE
Germany
Prior art keywords
mask
light
grating
lattice
triangles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19527681A
Other languages
German (de)
English (en)
Inventor
Ho-Young Kang
Cheol-Hong Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of DE19527681A1 publication Critical patent/DE19527681A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE19527681A 1994-07-30 1995-07-28 Projektionsbelichtungsverfahren und -vorrichtung sowie Maske hierfür Withdrawn DE19527681A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940018943A KR960005757A (ko) 1994-07-30 1994-07-30 투영 노광 방법, 이에 사용되는 투영 노광 장치 및 마스크

Publications (1)

Publication Number Publication Date
DE19527681A1 true DE19527681A1 (de) 1996-02-08

Family

ID=19389579

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19527681A Withdrawn DE19527681A1 (de) 1994-07-30 1995-07-28 Projektionsbelichtungsverfahren und -vorrichtung sowie Maske hierfür

Country Status (4)

Country Link
JP (1) JPH0862851A (ko)
KR (1) KR960005757A (ko)
DE (1) DE19527681A1 (ko)
TW (1) TW295676B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001063864A2 (en) * 2000-02-22 2001-08-30 Micron Technology, Inc. Chromeless alternating phase-shift reticle for producing semiconductor device features

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100468740B1 (ko) * 2002-06-22 2005-01-29 삼성전자주식회사 변형 조명을 제공하는 위상 격자 패턴 설계 방법 및 이를이용한 포토 마스크 제조 방법
CN104459875B (zh) * 2014-12-19 2017-04-05 中国科学院上海光学精密机械研究所 相位掩模板自动切换装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001063864A2 (en) * 2000-02-22 2001-08-30 Micron Technology, Inc. Chromeless alternating phase-shift reticle for producing semiconductor device features
WO2001063864A3 (en) * 2000-02-22 2002-03-21 Micron Technology Inc Chromeless alternating phase-shift reticle for producing semiconductor device features
US6376130B1 (en) 2000-02-22 2002-04-23 Micron Technology, Inc. Chromeless alternating reticle for producing semiconductor device features

Also Published As

Publication number Publication date
JPH0862851A (ja) 1996-03-08
KR960005757A (ko) 1996-02-23
TW295676B (ko) 1997-01-11

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee