DE1906392B2 - Photographisches verfahren zum herstellen von abbildungen - Google Patents
Photographisches verfahren zum herstellen von abbildungenInfo
- Publication number
- DE1906392B2 DE1906392B2 DE19691906392 DE1906392A DE1906392B2 DE 1906392 B2 DE1906392 B2 DE 1906392B2 DE 19691906392 DE19691906392 DE 19691906392 DE 1906392 A DE1906392 A DE 1906392A DE 1906392 B2 DE1906392 B2 DE 1906392B2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- photochromic
- parts
- irradiated
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 6
- 238000001311 chemical methods and process Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000004304 visual acuity Effects 0.000 claims 2
- 238000009826 distribution Methods 0.000 claims 1
- 238000010410 dusting Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000005755 formation reaction Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 230000000873 masking effect Effects 0.000 claims 1
- RZWWGOCLMSGROE-UHFFFAOYSA-N n-(2,6-dichlorophenyl)-5,7-dimethyl-[1,2,4]triazolo[1,5-a]pyrimidine-2-sulfonamide Chemical compound N1=C2N=C(C)C=C(C)N2N=C1S(=O)(=O)NC1=C(Cl)C=CC=C1Cl RZWWGOCLMSGROE-UHFFFAOYSA-N 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 230000000704 physical effect Effects 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- -1 B. Cadmiujpiselenid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/56—Processes using photosensitive compositions covered by the groups G03C1/64 - G03C1/72 or agents therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US70465368A | 1968-02-12 | 1968-02-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE1906392A1 DE1906392A1 (de) | 1970-04-23 |
| DE1906392B2 true DE1906392B2 (de) | 1976-10-28 |
Family
ID=24830374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19691906392 Granted DE1906392B2 (de) | 1968-02-12 | 1969-02-08 | Photographisches verfahren zum herstellen von abbildungen |
Country Status (5)
| Country | Link |
|---|---|
| BE (1) | BE728262A (enrdf_load_html_response) |
| CH (1) | CH513571A (enrdf_load_html_response) |
| DE (1) | DE1906392B2 (enrdf_load_html_response) |
| FR (1) | FR1602470A (enrdf_load_html_response) |
| GB (1) | GB1214458A (enrdf_load_html_response) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4340276A (en) | 1978-11-01 | 1982-07-20 | Minnesota Mining And Manufacturing Company | Method of producing a microstructured surface and the article produced thereby |
| CN110612001B (zh) * | 2018-06-14 | 2023-06-30 | 因特瓦克公司 | 多色介电涂层及uv喷墨打印 |
-
1968
- 1968-12-26 FR FR1602470D patent/FR1602470A/fr not_active Expired
-
1969
- 1969-01-20 GB GB307669A patent/GB1214458A/en not_active Expired
- 1969-02-07 CH CH196669A patent/CH513571A/fr not_active IP Right Cessation
- 1969-02-08 DE DE19691906392 patent/DE1906392B2/de active Granted
- 1969-02-12 BE BE728262D patent/BE728262A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1214458A (en) | 1970-12-02 |
| DE1906392A1 (de) | 1970-04-23 |
| FR1602470A (enrdf_load_html_response) | 1970-11-30 |
| BE728262A (enrdf_load_html_response) | 1969-07-16 |
| CH513571A (fr) | 1971-09-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| SH | Request for examination between 03.10.1968 and 22.04.1971 | ||
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 |