DE1544322A1 - Verfahren zur Herstellung von UEbergaengen in Halbleitern - Google Patents

Verfahren zur Herstellung von UEbergaengen in Halbleitern

Info

Publication number
DE1544322A1
DE1544322A1 DE19661544322 DE1544322A DE1544322A1 DE 1544322 A1 DE1544322 A1 DE 1544322A1 DE 19661544322 DE19661544322 DE 19661544322 DE 1544322 A DE1544322 A DE 1544322A DE 1544322 A1 DE1544322 A1 DE 1544322A1
Authority
DE
Germany
Prior art keywords
silicon
certain
semiconductor
conductivity type
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19661544322
Other languages
German (de)
English (en)
Inventor
Murray Bloom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TRW Semiconductors Inc
Original Assignee
TRW Semiconductors Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TRW Semiconductors Inc filed Critical TRW Semiconductors Inc
Publication of DE1544322A1 publication Critical patent/DE1544322A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • H10P14/22—
    • H10P14/2905—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
DE19661544322 1965-04-21 1966-04-19 Verfahren zur Herstellung von UEbergaengen in Halbleitern Pending DE1544322A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US44985565A 1965-04-21 1965-04-21

Publications (1)

Publication Number Publication Date
DE1544322A1 true DE1544322A1 (de) 1970-02-26

Family

ID=23785755

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19661544322 Pending DE1544322A1 (de) 1965-04-21 1966-04-19 Verfahren zur Herstellung von UEbergaengen in Halbleitern

Country Status (3)

Country Link
DE (1) DE1544322A1 (cg-RX-API-DMAC10.html)
GB (1) GB1077320A (cg-RX-API-DMAC10.html)
NL (1) NL6602553A (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2142045B (en) * 1983-06-15 1987-12-31 British Telecomm Growth of semiconductors
GB8421162D0 (en) * 1984-08-21 1984-09-26 British Telecomm Growth of semi-conductors

Also Published As

Publication number Publication date
NL6602553A (cg-RX-API-DMAC10.html) 1966-10-24
GB1077320A (en) 1967-07-26

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