DE1178666B - Galvanic nickel bath - Google Patents

Galvanic nickel bath

Info

Publication number
DE1178666B
DE1178666B DEG30300A DEG0030300A DE1178666B DE 1178666 B DE1178666 B DE 1178666B DE G30300 A DEG30300 A DE G30300A DE G0030300 A DEG0030300 A DE G0030300A DE 1178666 B DE1178666 B DE 1178666B
Authority
DE
Germany
Prior art keywords
acetylene
propine
pyridyl
bath
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEG30300A
Other languages
German (de)
Inventor
Jean Albert Marie Anto Gautier
Jean-Louis Levasseur
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Grauer & Weil Sarl
JEAN ALBERT MARIE ANTOINE GAUT
PERNIX SOC
Original Assignee
Grauer & Weil Sarl
JEAN ALBERT MARIE ANTOINE GAUT
PERNIX SOC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grauer & Weil Sarl, JEAN ALBERT MARIE ANTOINE GAUT, PERNIX SOC filed Critical Grauer & Weil Sarl
Publication of DE1178666B publication Critical patent/DE1178666B/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/24—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D213/28—Radicals substituted by singly-bound oxygen or sulphur atoms
    • C07D213/30—Oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Pyridine Compounds (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Description

BUNDESREPUBLIK DEUTSCHLANDFEDERAL REPUBLIC OF GERMANY

DEUTSCHESGERMAN

PATENTAMTPATENT OFFICE

AUSLEGESCHRIFTEDITORIAL

Internat. Kl.: C 23 b Boarding school Class: C 23 b

Deutsche Kl.: 48 a-5/08 German class: 48 a -5/08

Nummer: 1178 666 Number: 1 178 666

Aktenzeichen: G 30300 VI b / 48 a File number: G 30300 VI b / 48 a

Anmeldetag: 16. August 1960 Filing date: August 16, 1960

Auslegetag: 24. September 1964 Opening day: September 24, 1964

Die Erfindung betrifft ein galvanisches Nickelbad, bestehend aus einer Lösung von Nickelsalzen, Borsäure und einer Acetylenverbindung, die durch mindestens einen Phenylrest und mindestens eine wasserlöslichmachende Gruppe substituiert ist.The invention relates to a galvanic nickel bath consisting of a solution of nickel salts and boric acid and an acetylene compound represented by at least one phenyl group and at least one water-solubilizing group is substituted.

Es sind bereits saure galvanische Nickelbäder bekannt, die Acetylenverbindungen mit wenigstens einem Benzolring und einer wasserlöslichmachenden Gruppe als Substituenten enthalten. Diese Verbindungen enthalten im Molekül nur einen Benzolring.There are already known acidic galvanic nickel baths, the acetylene compounds with at least contain a benzene ring and a water-solubilizing group as substituents. These connections contain only one benzene ring in the molecule.

Bei diesem bekannten Bad ist insbesondere wegen des Gehaltes an Nickelsalzen und der Borsäure ein Stabilisator erforderlich, der von Sulfimiden und Sulfonamiden gebildet wird. Ferner wird ein Weichmacher benötigt. *5In this known bath is a particularly because of the content of nickel salts and boric acid Stabilizer required, which is formed by sulfimides and sulfonamides. It also becomes a plasticizer needed. * 5

Die Erfindung setzt sich die Aufgabe, zur Vermeidung dieser Nachteile mit einem einzigen als Sättigungsmittel dienenden Agens auszukommen. Darüber hinaus wird eine Verbesserung der Brillanz angestrebt. The invention has the object of avoiding these disadvantages with a single saturant serving agent. In addition, the aim is to improve the brilliance.

Eine leichte Verarbeitung unter Erzielung einer außergewöhnlichen Qualität der erhaltenen Niederschläge, wie Glanz, Gleichmäßigkeit, Duktilität und vor allen Dingen Porenfreiheit, wird gemäß der Erfindung dadurch erreicht, daß das Bad eine solche Acetylen-Benzol-Verbindung enthält, bei der ein Pyridinring über einen seiner Kohlenstoffatome an ein Kohlenstoffatom der Acetylenkette mit wenigstens einer Dreifachbindung gebunden ist.Easy processing, achieving exceptional quality of the precipitates obtained, such as gloss, evenness, ductility and, above all, freedom from pores, is made according to the Invention achieved in that the bath contains such an acetylene-benzene compound in which a Pyridine ring via one of its carbon atoms to one carbon atom of the acetylene chain with at least a triple bond is tied.

Vorzugsweise ist diese Verbindung ein 1,3-Diphenyll-(pyridyl-3)-propin-(2)-ol-(l), der Formel:This compound is preferably a 1,3-diphenyl- (pyridyl-3) -propine- (2) -ol- (l), the formula:

Galvanisches NickelbadGalvanic nickel bath

OHOH

-C — (-C - (

= C—CeHs = C-C e H s

die in einer Menge von 0,02 bis 0,3 g pro Liter zugefügt wird.which is added in an amount of 0.02 to 0.3 g per liter.

Eine weitere bevorzugt anzuwendende Verbindung ist ein l-Phenyl-l-(pyridyl-3)-propin-(2)-ol-(l) der FormelAnother preferred compound to be used is a l-phenyl-l- (pyridyl-3) -propine- (2) -ol- (l) der formula

OHOH

— C-CH- C-CH

C6HC 6 H

6H5 6 H 5

das dem Bad in einer
Litei zugesetzt wird.the bathroom in one
Litei is added.

Menge von etwa 0,8 g je Anmelder:Quantity of about 0.8 g per applicant:

Jean Albert Marie Antoine Gautier und Societe Pernix, Grauer &Weil, S. A. R. L., ParisJean Albert Marie Antoine Gautier and Societe Pernix, Grauer & Weil, S. A. R. L., Paris

Vertreter:Representative:

Dipl.-Ing. W. Mouths, Patentanwalt, Frankfurt/M., Krögerstr. 5Dipl.-Ing. W. Mouths, patent attorney, Frankfurt / M., Krögerstr. 5

Als Erfinder benannt: Jean Albert Marie Antoine Gautier, Jean-Louis Levasseur, ParisNamed inventor: Jean Albert Marie Antoine Gautier, Jean-Louis Levasseur, Paris

Beanspruchte Priorität:Claimed priority:

Frankreich vom 2. Februar 1960 (817 342)France of February 2, 1960 (817 342)

Die anderen Verbindungen nach der Erfindung sind mit anderen Zusätzen, die in den Vernickelungsbädern im allgemeinen gebraucht werden, wie Saccharin, Benzoesäuresulfinimid, o-Toluolsulfonamid, p-Toluolsulfonamid, naphthalintrisulfonsaures Natrium, gewisse Acetylenderivate usw., verträglich.The other compounds according to the invention are with other additives which are generally used in the nickel-plating baths, such as saccharin, Benzoic acid sulfinimide, o-toluenesulfonamide, p-toluenesulfonamide, Sodium naphthalenetrisulfonic acid, certain acetylene derivatives, etc., compatible.

Die Erfindung wird durch folgende Beispiele näher erläutert:The invention is explained in more detail by the following examples:

Beispiel 1example 1

NiSO4-7 H2O 350 g/lNiSO 4 -7 H 2 O 350 g / l

NiCl2 · 6 H2O 80 g/lNiCl 2 · 6 H 2 O 80 g / l

H3BO3 40 g/lH 3 BO 3 40 g / l

Saccharin 0,2 g/lSaccharin 0.2 g / l

l,3-Diphenyl-l-(pyridyl-3)-propin-(2)-1,3-Diphenyl-l- (pyridyl-3) -propine- (2) -

ol-(l) 0,15 g/lol- (l) 0.15 g / l

Laurylsulfat 0,2 g/lLauryl sulfate 0.2 g / l

Temperatur 6O0CTemperature 6O 0 C

Stromdichte 5 A/dm2 Current density 5 A / dm 2

pH-Wert 4,0pH 4.0

Beispiel 2Example 2

NiSO4-7 H2O 200 g/lNiSO 4 -7 H 2 O 200 g / l

NiCl2 · 6 H2O 10 g/lNiCl 2 · 6 H 2 O 10 g / l

H3BO3 10 g/lH 3 BO 3 10 g / l

naphthalintrisulfonsaures Natrium ... 0,5 g/lSodium naphthalenetrisulphonic acid ... 0.5 g / l

409 688/297409 688/297

l,3-Diphenyl-l-(pyridyl-3)-propin-(2)-1,3-Diphenyl-l- (pyridyl-3) -propine- (2) -

ol-(l) ol- (l)

Temperatur temperature

Stromdichte Current density

pH-Wert , PH value ,

0,05 g/l 600C 5 A/dm2 4,00.05 g / l 60 0 C 5 A / dm 2 4.0

Beispiel 3Example 3

Nickelfluorborat 320 g/lNickel fluoroborate 320 g / l

H3BO3 30 g/lH 3 BO 3 30 g / l

p-Toluolsulfonamid 0,2 g/Ip-toluenesulfonamide 0.2 g / l

l,3-Diphenyl-l-(pyridyl-3)-propin-(2)-1,3-Diphenyl-l- (pyridyl-3) -propine- (2) -

ol-(l) 0,2 g/lol- (l) 0.2 g / l

Temperatur 6O0CTemperature 6O 0 C

Stromdichte 5 A/dm2 Current density 5 A / dm 2

pH-Wert 4,0pH 4.0

Beispiel 4Example 4

NiSO4 -7 H2O 250 g/lNiSO 4 -7 H 2 O 250 g / l

NiCl2-OH2O 40 g/lNiCl 2 -OH 2 O 40 g / l

H3BO3 30 g/l aoH 3 BO 3 30 g / l ao

Saccharin 0,2 g/lSaccharin 0.2 g / l

l-Phenyl-l-(pyridyl-3)-propin-(2)-ol-(l) 0,8 g/ll-phenyl-l- (pyridyl-3) -propine- (2) -ol- (l) 0.8 g / l

Temperatur 60°CTemperature 60 ° C

Stromdichte 5 A/dm2 Current density 5 A / dm 2

pH-Wert 4,0 a5 pH 4.0 a 5

Claims (3)

Patentansprüche:Patent claims: 1. Bad zum galvanischen Abscheiden von Nickelüberzügen, bestehend aus einer Lösung von Nickelsalzen, Borsäure und einer Acetylenverbindung, die durch mindestens einen Phenylrest und mindestens eine wasserlöslichmachende Gruppe substituiert ist, dadurch gekennzeichnet, daß es eine solche Acetylen-Benzol-Verbindung enthält, bei der ein Pyridinring über einen seiner Kohlenstoffatome an ein Kohlenstoffatom der Acetylenkette mit wenigstens einer Dreifachbindung gebunden ist.1. Bath for the galvanic deposition of nickel coatings, consisting of a solution of nickel salts, boric acid and an acetylene compound, which is substituted by at least one phenyl radical and at least one water-solubilizing group, characterized in that that it contains such an acetylene-benzene compound in which a pyridine ring over one of its carbon atoms to a carbon atom of the acetylene chain with at least one Triple bond is tied. 2. Bad nach Anspruch 1, dadurch gekennzeichnet, daß es ein l,3-Diphenyl-l-(pyridyl-3)-propin-(2)-ol-(l) der Formel2. Bath according to claim 1, characterized in that there is a l, 3-diphenyl-l- (pyridyl-3) -propine- (2) -ol- (l) the formula OHOH ■ — C — C-. C-C6H5 ■ - C - C-. CC 6 H 5 C.H.C.H. in einer Menge von 0,02 bis 0,3 g je Liter enthält. contains in an amount of 0.02 to 0.3 g per liter. 3. Bad nach Anspruch 1, dadurch gekennzeichnet, daß es ein 1 -Phenyl- l-(pyridyl-3)-propin-(2)-ol-(l) der Formel3. Bath according to claim 1, characterized in that that it is a 1-phenyl- l- (pyridyl-3) -propine- (2) -ol- (l) of the formula OHOH — C — C CH- C - C CH N'N ' C6H5 C 6 H 5 in einer Menge von etwa 0,8 g je Liter enthält.contains in an amount of about 0.8 g per liter. In Betracht gezogene Druckschriften:
USA.-Patentschrift Nr. 2 800 442.Considered publications:
U.S. Patent No. 2,800,442.
DEG30300A 1960-02-02 1960-08-16 Galvanic nickel bath Pending DE1178666B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR817342A FR1256030A (en) 1960-02-02 1960-02-02 Improvements made to the means for producing nickel deposits by electrolytic means

Publications (1)

Publication Number Publication Date
DE1178666B true DE1178666B (en) 1964-09-24

Family

ID=8724629

Family Applications (1)

Application Number Title Priority Date Filing Date
DEG30300A Pending DE1178666B (en) 1960-02-02 1960-08-16 Galvanic nickel bath

Country Status (6)

Country Link
BE (1) BE599220A (en)
CH (1) CH407698A (en)
DE (1) DE1178666B (en)
ES (1) ES263694A1 (en)
FR (1) FR1256030A (en)
GB (1) GB897401A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484345A (en) * 1967-02-07 1969-12-16 Enthone Nickel electroplating

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2800442A (en) * 1955-10-04 1957-07-23 Udylite Res Corp Electrodeposition of nickel

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2800442A (en) * 1955-10-04 1957-07-23 Udylite Res Corp Electrodeposition of nickel

Also Published As

Publication number Publication date
BE599220A (en) 1961-05-16
FR1256030A (en) 1961-03-17
GB897401A (en) 1962-05-30
CH407698A (en) 1966-02-15
ES263694A1 (en) 1961-05-16

Similar Documents

Publication Publication Date Title
DE971806C (en) Electroplated nickel plating
DE1207177B (en) Process for the production of shiny galvanic metal coatings
DE1053274B (en) Bath for the production of galvanic metal coatings
DE1098781B (en) Bath for the production of high-gloss galvanic metal coatings
DE1184172B (en) Process for the galvanic deposition of firmly adhering and high-gloss copper coatings
DE2537065C2 (en)
CH629541A5 (en) METHOD FOR ELECTROLYTICALLY DEPOSITING AN IRON ALLOY.
DE1670376A1 (en) Electrolytic nickel bath
DE1178666B (en) Galvanic nickel bath
DE1237870B (en) Acid galvanic nickel bath
DE1146322B (en) Acid galvanic metal baths
DE1030133B (en) Process for the production of galvanic copper coatings
DE1248414B (en) Bath and method for galvanic deposition of nickel coatings
DE1151706B (en) Acid galvanic nickel bath
DE1084098B (en) Acid baths for the production of galvanic copper coatings
DE1233690B (en) Galvanic nickel bath
DE1208593B (en) Acid galvanic nickel bath for the deposition of semi-glossy coatings
DE1168208B (en) Galvanic metal baths
DE1086508B (en) Acid galvanic copper bath
DE1248415B (en) Acid galvanic copper baths
DE1028407B (en) Bath and process for the galvanic deposition of shiny nickel coatings
DE1173762B (en) Acid galvanic nickel bath
DE1264205B (en) Acid galvanic baths for the deposition of especially nickel coatings
DE1232799B (en) Acid galvanic bath
AT202829B (en) Process for the production of electroplated metal coatings