DE112013004359A5 - Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage - Google Patents

Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage Download PDF

Info

Publication number
DE112013004359A5
DE112013004359A5 DE112013004359.9T DE112013004359T DE112013004359A5 DE 112013004359 A5 DE112013004359 A5 DE 112013004359A5 DE 112013004359 T DE112013004359 T DE 112013004359T DE 112013004359 A5 DE112013004359 A5 DE 112013004359A5
Authority
DE
Germany
Prior art keywords
coating plant
reservoir
plant
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112013004359.9T
Other languages
English (en)
Inventor
Michael Popp
Marc Philippens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pictiva Displays International Ltd
Original Assignee
Osram Oled GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osram Oled GmbH filed Critical Osram Oled GmbH
Publication of DE112013004359A5 publication Critical patent/DE112013004359A5/de
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01BBOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/02Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material to surfaces by single means not covered by groups B05C1/00 - B05C7/00, whether or not also using other means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/70Containers, packaging elements or packages, specially adapted for particular articles or materials for materials not otherwise provided for
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
DE112013004359.9T 2012-09-05 2013-07-19 Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage Pending DE112013004359A5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012215708.5 2012-09-05
DE102012215708.5A DE102012215708A1 (de) 2012-09-05 2012-09-05 Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage
PCT/EP2013/065293 WO2014037139A1 (de) 2012-09-05 2013-07-19 Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage

Publications (1)

Publication Number Publication Date
DE112013004359A5 true DE112013004359A5 (de) 2015-05-21

Family

ID=49029066

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102012215708.5A Withdrawn DE102012215708A1 (de) 2012-09-05 2012-09-05 Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage
DE112013004359.9T Pending DE112013004359A5 (de) 2012-09-05 2013-07-19 Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102012215708.5A Withdrawn DE102012215708A1 (de) 2012-09-05 2012-09-05 Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage

Country Status (3)

Country Link
US (1) US20150203964A1 (de)
DE (2) DE102012215708A1 (de)
WO (1) WO2014037139A1 (de)

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3222149A (en) * 1963-02-19 1965-12-07 Warren W Drummond Method for producing conductive glass fiber yarn
GB1559978A (en) * 1976-12-01 1980-01-30 Gen Electric Co Ltd Chemical vapour deposition processes
JPH0269389A (ja) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法
US4975416A (en) * 1988-11-18 1990-12-04 Sumitomo Electric Industries, Ltd. Method of producing superconducting ceramic wire
US5989305A (en) * 1995-03-09 1999-11-23 Shin-Etsu Chemical Co., Ltd. Feeder of a solid organometallic compound
EP1132493A3 (de) * 2000-03-09 2001-09-19 Junji Kido Verfahren zur Abscheidung aus der Dampfphase von organischen Komponenten und zur Verfeinerung von organischen Komponenten
DE10048759A1 (de) * 2000-09-29 2002-04-11 Aixtron Gmbh Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD
JP2003002778A (ja) * 2001-06-26 2003-01-08 International Manufacturing & Engineering Services Co Ltd 薄膜堆積用分子線セル
US6915592B2 (en) * 2002-07-29 2005-07-12 Applied Materials, Inc. Method and apparatus for generating gas to a processing chamber
KR101183109B1 (ko) * 2002-07-30 2012-09-24 에이에스엠 아메리카, 인코포레이티드 캐리어 가스를 이용하는 승화 시스템
US7722720B2 (en) * 2004-12-08 2010-05-25 Rohm And Haas Electronic Materials Llc Delivery device
EP1860208B1 (de) * 2006-05-22 2014-10-15 Rohm and Haas Electronic Materials LLC Schicht Abscheidungsverfahren
US7775508B2 (en) * 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
TWI535874B (zh) * 2006-12-13 2016-06-01 環球展覽公司 用於固相材料之改良蒸發方法
TWI388078B (zh) * 2008-01-30 2013-03-01 Osram Opto Semiconductors Gmbh 電子組件之製造方法及電子組件
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
DE102009024411A1 (de) 2009-03-24 2010-09-30 Osram Opto Semiconductors Gmbh Dünnschichtverkapselung für ein optoelektronisches Bauelement, Verfahren zu dessen Herstellung und optoelektronisches Bauelement
KR101030005B1 (ko) * 2009-09-25 2011-04-20 삼성모바일디스플레이주식회사 증착 소스

Also Published As

Publication number Publication date
US20150203964A1 (en) 2015-07-23
DE102012215708A1 (de) 2014-03-06
WO2014037139A1 (de) 2014-03-13

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Legal Events

Date Code Title Description
R012 Request for examination validly filed
R081 Change of applicant/patentee

Owner name: PICTIVA DISPLAYS INTERNATIONAL LIMITED, IE

Free format text: FORMER OWNER: OSRAM OLED GMBH, 93049 REGENSBURG, DE

R082 Change of representative

Representative=s name: EPPING HERMANN FISCHER PATENTANWALTSGESELLSCHA, DE

R016 Response to examination communication