DE112013004359A5 - Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage - Google Patents
Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage Download PDFInfo
- Publication number
- DE112013004359A5 DE112013004359A5 DE112013004359.9T DE112013004359T DE112013004359A5 DE 112013004359 A5 DE112013004359 A5 DE 112013004359A5 DE 112013004359 T DE112013004359 T DE 112013004359T DE 112013004359 A5 DE112013004359 A5 DE 112013004359A5
- Authority
- DE
- Germany
- Prior art keywords
- coating plant
- reservoir
- plant
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/02—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material to surfaces by single means not covered by groups B05C1/00 - B05C7/00, whether or not also using other means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/70—Containers, packaging elements or packages, specially adapted for particular articles or materials for materials not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012215708.5 | 2012-09-05 | ||
DE102012215708.5A DE102012215708A1 (de) | 2012-09-05 | 2012-09-05 | Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage |
PCT/EP2013/065293 WO2014037139A1 (de) | 2012-09-05 | 2013-07-19 | Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage |
Publications (1)
Publication Number | Publication Date |
---|---|
DE112013004359A5 true DE112013004359A5 (de) | 2015-05-21 |
Family
ID=49029066
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102012215708.5A Withdrawn DE102012215708A1 (de) | 2012-09-05 | 2012-09-05 | Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage |
DE112013004359.9T Pending DE112013004359A5 (de) | 2012-09-05 | 2013-07-19 | Vorratsbehälter für eine Beschichtungsanlage und Beschichtungsanlage |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102012215708.5A Withdrawn DE102012215708A1 (de) | 2012-09-05 | 2012-09-05 | Vorratsbehälter für eine beschichtungsanlage und beschichtungsanlage |
Country Status (3)
Country | Link |
---|---|
US (1) | US20150203964A1 (de) |
DE (2) | DE102012215708A1 (de) |
WO (1) | WO2014037139A1 (de) |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3222149A (en) * | 1963-02-19 | 1965-12-07 | Warren W Drummond | Method for producing conductive glass fiber yarn |
GB1559978A (en) * | 1976-12-01 | 1980-01-30 | Gen Electric Co Ltd | Chemical vapour deposition processes |
JPH0269389A (ja) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
US4975416A (en) * | 1988-11-18 | 1990-12-04 | Sumitomo Electric Industries, Ltd. | Method of producing superconducting ceramic wire |
US5989305A (en) * | 1995-03-09 | 1999-11-23 | Shin-Etsu Chemical Co., Ltd. | Feeder of a solid organometallic compound |
EP1132493A3 (de) * | 2000-03-09 | 2001-09-19 | Junji Kido | Verfahren zur Abscheidung aus der Dampfphase von organischen Komponenten und zur Verfeinerung von organischen Komponenten |
DE10048759A1 (de) * | 2000-09-29 | 2002-04-11 | Aixtron Gmbh | Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD |
JP2003002778A (ja) * | 2001-06-26 | 2003-01-08 | International Manufacturing & Engineering Services Co Ltd | 薄膜堆積用分子線セル |
US6915592B2 (en) * | 2002-07-29 | 2005-07-12 | Applied Materials, Inc. | Method and apparatus for generating gas to a processing chamber |
KR101183109B1 (ko) * | 2002-07-30 | 2012-09-24 | 에이에스엠 아메리카, 인코포레이티드 | 캐리어 가스를 이용하는 승화 시스템 |
US7722720B2 (en) * | 2004-12-08 | 2010-05-25 | Rohm And Haas Electronic Materials Llc | Delivery device |
EP1860208B1 (de) * | 2006-05-22 | 2014-10-15 | Rohm and Haas Electronic Materials LLC | Schicht Abscheidungsverfahren |
US7775508B2 (en) * | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
TWI535874B (zh) * | 2006-12-13 | 2016-06-01 | 環球展覽公司 | 用於固相材料之改良蒸發方法 |
TWI388078B (zh) * | 2008-01-30 | 2013-03-01 | Osram Opto Semiconductors Gmbh | 電子組件之製造方法及電子組件 |
US8741062B2 (en) * | 2008-04-22 | 2014-06-03 | Picosun Oy | Apparatus and methods for deposition reactors |
DE102009024411A1 (de) | 2009-03-24 | 2010-09-30 | Osram Opto Semiconductors Gmbh | Dünnschichtverkapselung für ein optoelektronisches Bauelement, Verfahren zu dessen Herstellung und optoelektronisches Bauelement |
KR101030005B1 (ko) * | 2009-09-25 | 2011-04-20 | 삼성모바일디스플레이주식회사 | 증착 소스 |
-
2012
- 2012-09-05 DE DE102012215708.5A patent/DE102012215708A1/de not_active Withdrawn
-
2013
- 2013-07-19 US US14/423,685 patent/US20150203964A1/en not_active Abandoned
- 2013-07-19 WO PCT/EP2013/065293 patent/WO2014037139A1/de active Application Filing
- 2013-07-19 DE DE112013004359.9T patent/DE112013004359A5/de active Pending
Also Published As
Publication number | Publication date |
---|---|
US20150203964A1 (en) | 2015-07-23 |
DE102012215708A1 (de) | 2014-03-06 |
WO2014037139A1 (de) | 2014-03-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R012 | Request for examination validly filed | ||
R081 | Change of applicant/patentee |
Owner name: PICTIVA DISPLAYS INTERNATIONAL LIMITED, IE Free format text: FORMER OWNER: OSRAM OLED GMBH, 93049 REGENSBURG, DE |
|
R082 | Change of representative |
Representative=s name: EPPING HERMANN FISCHER PATENTANWALTSGESELLSCHA, DE |
|
R016 | Response to examination communication |