DE10305109B8 - Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung - Google Patents

Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung Download PDF

Info

Publication number
DE10305109B8
DE10305109B8 DE2003105109 DE10305109A DE10305109B8 DE 10305109 B8 DE10305109 B8 DE 10305109B8 DE 2003105109 DE2003105109 DE 2003105109 DE 10305109 A DE10305109 A DE 10305109A DE 10305109 B8 DE10305109 B8 DE 10305109B8
Authority
DE
Germany
Prior art keywords
production
component
insulating layer
highly insulating
electrically highly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE2003105109
Other languages
English (en)
Other versions
DE10305109A1 (de
DE10305109B4 (de
Inventor
Mario Dr. Birkholz
Thomas Dr. Rer. Nat. Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority to DE2003105109 priority Critical patent/DE10305109B8/de
Publication of DE10305109A1 publication Critical patent/DE10305109A1/de
Publication of DE10305109B4 publication Critical patent/DE10305109B4/de
Application granted granted Critical
Publication of DE10305109B8 publication Critical patent/DE10305109B8/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228Gas flow assisted PVD deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/10Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74Physical characteristics
    • C04B2235/78Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
    • C04B2235/781Nanograined materials, i.e. having grain sizes below 100 nm

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Physical Vapour Deposition (AREA)
DE2003105109 2003-02-07 2003-02-07 Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung Expired - Fee Related DE10305109B8 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE2003105109 DE10305109B8 (de) 2003-02-07 2003-02-07 Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2003105109 DE10305109B8 (de) 2003-02-07 2003-02-07 Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung

Publications (3)

Publication Number Publication Date
DE10305109A1 DE10305109A1 (de) 2004-08-26
DE10305109B4 DE10305109B4 (de) 2010-07-08
DE10305109B8 true DE10305109B8 (de) 2010-11-11

Family

ID=32747628

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2003105109 Expired - Fee Related DE10305109B8 (de) 2003-02-07 2003-02-07 Bauteil mit einer elektrisch hochisolierenden Schicht und Verfahren zu dessen Herstellung

Country Status (1)

Country Link
DE (1) DE10305109B8 (de)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0701982A1 (de) * 1994-09-16 1996-03-20 Sumitomo Electric Industries, Limited Werkzeuge die diesem Film enthalten Mehrschichtfilm mit ultrafeinen Partikeln und hartem Verbundwerkstoff
DE19830206A1 (de) * 1997-09-16 1999-03-18 Fraunhofer Ges Forschung Verfahren zur Beschichtung von Substraten mit Aluminiumoxid (Al¶2¶O¶3¶) und damit beschichtetes Werkstück
DE19804838A1 (de) * 1998-01-29 1999-08-05 Inst Angewandte Chemie Berlin Verfahren zur plasmagestützten Oberflächenwandlung teilchenförmiger Stoffe sowie Hohlkathoden-Plasmaquelle
DE10104611A1 (de) * 2001-02-02 2002-08-14 Bosch Gmbh Robert Vorrichtung zur keramikartigen Beschichtung eines Substrates

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0701982A1 (de) * 1994-09-16 1996-03-20 Sumitomo Electric Industries, Limited Werkzeuge die diesem Film enthalten Mehrschichtfilm mit ultrafeinen Partikeln und hartem Verbundwerkstoff
DE19830206A1 (de) * 1997-09-16 1999-03-18 Fraunhofer Ges Forschung Verfahren zur Beschichtung von Substraten mit Aluminiumoxid (Al¶2¶O¶3¶) und damit beschichtetes Werkstück
DE19804838A1 (de) * 1998-01-29 1999-08-05 Inst Angewandte Chemie Berlin Verfahren zur plasmagestützten Oberflächenwandlung teilchenförmiger Stoffe sowie Hohlkathoden-Plasmaquelle
DE10104611A1 (de) * 2001-02-02 2002-08-14 Bosch Gmbh Robert Vorrichtung zur keramikartigen Beschichtung eines Substrates

Also Published As

Publication number Publication date
DE10305109A1 (de) 2004-08-26
DE10305109B4 (de) 2010-07-08

Similar Documents

Publication Publication Date Title
DE60209148D1 (de) Beschichteter gegenstand mit verbesserter barriereschichtstruktur und verfahren zu dessen herstellung
ATE447942T1 (de) Verfahren zur herstellung einer gegen missbrauch gesicherten darreichungsform
DE60045375D1 (de) Verfahren zur ätzung einer schicht mit niedriger dielektrizitätskonstante
DE502005007446D1 (de) Optoelektronisches Bauelement mit mehreren Stromaufweitungsschichten und Verfahren zu dessen Herstellung
DE602004021927D1 (de) Halbleiterbauelement und verfahren zu seiner herstellung
DE602005004586D1 (de) Substrat mit hoher Zuverlässigkeit der elektrischen Verbindung einer mit Verdrahtungen verbundenen Durchkontaktierung und Verfahren zur Herstellung desselben
DE60325690D1 (de) Halbleiterbauelement und verfahren zu seiner herstellung
DE60144546D1 (de) Saphirsubstrat, elektronisches Bauelement und Verfahren zu dessen Herstellung
DE60116216D1 (de) Verfahren zur Reduzierung der Dielektrizitätskonstante in einer SiOC Schicht
DE60324376D1 (de) Halbleiterbauelement und Verfahren zu dessen Herstellung
DE602005002661D1 (de) Verfahren zur Herstellung einer leitfähigen Diamantelektrode
DE502004004097D1 (de) Schichtstruktur und verfahren zur herstellung einer schichtstruktur
DE69920280D1 (de) Passives elektrisches element und verfahren zu seiner herstellung
DE60207300D1 (de) Verfahren zur herstellung eines aerogelhaltigen isolationsgegenstandes
DE602005013692D1 (de) Halbleiterbauelement und verfahren zu seiner herstellung
DE60337036D1 (de) Halbleiterbauelement und verfahren zu seiner herstellung
DE602004018079D1 (de) Verfahren zur Herstellung eines elektrischen Widerstandsheizelements
DE502005010758D1 (de) Elektrische funktionseinheit und verfahren zu deren herstellung
DE60237174D1 (de) Elektrisch leitfähige Zusammensetzung, elektrisch leitfähige Beschichtung und Verfahren zur Bildung einer elektrisch leitfähigen Beschichtung
DE602005024595D1 (de) Verfahren zur herstellung eines elektrisch leitfähigen strukturmaterials
DE60322915D1 (de) Elektrisch abscheidbare dielektrische berzugsmittel sowie verfahren zur dielektrischen beschichtung von substraten
DE60239493D1 (de) Halbleiterbauelement und verfahren zu seiner herstellung
DE60327601D1 (de) Supraleitfähige schicht und verfahren zu ihrer herstellung
DE602004021601D1 (de) Positivphotoresistzusammensetzung und verfahren zur ausbildung einer resiststruktur
NO20031624D0 (no) Galvanisk metode for måling av elektrisk anisotropi

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8381 Inventor (new situation)

Inventor name: JUNG, THOMAS, DR. RER. NAT., 38173 SICKTE, DE

Inventor name: BIRKHOLZ, MARIO, DR., 38100 BRAUNSCHWEIG, DE

8396 Reprint of erroneous front page
8364 No opposition during term of opposition
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20130903