DE602005002661D1 - Verfahren zur Herstellung einer leitfähigen Diamantelektrode - Google Patents

Verfahren zur Herstellung einer leitfähigen Diamantelektrode

Info

Publication number
DE602005002661D1
DE602005002661D1 DE602005002661T DE602005002661T DE602005002661D1 DE 602005002661 D1 DE602005002661 D1 DE 602005002661D1 DE 602005002661 T DE602005002661 T DE 602005002661T DE 602005002661 T DE602005002661 T DE 602005002661T DE 602005002661 D1 DE602005002661 D1 DE 602005002661D1
Authority
DE
Germany
Prior art keywords
producing
conductive diamond
diamond electrode
electrode
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005002661T
Other languages
English (en)
Other versions
DE602005002661T2 (de
Inventor
Tomoyasu Shibata
Masashi Hosonuma
Tsuneto Furuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Nora Permelec Ltd
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Publication of DE602005002661D1 publication Critical patent/DE602005002661D1/de
Application granted granted Critical
Publication of DE602005002661T2 publication Critical patent/DE602005002661T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
DE602005002661T 2004-02-24 2005-02-22 Verfahren zur Herstellung einer leitfähigen Diamantelektrode Active DE602005002661T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004048460A JP4456378B2 (ja) 2004-02-24 2004-02-24 導電性ダイヤモンド電極の製造方法
JP2004048460 2004-02-24

Publications (2)

Publication Number Publication Date
DE602005002661D1 true DE602005002661D1 (de) 2007-11-15
DE602005002661T2 DE602005002661T2 (de) 2008-01-31

Family

ID=34747448

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005002661T Active DE602005002661T2 (de) 2004-02-24 2005-02-22 Verfahren zur Herstellung einer leitfähigen Diamantelektrode

Country Status (4)

Country Link
US (1) US7273536B2 (de)
EP (1) EP1568798B1 (de)
JP (1) JP4456378B2 (de)
DE (1) DE602005002661T2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070042667A1 (en) * 2002-03-08 2007-02-22 Chien-Min Sung Diamond-like carbon energy conversion devices and methods thereof
AT412002B (de) * 2002-07-08 2004-08-26 Wolfgang Dipl Ing Mag Wesner Diamantelektrode und verfahren zu ihrer herstellung
US7866342B2 (en) 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US7866343B2 (en) 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
US8555921B2 (en) 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
JP4535822B2 (ja) 2004-09-28 2010-09-01 ペルメレック電極株式会社 導電性ダイヤモンド電極及びその製造方法
DE102004047532B3 (de) * 2004-09-30 2006-01-26 Basf Coatings Ag Beschichtungsanlage, umfassend mindestens eine Vorbehandlungsanlage
JP4673696B2 (ja) * 2005-08-01 2011-04-20 ペルメレック電極株式会社 導電性ダイヤモンド電極及びその製造方法
JP4500745B2 (ja) * 2005-08-03 2010-07-14 ペルメレック電極株式会社 電解用電極の製造方法
US7833581B2 (en) * 2006-09-11 2010-11-16 The Hong Kong University Of Science And Technology Method for making a highly stable diamond film on a substrate
GB0622482D0 (en) * 2006-11-10 2006-12-20 Element Six Ltd Diamond electrode
CH705830B1 (de) * 2007-11-30 2013-06-14 Aonsys Technologies Ltd Verfahren und Geschirrspüler zum Reinigen von Geschirr mit elektrolysiertem Wasser mittels oxidativen Radikalen, erzeugt durch Diamant-Elektroden.
ATE486981T1 (de) * 2007-12-21 2010-11-15 Condias Gmbh Verfahren zur aufbringung einer diamantschicht auf ein graphitsubstrat
JP5284716B2 (ja) * 2008-07-31 2013-09-11 株式会社神戸製鋼所 ダイヤモンド電極とそのダイヤモンド電極の製造方法、およびオゾン発生装置
US20100101010A1 (en) * 2008-10-24 2010-04-29 Watkins Manufacturing Corporation Chlorinator for portable spas
US7939367B1 (en) 2008-12-18 2011-05-10 Crystallume Corporation Method for growing an adherent diamond layer atop an interlayer bonded to a compound semiconductor substrate
US8266736B2 (en) * 2009-07-16 2012-09-18 Watkins Manufacturing Corporation Drop-in chlorinator for portable spas
DE102009035546A1 (de) 2009-07-31 2011-02-03 Bayer Materialscience Ag Elektrode und Elektrodenbeschichtung
JP5457810B2 (ja) * 2009-12-07 2014-04-02 クロリンエンジニアズ株式会社 オゾン生成装置
US20110284391A1 (en) * 2010-05-21 2011-11-24 Verein fuer Kernve. und Analyt. Rosse. e.V. (VKTA) Process and apparatus for separating nitroaromatics from wastewater
TWI508872B (zh) * 2010-07-26 2015-11-21 Mitsubishi Rayon Co 奈米壓印用模具的製造裝置以及奈米壓印用模具的製造方法
JP2014502312A (ja) 2010-12-03 2014-01-30 エレクトロリティック、オゾン、インコーポレイテッド オゾン生成のための電解槽
EP2484629B1 (de) * 2011-02-03 2013-06-26 Nivarox-FAR S.A. Komplexes durchbrochenes mikromechanisches Bauteil
JP5777962B2 (ja) * 2011-07-14 2015-09-16 日本バイリーン株式会社 ダイヤモンド膜の製造方法
JP5882878B2 (ja) * 2012-11-08 2016-03-09 株式会社神戸製鋼所 ダイヤモンド電極及びダイヤモンド電極を用いたオゾン発生装置
DE102013202144A1 (de) 2013-02-08 2014-08-14 Bayer Materialscience Ag Elektrokatalysator, Elektrodenbeschichtung und Elektrode zur Herstellung von Chlor
DE102013202143A1 (de) 2013-02-08 2014-08-14 Bayer Materialscience Ag Katalysatorbeschichtung und Verfahren zu ihrer Herstellung
KR101480023B1 (ko) * 2014-05-29 2015-01-07 주식회사 아벡테크 다이아몬드 전극 및 그 제조 방법
CN110459455B (zh) * 2018-05-08 2020-05-05 中国科学院大连化学物理研究所 可实现接近常压气氛条件下工作的光发射电子显微成像方法及其成像系统
CN110459454B (zh) * 2018-05-08 2020-05-05 中国科学院大连化学物理研究所 一种将可调谐深紫外激光源与近常压光发射电子显微镜联合的成像系统及方法
JP7348422B1 (ja) * 2023-03-23 2023-09-20 住友化学株式会社 ダイヤモンド電極、およびダイヤモンド電極の製造方法
JP7322315B1 (ja) * 2023-03-31 2023-08-07 住友化学株式会社 ダイヤモンド電極

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR930701638A (ko) * 1991-06-24 1993-06-12 홍고오 므쯔미 다이어몬드류 피복부재 및 그 제조방법
DE19911746A1 (de) * 1999-03-16 2000-09-21 Basf Ag Diamantelektroden
US7332065B2 (en) * 2003-06-19 2008-02-19 Akzo Nobel N.V. Electrode

Also Published As

Publication number Publication date
DE602005002661T2 (de) 2008-01-31
EP1568798A2 (de) 2005-08-31
JP2005240074A (ja) 2005-09-08
US7273536B2 (en) 2007-09-25
EP1568798B1 (de) 2007-10-03
US20050186345A1 (en) 2005-08-25
EP1568798A3 (de) 2005-12-14
JP4456378B2 (ja) 2010-04-28

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