DE10216671A1 - Beschichtungsanlage - Google Patents

Beschichtungsanlage

Info

Publication number
DE10216671A1
DE10216671A1 DE2002116671 DE10216671A DE10216671A1 DE 10216671 A1 DE10216671 A1 DE 10216671A1 DE 2002116671 DE2002116671 DE 2002116671 DE 10216671 A DE10216671 A DE 10216671A DE 10216671 A1 DE10216671 A1 DE 10216671A1
Authority
DE
Germany
Prior art keywords
cathode
substrate
space
coating system
gas supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE2002116671
Other languages
German (de)
English (en)
Inventor
Michael Geisler
Albert Kastner
Bernd Szyszka
Andreas Pflug
Niels Malkomes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials GmbH and Co KG
Fraunhofer Institut fuer Schicht und Oberflaechentechnik IST
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Applied Films GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV, Applied Films GmbH and Co KG filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority to DE2002116671 priority Critical patent/DE10216671A1/de
Priority to EP03746233A priority patent/EP1495152A2/de
Priority to CN 03813834 priority patent/CN1662672A/zh
Priority to PCT/DE2003/001216 priority patent/WO2003087426A2/de
Priority to US10/511,389 priority patent/US20050145487A1/en
Priority to JP2003584359A priority patent/JP2005522584A/ja
Priority to AU2003232604A priority patent/AU2003232604A1/en
Publication of DE10216671A1 publication Critical patent/DE10216671A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0089—Reactive sputtering in metallic mode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0068—Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Fuel Cell (AREA)
DE2002116671 2002-04-15 2002-04-15 Beschichtungsanlage Withdrawn DE10216671A1 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE2002116671 DE10216671A1 (de) 2002-04-15 2002-04-15 Beschichtungsanlage
EP03746233A EP1495152A2 (de) 2002-04-15 2003-04-11 Beschichtungsanlage
CN 03813834 CN1662672A (zh) 2002-04-15 2003-04-11 覆层设备
PCT/DE2003/001216 WO2003087426A2 (de) 2002-04-15 2003-04-11 Beschichtungsanlage
US10/511,389 US20050145487A1 (en) 2002-04-15 2003-04-11 Coating installation
JP2003584359A JP2005522584A (ja) 2002-04-15 2003-04-11 被覆装置
AU2003232604A AU2003232604A1 (en) 2002-04-15 2003-04-11 Coating installation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2002116671 DE10216671A1 (de) 2002-04-15 2002-04-15 Beschichtungsanlage

Publications (1)

Publication Number Publication Date
DE10216671A1 true DE10216671A1 (de) 2003-12-18

Family

ID=29224490

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2002116671 Withdrawn DE10216671A1 (de) 2002-04-15 2002-04-15 Beschichtungsanlage

Country Status (6)

Country Link
EP (1) EP1495152A2 (ru)
JP (1) JP2005522584A (ru)
CN (1) CN1662672A (ru)
AU (1) AU2003232604A1 (ru)
DE (1) DE10216671A1 (ru)
WO (1) WO2003087426A2 (ru)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8192597B2 (en) * 2006-03-28 2012-06-05 Nv Bekaert Sa Coating apparatus

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4428811A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of a group IVb metal
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
JPS62287074A (ja) * 1986-06-04 1987-12-12 Sumitomo Bakelite Co Ltd ロ−ルコ−タ−装置
JPH042771A (ja) * 1990-04-18 1992-01-07 Fujitsu Ltd スパッタリング装置
JPH05132774A (ja) * 1991-11-12 1993-05-28 Fujitsu Ltd スパツタ装置
JPH0641733A (ja) * 1992-07-28 1994-02-15 Matsushita Electric Ind Co Ltd 反応性スパッタリング装置
JPH06172995A (ja) * 1992-12-09 1994-06-21 Tokyo Electron Ltd マグネトロンスパッタリング装置及びスパッタリングガン
DE4413378A1 (de) * 1994-04-19 1995-10-26 Leybold Ag Einrichtung zum Beschichten eines Substrats

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8200902A (nl) * 1982-03-05 1983-10-03 Philips Nv Magnetron-kathodesputtersysteem.
US5427665A (en) * 1990-07-11 1995-06-27 Leybold Aktiengesellschaft Process and apparatus for reactive coating of a substrate
ZA956811B (en) * 1994-09-06 1996-05-14 Boc Group Inc Dual cylindrical target magnetron with multiple anodes
DE19609970A1 (de) * 1996-03-14 1997-09-18 Leybold Systems Gmbh Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat
EP0860513A3 (en) * 1997-02-19 2000-01-12 Canon Kabushiki Kaisha Thin film forming apparatus and process for forming thin film using same
US6238527B1 (en) * 1997-10-08 2001-05-29 Canon Kabushiki Kaisha Thin film forming apparatus and method of forming thin film of compound by using the same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4428811A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of a group IVb metal
DE3331707A1 (de) * 1983-09-02 1985-03-21 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern
JPS62287074A (ja) * 1986-06-04 1987-12-12 Sumitomo Bakelite Co Ltd ロ−ルコ−タ−装置
JPH042771A (ja) * 1990-04-18 1992-01-07 Fujitsu Ltd スパッタリング装置
JPH05132774A (ja) * 1991-11-12 1993-05-28 Fujitsu Ltd スパツタ装置
JPH0641733A (ja) * 1992-07-28 1994-02-15 Matsushita Electric Ind Co Ltd 反応性スパッタリング装置
JPH06172995A (ja) * 1992-12-09 1994-06-21 Tokyo Electron Ltd マグネトロンスパッタリング装置及びスパッタリングガン
DE4413378A1 (de) * 1994-04-19 1995-10-26 Leybold Ag Einrichtung zum Beschichten eines Substrats

Also Published As

Publication number Publication date
EP1495152A2 (de) 2005-01-12
WO2003087426A2 (de) 2003-10-23
AU2003232604A8 (en) 2003-10-27
AU2003232604A1 (en) 2003-10-27
WO2003087426A3 (de) 2004-02-19
CN1662672A (zh) 2005-08-31
JP2005522584A (ja) 2005-07-28

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Legal Events

Date Code Title Description
OM8 Search report available as to paragraph 43 lit. 1 sentence 1 patent law
8127 New person/name/address of the applicant

Owner name: APPLIED FILMS GMBH & CO. KG, 63755 ALZENAU, DE

8127 New person/name/address of the applicant

Owner name: FRAUNHOFER INSTITUT FUER SCHICHT- UND OBERFLAECHENTECHNIK

Owner name: APPLIED FILMS GMBH & CO. KG, 63755 ALZENAU, DE

8127 New person/name/address of the applicant

Owner name: APPLIED MATERIALS GMBH & CO. KG, 63755 ALZENAU, DE

Owner name: VERITAS AG, 63571 GELNHAUSEN, DE

8127 New person/name/address of the applicant

Owner name: FRAUNHOFER INSTITUT FUER SCHICHT- UND OBERFLAE, DE

Owner name: APPLIED MATERIALS GMBH & CO. KG, 63755 ALZENAU, DE

8139 Disposal/non-payment of the annual fee