DE102015209175A1 - Pupillenfacettenspiegel - Google Patents

Pupillenfacettenspiegel Download PDF

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Publication number
DE102015209175A1
DE102015209175A1 DE102015209175.9A DE102015209175A DE102015209175A1 DE 102015209175 A1 DE102015209175 A1 DE 102015209175A1 DE 102015209175 A DE102015209175 A DE 102015209175A DE 102015209175 A1 DE102015209175 A1 DE 102015209175A1
Authority
DE
Germany
Prior art keywords
pupil
facet mirror
reflection surfaces
illumination
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102015209175.9A
Other languages
German (de)
English (en)
Inventor
Thomas Fischer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102015209175.9A priority Critical patent/DE102015209175A1/de
Priority to KR1020177033203A priority patent/KR102611719B1/ko
Priority to CN201680024997.1A priority patent/CN107567598B/zh
Priority to PCT/EP2016/060535 priority patent/WO2016184743A1/en
Priority to TW105115498A priority patent/TWI761304B/zh
Publication of DE102015209175A1 publication Critical patent/DE102015209175A1/de
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102015209175.9A 2015-05-20 2015-05-20 Pupillenfacettenspiegel Ceased DE102015209175A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102015209175.9A DE102015209175A1 (de) 2015-05-20 2015-05-20 Pupillenfacettenspiegel
KR1020177033203A KR102611719B1 (ko) 2015-05-20 2016-05-11 동공 패싯 미러
CN201680024997.1A CN107567598B (zh) 2015-05-20 2016-05-11 光瞳分面反射镜
PCT/EP2016/060535 WO2016184743A1 (en) 2015-05-20 2016-05-11 Pupil facet mirror
TW105115498A TWI761304B (zh) 2015-05-20 2016-05-19 光瞳琢面反射鏡、用以決定光瞳琢面反射鏡之設計的方法以及用以產生微結構或奈米結構組件的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102015209175.9A DE102015209175A1 (de) 2015-05-20 2015-05-20 Pupillenfacettenspiegel

Publications (1)

Publication Number Publication Date
DE102015209175A1 true DE102015209175A1 (de) 2016-11-24

Family

ID=55963367

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102015209175.9A Ceased DE102015209175A1 (de) 2015-05-20 2015-05-20 Pupillenfacettenspiegel

Country Status (5)

Country Link
KR (1) KR102611719B1 (zh)
CN (1) CN107567598B (zh)
DE (1) DE102015209175A1 (zh)
TW (1) TWI761304B (zh)
WO (1) WO2016184743A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11543753B2 (en) 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016205624B4 (de) * 2016-04-05 2017-12-28 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie, Beleuchtungssystem, Projektionsbelichtungsanlage und Verfahren zur Projektionsbelichtung
EP3614194A1 (en) * 2018-08-24 2020-02-26 ASML Netherlands B.V. Matching pupil determination

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1225481A2 (de) 2001-01-23 2002-07-24 Carl Zeiss Semiconductor Manufacturing Technologies Ag Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm
US6438199B1 (en) 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
US6658084B2 (en) 2000-10-27 2003-12-02 Carl Zeiss Smt Ag Illumination system with variable adjustment of the illumination
US6859328B2 (en) 1998-05-05 2005-02-22 Carl Zeiss Semiconductor Illumination system particularly for microlithography
US6859515B2 (en) 1998-05-05 2005-02-22 Carl-Zeiss-Stiftung Trading Illumination system, particularly for EUV lithography
WO2009100856A1 (en) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facet mirror for use in a projection exposure apparatus for microlithography
DE102008001511A1 (de) * 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
US20130335720A1 (en) 2010-11-09 2013-12-19 Hideo Takino Reflecting optical member, optical system, exposure apparatus, and device manufacturing method
DE102012216502A1 (de) 2012-09-17 2014-03-20 Carl Zeiss Smt Gmbh Spiegel
WO2014060170A1 (en) * 2012-10-15 2014-04-24 Asml Netherlands B.V. Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002067021A1 (fr) * 2001-02-23 2002-08-29 Nikon Corporation Reflecteur polygone, et systeme optique d'eclairage et dispositif d'exposition a semi-conducteurs utilisant le reflecteur polygone
JP2004264561A (ja) * 2003-02-28 2004-09-24 Omron Corp 反射板、該反射板を用いた表示装置、該表示装置を用いた電子機器
KR20060013005A (ko) * 2004-08-05 2006-02-09 삼성전자주식회사 마스크, 박막트랜지스터 기판, 이의 제조 방법 및 이를갖는 표시장치
ES2346395B1 (es) * 2009-04-01 2011-10-03 Lledo Iluminacion S.A. Reflector de revolucion con estructura facetada basada en el numero aureo.
CN102695988B (zh) * 2009-12-23 2015-09-02 Asml荷兰有限公司 光刻设备以及器件制造方法
DE102011003928B4 (de) * 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011086345A1 (de) * 2011-11-15 2013-05-16 Carl Zeiss Smt Gmbh Spiegel
DE102012010093A1 (de) * 2012-05-23 2013-11-28 Carl Zeiss Smt Gmbh Facettenspiegel
DE102012020257A1 (de) * 2012-10-16 2014-04-17 Giesecke & Devrient Gmbh Optisch variables Flächenmuster
DE102013212363A1 (de) * 2013-06-27 2014-07-31 Carl Zeiss Smt Gmbh Facettenspiegel, insbesondere für die EUV-Projektionslithografie
DE102013219057A1 (de) * 2013-09-23 2015-03-26 Carl Zeiss Smt Gmbh Facettenspiegel für eine Projektionsbelichtungsanlage

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6438199B1 (en) 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
US6859328B2 (en) 1998-05-05 2005-02-22 Carl Zeiss Semiconductor Illumination system particularly for microlithography
US6859515B2 (en) 1998-05-05 2005-02-22 Carl-Zeiss-Stiftung Trading Illumination system, particularly for EUV lithography
US6658084B2 (en) 2000-10-27 2003-12-02 Carl Zeiss Smt Ag Illumination system with variable adjustment of the illumination
EP1225481A2 (de) 2001-01-23 2002-07-24 Carl Zeiss Semiconductor Manufacturing Technologies Ag Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm
WO2009100856A1 (en) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facet mirror for use in a projection exposure apparatus for microlithography
US20110001947A1 (en) 2008-02-15 2011-01-06 Carl Zeiss Smt Ag Facet mirror for use in a projection exposure apparatus for microlithography
DE102008001511A1 (de) * 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
US20130335720A1 (en) 2010-11-09 2013-12-19 Hideo Takino Reflecting optical member, optical system, exposure apparatus, and device manufacturing method
DE102012216502A1 (de) 2012-09-17 2014-03-20 Carl Zeiss Smt Gmbh Spiegel
WO2014060170A1 (en) * 2012-10-15 2014-04-24 Asml Netherlands B.V. Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11543753B2 (en) 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems

Also Published As

Publication number Publication date
KR102611719B1 (ko) 2023-12-08
TWI761304B (zh) 2022-04-21
WO2016184743A1 (en) 2016-11-24
CN107567598A (zh) 2018-01-09
CN107567598B (zh) 2021-01-29
TW201702637A (zh) 2017-01-16
KR20180008494A (ko) 2018-01-24

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R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final