DE102014018435A1 - Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen - Google Patents

Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen Download PDF

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Publication number
DE102014018435A1
DE102014018435A1 DE102014018435.8A DE102014018435A DE102014018435A1 DE 102014018435 A1 DE102014018435 A1 DE 102014018435A1 DE 102014018435 A DE102014018435 A DE 102014018435A DE 102014018435 A1 DE102014018435 A1 DE 102014018435A1
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DE
Germany
Prior art keywords
general formula
ring size
hexachlorodisilane
mixture
cycloalkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102014018435.8A
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German (de)
English (en)
Inventor
Martin Katz
Michael Schley
Friedrich Schaaff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Silicon Products Bitterfeld Gmbh&co KG
Silicon Products Bitterfeld Gmbh&coKg
Original Assignee
Silicon Products Bitterfeld Gmbh&co KG
Silicon Products Bitterfeld Gmbh&coKg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silicon Products Bitterfeld Gmbh&co KG, Silicon Products Bitterfeld Gmbh&coKg filed Critical Silicon Products Bitterfeld Gmbh&co KG
Priority to DE102014018435.8A priority Critical patent/DE102014018435A1/de
Priority to KR1020177015427A priority patent/KR20170091623A/ko
Priority to PCT/DE2015/000562 priority patent/WO2016091240A1/fr
Priority to EP15825916.8A priority patent/EP3230206A1/fr
Priority to CN201580075776.2A priority patent/CN107207267A/zh
Publication of DE102014018435A1 publication Critical patent/DE102014018435A1/de
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
    • B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
    • B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
    • B01J31/0235—Nitrogen containing compounds
    • B01J31/0237—Amines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
    • B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
    • B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
    • B01J31/0235—Nitrogen containing compounds
    • B01J31/0239—Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10778—Purification

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
DE102014018435.8A 2014-12-10 2014-12-10 Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen Withdrawn DE102014018435A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102014018435.8A DE102014018435A1 (de) 2014-12-10 2014-12-10 Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen
KR1020177015427A KR20170091623A (ko) 2014-12-10 2015-11-20 공정 배출가스 흐름 내에 함유된 클로로실란 혼합물로부터 헥사클로로디실란의 회수 방법
PCT/DE2015/000562 WO2016091240A1 (fr) 2014-12-10 2015-11-20 Procédé pour la production d'hexachlorodisilane à partir de mélanges de chlorosilanes contenus dans des flux d'effluents gazeux de procédé
EP15825916.8A EP3230206A1 (fr) 2014-12-10 2015-11-20 Procédé pour la production d'hexachlorodisilane à partir de mélanges de chlorosilanes contenus dans des flux d'effluents gazeux de procédé
CN201580075776.2A CN107207267A (zh) 2014-12-10 2015-11-20 由在工艺废气流中所含的氯硅烷混合物获得六氯乙硅烷的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014018435.8A DE102014018435A1 (de) 2014-12-10 2014-12-10 Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen

Publications (1)

Publication Number Publication Date
DE102014018435A1 true DE102014018435A1 (de) 2016-06-16

Family

ID=55174478

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102014018435.8A Withdrawn DE102014018435A1 (de) 2014-12-10 2014-12-10 Verfahren zur Gewinnung von Hexachlordisilan aus in Prozessabgasströmen enthaltenen Gemischen von Chlorsilanen

Country Status (5)

Country Link
EP (1) EP3230206A1 (fr)
KR (1) KR20170091623A (fr)
CN (1) CN107207267A (fr)
DE (1) DE102014018435A1 (fr)
WO (1) WO2016091240A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI791547B (zh) 2017-07-31 2023-02-11 中國大陸商南大光電半導體材料有限公司 製備五氯二矽烷之方法及包含五氯二矽烷之經純化的反應產物
WO2021164876A1 (fr) * 2020-02-20 2021-08-26 Wacker Chemie Ag Procédé d'obtention d'hexachlorodisilane par réaction d'au moins un chlorodisilane partiellement hydrogéné sur un adsorbeur solide non fonctionnalisé
CN112479212B (zh) * 2020-12-16 2022-06-28 亚洲硅业(青海)股份有限公司 一种六氯乙硅烷提纯装置及方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1142848B (de) 1958-06-25 1963-01-31 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinem Siliciumhexachlorid
DE3503262A1 (de) 1985-01-31 1986-08-07 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zum aufarbeiten von bei der siliciumherstellung anfallenden halogensilangemischen
EP1264798A1 (fr) 2000-08-02 2002-12-11 Mitsubishi Materials Polycrystalline Silicon Corporation Procede de production d'hexachlorure de disilicium
JP2006176357A (ja) * 2004-12-22 2006-07-06 Sumitomo Titanium Corp ヘキサクロロジシランの製造方法
WO2008051328A1 (fr) * 2006-10-24 2008-05-02 Dow Corning Corporation Composition comprenant du néopentasilane et procédé de préparation
DE102007000841A1 (de) * 2007-10-09 2009-04-16 Wacker Chemie Ag Verfahren zur Herstellung von hochreinem Hexachlordisilan
US20090104100A1 (en) 2006-03-07 2009-04-23 Hiroshi Imamura Method for detoxifying hcd gas and apparatus therefor
DE102010043649A1 (de) * 2010-11-09 2012-05-10 Evonik Degussa Gmbh Verfahren zur Spaltung höherer Silane
EP2036859B1 (fr) 2007-09-05 2012-08-22 Shin-Etsu Chemical Co., Ltd. Procédé de production de silicium polycristallin
EP2544795B1 (fr) 2010-03-12 2014-04-30 Wacker Chemie AG Procédé pour l'élimination de vapeurs contenant de l'hexachlorodisilane

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2067745B1 (fr) * 2007-11-30 2017-07-12 Mitsubishi Materials Corporation Procédé pour séparer et récupérer des gaz de réaction de conversion
DE102009053804B3 (de) * 2009-11-18 2011-03-17 Evonik Degussa Gmbh Verfahren zur Herstellung von Hydridosilanen
DE102010043648A1 (de) * 2010-11-09 2012-05-10 Evonik Degussa Gmbh Verfahren zur selektiven Spaltung höherer Silane

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1142848B (de) 1958-06-25 1963-01-31 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinem Siliciumhexachlorid
DE3503262A1 (de) 1985-01-31 1986-08-07 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zum aufarbeiten von bei der siliciumherstellung anfallenden halogensilangemischen
EP1264798A1 (fr) 2000-08-02 2002-12-11 Mitsubishi Materials Polycrystalline Silicon Corporation Procede de production d'hexachlorure de disilicium
JP2006176357A (ja) * 2004-12-22 2006-07-06 Sumitomo Titanium Corp ヘキサクロロジシランの製造方法
US20090104100A1 (en) 2006-03-07 2009-04-23 Hiroshi Imamura Method for detoxifying hcd gas and apparatus therefor
WO2008051328A1 (fr) * 2006-10-24 2008-05-02 Dow Corning Corporation Composition comprenant du néopentasilane et procédé de préparation
EP2036859B1 (fr) 2007-09-05 2012-08-22 Shin-Etsu Chemical Co., Ltd. Procédé de production de silicium polycristallin
DE102007000841A1 (de) * 2007-10-09 2009-04-16 Wacker Chemie Ag Verfahren zur Herstellung von hochreinem Hexachlordisilan
EP2544795B1 (fr) 2010-03-12 2014-04-30 Wacker Chemie AG Procédé pour l'élimination de vapeurs contenant de l'hexachlorodisilane
DE102010043649A1 (de) * 2010-11-09 2012-05-10 Evonik Degussa Gmbh Verfahren zur Spaltung höherer Silane

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP 2006 176 357 A (Maschinenübersetzung), AIPN [online] JPO [abgerufen am 25.09.2015] und Derwent-abstract, AN_WPI : 2006514913

Also Published As

Publication number Publication date
EP3230206A1 (fr) 2017-10-18
KR20170091623A (ko) 2017-08-09
CN107207267A (zh) 2017-09-26
WO2016091240A1 (fr) 2016-06-16

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R016 Response to examination communication
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee