DE102014007522A1 - Trägeranordnung für eine Verdampferquelle - Google Patents

Trägeranordnung für eine Verdampferquelle Download PDF

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Publication number
DE102014007522A1
DE102014007522A1 DE102014007522.2A DE102014007522A DE102014007522A1 DE 102014007522 A1 DE102014007522 A1 DE 102014007522A1 DE 102014007522 A DE102014007522 A DE 102014007522A DE 102014007522 A1 DE102014007522 A1 DE 102014007522A1
Authority
DE
Germany
Prior art keywords
evaporator
evaporator source
steam distributor
source
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102014007522.2A
Other languages
German (de)
English (en)
Inventor
Georg Voorwinden
Erwin Gross
Ulrich Englert
Armin Sorg
Axel Straub
Philipp von Bismarck
Michael Pisch
Lioudmila Knoth
Alexander Marienfeld
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zentrum fur Sonnenenergie- und Wasserstoff-Fo De
Nice Solar Energy GmbH
Original Assignee
Zentrum fuer Sonnenenergie und Wasserstoff Forschung Baden Wuerttemberg
Manz AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zentrum fuer Sonnenenergie und Wasserstoff Forschung Baden Wuerttemberg, Manz AG filed Critical Zentrum fuer Sonnenenergie und Wasserstoff Forschung Baden Wuerttemberg
Priority to DE102014007522.2A priority Critical patent/DE102014007522A1/de
Priority to CN201580026919.0A priority patent/CN106414790B/zh
Priority to PCT/EP2015/061130 priority patent/WO2015177219A1/de
Priority to CN201811574378.7A priority patent/CN109609904A/zh
Publication of DE102014007522A1 publication Critical patent/DE102014007522A1/de
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
DE102014007522.2A 2014-05-23 2014-05-23 Trägeranordnung für eine Verdampferquelle Withdrawn DE102014007522A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE102014007522.2A DE102014007522A1 (de) 2014-05-23 2014-05-23 Trägeranordnung für eine Verdampferquelle
CN201580026919.0A CN106414790B (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置
PCT/EP2015/061130 WO2015177219A1 (de) 2014-05-23 2015-05-20 Trägeranordnung für eine verdampferquelle
CN201811574378.7A CN109609904A (zh) 2014-05-23 2015-05-20 用于蒸发器源的承载器装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014007522.2A DE102014007522A1 (de) 2014-05-23 2014-05-23 Trägeranordnung für eine Verdampferquelle

Publications (1)

Publication Number Publication Date
DE102014007522A1 true DE102014007522A1 (de) 2015-11-26

Family

ID=53433158

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102014007522.2A Withdrawn DE102014007522A1 (de) 2014-05-23 2014-05-23 Trägeranordnung für eine Verdampferquelle

Country Status (3)

Country Link
CN (2) CN109609904A (ko)
DE (1) DE102014007522A1 (ko)
WO (1) WO2015177219A1 (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19820859A1 (de) * 1998-05-09 1999-11-11 Leybold Systems Gmbh Vorrichtung zum Beschichten flacher Substrate
US20100285218A1 (en) 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20120122276A1 (en) * 2006-04-20 2012-05-17 Volker Probst Thermal evaporation apparatus, use and method of depositing a material
DE102011056645A1 (de) * 2010-12-20 2012-06-21 General Electric Co. Dampfabscheidungsvorrichtung und Verfahren zur kontinuierlichen Abscheidung einer dotierten Dünnfilmschicht auf einem Substrat

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5167984A (en) * 1990-12-06 1992-12-01 Xerox Corporation Vacuum deposition process
JP3237399B2 (ja) * 1994-06-03 2001-12-10 東洋インキ製造株式会社 真空蒸着装置
EP1695038B1 (en) * 2003-12-12 2013-02-13 Semequip, Inc. Controlling the flow of vapors sublimated from solids
US8986455B2 (en) * 2007-10-12 2015-03-24 Jln Solar, Inc. Thermal evaporation sources for wide-area deposition
EP2088612A1 (en) * 2007-12-21 2009-08-12 Applied Materials, Inc. Method of heating or cleaning a web or foil
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
CN102712993A (zh) * 2009-11-30 2012-10-03 维易科精密仪器国际贸易(上海)有限公司 直线淀积源
US20110275196A1 (en) * 2010-05-03 2011-11-10 University Of Delaware Thermal Evaporation Sources with Separate Crucible for Holding the Evaporant Material
CN103545460B (zh) * 2012-07-10 2017-04-12 三星显示有限公司 有机发光显示装置、有机发光显示设备及其制造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19820859A1 (de) * 1998-05-09 1999-11-11 Leybold Systems Gmbh Vorrichtung zum Beschichten flacher Substrate
US20120122276A1 (en) * 2006-04-20 2012-05-17 Volker Probst Thermal evaporation apparatus, use and method of depositing a material
US20100285218A1 (en) 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
DE102011056645A1 (de) * 2010-12-20 2012-06-21 General Electric Co. Dampfabscheidungsvorrichtung und Verfahren zur kontinuierlichen Abscheidung einer dotierten Dünnfilmschicht auf einem Substrat

Also Published As

Publication number Publication date
CN106414790A (zh) 2017-02-15
WO2015177219A1 (de) 2015-11-26
CN106414790B (zh) 2019-01-04
CN109609904A (zh) 2019-04-12

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Legal Events

Date Code Title Description
R012 Request for examination validly filed
R081 Change of applicant/patentee

Owner name: MANZ CIGS TECHNOLOGY GMBH, DE

Free format text: FORMER OWNER: MANZ AG, 72768 REUTLINGEN, DE

Owner name: ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FO, DE

Free format text: FORMER OWNER: MANZ AG, 72768 REUTLINGEN, DE

R082 Change of representative

Representative=s name: QUERMANN STURM WEILNAU PATENTANWAELTE PARTNERS, DE

R081 Change of applicant/patentee

Owner name: NICE SOLAR ENERGY GMBH, DE

Free format text: FORMER OWNERS: MANZ AG, 72768 REUTLINGEN, DE; ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FORSCHUNG BADEN-WUERTTEMBERG(ZSW), 70565 STUTTGART, DE

Owner name: MANZ CIGS TECHNOLOGY GMBH, DE

Free format text: FORMER OWNERS: MANZ AG, 72768 REUTLINGEN, DE; ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FORSCHUNG BADEN-WUERTTEMBERG(ZSW), 70565 STUTTGART, DE

Owner name: ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FO, DE

Free format text: FORMER OWNERS: MANZ AG, 72768 REUTLINGEN, DE; ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FORSCHUNG BADEN-WUERTTEMBERG(ZSW), 70565 STUTTGART, DE

R082 Change of representative

Representative=s name: PATENTANWAELTE STURM WEILNAU FRANKE PARTNERSCH, DE

Representative=s name: QUERMANN STURM WEILNAU PATENTANWAELTE PARTNERS, DE

R081 Change of applicant/patentee

Owner name: NICE SOLAR ENERGY GMBH, DE

Free format text: FORMER OWNERS: MANZ CIGS TECHNOLOGY GMBH, 74523 SCHWAEBISCH HALL, DE; ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FORSCHUNG BADEN-WUERTTEMBERG(ZSW), 70565 STUTTGART, DE

Owner name: ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FO, DE

Free format text: FORMER OWNERS: MANZ CIGS TECHNOLOGY GMBH, 74523 SCHWAEBISCH HALL, DE; ZENTRUM FUER SONNENENERGIE- UND WASSERSTOFF-FORSCHUNG BADEN-WUERTTEMBERG(ZSW), 70565 STUTTGART, DE

R082 Change of representative

Representative=s name: QUERMANN STURM WEILNAU PATENTANWAELTE PARTNERS, DE

Representative=s name: PATENTANWAELTE STURM WEILNAU FRANKE PARTNERSCH, DE

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee